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    • 8. 发明申请
    • Photodiode Array
    • 光电二极管阵列
    • US20090121306A1
    • 2009-05-14
    • US11793651
    • 2005-12-21
    • Yoshitaka Ishikawa
    • Yoshitaka Ishikawa
    • H01L31/09
    • H01L27/14663H01L27/1446H01L27/1463H01L31/107
    • The present invention provides a photodiode array which can secure a sufficient aperture ratio with respect to light to be detected while restraining crosstalk between photodetecting channels even during operation in Geiger mode. In a photodiode array 1, resistors 42 and wirings 43 to be electrically connected to avalanche multipliers 6, respectively, are collectively formed on the upper surface side of a semiconductor substrate 2. Therefore, by setting the lower surface side of the semiconductor substrate 2 as a light-incident side, a sufficient aperture ratio can be secured while restraining crosstalk between photodetecting channels 10 by separators 5. Furthermore, on the lower surface side of the semiconductor substrate 2, accumulation layers 7 are formed, so that high quantum efficiency in each photodetecting channel 10 is secured and the effective aperture ratio is improved. The accumulation layers 7 lower the contact resistance between the semiconductor substrate 2 and the transparent electrode layer 3 and make it possible to form a satisfactory contact.
    • 本发明提供一种光电二极管阵列,即使在盖革模式下操作时,也能够在抑制光检测通道之间的串扰的同时,确保相对于被检测光的足够的开口率。 在光电二极管阵列1中,分别与半导体衬底2的上表面侧电连接到雪崩倍增器6的电阻器42和布线43共同形成。因此,通过将半导体衬底2的下表面侧设置为 光入射侧,通过隔膜5抑制光检测通道10之间的串扰,可以确保充分的开口率。此外,在半导体基板2的下表面侧形成有积累层7,从而在每个 光电检测通道10被固定,有效开口率得到改善。 累积层7降低半导体衬底2和透明电极层3之间的接触电阻,并且可以形成令人满意的接触。
    • 9. 发明授权
    • Photomultiplier having a multilayer semiconductor device
    • 具有多层半导体器件的光电倍增管
    • US5654536A
    • 1997-08-05
    • US557541
    • 1995-11-14
    • Motohiro SuyamaMasaharu MuramatsuMakoto OishiYoshitaka IshikawaKoei Yamamoto
    • Motohiro SuyamaMasaharu MuramatsuMakoto OishiYoshitaka IshikawaKoei Yamamoto
    • H01J43/04H01J43/12H01L31/107H01J40/14
    • H01L31/1075H01J43/04H01J43/12
    • In a photomultiplier of the present invention, a semiconductor device arranged in an envelope to oppose a photocathode is constituted by a semiconductor substrate of a first conductivity type, a carrier multiplication layer of a second conductivity type different from the first conductivity type, which is formed on the semiconductor substrate by opitaxial growth, a breakdown voltage control layer of the second conductivity type, which is formed on the carrier multiplication layer and has a dopant concentration higher than that of the carrier multiplication layer, a first insulating layer formed on the breakdown voltage control layer and said carrier multiplication layer while partially exposing the surface of the breakdown voltage control layer as a receptor for photoelectrons and consisting of a nitride, and an ohmic electrode layer formed on a peripheral surface portion of the receptor of the breakdown voltage control layer. When the dopant concentration distribution in the carrier multiplication layer is uniformly controlled on the basis of epitaxial growth, the uniformity of an avalanche multiplication gain for photoelectrons incident at different positions on the receptor of the semiconductor device is improved, thereby largely increasing the energy resolving power.
    • 在本发明的光电倍增器中,布置在外壳中以与光电阴极相对的半导体器件由第一导电类型的半导体衬底,不同于第一导电类型的第二导电类型的载流子倍增层构成,形成 在所述半导体衬底上通过外延生长形成第二导电类型的击穿电压控制层,所述第二导电类型的击穿电压控制层形成在所述载体倍增层上并且具有高于载流子倍增层的掺杂剂浓度的第一绝缘层, 控制层和所述载体倍增层,同时部分地暴露作为光电子的受体的击穿电压控制层的表面,并由氮化物和形成在击穿电压控制层的受体的外围表面部分上的欧姆电极层组成。 当基于外延生长均匀地控制载体倍增层中的掺杂剂浓度分布时,提高入射在半导体器件的接收器上的不同位置处的光电子的雪崩倍增益的均匀性,从而大大提高能量分辨能力 。