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    • 2. 发明授权
    • Image outputting system
    • 图像输出系统
    • US07310159B1
    • 2007-12-18
    • US09707765
    • 2000-11-08
    • Haruo SoedaYoshiki KawaokaHiroyuki Yoshinaga
    • Haruo SoedaYoshiki KawaokaHiroyuki Yoshinaga
    • G06F3/12G06K15/00
    • G06K15/00B41J29/393G06F3/1208G06F3/1229G06F3/1288G06K15/1805G06K15/1809H04N1/00015H04N1/00034H04N1/00058H04N1/00079H04N1/00082H04N1/3871H04N1/6091
    • An image outputting system that can keep the printed image quality always in good condition by correcting printing color tone based on printing color correcting information received via a network. The image outputting system comprises: an image outputting apparatus including a flat-bed scanner for reading an image, printers for printing the image, a network interface or a modem connectable with external devices via a network, and a correcting device for correcting printing color tone based on printing color correcting information received via the network; and a network server connected to the network for sending the printing color correcting information to the image outputting apparatus via the network. Thus, the network server controls the printing unit based on status information acquired from the image outputting apparatus and always keep the printed image quality in good condition.
    • 通过基于通过网络接收的打印色彩校正信息来校正打印色调,可以使打印的图像质量始终保持良好状态的图像输出系统。 图像输出系统包括:图像输出装置,包括用于读取图像的平板扫描仪,用于打印图像的打印机,经由网络与外部设备连接的网络接口或调制解调器,以及用于校正打印色调的校正装置 基于经由网络接收的打印颜色校正信息; 以及连接到网络的网络服务器,用于经由网络将打印色彩校正信息发送到图像输出装置。 因此,网络服务器基于从图像输出装置获取的状态信息来控制打印单元,并且始终保持打印的图像质量良好。
    • 3. 发明申请
    • METHOD FOR PRODUCING SEMICONDUCTOR OPTICAL DEVICE AND SEMICONDUCTOR OPTICAL DEVICE
    • 用于生产半导体光学器件和半导体光学器件的方法
    • US20120094415A1
    • 2012-04-19
    • US13267952
    • 2011-10-07
    • Hideki YAGIHiroyuki Yoshinaga
    • Hideki YAGIHiroyuki Yoshinaga
    • H01L33/08
    • H01S5/0202H01S5/0203H01S5/22H01S5/2213
    • A method for producing a semiconductor optical device includes the steps of forming a semiconductor region including a ridge structure on a substrate; forming an insulating film on the semiconductor region; forming a non-photosensitive resin region on the insulating film, forming a first mask that defines a scribe area; forming the scribe area by etching using the first mask; after removing the first mask, forming an insulating layer by etching the insulating film, forming an electrode on the ridge structure and the non-photosensitive resin region to produce a substrate product; forming a scribe line on a surface of the semiconductor region in the scribe area of the substrate product; and cutting the product along the scribe line to form a semiconductor laser bar.
    • 一种制造半导体光学器件的方法包括以下步骤:在衬底上形成包括脊结构的半导体区域; 在半导体区域上形成绝缘膜; 在所述绝缘膜上形成非感光性树脂区域,形成限定划线区域的第一掩模; 通过使用第一掩模的蚀刻形成划线区域; 在去除第一掩模之后,通过蚀刻绝缘膜形成绝缘层,在脊结构和非感光树脂区上形成电极以产生基底产物; 在基板产品的划线区域中的半导体区域的表面上形成划线; 并沿着划线切割产品以形成半导体激光条。
    • 5. 发明授权
    • Method for producing semiconductor optical device
    • 半导体光学元件的制造方法
    • US08617969B2
    • 2013-12-31
    • US13530154
    • 2012-06-22
    • Kenji SakuraiHideki YagiHiroyuki Yoshinaga
    • Kenji SakuraiHideki YagiHiroyuki Yoshinaga
    • H01L21/00
    • H01L33/0075H01S5/2275
    • A method for producing a semiconductor optical device includes the steps of growing a semiconductor stacked layer including an etch stop layer and a plurality of semiconductor layers on a major surface of a substrate; forming a mask layer on a top surface of the semiconductor stacked layer so that a tip portion of each of protrusions that protrude from the top surface among protrusions generated in the step of growing the semiconductor stacked layer is exposed; etching the protrusion by wet etching using the mask layer; after etching the protrusion by wet etching, removing the protrusion by dry etching; and removing the mask layer from the top surface, after removing the protrusion by dry etching.
    • 一种制造半导体光学器件的方法包括以下步骤:在衬底的主表面上生长包括蚀刻停止层和多个半导体层的半导体堆叠层; 在所述半导体层叠层的顶面上形成掩模层,使得在所述半导体堆叠层的生长步骤中产生的突起中从所述顶面突出的突起的前端部露出; 通过使用掩模层的湿蚀刻来蚀刻突起; 在通过湿蚀刻蚀刻突起之后,通过干蚀刻去除突起; 并且通过干蚀刻去除突起之后从顶表面去除掩模层。
    • 7. 发明申请
    • Electrostatic discharge protection circuit
    • 静电放电保护电路
    • US20050162790A1
    • 2005-07-28
    • US10924195
    • 2004-08-24
    • Hiroyuki Yoshinaga
    • Hiroyuki Yoshinaga
    • H01L27/04H01L21/822H01L27/02H01L27/06H02H9/00
    • H01L27/0251H01L2924/0002H01L2924/00
    • An electrostatic discharge protection circuit comprises an input terminal, an output terminal connected to the input terminal via a transmission line, and connected to a circuit to be protected, and a filter circuit disposed in the transmission line, wherein the filter circuit includes at least one inductor disposed in the transmission line between the input terminal and the output terminal, and connected in series when a plurality of inductors are arranged, and at least one electrostatic discharge protection device connected between the transmission line and a reference potential line, the filter circuit being symmetrically configured in terms of an equivalent circuit between the input terminal and the output terminal.
    • 一种静电放电保护电路,包括输入端子,经由传输线路连接到输入端子并连接到待保护电路的输出端子和设置在传输线路中的滤波电路,其中滤波电路包括至少一个 电感器设置在输入端子和输出端子之间的传输线中,并且当布置多个电感器时串联连接,并且至少一个静电放电保护器件连接在传输线和参考电位线之间,滤波器电路是 根据输入端子和输出端子之间的等效电路对称地配置。
    • 9. 发明授权
    • Method for producing semiconductor optical device and semiconductor optical device
    • 半导体光学器件和半导体光学器件的制造方法
    • US08450128B2
    • 2013-05-28
    • US13267952
    • 2011-10-07
    • Hideki YagiHiroyuki Yoshinaga
    • Hideki YagiHiroyuki Yoshinaga
    • H01L21/00
    • H01S5/0202H01S5/0203H01S5/22H01S5/2213
    • A method for producing a semiconductor optical device includes the steps of forming a semiconductor region including a ridge structure on a substrate; forming an insulating film on the semiconductor region; forming a non-photosensitive resin region on the insulating film, forming a first mask that defines a scribe area; forming the scribe area by etching using the first mask; after removing the first mask, forming an insulating layer by etching the insulating film, forming an electrode on the ridge structure and the non-photosensitive resin region to produce a substrate product; forming a scribe line on a surface of the semiconductor region in the scribe area of the substrate product; and cutting the product along the scribe line to form a semiconductor laser bar.
    • 一种制造半导体光学器件的方法包括以下步骤:在衬底上形成包括脊结构的半导体区域; 在半导体区域上形成绝缘膜; 在所述绝缘膜上形成非感光性树脂区域,形成限定划线区域的第一掩模; 通过使用第一掩模的蚀刻形成划线区域; 在去除第一掩模之后,通过蚀刻绝缘膜形成绝缘层,在脊结构和非感光树脂区上形成电极以产生基底产物; 在基板产品的划线区域中的半导体区域的表面上形成划线; 并沿着划线切割产品以形成半导体激光条。
    • 10. 发明授权
    • Electrostatic protection circuit
    • 静电保护电路
    • US07570467B2
    • 2009-08-04
    • US11237149
    • 2005-09-27
    • Kentaro WatanabeHiroyuki Yoshinaga
    • Kentaro WatanabeHiroyuki Yoshinaga
    • H02H9/00
    • H01L27/0262
    • An electrostatic protection circuit being an integrated circuit on a semiconductor substrate and including a first power supply terminal having a predetermined potential VDD, a second power supply terminal having a lower potential VSS than the predetermined potential, and an input/output terminal for a signal, the electrostatic protection circuit including: a first and second diodes having the respective cathode electrodes thereof connected in series at a first common connection point between the first power supply terminal and input/output terminal; a third and fourth diodes having the respective anode electrodes thereof connected in series at a second common connection point between the second power supply terminal and input/output terminal; a first discharge element, connected between the first and second common connection points, for discharging excessive static electricity; and a second discharge element, connected between the first and second power supply terminals, for discharging excessive static electricity.
    • 一种静电保护电路,是半导体衬底上的集成电路,包括具有预定电位VDD的第一电源端子,具有比预定电位低的电位VSS的第二电源端子和用于信号的输入/输出端子, 所述静电保护电路包括:第一和第二二极管,其第一和第二二极管具有在第一电源端子和输入/输出端子之间的第一公共连接点串联连接的各个阴极电极; 第三和第四二极管,其各自的阳极电极在第二电源端子和输入/输出端子之间的第二公共连接点处串联连接; 第一放电元件,连接在第一和第二公共连接点之间,用于释放过多的静电; 以及第二放电元件,连接在第一和第二电源端子之间,用于释放过多的静电。