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    • 5. 发明授权
    • Pattern inspection apparatus and pattern inspection method
    • 图案检验装置和图案检验方法
    • US08698081B2
    • 2014-04-15
    • US13317860
    • 2011-10-31
    • Takayuki NakamuraTsutomu Murakawa
    • Takayuki NakamuraTsutomu Murakawa
    • H01J37/28
    • H01J37/28G01N23/225
    • The pattern inspection apparatus includes: an irradiator irradiating a sample with an electron beam; an electron detector detecting an amount of electrons generated on the sample having a pattern formed thereon, by the irradiation of the electron beam; an image processor generating a SEM image of the pattern on the basis of the electron amount; and a controller acquiring defect position information on the pattern formed on the sample from an optical defect inspection device. The controller specifies a defect candidate pattern from the SEM image on the basis of the defect position information and judges whether a defect in the defect candidate pattern is to be transferred onto a wafer. The controller determines a view field of the SEM image on the basis of the defect position information and specifies the defect candidate pattern from image information on patterns displayed in the view field.
    • 图案检查装置包括:用电子束照射样品的照射器; 电子检测器,通过电子束的照射检测在其上形成有图案的样品上产生的电子的量; 基于电子量产生图案的SEM图像的图像处理器; 以及控制器从光学缺陷检查装置获取关于在样品上形成的图案的缺陷位置信息。 控制器基于缺陷位置信息从SEM图像指定缺陷候选图案,并判断缺陷候选图案中的缺陷是否被转印到晶片上。 控制器基于缺陷位置信息确定SEM图像的视野,并根据视场中显示的图案的图像信息指定缺陷候选模式。
    • 7. 发明申请
    • GUIDE ASSEMBLY FOR ENDOSCOPE
    • 内镜指南大会
    • US20120302830A1
    • 2012-11-29
    • US13479598
    • 2012-05-24
    • Tsuyoshi AshidaTakayuki NakamuraShinichi YamakawaYasunori Ohta
    • Tsuyoshi AshidaTakayuki NakamuraShinichi YamakawaYasunori Ohta
    • A61B1/00
    • A61B1/0016A61B1/00135A61B1/00154
    • An endoscope includes a head assembly having a first central axis for entry in a body cavity. In combination with the endoscope, a guide assembly includes a shaft sleeve having a lumen, for mounting on the head assembly therewith. An endless track device is supported around the shaft sleeve, for endlessly moving along the first central axis, for propulsion of the head assembly inside the body cavity. A support sleeve is disposed between the shaft sleeve and the endless track device, having a second central axis different from the first central axis, for supporting the endless track device movably. Preferably, the endoscope includes an imaging window area formed in a distal surface of the head assembly and offset from the first central axis. A position shift between the first and second central axes is predetermined according to a position shift between the imaging window area and the first central axis.
    • 内窥镜包括具有用于进入体腔的第一中心轴线的头部组件。 与内窥镜组合,引导组件包括具有内腔的轴套,用于安装在头部组件上。 环形轨道装置被支撑在轴套周围,用于沿着第一中心轴线不停地移动,用于将头部组件推进到体腔内。 支撑套筒设置在轴套和环形轨道装置之间,具有不同于第一中心轴线的第二中心轴线,用于可移动地支撑环形轨道装置。 优选地,内窥镜包括形成在头部组件的远侧表面中并与第一中心轴线偏移的成像窗口区域。 第一和第二中心轴之间的位置偏移根据成像窗口区域和第一中心轴线之间的位置偏移而预先确定。
    • 9. 发明授权
    • Mask inspection apparatus and image creation method
    • 面膜检查装置及图像制作方法
    • US08071943B2
    • 2011-12-06
    • US12653792
    • 2009-12-21
    • Tsutomu MurakawaToshimichi IwaiJun MatsumotoTakayuki NakamuraYoshiaki Ogiso
    • Tsutomu MurakawaToshimichi IwaiJun MatsumotoTakayuki NakamuraYoshiaki Ogiso
    • G01N23/00H01J37/28
    • G03F1/86
    • Provided is a mask inspection apparatus including: emitting unit for emitting electron beams onto a sample; electron detecting unit for detecting the quantity of electrons produced, by the emission of the electron beams, from the sample with patterns formed thereon; image processing unit for generating image data for the patterns on the basis of the electron quantity; and controlling unit for controlling the emitting unit, the electron detecting unit, and the image processing unit. The controlling unit calculates, from the size of a designated observation area of the sample, a division number of divisional images that are synthesized to form a joint image that covers the entire designated observation area. The controlling unit determines divisional areas so that adjacent divisional areas partially overlap each other. The controlling unit acquires SEM images for the respective divisional areas. The controlling unit synthesizes the SEM images of the divisional areas on the basis of coordinate data for the divisional areas and on the basis of edge information for patterns included in the overlapping regions, and thereby creates an SEM image of a wide field of view that covers the observation area.
    • 提供了一种掩模检查装置,包括:用于向样品发射电子束的发射单元; 电子检测单元,用于通过发射电子束从形成在其上的图案的样品检测产生的电子量; 图像处理单元,用于基于电子量产生用于图案的图像数据; 以及用于控制发光单元,电子检测单元和图像处理单元的控制单元。 控制单元根据样本的指定观察区域的大小,计算合成为形成覆盖整个指定观察区域的关节图像的分割图像的分割数。 控制单元确定分区,使得相邻的分区彼此部分重叠。 控制单元获取各分区的SEM图像。 控制单元基于分割区域的坐标数据并基于重叠区域中包含的图案的边缘信息来合成分割区域的SEM图像,从而创建覆盖了宽视场的SEM图像 观察区。