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    • 1. 发明授权
    • Fluorescent glass dosimeter
    • 荧光玻璃剂量计
    • US4922115A
    • 1990-05-01
    • US213931
    • 1988-06-30
    • Yasushi MawatariToru IkegamiMotoyuki SatoBertram BurgkhardtErnst PieschHans-Gerd Rober
    • Yasushi MawatariToru IkegamiMotoyuki SatoBertram BurgkhardtErnst PieschHans-Gerd Rober
    • G01T1/06G01T1/10
    • G01T1/06G01T1/10
    • A fluorescent glass dosimeter comprises a glass element holder including inner and outer envelopes. Each of the inner and outer envelopes has a mask frame used for covering the peripheral portions of the corresponding fluorescent detection surface of a fluorescent glass element. The fluorescent glass dosimeter further comprises upper and lower cases. The upper case serves as a pivotable lock member and includes a lock portion, the locking condition of which can be released by means of a magnet. The lower case is adapted to receive the glass element holder. The upper and lower cases are engageable with each other at their slide portions. The glass element holder includes an integral index plate havig an identification hole code at a predetermined location. A direction regulating member is provided for the lower case, and a portion engageable with the direction regulating member is provided for the glass element holder. The fluorescent glass holder is positioned as a result of the engagement between the direction regulating member and the engageable portion of the glass element holder. A filter, used for adjusting energy dependency upon a radiation exposure, is located on the inner side of the upper wall of each of the upper and lower cases. A filter, used for adjusting direction dependency upon an incident radiation, is located on the inner side of the side wall of the lower case.
    • 荧光玻璃剂量计包括玻璃元件保持器,其包括内包封和外封套。 内包封和外包封中的每一个具有用于覆盖荧光玻璃元件的相应荧光检测表面的周边部分的掩模框架。 荧光玻璃剂量计还包括上壳体和下壳体。 上壳体用作可枢转的锁定构件,并且包括锁定部分,其锁定状态可以通过磁体释放。 下壳体适于容纳玻璃元件支架。 上壳体和下壳体在其滑动部分处可彼此接合。 玻璃元件保持器包括在预定位置处的识别孔代码的整体折射板。 一个方向调节件被设置用于下壳体,并且与该方向调节件接合的部分设置用于玻璃元件保持器。 荧光玻璃保持器由于方向调节构件和玻璃元件保持器的可接合部分之间的接合而定位。 用于调节对辐射照射的能量依赖性的过滤器位于每个上壳体和下壳体的上壁的内侧。 用于调整入射辐射的方向依赖性的滤光器位于下壳体的侧壁的内侧。
    • 5. 发明授权
    • Semiconductor device with fixed charge layers
    • 具有固定电荷层的半导体器件
    • US08754465B2
    • 2014-06-17
    • US13603704
    • 2012-09-05
    • Motoyuki Sato
    • Motoyuki Sato
    • H01L29/788
    • H01L29/788H01L21/28273H01L29/42332H01L29/513H01L29/517H01L29/518H01L29/66825H01L29/7883
    • According to one embodiment, a semiconductor device includes a semiconductor substrate, a tunnel insulating film on the semiconductor substrate, a first floating gate electrode on the tunnel insulating film, an inter-floating gate insulating film on the first floating gate electrode, a second floating gate electrode on the inter-floating gate insulating film, an inter-electrode insulating film on the second floating gate electrode, and a control gate electrode on the inter-electrode insulating film. The inter-floating gate insulating film includes a main insulating film, and a first fixed charge layer between the main insulating film and the second floating gate electrode and having negative fixed charges.
    • 根据一个实施例,半导体器件包括半导体衬底,半导体衬底上的隧道绝缘膜,隧道绝缘膜上的第一浮栅,第一浮栅上的浮置浮栅绝缘膜,第二浮置 互栅极绝缘膜上的栅电极,第二浮栅上的电极间绝缘膜,以及电极间绝缘膜上的控制栅电极。 互浮栅极绝缘膜包括主绝缘膜和主绝缘膜和第二浮栅之间的第一固定电荷层,并具有负固定电荷。
    • 6. 发明授权
    • Semiconductor device
    • 半导体器件
    • US08037384B2
    • 2011-10-11
    • US12340549
    • 2008-12-19
    • Takumi HasegawaMotoyuki SatoTomoji NakamuraNobuo KonamiJun Matsushima
    • Takumi HasegawaMotoyuki SatoTomoji NakamuraNobuo KonamiJun Matsushima
    • G01R31/28
    • G01R31/318533
    • A semiconductor device includes a test target circuit; scan chains that enable scanning of the test target circuit; a first random number generation circuit that forms test patterns supplied to the scan chains; a second random number generation circuit that is provided separately from the first random number generation circuit; and a random number control circuit that uses the random numbers generated by the second random number generation circuit to change the random numbers generated by the first random number generation circuit. In a test of the semiconductor device, since a period of a clock of a scan chain does not need to be longer than that of a clock of a pattern generator, the number of clocks of the pattern generator needed for a test can be prevented from increasing. Accordingly, a test time can be prevented from increasing.
    • 半导体器件包括测试目标电路; 可扫描测试目标电路的扫描链; 形成提供给扫描链的测试图案的第一随机数生成电路; 与第一随机数生成电路分开设置的第二随机数生成电路; 以及使用由第二随机数生成电路产生的随机数来改变由第一随机数生成电路产生的随机数的随机数控制电路。 在半导体器件的测试中,由于扫描链的时钟周期不需要长于模式发生器的时钟周期,因此可以防止测试所需的模式发生器的时钟数 增加。 因此,可以防止测试时间增加。
    • 8. 发明授权
    • Method of manufacturing semiconductor device
    • 制造半导体器件的方法
    • US07521309B2
    • 2009-04-21
    • US11948344
    • 2007-11-30
    • Akio KanekoMotoyuki SatoKatsuyuki SekineTomohiro SaitoKazuaki NakajimaTomonori Aoyama
    • Akio KanekoMotoyuki SatoKatsuyuki SekineTomohiro SaitoKazuaki NakajimaTomonori Aoyama
    • H01L21/336
    • H01L29/517H01L21/28097H01L21/3215H01L21/823814H01L21/823835H01L21/823842H01L29/66507
    • A method of manufacturing a semiconductor device having a MOSFET of a first conductivity type and a MOSFET of a second conductivity type different from the first conductivity type formed on a semiconductor substrate, the method has: forming a gate insulating film; forming a first gate electrode layer, and forming a second gate electrode layer; forming a first metal containing layer on said first gate electrode layer and said second gate electrode layer; forming a second metal containing layer for preventing diffusion of a metal on said first metal containing layer; forming a third metal containing layer on said second gate electrode layer from which said first metal containing layer and said second metal containing layer are selectively removed, the third metal containing layer having a thickness different from the thickness of said first metal containing layer in a case where the third metal containing layer contains the same metal or alloy as the metal or alloy contained in said first metal containing layer; and performing a thermal processing, thereby causing reaction between the metal contained in said first metal containing layer and said first gate electrode layer to convert said first gate electrode layer into an alloy and causing reaction between the metal contained in said third metal containing layer and said second gate electrode layer to convert said second gate electrode layer into an alloy, thereby forming gate electrodes of different compositions.
    • 一种制造具有第一导电类型的MOSFET的半导体器件的方法和形成在半导体衬底上的与第一导电类型不同的第二导电类型的MOSFET,该方法具有:形成栅极绝缘膜; 形成第一栅电极层,形成第二栅电极层; 在所述第一栅电极层和所述第二栅电极层上形成第一含金属层; 形成用于防止金属在所述第一金属含有层上的扩散的第二含金属层; 在所述第二栅电极层上形成第三金属含有层,从所述第二金属含有层和所述第二金属含有层被选择性地除去,所述第三金属含有层的厚度与所述第一金属含有层的厚度不同 其中所述第三含金属层包含与所述第一含金属层中所含的金属或合金相同的金属或合金; 并进行热处理,从而使包含在所述第一金属含有层中的金属与所述第一栅极电极层之间产生反应,将所述第一栅电极层转换成合金,并引起所述第三金属含有层中含有的金属与所述 第二栅极电极层,以将所述第二栅电极层转换成合金,从而形成不同组成的栅电极。