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1. 发明授权

US08997571B2 Ultrasonic probe, and photoacoustic-ultrasonic system and inspection object imaging apparatus including the ultrasonic probe 有权
标题翻译：超声波探头和光声超声波系统以及包括超声波探头在内的检测对象成像设备
公开(公告)号：US08997571B2
公开(公告)日：2015-04-07
申请号：US12999303
申请日：2009-06-17
申请人： Yasuhiro Someda , Keishi Saito , Yasufumi Asao , Katsumi Nakagawa , Shigeru Ichihara
发明人： Yasuhiro Someda , Keishi Saito , Yasufumi Asao , Katsumi Nakagawa , Shigeru Ichihara
IPC分类号： A61B5/05 , G01N23/02 , A61B8/14 , A61B5/00 , A61B8/08
CPC分类号： A61B8/4416 , A61B5/0035 , A61B5/0095 , A61B8/0825 , A61B8/14 , A61B8/145 , A61B8/4444 , A61B8/4494 , A61B8/483 , A61B8/5238
摘要： Provided are an ultrasonic probe capable of forming an image without degradation even when the frequency band of a photoacoustic wave and the frequency band of an ultrasonic wave used in ultrasonography are separated from each other, and an inspection object imaging apparatus including the ultrasonic probe. The ultrasonic probe includes a first array device capable of transmitting and receiving an ultrasonic wave; and a second array device capable of receiving a photoacoustic wave. The first array device includes plural electromechanical transducers arranged in a direction perpendicular to a scanning direction, the second array device includes plural electromechanical transducers arranged in a two-dimensional manner, and the first array device and the second array device are provided on the same plane and in the scanning direction.
摘要翻译：即使在光声波的频带和超声波中使用的超声波的频带彼此分离的情况下，也能够形成图像而不劣化的超声波探头，以及包括超声波探头的检查对象成像装置。超声波探头包括能够发送和接收超声波的第一阵列装置; 以及能够接收光声波的第二阵列装置。第一阵列器件包括沿与扫描方向垂直的方向配置的多个机电换能器，第二阵列器件包括以二维方式布置的多个机电换能器，第一阵列器件和第二阵列器件设置在同一平面上并沿扫描方向。

2. 发明授权

US07425714B2 Measurement method of electron beam current, electron beam writing system and electron beam detector 有权
标题翻译：电子束电流，电子束写入系统和电子束检测器的测量方法
公开(公告)号：US07425714B2
公开(公告)日：2008-09-16
申请号：US11207710
申请日：2005-08-22
申请人： Makoto Sakakibara , Yoshinori Nakayama , Hiroya Ohta , Yasunari Sohda , Noriyuki Tanaka , Yasuhiro Someda
发明人： Makoto Sakakibara , Yoshinori Nakayama , Hiroya Ohta , Yasunari Sohda , Noriyuki Tanaka , Yasuhiro Someda
IPC分类号： G21K5/10
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G01R19/0061 , H01J37/243 , H01J2237/30472
摘要： A technology capable of reducing the influence of the noise overlapped in a long transmission line when accurately measuring weak beam current in an electron beam writing system and capable of accurately and efficiently measuring weak beam current in a beam writing system using multiple beams is provided. With using a switch for connecting and disconnecting an electron beam detecting device and a detected signal line, the electron beam detecting device is disconnected from the detected signal line to accumulate the detected signals in the electron beam detecting device during the beam current measurement. Simultaneously with the finish of the measurement, the electron beam detecting device and the detected signal line are connected to measure the accumulated signals. Also, in order to simultaneously perform the measurement method, a plurality of electron beam detecting devices and switches are used to simultaneously measure a plurality of electron beams with high accuracy.
摘要翻译：提供了一种能够在精确测量电子束写入系统中的弱光束电流的同时减少重叠在长传输线上的噪声影响的技术，并且能够精确高效地测量使用多个光束的光束写入系统中的弱光束电流。通过使用用于连接和断开电子束检测装置的开关和检测到的信号线，电子束检测装置与检测到的信号线断开，以在束电流测量期间将检测到的信号累积在电子束检测装置中。在测量结束的同时，连接电子束检测装置和检测信号线来测量累积信号。此外，为了同时进行测量方法，使用多个电子束检测装置和开关以高精度同时测量多个电子束。

3. 发明申请

US20060289781A1 Method and apparatus for applying charged particle beam 有权
标题翻译：用于施加带电粒子束的方法和装置
公开(公告)号：US20060289781A1
公开(公告)日：2006-12-28
申请号：US11475014
申请日：2006-06-27
申请人： Sayaka Tanimoto , Yasunari Sohda , Yasuhiro Someda , Masaki Hosoda
发明人： Sayaka Tanimoto , Yasunari Sohda , Yasuhiro Someda , Masaki Hosoda
IPC分类号： H01J3/14 , G21K1/08
CPC分类号： H01J37/304 , B82Y10/00 , B82Y40/00 , H01J37/1471 , H01J37/3174 , H01J2237/0458 , H01J2237/1501 , H01J2237/31774 , H01J2237/31776
摘要： In a charged particle beam applying apparatus such as an electron beams lithography system, there is a technology that facilitates positional adjustment of a crossover and improves throughput of the apparatus. A front focal plane of a condenser lens is provided with a sharp end face (crossover regulation edge) for regulating the height of the crossover on a beam axis. By using the crossover regulation edge to measure the shape of an electron beam, the shape of the beam on the front focal plane of the condenser lens can be always checked even if the height of the crossover formed by an electron gun or the resistance of a source forming lens is changed.
摘要翻译：在诸如电子束光刻系统的带电粒子束施加装置中，存在促进交叉的位置调整并提高装置的生产量的技术。聚光透镜的前焦平面设置有用于调节光束轴上的交叉点的高度的尖端（交叉调节边缘）。通过使用交叉调节边缘来测量电子束的形状，即使电子枪形成的交叉点的高度或电子枪的电阻，也可以始终检查聚光透镜的前焦平面上的光束的形状源形成透镜改变。

4. 发明授权

US06730916B1 Electron beam lithography apparatus 有权
标题翻译：电子束光刻设备
公开(公告)号：US06730916B1
公开(公告)日：2004-05-04
申请号：US09691234
申请日：2000-10-19
申请人： Hiroshi Tsuji , Mitsuru Inoue , Norio Saitou , Yasuhiro Someda , Yoshimasa Fukushima
发明人： Hiroshi Tsuji , Mitsuru Inoue , Norio Saitou , Yasuhiro Someda , Yoshimasa Fukushima
IPC分类号： H01J3720
CPC分类号： H01J37/09 , H01J37/20 , H01J2237/3175 , H02K11/01 , H02K41/03
摘要： An electron beam lithography apparatus of the present invention prevents the electron beam trajectory from being affected by a leakage magnetic field from a permanent magnet which is used as a sample stage guide/driving mechanism. In this electron beam lithography apparatus, an air bearing guide is used as a sample stage guide mechanism, and the stage posture is held by attracting the stage floating on a surface plate to the surface plate side by the permanent magnet. To avoid the leakage magnetic field from the permanent magnet from affecting the electron beam irradiation position on the sample, the permanent magnet is magnetically shielded by a shield member. In addition, to reduce variations in magnetic field above the sample, which are generated when the shield member moves in a leakage magnetic field from the electron lens, another shield member is arranged under the electron lens.
摘要翻译：本发明的电子束光刻设备防止电子束轨迹受到用作样品台引导/驱动机构的永久磁铁的泄漏磁场的影响。在该电子束光刻装置中，使用空气轴承引导件作为样品台引导机构，通过永久磁铁吸引在表面板上浮动到台板侧的台架来保持台阶姿态。为了避免来自永磁体的泄漏磁场影响样品上的电子束照射位置，永磁体被屏蔽部件磁屏蔽。此外，为了减小当屏蔽部件在来自电子透镜的泄漏磁场中移动时产生的样品上方的磁场的变化，在电子透镜下方设置有另一个屏蔽部件。

5. 发明授权

US06329665B1 Charged particle beam lithography apparatus for forming pattern on semi-conductor 失效
标题翻译：用于在半导体上形成图案的带电粒子束光刻设备
公开(公告)号：US06329665B1
公开(公告)日：2001-12-11
申请号：US09621708
申请日：2000-07-21
申请人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
发明人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
IPC分类号： H01J37304
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： In order to provide a high-speed and high accuracy cell projection exposure apparatus which increases a pattern projection number extremely, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for a mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.
摘要翻译：为了提供极大地增加图案投影数的高速和高精度的单元投影曝光装置，提供了安装传送孔和传输孔的多个模板掩模，并且通过驱动级定位，电子束通过通过其他模板掩模的透射孔，同时用光束偏转装置在模板掩模上选择孔，将传播孔连续地提供给掩模传送方向，模板掩模在与梁一起传播的同时被移动，而其它模版当指定的模板掩模孔组被曝光时，执行掩模转印。重复这些操作，以便执行所有曝光处理。

6. 发明申请

US20110106478A1 PHOTOACOUSTIC APPARATUS 有权
标题翻译：光电设备
公开(公告)号：US20110106478A1
公开(公告)日：2011-05-05
申请号：US12908232
申请日：2010-10-20
申请人： Yasuhiro Someda
发明人： Yasuhiro Someda
IPC分类号： G06F19/00 , G01D18/00
CPC分类号： A61B5/0095 , A61B5/0059 , A61B5/0062 , A61B8/08 , A61B2576/00 , G01N21/1702
摘要： In a photoacoustic apparatus, a light source irradiates an inspection target with pulsed light; a detector detects acoustic waves generated in the inspection target due to interaction of the pulsed light with the inspection target, and outputs detection signals corresponding to the detected acoustic waves; a light-quantity measurement unit measures the quantity of the light output from the light source; and a signal processor obtains information on an inside of the inspection target by using the detection signals output from the detector. The signal processor also corrects intensities of the detection signals so as to suppress variations in intensities of the detection signals caused by a temporal change in the quantity of the light.
摘要翻译：在光声装置中，光源用脉冲光照射检查对象物; 检测器检测由于脉冲光与检查对象的相互作用而在检查对象物中产生的声波，并且输出与检测到的声波相对应的检测信号; 光量测量单元测量从光源输出的光量; 并且信号处理器通过使用从检测器输出的检测信号来获取关于检查对象的内部的信息。信号处理器还校正检测信号的强度，以便抑制由光量的时间变化引起的检测信号的强度变化。

7. 发明申请

US20110088477A1 ULTRASONIC PROBE, AND PHOTOACOUSTIC-ULTRASONIC SYSTEM AND INSPECTION OBJECT IMAGING APPARATUS INCLUDING THE ULTRASONIC PROBE 有权
标题翻译：超声波探头和光电超声波系统及检测对象成像装置，包括超声波探头
公开(公告)号：US20110088477A1
公开(公告)日：2011-04-21
申请号：US12999303
申请日：2009-06-17
申请人： Yasuhiro Someda , Keishi Saito , Yasufumi Asao , Katsumi Nakagawa , Shigeru Ichihara
发明人： Yasuhiro Someda , Keishi Saito , Yasufumi Asao , Katsumi Nakagawa , Shigeru Ichihara
IPC分类号： G01N29/24 , G01N29/26
CPC分类号： A61B8/4416 , A61B5/0035 , A61B5/0095 , A61B8/0825 , A61B8/14 , A61B8/145 , A61B8/4444 , A61B8/4494 , A61B8/483 , A61B8/5238
摘要： Provided are an ultrasonic probe capable of forming an image without degradation even when the frequency band of a photoacoustic wave and the frequency band of an ultrasonic wave used in ultrasonography are separated from each other, and an inspection object imaging apparatus including the ultrasonic probe. The ultrasonic probe includes a first array device capable of transmitting and receiving an ultrasonic wave; and a second array device capable of receiving a photoacoustic wave. The first array device includes plural electromechanical transducers arranged in a direction perpendicular to a scanning direction, the second array device includes plural electromechanical transducers arranged in a two-dimensional manner, and the first array device and the second array device are provided on the same plane and in the scanning direction.
摘要翻译：即使在光声波的频带和超声波中使用的超声波的频带彼此分离的情况下，也能够形成图像而不劣化的超声波探头，以及包括超声波探头的检查对象成像装置。超声波探头包括能够发送和接收超声波的第一阵列装置; 以及能够接收光声波的第二阵列装置。第一阵列器件包括沿与扫描方向垂直的方向配置的多个机电换能器，第二阵列器件包括以二维方式布置的多个机电换能器，第一阵列器件和第二阵列器件设置在同一平面上并沿扫描方向。

8. 发明授权

US07341393B2 Mechanism for sealing 有权
标题翻译：密封机构
公开(公告)号：US07341393B2
公开(公告)日：2008-03-11
申请号：US11155633
申请日：2005-06-20
申请人： Masaki Hosoda , Masato Muraki , Yasuhiro Someda , Mahito Negishi , Koichi Wakizaka , Masakazu Sugaya
发明人： Masaki Hosoda , Masato Muraki , Yasuhiro Someda , Mahito Negishi , Koichi Wakizaka , Masakazu Sugaya
IPC分类号： F16C11/00 , F16D1/12
CPC分类号： H01J37/3007 , H01J9/18 , H01J37/04 , H01J2237/1205 , H01J2237/151 , H01J2237/166 , H01J2237/31774 , Y10T403/32713
摘要： A mechanism for connecting first and second members through a sealing member sandwiched therebetween includes a position adjustment portion which adjusts a position of the first member in a direction substantially perpendicular to a surface of the second member with respect to the sealing member arranged on the second member, a reference portion which is provided to the second member and has a reference surface substantially perpendicular to the surface of the second member, and a pressing portion which presses the first member in a direction substantially parallel to the surface of the second member against the reference surface of the reference portion. A positioning member is provided to the first member and comes into contact with the reference surface of the reference portion, with the positioning member being position-adjustable with respect to a reference position of the first member. The first member, while being separated from the sealing member by the position adjustment portion, is positioned by the reference portion and pressing portion in the direction substantially parallel to the surface of the second member, and is thereafter moved by the position adjustment portion in the direction substantially perpendicular to the surface of the second member to deform the sealing member.
摘要翻译：用于通过夹在其间的密封构件连接第一和第二构件的机构包括位置调整部分，其相对于布置在第二构件上的密封构件调节第一构件在基本上垂直于第二构件的表面的方向上的位置设置在第二构件上并且具有基本上垂直于第二构件的表面的基准表面的参考部分，以及按照基本平行于第二构件的表面的方向按压第一构件的按压部分，参考部分的表面。定位构件设置到第一构件并与基准部分的基准表面接触，定位构件相对于第一构件的基准位置可位置调节。第一构件在通过位置调节部分与密封构件分离的同时，通过基准部分和按压部分在基本上平行于第二构件的表面的方向上定位，然后通过位置调整部分方向基本上垂直于第二构件的表面以使密封构件变形。

9. 发明授权

US06555833B2 Charged particle beam lithography apparatus for forming pattern on semi-conductor 失效
公开(公告)号：US06555833B2
公开(公告)日：2003-04-29
申请号：US10194003
申请日：2002-07-15
申请人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
发明人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
IPC分类号： H01J37304
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： In order to provide a high-speed and high accuracy cell projection exposure apparatus which greatly increases a pattern projection speed, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.

10. 发明授权

US5650631A Electron beam writing system 失效
标题翻译：电子束写入系统
公开(公告)号：US5650631A
公开(公告)日：1997-07-22
申请号：US470592
申请日：1995-06-07
申请人： Yasunari Sohda , Masahide Okumura , Yasuhiro Someda , Hidetoshi Satoh , Yoshinori Nakayama , Norio Saitou
发明人： Yasunari Sohda , Masahide Okumura , Yasuhiro Someda , Hidetoshi Satoh , Yoshinori Nakayama , Norio Saitou
IPC分类号： G21K5/04 , G03F7/20 , H01J37/04 , H01J37/09 , H01J37/147 , H01J37/305 , H01L21/027 , H01J37/30
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J2237/0435 , H01J2237/31774 , H01J2237/31776
摘要： A blanking array is used for controlling an electron beam in an electron beam writing system. Electrodes in the array are formed in parallel and two sets of the parallel electrodes, orthogonal to one another, are used for dividing the electron beam into a plurality of individual exposure areas. The sets of parallel electrodes can be formed in one array by a wire mesh or in two separate arrays spaced closely together or farther apart at different focal point positions. The electrodes are provided to extend across an aperture, such as a square or triangular aperture. For a triangular aperture, the electrodes are made parallel to the hypotenuse of the triangle. The writing patterns are formed by combining the exposure areas. Control of each exposure area is realized by applying opposite polarity voltage to adjacent electrodes in order to deflect the portion of the beam passing between the adjacent electrodes. The deflected beam portions are blocked by a downstream aperture that permits the non-deflected electron beam portions to pass through for forming the patterns to be written.
摘要翻译：消隐阵列用于控制电子束写入系统中的电子束。阵列中的电极平行地形成，并且彼此正交的两组平行电极被用于将电子束分成多个单独的曝光区域。这些平行电极组可以通过丝网形成一个阵列，或者可以在不同的焦点位置处彼此间隔开或更远的两个分离的阵列中形成。电极被设置成延伸穿过诸如正方形或三角形孔的孔。对于三角形孔，电极与三角形的斜边平行。通过组合曝光区域形成书写图案。通过对相邻的电极施加相反极性的电压来实现对每个曝光区域的控制，以便偏转通过相邻电极的光束的部分。偏转的光束部分被允许非偏转的电子束部分通过以形成待写入的图案的下游孔阻挡。

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