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    • 1. 发明授权
      US07288778B2 Collector for EUV light source 失效
    • Collector for EUV light source
    • EUV光源收集器
    • US07288778B2
    • 2007-10-30
    • US11603670
    • 2006-11-21
    • William N. Partio , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov
    • William N. Partio , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov
    • H01J35/20
    • H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
    • It will be understood that an apparatus and method is disclosed, which may comprise a multi-layer reflecting coating forming an EUV reflective surface which may comprise a spectral filter tuned to selectively highly reflect light in a band centered about at a first preferred wavelength and to significantly reduce the reflection of light at a band centered about a second wavelength, e.g., it may be tuned to reflect maximally or almost maximally, near the top of the reflectivity curve, e.g., at around 13.5 nm and at a significantly lower reflectivity at, e.g., around 11 nm, to discriminate against light near 11 nm and favor light at around 13.5 nm. The spectral filter may comprise a plurality of nested grazing angle of incidence shells comprising reflective surfaces comprising the multi-layer reflective coating. e.g. multilayer mirrors, e.g., with one or more reflecting surfaces per shell.
    • 应当理解，公开了一种装置和方法，其可以包括形成EUV反射表面的多层反射涂层，其可以包括调谐为选择性地高度反射在以第一优选波长为中心的带的光的光谱滤光器，并且 显着地减少了在以第二波长为中心的频带处的光的反射，例如，它可以被调谐以在反射率曲线的顶部附近最大或几乎最大程度地反射，例如在大约13.5nm处和在显着较低的反射率处， 例如约11nm，以区分11nm附近的光并有利于约13.5nm的光。 频谱滤波器可以包括多个嵌套的入射角入射壳，包括多层反射涂层的反射表面。 例如 多层反射镜，例如每个壳体具有一个或多个反射表面。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Espacenet 法律信息 同族专利 专利引用
    • 9. 发明申请
      US20080197297A1 High repetition rate laser produced plasma EUV light source 有权
    • High repetition rate laser produced plasma EUV light source
    • US20080197297A1
    • 2008-08-21
    • US11471434
    • 2006-06-20
    • Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
    • Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
    • G01J3/10
    • B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
    • An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
    • 10. 发明授权
      US06815700B2 Plasma focus light source with improved pulse power system 失效
    • Plasma focus light source with improved pulse power system
    • 等离子聚焦光源具有改进的脉冲电源系统
    • US06815700B2
    • 2004-11-09
    • US10189824
    • 2002-07-03
    • Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin
    • Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin
    • H05H104
    • H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
    • The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially. The central electrode is preferably hollow and the active gas is introduced out of the hollow electrode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. In preferred embodiments the central electrode is pulsed with a high negative electrical pulse so that the central electrode functions as a hollow cathode. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. Special techniques are described for cooling the central electrode. In one example, water is circulated through the walls of the hollow electrode. In another example, a heat pipe cooling system is described for cooling the central electrode.
    • 本发明提供了一种高能量光子源。 一对等离子体夹紧电极位于真空室中。 该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。 脉冲电源在电压足够高的电压下提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在源或活性气体的光谱线处提供辐射。 优选地，电极被同轴配置。 中心电极优选是中空电极，并且活性气体从中空电极引出。 这允许对光谱线源进行优化和缓冲气体的单独优化。 在优选的实施例中，中心电极用高的负电脉冲脉冲，使得中心电极用作空心阴极。 本发明优选的实施例公开了电容值的优化，阳极长度和形状以及优选的活性气体输送系统。 优选实施例还包括脉冲功率系统，其包括充电电容器和包括脉冲变压器的磁压缩电路。 描述了用于冷却中心电极的特殊技术。 在一个实例中，水通过中空电极的壁循环。 在另一个实例中，描述了用于冷却中心电极的热管冷却系统。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Espacenet 法律信息 同族专利 专利引用
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