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1. 发明申请

US20180007771A1 DROPLET DETECTOR AND EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS 审中-公开
公开(公告)号：US20180007771A1
公开(公告)日：2018-01-04
申请号：US15697915
申请日：2017-09-07
申请人： Gigaphoton Inc.
发明人： Kouichi SATOU , Takayuki YABU , Yoshifumi UENO , Hirokazu HOSODA
IPC分类号： H05G2/00 , H01S3/10
CPC分类号： H05G2/008 , G21K2201/06 , H01S3/10 , H05G2/005 , H05G2/006
摘要： The stability of operations of an EUV light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.

2. 发明授权

US09348067B2 Tilted gratings and method for production of tilted gratings 有权
标题翻译：倾斜光栅和倾斜光栅的生产方法
公开(公告)号：US09348067B2
公开(公告)日：2016-05-24
申请号：US13319196
申请日：2010-06-09
申请人： Gereon Vogtmeier , Klaus Juergen Engel , Thomas Koehler , Ewald Roessl
发明人： Gereon Vogtmeier , Klaus Juergen Engel , Thomas Koehler , Ewald Roessl
IPC分类号： G21K1/00 , G02B5/18 , A61B6/00
CPC分类号： G02B5/1857 , A61B6/484 , G21K2201/06 , G21K2207/005
摘要： The present invention relates to phase-contrast imaging which visualizes the phase information of coherent radiation passing a scanned object. Focused gratings are used which reduce the creation of trapezoid profile in a projection with a particular angle to the optical axis. A laser supported method is used in combination with a dedicating etching process for creating such focused grating structures.
摘要翻译：本发明涉及相位成像，其可视化通过扫描对象的相干辐射的相位信息。使用聚焦光栅，其减小了与光轴具有特定角度的投影中的梯形轮廓的产生。激光支持的方法与用于产生这种聚焦光栅结构的专用蚀刻工艺组合使用。

3. 发明申请

US20130070893A1 X-RAY IMAGING APPARATUS, X-RAY IMAGING METHOD, AND X-RAY IMAGING PROGRAM 有权
标题翻译： X射线成像装置，X射线成像方法和X射线成像程序
公开(公告)号：US20130070893A1
公开(公告)日：2013-03-21
申请号：US13682445
申请日：2012-11-20
申请人： CANON KABUSHIKI KAISHA
发明人： Chidane Ouchi , Kentaro Nagai , Toru Den , Hidenosuke Itoh
IPC分类号： G01J9/02
CPC分类号： G06T7/0002 , A61B6/4291 , A61B6/484 , G01J9/02 , G01N23/04 , G01N23/20075 , G01N2223/401 , G21K1/06 , G21K2201/06 , G21K2201/067
摘要： An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.
摘要翻译： X射线成像装置包括相位光栅，吸收光栅，检测器和运算单元。算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。此外，运算单元执行相位检索步骤，从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱，对分离的频谱进行傅里叶逆变换，获取差分相位图像。

4. 发明申请

US20130009076A1 EXTREME ULTRAVIOLET LIGHT SOURCE AND POSITIONING METHOD OF LIGHT FOCUSING OPTICAL MEANS 有权
标题翻译：极光超光源光源和光聚焦光学定位方法
公开(公告)号：US20130009076A1
公开(公告)日：2013-01-10
申请号：US13636086
申请日：2011-03-02
申请人： Daiki Yamatani
发明人： Daiki Yamatani
IPC分类号： G21K5/00
CPC分类号： H01L21/0274 , G03F7/2004 , G03F7/70033 , G03F7/70133 , G03F7/70141 , G03F7/70166 , G03F7/7085 , G21K1/067 , G21K2201/06 , H05G2/00 , H05G2/003 , H05G2/005 , H05G2/008
摘要： In an extreme ultraviolet (“EUV”) light source apparatus, uneven angle distribution images of EUV light are detected prior to an adjustment function by a detector, and angle distribution image data is recorded. Movement data corresponding to the recorded angle distribution image data is also recorded. The movement data corresponds to a movement amount and direction that the optical focusing means is moved from a position in which the angle distribution is even to the position in which the corresponding uneven angle distribution image is obtained. For the adjustment, a current angle distribution property image is detected by the detector and is compared with the uneven angle distribution property image data stored, and image data which is most closely matched with the current angle distribution property is selected. The movement data that corresponds to the selected image data is read out, and the light focusing optical means is moved based thereon.
摘要翻译：在极紫外（EUV）光源装置中，通过检测器在调节功能之前检测到EUV光的不均匀角分布图像，并记录角度分布图像数据。还记录与记录角度分布图像数据对应的运动数据。运动数据对应于光学聚焦装置从角度分布均匀的位置移动到获得相应的不均匀角度分布图像的位置的移动量和方向。对于调整，由检测器检测当前的角度分布特性图像，并将其与存储的不均匀角度分布特性图像数据进行比较，并且选择与当前角度分布特性最紧密匹配的图像数据。读取对应于所选择的图像数据的移动数据，并且基于此移动聚焦光学装置。

5. 发明授权

US08263950B2 Radiation source 有权
标题翻译：辐射源
公开(公告)号：US08263950B2
公开(公告)日：2012-09-11
申请号：US12788903
申请日：2010-05-27
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Kurt Gielissen , Martin Jacobus Johan Jak
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Kurt Gielissen , Martin Jacobus Johan Jak
IPC分类号： G03B27/54 , G21K5/00
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70858 , G21K2201/06
摘要： A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.
摘要翻译：辐射源可以包括用于发射辐射的辐射发射器，用于收集由辐射发射器发射的辐射的收集器以及在使用中被配置成将冷却的气体引入到辐射源中的出口。

6. 发明授权

US07864415B2 Use of a focusing vortex lens as the objective in spiral phase contrast microscopy 有权
标题翻译：使用聚焦旋转透镜作为螺旋相差显微镜的目标
公开(公告)号：US07864415B2
公开(公告)日：2011-01-04
申请号：US11856403
申请日：2007-09-17
申请人： Ian McNulty
发明人： Ian McNulty
IPC分类号： G02B21/00
CPC分类号： G21K1/06 , G02B5/189 , G02B21/14 , G21K2201/06 , G21K2201/067 , G21K2207/005
摘要： A method and objective apparatus are provided for implementing an enhanced phase contrast microscope. A focusing vortex lens, defined by a diffractive spiral zone plate (SZP) lens, is used for the objective for the phase contrast microscope. The SZP lens focuses and imparts a helical phase to incident illumination to image the specimen with spiral phase contrast. The spiral phase contrast microscope is sensitive to phase gradients in all sample axes. Replacing the objective of a microscope with the diffractive SZP lens of the invention immediately provides existing instruments with spiral phase contrast capability.
摘要翻译：提供了一种实现增强型相差显微镜的方法和目标装置。用于相差显微镜的目标使用由衍射螺旋区域（SZP）透镜限定的聚焦涡透镜。 SZP透镜聚焦并向入射照明施加螺旋相以对具有螺旋相位对比度的样品进行成像。螺旋相差显微镜对所有样品轴的相位梯度敏感。用本发明的衍射SZP透镜替代显微镜的目的立即提供现有的具有螺旋相位对比能力的仪器。

7. 发明授权

US07474729B2 Soft X-ray microscope 失效
标题翻译：软X射线显微镜
公开(公告)号：US07474729B2
公开(公告)日：2009-01-06
申请号：US11510615
申请日：2006-08-28
申请人： Kwon-ha Yoon , Kyong-woo Kim
发明人： Kwon-ha Yoon , Kyong-woo Kim
IPC分类号： G21K7/00
CPC分类号： G21K7/00 , G21K2201/06 , H05G2/008
摘要： A soft X-ray microscope includes a table (10); a housing (20) installed to the upper side of the table (10) and having a partition (22); a light source chamber (30) installed lower than the partition (22) of the housing (20) to project a light to liquid jetted under a high pressure to generate plasma; a mirror chamber (40), installed above the partition (22) of the housing (20), in which first and second mirror (410 and 430) are respectively installed to upper and lower sides of a holder (420) for storing a living sample, the soft X-ray generated by the plasma generated in the light source chamber (30) illuminates the living sample, and the soft X-ray penetrated the living sample is amplified to obtain an image in an image capturing chamber; and an image capturing chamber (50) installed to the upper side of the housing (20) to amplify a light image signal amplified through the mirror chamber (40) and to capture the light image on an external screen to allow distinguishing the light image from exterior.
摘要翻译：软X射线显微镜包括台（10）; 安装在所述工作台（10）的上侧并具有隔板（22）的壳体（20）; 光源室（30），其安装在所述壳体（20）的隔板（22）的下方，以将在高压下喷射的液体投射到液体中以产生等离子体; 安装在所述壳体（20）的隔板（22）上方的反射镜室（40），其中第一和第二反射镜（410和430）分别安装在用于储存活体的保持器（420）的上侧和下侧样品中，由光源室（30）中产生的等离子体产生的软X射线照射活体样品，并且穿透活体样品的软X射线被放大，以在摄像室中获得图像; 以及安装到所述壳体（20）的上侧的图像捕获室（50），以放大通过所述镜室（40）放大的光图像信号，并将所述光图像捕获到外部屏幕上以允许将所述光图像与外观。

8. 发明申请

US20070292680A1 Optical film, production method of optical film, polarizing plate and liquid crystal display device 审中-公开
标题翻译：光学膜，光学膜的制造方法，偏光板和液晶显示装置
公开(公告)号：US20070292680A1
公开(公告)日：2007-12-20
申请号：US11808703
申请日：2007-06-12
申请人： Hajime Nakayama , Susumu Sugiyama
发明人： Hajime Nakayama , Susumu Sugiyama
IPC分类号： G11B11/105
CPC分类号： G02B5/3091 , G02F1/1335 , G02F2201/50 , G21K2201/06 , Y10T428/26
摘要： An optical film having a value of 1.6 or more, wherein the value is obtained by dividing a larger value by a smaller value of the maximum X-ray diffraction intensity within a range 2θ=10 to 40° in a longitudinal direction of the film and the maximum X-ray diffraction intensity within a range 2θ=10 to 40° in a direction approximately vertical to the longitudinal direction of the film, and an optical film having a value of 1.3 or more, wherein the value is obtained by dividing a larger value by a smaller value of a tensile elastic modulus in a longitudinal direction of the film and a tensile elastic modulus in a direction approximately vertical to the longitudinal direction of the film.
摘要翻译：一种值为1.6以上的光学膜，其特征在于，通过在膜的长度方向上将最大X射线衍射强度的较大值除以2θ= 10〜40°的范围内的较大值来获得，在与膜长度方向大致垂直的方向上的2θ= 10〜40°的范围内的最大X射线衍射强度和1.3以上的光学膜，其中，通过将较大的通过在膜的纵向方向上的拉伸弹性模量值较小的值和在与膜的纵向方向大致垂直的方向上的拉伸弹性模量的值。

9. 发明申请

US20070183581A1 Focus/detector system of an X-ray apparatus for generating phase contrast recordings 有权
标题翻译：用于产生相位记录的X射线设备的聚焦/检测器系统
公开(公告)号：US20070183581A1
公开(公告)日：2007-08-09
申请号：US11700152
申请日：2007-01-31
申请人： Bjorn Heismann , Eckhard Hempel , Stefan Popescu
发明人： Bjorn Heismann , Eckhard Hempel , Stefan Popescu
IPC分类号： G03F1/00 , G21K1/00
CPC分类号： A61B6/06 , A61B6/00 , A61B6/032 , A61B6/4014 , A61B6/4092 , A61B6/4233 , A61B6/4266 , A61B6/4291 , A61B6/4441 , A61B6/484 , G03B42/02 , G21K2201/06 , G21K2207/005
摘要： A focus/detector system of an X-ray apparatus is disclosed for generating projective or tomographic phase contrast recordings. In at least one embodiment, the system includes a beam source, including a focus and a focus-side source grating, arranged in the beam path to generate a field of ray-wise coherent X-rays; and a grating/detector arrangement having a phase grating with grating lines arranged parallel to the source grating for generating an interference pattern and a detector having a multiplicity of detector elements arranged flat for measuring the radiation intensity behind the phase grating. Further, the detector elements are formed by a multiplicity of elongate detection strips, which are aligned parallel to the grating lines of the phase grating. Furthermore, at least one embodiment also relates to the use of this focus/detector system in an X-ray system for generating projective recordings or in C-arc equipment or a CT system, and/or to a method for generating projective and tomographic X-ray recordings of a subject.
摘要翻译：公开了用于产生投影或层析相位对比记录的X射线装置的焦点/检测器系统。在至少一个实施例中，系统包括布置在光束路径中以产生射线相干X射线场的束源，包括焦点和焦点侧源光栅; 以及具有相位光栅的光栅/检测器装置，其具有平行于源光栅布置的光栅线，用于产生干涉图案;以及检测器，具有平坦布置的多个检测器元件，用于测量相位光栅后面的辐射强度。此外，检测器元件由多个细长的检测条形成，其平行于相位光栅的光栅线排列。此外，至少一个实施例还涉及在X射线系统中用于产生投影记录或在C弧设备或CT系统中使用该焦点/检测器系统和/或用于产生投影和断层X的方法录音的主题。

10. 发明授权

US07109503B1 Systems for protecting internal components of an EUV light source from plasma-generated debris 有权
标题翻译：用于保护EUV光源的内部部件免受等离子体产生的碎片的系统
公开(公告)号：US07109503B1
公开(公告)日：2006-09-19
申请号：US11067099
申请日：2005-02-25
申请人： Norbert R. Bowering , Bjorn A. M. Hansson , Alexander N. Bykanov , Oleh Khodykin , Alexander I. Ershov , William N. Partlo
发明人： Norbert R. Bowering , Bjorn A. M. Hansson , Alexander N. Bykanov , Oleh Khodykin , Alexander I. Ershov , William N. Partlo
IPC分类号： G01J1/00
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
摘要翻译：公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

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