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1. 发明申请

US20080026315A1 FLUORINATED HALF ESTER OF MALEIC ANHYDRIDE POLYMERS FOR DRY 193 NM TOP ANTIREFLECTIVE COATING APPLICATION 失效
标题翻译：用于干燥193 NM顶级抗反射涂层应用的马来酸酐聚合物的氟化半酯
公开(公告)号：US20080026315A1
公开(公告)日：2008-01-31
申请号：US11425529
申请日：2006-06-21
申请人： Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi
发明人： Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , G03F7/0046 , G03F7/0752 , Y10S438/952
摘要： The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition comprises an aqueous base-soluble polymer having a backbone and a fluorinated half ester moiety. The fluorinated half ester moiety is pendant from the backbone. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
摘要翻译：本发明公开了适合用作193nm光刻的顶部抗反射涂层和阻挡层的组合物。本发明的组合物可溶于碱性水溶液中，并且在193nm具有低折射率。本发明的组合物包含具有主链和氟化半酯部分的水溶性基团可溶性聚合物。氟化半酯部分是从骨架侧挂。本发明还公开了通过在光刻中使用本发明的组合物在衬底上形成图案化层的方法。

2. 发明授权

US07235342B2 Negative photoresist composition including non-crosslinking chemistry 有权
标题翻译：负光致抗蚀剂组合物包括非交联化学
公开(公告)号：US07235342B2
公开(公告)日：2007-06-26
申请号：US10766058
申请日：2004-01-28
申请人： Wenjie Li , Pushkara R. Varanasi
发明人： Wenjie Li , Pushkara R. Varanasi
IPC分类号： G03F7/038 , G03F7/30
CPC分类号： G03F7/0382 , G03F7/0046 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/128
摘要： A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The composition includes: a radiation sensitive acid generator; a hydroxy-containing additive; and a resist polymer derived from at least one first monomer. The resist polymer may be further derived from a second monomer having an aqueous base soluble moiety. The hydroxy-containing additive has the structure of Q—OH, where Q may include one or more cyclic structures. Q—OH may have a primary alcohol structure. The acid generator is adapted to generate an acid upon exposure to radiation. The resist polymer is adapted to chemically react with the additive in the presence of the acid to generate a non-crosslinking reaction product that is insoluble in an aqueous alkaline developer solution.
摘要翻译：负性光致抗蚀剂组合物和通过使用负性光致抗蚀剂组合物构图基板的方法。组合物包括：辐射敏感酸发生剂; 含羟基的添加剂; 和衍生自至少一种第一单体的抗蚀剂聚合物。抗蚀剂聚合物可以进一步衍生自具有碱性水溶性部分的第二单体。含羟基的添加剂具有Q-OH的结构，其中Q可以包括一个或多个环状结构。 Q-OH可以具有伯醇结构。酸产生器适于在暴露于辐射时产生酸。抗蚀剂聚合物适于在酸存在下与添加剂发生化学反应以产生不溶于碱性显影剂水溶液的非交联反应产物。

3. 发明申请

US20100297557A1 Coating compositions suitable for use with an overcoated photoresist 有权
标题翻译：适用于外涂光致抗蚀剂的涂料组合物
公开(公告)号：US20100297557A1
公开(公告)日：2010-11-25
申请号：US12658615
申请日：2010-02-08
申请人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
发明人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
IPC分类号： G03F7/004 , C08G73/10
CPC分类号： G03F7/2008 , C08L25/18 , C08L29/02 , C08L33/06 , C08L33/24 , G03F7/091 , G03F7/11
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
摘要翻译：提供了可以用含水碱性显影剂显影的有机涂料组合物，特别是抗反射涂料组合物，包括在外涂光致抗蚀剂层的显影过程中的一个步骤。优选的涂料组合物包含包含至少四个不同官能团的四元共聚物。

4. 发明授权

US07563563B2 Wet developable bottom antireflective coating composition and method for use thereof 失效
标题翻译：湿可显影底部抗反射涂料组合物及其使用方法
公开(公告)号：US07563563B2
公开(公告)日：2009-07-21
申请号：US11405879
申请日：2006-04-18
申请人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
发明人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
IPC分类号： G03C1/825 , G03F7/039 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
摘要翻译：本发明公开了一种用于在基材表面和正性光致抗蚀剂组合物之间施加的抗反射涂料组合物。抗反射涂料组合物可在含水碱性显影剂中显影。抗反射涂料组合物包括聚合物，其包含至少一种含有一个或多个选自内酯，马来酰亚胺和N-烷基马来酰亚胺的部分的单体单元; 和含有一个或多个吸收部分的至少一个单体单元。聚合物不包含酸不稳定基团。本发明还公开了一种通过在光刻中使用本发明的抗反射涂料组合物来形成和转印浮雕图像的方法。

5. 发明申请

US20090181319A1 AROMATIC FLUORINE-FREE PHOTOACID GENERATORS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME 审中-公开
标题翻译：芳香无氟光纤发生器和含有它的光电组合物
公开(公告)号：US20090181319A1
公开(公告)日：2009-07-16
申请号：US12015041
申请日：2008-01-16
申请人： Wenjie Li , Sen Liu , Wu-Song Huang , Pushkara R. Varanasi , Irene Popova
发明人： Wenjie Li , Sen Liu , Wu-Song Huang , Pushkara R. Varanasi , Irene Popova
IPC分类号： G03F7/004 , G03F7/26 , C07C317/14
CPC分类号： C07C309/59 , C07C25/18 , C07C309/40 , C07C381/12 , G03F7/0045 , G03F7/0397
摘要： Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free aromatic sulfonate anionic component having one or more electron withdrawing groups. The photoacid generators preferably contain a fluorine-free onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer having a lactone functionality. The compositions are especially useful for forming material patterns using 193 nm (ArF) imaging radiation.
摘要翻译：含有无氟光致酸发生剂的无氟光致酸发生剂和光致抗蚀剂组合物可用作具有PFOS / PFAS光致酸产生剂的光致抗蚀剂的替代品。光酸产生剂的特征在于存在具有一个或多个吸电子基团的无氟芳族磺酸盐阴离子组分。光酸产生剂优选含有无氟鎓阳离子成分，更优选含有阳离子锍组分。光致抗蚀剂组合物优选含有具有内酯官能度的酸敏感成像聚合物。组合物对于使用193nm（ArF）成像辐射形成材料图案特别有用。

6. 发明授权

US09726977B2 Coating compositions suitable for use with an overcoated photoresist 有权
公开(公告)号：US09726977B2
公开(公告)日：2017-08-08
申请号：US12658615
申请日：2010-02-08
申请人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
发明人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
IPC分类号： G03F7/095 , G03F7/09 , G03F7/11 , G03F7/20 , C08L25/18 , C08L29/02 , C08L33/06 , C08L33/24
CPC分类号： G03F7/2008 , C08L25/18 , C08L29/02 , C08L33/06 , C08L33/24 , G03F7/091 , G03F7/11
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.

7. 发明授权

US08202678B2 Wet developable bottom antireflective coating composition and method for use thereof 有权
标题翻译：湿可显影底部抗反射涂料组合物及其使用方法
公开(公告)号：US08202678B2
公开(公告)日：2012-06-19
申请号：US12478442
申请日：2009-06-04
申请人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
发明人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
IPC分类号： G03F7/09 , G03F7/20 , G03F7/30 , G03F7/36 , G03C1/825
CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
摘要翻译：本发明公开了一种用于在基材表面和正性光致抗蚀剂组合物之间施加的抗反射涂料组合物。抗反射涂料组合物可在含水碱性显影剂中显影。抗反射涂料组合物包括聚合物，其包含至少一种含有一个或多个选自内酯，马来酰亚胺和N-烷基马来酰亚胺的部分的单体单元; 和含有一个或多个吸收部分的至少一个单体单元。聚合物不包含酸不稳定基团。本发明还公开了一种通过在光刻中使用本发明的抗反射涂料组合物来形成和转印浮雕图像的方法。

8. 发明授权

US07754820B2 Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application 失效
标题翻译：用于干燥193nm顶部抗反射涂层的马来酸酐聚合物的氟化半酯
公开(公告)号：US07754820B2
公开(公告)日：2010-07-13
申请号：US12176440
申请日：2008-07-21
申请人： Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi
发明人： Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi
IPC分类号： G03F7/11 , C08F22/16 , C08F283/12
CPC分类号： G03F7/091 , G03F7/0046 , G03F7/0752 , Y10S438/952
摘要： The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition comprises an aqueous base-soluble polymer having a backbone and a fluorinated half ester moiety. The fluorinated half ester moiety is pendant from the backbone. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
摘要翻译：本发明公开了一种适合用作193nm光刻的顶部抗反射涂层和阻挡层的组合物。本发明的组合物可溶于碱性水溶液中，并且在193nm具有低折射率。本发明的组合物包含具有主链和氟化半酯部分的水溶性基团可溶性聚合物。氟化半酯部分是从骨架侧挂。本发明还公开了通过在光刻中使用本发明的组合物在衬底上形成图案化层的方法。

9. 发明授权

US07011923B2 Negative photoresist and method of using thereof 失效
标题翻译：负光致抗蚀剂及其使用方法
公开(公告)号：US07011923B2
公开(公告)日：2006-03-14
申请号：US10820117
申请日：2004-04-07
申请人： Wenjie Li , Pushkara R. Varanasi
发明人： Wenjie Li , Pushkara R. Varanasi
IPC分类号： G03C1/73 , G03F7/038 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/0382 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/11 , Y10S430/111 , Y10S430/115 , Y10S430/122
摘要： A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The negative photoresist composition comprises a radiation sensitive acid generator, a first polymer containing an alkoxymethyl amido group and a hydroxy-containing second polymer. The first and second polymers may also have a repeating unit having an aqueous base soluble moiety. The first and second polymers undergo acid catalyzed crosslinking upon exposure of the acid to radiation, producing a product that is insoluble in an aqueous alkaline developer solution.
摘要翻译：负性光致抗蚀剂组合物和通过使用负性光致抗蚀剂组合物构图基板的方法。负性光致抗蚀剂组合物包含辐射敏感性酸产生剂，含有烷氧基甲基酰氨基的第一聚合物和含羟基的第二聚合物。第一和第二聚合物也可以具有含有碱水溶性部分的重复单元。第一和第二聚合物在将酸暴露于辐射时经历酸催化交联，产生不溶于碱性显影剂水溶液的产物。

10. 发明申请

US20090291392A1 WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF 有权
标题翻译：可湿性底漆抗反射涂料组合物及其使用方法
公开(公告)号：US20090291392A1
公开(公告)日：2009-11-26
申请号：US12478442
申请日：2009-06-04
申请人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
发明人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
IPC分类号： G03F7/004 , C08G73/10 , C08G63/08 , C08L67/04 , C08L79/08 , G03F7/20
CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
摘要翻译：本发明公开了一种用于在基材表面和正性光致抗蚀剂组合物之间施加的抗反射涂料组合物。抗反射涂料组合物可在含水碱性显影剂中显影。抗反射涂料组合物包括聚合物，其包含至少一种含有一个或多个选自内酯，马来酰亚胺和N-烷基马来酰亚胺的部分的单体单元; 和含有一个或多个吸收部分的至少一个单体单元。聚合物不包含酸不稳定基团。本发明还公开了一种通过在光刻中使用本发明的抗反射涂料组合物来形成和转印浮雕图像的方法。

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