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1. 发明申请

US20090291392A1 WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF 有权
标题翻译：可湿性底漆抗反射涂料组合物及其使用方法
公开(公告)号：US20090291392A1
公开(公告)日：2009-11-26
申请号：US12478442
申请日：2009-06-04
申请人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
发明人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
IPC分类号： G03F7/004 , C08G73/10 , C08G63/08 , C08L67/04 , C08L79/08 , G03F7/20
CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
摘要翻译：本发明公开了一种用于在基材表面和正性光致抗蚀剂组合物之间施加的抗反射涂料组合物。抗反射涂料组合物可在含水碱性显影剂中显影。抗反射涂料组合物包括聚合物，其包含至少一种含有一个或多个选自内酯，马来酰亚胺和N-烷基马来酰亚胺的部分的单体单元; 和含有一个或多个吸收部分的至少一个单体单元。聚合物不包含酸不稳定基团。本发明还公开了一种通过在光刻中使用本发明的抗反射涂料组合物来形成和转印浮雕图像的方法。

2. 发明授权

US07563563B2 Wet developable bottom antireflective coating composition and method for use thereof 失效
标题翻译：湿可显影底部抗反射涂料组合物及其使用方法
公开(公告)号：US07563563B2
公开(公告)日：2009-07-21
申请号：US11405879
申请日：2006-04-18
申请人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
发明人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
IPC分类号： G03C1/825 , G03F7/039 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
摘要翻译：本发明公开了一种用于在基材表面和正性光致抗蚀剂组合物之间施加的抗反射涂料组合物。抗反射涂料组合物可在含水碱性显影剂中显影。抗反射涂料组合物包括聚合物，其包含至少一种含有一个或多个选自内酯，马来酰亚胺和N-烷基马来酰亚胺的部分的单体单元; 和含有一个或多个吸收部分的至少一个单体单元。聚合物不包含酸不稳定基团。本发明还公开了一种通过在光刻中使用本发明的抗反射涂料组合物来形成和转印浮雕图像的方法。

3. 发明授权

US08202678B2 Wet developable bottom antireflective coating composition and method for use thereof 有权
标题翻译：湿可显影底部抗反射涂料组合物及其使用方法
公开(公告)号：US08202678B2
公开(公告)日：2012-06-19
申请号：US12478442
申请日：2009-06-04
申请人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
发明人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
IPC分类号： G03F7/09 , G03F7/20 , G03F7/30 , G03F7/36 , G03C1/825
CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
摘要翻译：本发明公开了一种用于在基材表面和正性光致抗蚀剂组合物之间施加的抗反射涂料组合物。抗反射涂料组合物可在含水碱性显影剂中显影。抗反射涂料组合物包括聚合物，其包含至少一种含有一个或多个选自内酯，马来酰亚胺和N-烷基马来酰亚胺的部分的单体单元; 和含有一个或多个吸收部分的至少一个单体单元。聚合物不包含酸不稳定基团。本发明还公开了一种通过在光刻中使用本发明的抗反射涂料组合物来形成和转印浮雕图像的方法。

4. 发明申请

US20100047712A1 TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS 有权
标题翻译：含有疏水性和酸性组合物的顶级抗反射涂料组合物
公开(公告)号：US20100047712A1
公开(公告)日：2010-02-25
申请号：US12605771
申请日：2009-10-26
申请人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
发明人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/091 , G03F7/0046 , Y10S438/952
摘要： The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
摘要翻译：本发明公开了一种适合用作浸没式光刻的顶部抗反射涂层和阻挡层的组合物。本发明的组合物可溶于碱性水溶液并且不溶于水。本发明的组合物包含具有至少一个疏水部分，至少一个pKa为1或更小的酸性部分和至少一种水溶性基团可溶部分的聚合物。本发明还公开了通过在光刻中使用本发明的组合物在衬底上形成图案化层的方法。

5. 发明授权

US07608390B2 Top antireflective coating composition containing hydrophobic and acidic groups 有权
标题翻译：顶级抗反射涂料组合物含有疏水和酸性基团
公开(公告)号：US07608390B2
公开(公告)日：2009-10-27
申请号：US11462527
申请日：2006-08-04
申请人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
发明人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
IPC分类号： G03F7/40 , G03F7/11
CPC分类号： G03F7/091 , G03F7/0046 , Y10S438/952
摘要： The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
摘要翻译：本发明公开了一种适合用作浸没式光刻的顶部抗反射涂层和阻挡层的组合物。本发明的组合物可溶于碱性水溶液并且不溶于水。本发明的组合物包含具有至少一个疏水部分，至少一个pKa为1或更小的酸性部分和至少一种碱可溶性部分的聚合物。本发明还公开了通过在光刻中使用本发明的组合物在衬底上形成图案化层的方法。

6. 发明授权

US08304178B2 Top antireflective coating composition containing hydrophobic and acidic groups 有权
标题翻译：含有疏水和酸性基团的顶级抗反射涂料组合物
公开(公告)号：US08304178B2
公开(公告)日：2012-11-06
申请号：US12605771
申请日：2009-10-26
申请人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
发明人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
IPC分类号： G03F7/11 , G03F7/40 , C08F18/20
CPC分类号： G03F7/091 , G03F7/0046 , Y10S438/952
摘要： The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
摘要翻译：本发明公开了一种适合用作浸没式光刻的顶部抗反射涂层和阻挡层的组合物。本发明的组合物可溶于碱性水溶液并且不溶于水。本发明的组合物包含具有至少一个疏水部分，至少一个pKa为1或更小的酸性部分和至少一种碱可溶性部分的聚合物。本发明还公开了通过在光刻中使用本发明的组合物在衬底上形成图案化层的方法。

7. 发明申请

US20080032228A1 TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS 有权
标题翻译：含有疏水性和酸性组合物的顶级抗反射涂料组合物
公开(公告)号：US20080032228A1
公开(公告)日：2008-02-07
申请号：US11462527
申请日：2006-08-04
申请人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
发明人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , G03F7/0046 , Y10S438/952
摘要： The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
摘要翻译：本发明公开了一种适合用作浸没式光刻的顶部抗反射涂层和阻挡层的组合物。本发明的组合物可溶于碱性水溶液并且不溶于水。本发明的组合物包含具有至少一个疏水部分，至少一个pKa为1或更小的酸性部分和至少一种碱可溶性部分的聚合物。本发明还公开了通过在光刻中使用本发明的组合物在衬底上形成图案化层的方法。

8. 发明申请

US20080248208A1 APPARATUS AND METHOD FOR MEASURING THE QUANTITY OF CONDENSABLE MATERIALS WHICH OUTGAS DURING CURE OF ORGANIC THIN FILMS 审中-公开
标题翻译：用于测量有机薄膜固化的易熔材料数量的装置和方法
公开(公告)号：US20080248208A1
公开(公告)日：2008-10-09
申请号：US11697403
申请日：2007-04-06
申请人： Mark Stephen Chace , John Richard Graziano , Ranee Wai-Ling Kwong , Margaret C. Lawson , Alfred Oscar Passano
发明人： Mark Stephen Chace , John Richard Graziano , Ranee Wai-Ling Kwong , Margaret C. Lawson , Alfred Oscar Passano
IPC分类号： B05D3/02 , B05C11/00
CPC分类号： H01L21/67109 , H01L21/67253
摘要： An apparatus and method for measuring an amount of condensable material which outgas during cure of organic thin films. The apparatus includes a hotplate placed in a chamber having a removeable liner and means for cooling the liner. The method includes: weighing the liner, sequentially placing multiple substrates on said hotplate, and then weighing the liner again.
摘要翻译：一种用于测量有机薄膜固化期间出气的可冷凝材料的量的装置和方法。该设备包括放置在具有可移除衬垫的室中的加热板和用于冷却衬套的装置。该方法包括：对衬垫进行称重，将多个衬底依次放置在所述加热板上，然后再次称重衬垫。

9. 发明授权

US07700262B2 Top coat material and use thereof in lithography processes 失效
标题翻译：面漆材料及其在光刻工艺中的应用
公开(公告)号：US07700262B2
公开(公告)日：2010-04-20
申请号：US12044004
申请日：2008-03-07
申请人： Wenjie Li , Margaret C. Lawson , Pushkara Rao Varanasi
发明人： Wenjie Li , Margaret C. Lawson , Pushkara Rao Varanasi
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10T428/3154
摘要： A top coat material for applying on top of a photoresist material is disclosed. The top coat material includes a polymer, which includes at least one fluorosulfonamide monomer unit having one of the following two structures: wherein: M is a polymerizable backbone moiety; Z is a linking moiety selected from the group consisting of —C(O)O—, —C(O)—, —OC(O)—, and —O—C(O)—C(O)—O—; R1 is selected from the group consisting of an alkylene, an arylene, a semi- or perfluorinated alkylene, and a semi- or perfluorinated arylene; p and q are 0 or 1; R2 is selected from the group consisting of hydrogen, fluorine, an alkyl group of 1 to 6 carbons, and a semi- or perfluorinated alkyl group of 1 to 6 carbons; n is an integer from 1 to 6; and R3 is selected from the group consisting of hydrogen, an alkyl, an aryl, a semi- or perfluorinated alkyl, and a semi- or perfluorinated aryl. The top coat material may be used in lithography processes, wherein the top coat material is applied on a photoresist layer. The top coat material is preferably soluble in aqueous alkaline developer. The top coat material is also preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
摘要翻译：公开了一种用于涂覆在光致抗蚀剂材料上的顶涂层材料。面漆材料包括聚合物，其包括至少一种具有以下两种结构之一的氟磺酰胺单体单元：其中：M是可聚合主链部分; Z是选自-C（O）O-，-C（O） - ， - OC（O） - 和-O-C（O）-C（O）-O-的连接部分; R1选自亚烷基，亚芳基，半或全氟亚烷基，以及半或全氟化亚芳基; p和q为0或1; R2选自氢，氟，1至6个碳的烷基和1至6个碳的半或全氟化烷基; n是1至6的整数; 并且R 3选自氢，烷基，芳基，半或全氟烷基和半或全氟芳基。面漆材料可以用在光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。顶涂层材料优选可溶于含水碱性显影剂。面漆材料也优选不溶于水，因此特别适用于使用水作为成像介质的浸渍光刻技术。

10. 发明申请

US20080166568A1 TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES 失效
公开(公告)号：US20080166568A1
公开(公告)日：2008-07-10
申请号：US12044004
申请日：2008-03-07
申请人： Wenjie Li , Margaret C. Lawson , Pushkara Rao Varanasi
发明人： Wenjie Li , Margaret C. Lawson , Pushkara Rao Varanasi
IPC分类号： B32B27/28
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10T428/3154
摘要： A top coat material for applying on top of a photoresist material is disclosed. The top coat material includes a polymer, which includes at least one fluorosulfonamide monomer unit having one of the following two structures: wherein: M is a polymerizable backbone moiety; Z is a linking moiety selected from the group consisting of —C(O)O—, —C(O)—, —OC(O)—, and —O—C(O)—C(O)—O—; R1 is selected from the group consisting of an alkylene, an arylene, a semi- or perfluorinated alkylene, and a semi- or perfluorinated arylene; p and q are 0 or 1; R2 is selected from the group consisting of hydrogen, fluorine, an alkyl group of 1 to 6 carbons, and a semi- or perfluorinated alkyl group of 1 to 6 carbons; n is an integer from 1 to 6; and R3 is selected from the group consisting of hydrogen, an alkyl, an aryl, a semi- or perfluorinated alkyl, and a semi- or perfluorinated aryl. The top coat material may be used in lithography processes, wherein the top coat material is applied on a photoresist layer. The top coat material is preferably soluble in aqueous alkaline developer. The top coat material is also preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.

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