专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07563563B2 Wet developable bottom antireflective coating composition and method for use thereof 失效
标题翻译：湿可显影底部抗反射涂料组合物及其使用方法
公开(公告)号：US07563563B2
公开(公告)日：2009-07-21
申请号：US11405879
申请日：2006-04-18
申请人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
发明人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
IPC分类号： G03C1/825 , G03F7/039 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
摘要翻译：本发明公开了一种用于在基材表面和正性光致抗蚀剂组合物之间施加的抗反射涂料组合物。抗反射涂料组合物可在含水碱性显影剂中显影。抗反射涂料组合物包括聚合物，其包含至少一种含有一个或多个选自内酯，马来酰亚胺和N-烷基马来酰亚胺的部分的单体单元; 和含有一个或多个吸收部分的至少一个单体单元。聚合物不包含酸不稳定基团。本发明还公开了一种通过在光刻中使用本发明的抗反射涂料组合物来形成和转印浮雕图像的方法。

2. 发明申请

US20090291392A1 WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF 有权
标题翻译：可湿性底漆抗反射涂料组合物及其使用方法
公开(公告)号：US20090291392A1
公开(公告)日：2009-11-26
申请号：US12478442
申请日：2009-06-04
申请人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
发明人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
IPC分类号： G03F7/004 , C08G73/10 , C08G63/08 , C08L67/04 , C08L79/08 , G03F7/20
CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
摘要翻译：本发明公开了一种用于在基材表面和正性光致抗蚀剂组合物之间施加的抗反射涂料组合物。抗反射涂料组合物可在含水碱性显影剂中显影。抗反射涂料组合物包括聚合物，其包含至少一种含有一个或多个选自内酯，马来酰亚胺和N-烷基马来酰亚胺的部分的单体单元; 和含有一个或多个吸收部分的至少一个单体单元。聚合物不包含酸不稳定基团。本发明还公开了一种通过在光刻中使用本发明的抗反射涂料组合物来形成和转印浮雕图像的方法。

3. 发明授权

US08202678B2 Wet developable bottom antireflective coating composition and method for use thereof 有权
标题翻译：湿可显影底部抗反射涂料组合物及其使用方法
公开(公告)号：US08202678B2
公开(公告)日：2012-06-19
申请号：US12478442
申请日：2009-06-04
申请人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
发明人： Kuang-Jung J. Chen , Mahmoud Khojasteh , Ranee Wai-Ling Kwong , Margaret C. Lawson , Wenjie Li , Kaushal S. Patel , Pushkara R. Varanasi
IPC分类号： G03F7/09 , G03F7/20 , G03F7/30 , G03F7/36 , G03C1/825
CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
摘要翻译：本发明公开了一种用于在基材表面和正性光致抗蚀剂组合物之间施加的抗反射涂料组合物。抗反射涂料组合物可在含水碱性显影剂中显影。抗反射涂料组合物包括聚合物，其包含至少一种含有一个或多个选自内酯，马来酰亚胺和N-烷基马来酰亚胺的部分的单体单元; 和含有一个或多个吸收部分的至少一个单体单元。聚合物不包含酸不稳定基团。本发明还公开了一种通过在光刻中使用本发明的抗反射涂料组合物来形成和转印浮雕图像的方法。

4. 发明授权

US07608390B2 Top antireflective coating composition containing hydrophobic and acidic groups 有权
标题翻译：顶级抗反射涂料组合物含有疏水和酸性基团
公开(公告)号：US07608390B2
公开(公告)日：2009-10-27
申请号：US11462527
申请日：2006-08-04
申请人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
发明人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
IPC分类号： G03F7/40 , G03F7/11
CPC分类号： G03F7/091 , G03F7/0046 , Y10S438/952
摘要： The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
摘要翻译：本发明公开了一种适合用作浸没式光刻的顶部抗反射涂层和阻挡层的组合物。本发明的组合物可溶于碱性水溶液并且不溶于水。本发明的组合物包含具有至少一个疏水部分，至少一个pKa为1或更小的酸性部分和至少一种碱可溶性部分的聚合物。本发明还公开了通过在光刻中使用本发明的组合物在衬底上形成图案化层的方法。

5. 发明申请

US20080032228A1 TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS 有权
标题翻译：含有疏水性和酸性组合物的顶级抗反射涂料组合物
公开(公告)号：US20080032228A1
公开(公告)日：2008-02-07
申请号：US11462527
申请日：2006-08-04
申请人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
发明人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , G03F7/0046 , Y10S438/952
摘要： The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
摘要翻译：本发明公开了一种适合用作浸没式光刻的顶部抗反射涂层和阻挡层的组合物。本发明的组合物可溶于碱性水溶液并且不溶于水。本发明的组合物包含具有至少一个疏水部分，至少一个pKa为1或更小的酸性部分和至少一种碱可溶性部分的聚合物。本发明还公开了通过在光刻中使用本发明的组合物在衬底上形成图案化层的方法。

6. 发明授权

US08304178B2 Top antireflective coating composition containing hydrophobic and acidic groups 有权
标题翻译：含有疏水和酸性基团的顶级抗反射涂料组合物
公开(公告)号：US08304178B2
公开(公告)日：2012-11-06
申请号：US12605771
申请日：2009-10-26
申请人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
发明人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
IPC分类号： G03F7/11 , G03F7/40 , C08F18/20
CPC分类号： G03F7/091 , G03F7/0046 , Y10S438/952
摘要： The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
摘要翻译：本发明公开了一种适合用作浸没式光刻的顶部抗反射涂层和阻挡层的组合物。本发明的组合物可溶于碱性水溶液并且不溶于水。本发明的组合物包含具有至少一个疏水部分，至少一个pKa为1或更小的酸性部分和至少一种碱可溶性部分的聚合物。本发明还公开了通过在光刻中使用本发明的组合物在衬底上形成图案化层的方法。

7. 发明申请

US20100047712A1 TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS 有权
标题翻译：含有疏水性和酸性组合物的顶级抗反射涂料组合物
公开(公告)号：US20100047712A1
公开(公告)日：2010-02-25
申请号：US12605771
申请日：2009-10-26
申请人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
发明人： Mahmoud Khojasteh , Wu-Song Huang , Margaret C. Lawson , Kaushal S. Patel , Irene Popova , Pushkara R. Varanasi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/091 , G03F7/0046 , Y10S438/952
摘要： The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
摘要翻译：本发明公开了一种适合用作浸没式光刻的顶部抗反射涂层和阻挡层的组合物。本发明的组合物可溶于碱性水溶液并且不溶于水。本发明的组合物包含具有至少一个疏水部分，至少一个pKa为1或更小的酸性部分和至少一种水溶性基团可溶部分的聚合物。本发明还公开了通过在光刻中使用本发明的组合物在衬底上形成图案化层的方法。

8. 发明授权

US07217496B2 Fluorinated photoresist materials with improved etch resistant properties 有权
标题翻译：具有改善耐蚀性能的氟化光致抗蚀剂材料
公开(公告)号：US07217496B2
公开(公告)日：2007-05-15
申请号：US10988137
申请日：2004-11-12
申请人： Mahmoud Khojasteh , Pushkara Rao Varanasi , Wenjie Li , Kuang-Jung J Chen , Kaushal S. Patel
发明人： Mahmoud Khojasteh , Pushkara Rao Varanasi , Wenjie Li , Kuang-Jung J Chen , Kaushal S. Patel
IPC分类号： G03C1/73 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/126
摘要： A photoresist composition including a polymer is disclosed, wherein the polymer includes at least one monomer having the formula: where R1 represents hydrogen (H), a linear, branched or cyclo alkyl group of 1 to 20 carbons, a semi- or perfluorinated linear, branched or cyclo alkyl group of 1 to 20 carbons or CN; R2 represents an alicyclic group of 5 or more carbon atoms; X represents a methylene, ether, ester, amide or carbonate linkage; R3 represents a linear or branched alkylene group or semi- or perfluorinated linear or branched alkylene group with 1 or more carbon atoms; R4 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perflourinated aliphatic group; R5 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group; n represents an integer of 1 or more; and OR12 represents OH or at least one acid labile group selected from a tertiary alkyl carbonate, a tertiary alkyl ester, a tertiary alkyl ether, an acetal and a ketal. A method of patterning a substrate is also disclosed, wherein the method includes: applying the photoresist composition mentioned above to the substrate to form a film; patternwise exposing the film to an imaging radiation source; and developing areas of the film to form a patterned substrate.
摘要翻译：公开了包含聚合物的光致抗蚀剂组合物，其中聚合物包括至少一种具有下式的单体：其中R 1表示氢（H），1至20个碳的直链，支链或环烷基，碳原子数为1〜20的半全氟化或全氟化的支链或环状烷基，CN; R 2表示5个以上碳原子的脂环基; X表示亚甲基，醚，酯，酰胺或碳酸酯键; R 3表示具有1个或更多个碳原子的直链或支链亚烷基或半或全氟化的直链或支链亚烷基; R 4表示氢（H），甲基（CH 3），三氟甲基（CF 3），二氟甲基（CHF 2）（CH 2 CH 2），或半或全氟化脂族基团; R 5表示三氟甲基（CF 3），二氟甲基（CH 2）2，氟甲基（CH 2 CH 2），氟甲基或半或全氟取代或未取代的脂族基团; n表示1以上的整数，和OR 12代表OH或选自叔碳酸烷基酯，叔烷基酯，叔烷基醚，缩醛和缩酮中的至少一种酸不稳定基团。还公开了一种图案化衬底的方法，其中该方法包括：将上述光致抗蚀剂组合物施加到衬底上以形成膜; 将膜图案化地曝光到成像辐射源; 和显影区域以形成图案化衬底。

9. 发明授权

US07544750B2 Top antireflective coating composition with low refractive index at 193nm radiation wavelength 有权
$Top antireflective coating composition with low refractive index at 193nm radiation wavelength$
标题翻译：顶部抗反射涂层组合物，在193nm辐射波长下具有低折射率
公开(公告)号：US07544750B2
公开(公告)日：2009-06-09
申请号：US11249693
申请日：2005-10-13
申请人： Wu-Song S. Huang , William H. Heath , Kaushal S. Patel , Pushkara R. Varanasi
发明人： Wu-Song S. Huang , William H. Heath , Kaushal S. Patel , Pushkara R. Varanasi
IPC分类号： G03F7/09
CPC分类号： G03F7/091 , Y10S438/952
摘要： Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and a refractive index value n of less than 1.5 with respect to a radiation wavelength of 193 nm have been found which are especially useful as top antireflective coatings in 193 nm dry lithographic processes. Polymers with an ethylenic backbone and having fluorine and sulfonic acid moieties have been found to be especially useful. The compositions enable top reflection control at 193 nm while providing ease of use by virtue of their solubility in aqueous alkaline developer solutions.
摘要翻译：已经发现特征在于具有相对于193nm的辐射波长的具有芳族部分和折射率值n小于1.5的水溶性基团可溶性聚合物的组合物，其特别可用作193nm干法光刻中的顶部抗反射涂层过程。已经发现具有乙烯主链并具有氟和磺酸部分的聚合物是特别有用的。该组合物能够在193nm的顶部反射控制，同时通过其在含水碱性显影剂溶液中的溶解度而提供易于使用。

10. 发明申请

US20080138631A1 METHOD TO REDUCE MECHANICAL WEAR OF IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：降低机械磨损的方法
公开(公告)号：US20080138631A1
公开(公告)日：2008-06-12
申请号：US11567394
申请日：2006-12-06
申请人： Kaushal S. Patel , Daniel A. Corliss
发明人： Kaushal S. Patel , Daniel A. Corliss
IPC分类号： B32B9/00
CPC分类号： C23C30/00 , G03F7/70341 , G03F7/70916 , G03F7/7095
摘要： A protective coating is provided for components of an immersion lithography tool, in which at least a portion of a component exposed to the immersion fluid is protected by a thin, hard protective coating, comprising materials such as silicon carbide, diamond, diamond-like carbon, boron nitride, boron carbide, tungsten carbide, aluminum oxide, sapphire, titanium nitride, titanium carbonitride, titanium aluminum nitride and titanium carbide. The protective coating may be formed by methods such as CVD, PECVD, APCVD, LPCVD, LECVD, PVD, thin-film evaporation, sputtering, and thermal annealing in the presence of a gas. The protective coating preferably has a hardness greater than a Knoop hardness of about 1000 and more preferably greater than about 2000, or a Moh hardness greater than about 7, more preferably greater than about 9. The protective coating minimizes defects due to mechanical wear of scanner components.
摘要翻译：为浸没式光刻工具的组件提供保护涂层，其中暴露于浸没流体的部件的至少一部分被薄的硬质保护涂层保护，其包括诸如碳化硅，金刚石，类金刚石碳，氮化硼，碳化硼，碳化钨，氧化铝，蓝宝石，氮化钛，碳氮化钛，氮化铝钛和碳化钛。可以通过诸如CVD，PECVD，APCVD，LPCVD，LECVD，PVD，薄膜蒸发，溅射和在气体存在下的热退火的方法形成保护涂层。保护涂层优选具有大于Knoop硬度大约1000，更优选大于约2000的硬度，或大于约7，更优选大于约9的莫氏硬度。保护涂层使由于扫描仪的机械磨损引起的缺陷最小化组件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式