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    • 4. 发明授权
    • Method and device for ranking frequencies
    • 多模多苗多待通信终端,以及用于仲裁接收冲突的仲裁方法和装置
    • US08676253B2
    • 2014-03-18
    • US13574563
    • 2011-05-24
    • Wenjie Li
    • Wenjie Li
    • H04W88/02
    • H04W88/06H04W8/183H04W68/00H04W76/40
    • An arbitration method and device for arbitrating receiving conflict in a multi-mode multi-SIM multi-standby communication terminal is provided. The method includes: determining if there are at least two cards to receive messages in a time cycle while all of the cards are in standby states, the time cycle being a radio frame of one card; identifying types of messages to be received by the at least two cards after determining there are at least two cards to receive messages in the time cycle, and the types of messages comprising paging message and broadcast message; determining if a receiving conflict occurs; and arbitrating based on the types of receiving conflicts and obtaining arbitration results after determining there is a receiving conflict. The arbitration results include: receiving a paging message preferentially; receiving the paging message with the longest paging period; and receiving the broadcast message with the highest priority.
    • 提供了一种仲裁方法和装置,用于仲裁多模多SIM多待通信终端中的接收冲突。 该方法包括:当所有卡处于待机状态时,确定是否存在至少两个卡以在时间周期中接收消息,该时间周期是一个卡的无线电帧; 在确定在该时间周期中存在至少两个接收消息的卡以及包括寻呼消息和广播消息的消息的类型之后,识别由至少两张卡接收的消息的类型; 确定是否发生接收冲突; 并根据接收冲突的类型进行仲裁,并在确定接收冲突后获得仲裁结果。 仲裁结果包括:优先接收寻呼消息; 以最长的寻呼周期接收寻呼消息; 并接收具有最高优先级的广播消息。
    • 5. 发明授权
    • Top coat material and use thereof in lithography processes
    • 面漆材料及其在光刻工艺中的应用
    • US07700262B2
    • 2010-04-20
    • US12044004
    • 2008-03-07
    • Wenjie LiMargaret C. LawsonPushkara Rao Varanasi
    • Wenjie LiMargaret C. LawsonPushkara Rao Varanasi
    • G03F7/00G03F7/004
    • G03F7/11G03F7/0046G03F7/2041Y10T428/3154
    • A top coat material for applying on top of a photoresist material is disclosed. The top coat material includes a polymer, which includes at least one fluorosulfonamide monomer unit having one of the following two structures: wherein: M is a polymerizable backbone moiety; Z is a linking moiety selected from the group consisting of —C(O)O—, —C(O)—, —OC(O)—, and —O—C(O)—C(O)—O—; R1 is selected from the group consisting of an alkylene, an arylene, a semi- or perfluorinated alkylene, and a semi- or perfluorinated arylene; p and q are 0 or 1; R2 is selected from the group consisting of hydrogen, fluorine, an alkyl group of 1 to 6 carbons, and a semi- or perfluorinated alkyl group of 1 to 6 carbons; n is an integer from 1 to 6; and R3 is selected from the group consisting of hydrogen, an alkyl, an aryl, a semi- or perfluorinated alkyl, and a semi- or perfluorinated aryl. The top coat material may be used in lithography processes, wherein the top coat material is applied on a photoresist layer. The top coat material is preferably soluble in aqueous alkaline developer. The top coat material is also preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
    • 公开了一种用于涂覆在光致抗蚀剂材料上的顶涂层材料。 面漆材料包括聚合物,其包括至少一种具有以下两种结构之一的氟磺酰胺单体单元:其中:M是可聚合主链部分; Z是选自-C(O)O-,-C(O) - , - OC(O) - 和-O-C(O)-C(O)-O-的连接部分; R1选自亚烷基,亚芳基,半或全氟亚烷基,以及半或全氟化亚芳基; p和q为0或1; R2选自氢,氟,1至6个碳的烷基和1至6个碳的半或全氟化烷基; n是1至6的整数; 并且R 3选自氢,烷基,芳基,半或全氟烷基和半或全氟芳基。 面漆材料可以用在光刻工艺中,其中将顶涂层材料施加在光致抗蚀剂层上。 顶涂层材料优选可溶于含水碱性显影剂。 面漆材料也优选不溶于水,因此特别适用于使用水作为成像介质的浸渍光刻技术。
    • 7. 发明授权
    • Polymorphs of an androgen receptor modulator
    • 雄激素受体调节剂的多态性
    • US07365202B2
    • 2008-04-29
    • US11633152
    • 2006-12-04
    • Lushi TanRobert S. MeissnerWenjie LiJames J. PerkinsAaron S. CoteJoyce StellabottYuan-Hon Kiang
    • Lushi TanRobert S. MeissnerWenjie LiJames J. PerkinsAaron S. CoteJoyce StellabottYuan-Hon Kiang
    • C07D221/18
    • C07J73/005C07D471/04
    • Compounds of structural formula I are modulators of the androgen receptor (AR) in a tissue selective manner. These compounds are useful in the enhancement of weakened muscle tone and the treatment of conditions caused by androgen deficiency or which can be ameliorated by androgen administration, including osteoporosis, osteopenia, glucocorticoid-induced osteoporosis, periodontal disease, bone fracture, bone damage following bone reconstructive surgery, sarcopenia, frailty, aging skin, male hypogonadism, postmenopausal symptoms in women, atherosclerosis, hypercholesterolemia, hyperlipidemia, obesity, aplastic anemia and other hematopoietic disorders, inflammatory arthritis and joint repair, HIV-wasting, prostate cancer, benign prostatic hyperplasia (BPH), abdominal adiposity, metabolic syndrome, type II diabetes, cancer cachexia, Alzheimer's disease, muscular dystrophies, cognitive decline, sexual dysfunction, sleep apnea, depression, premature ovarian failure, and autoimmune disease, alone or in combination with other active agents.
    • 结构式I的化合物是以组织选择性方式的雄激素受体(AR)的调节剂。 这些化合物可用于增强弱化肌张力和治疗由雄激素缺乏引起的疾病或可由雄激素给药改善的疾病,包括骨质疏松症,骨质减少,糖皮质激素诱导的骨质疏松症,牙周病,骨折,骨重建后的骨损伤 手术,肌营养不良,虚弱,老化的皮肤,男性性腺机能减退,女性绝经后症状,动脉粥样硬化,高胆固醇血症,高脂血症,肥胖,再生障碍性贫血和其他造血障碍,炎性关节炎和关节修复,艾滋病毒消耗,前列腺癌,良性前列腺增生 ),腹部肥胖,代谢综合征,II型糖尿病,癌症恶病质,阿尔茨海默氏病,肌营养不良症,认知衰退,性功能障碍,睡眠呼吸暂停,抑郁症,卵巢早衰以及自身免疫性疾病,单独或与其它活性剂组合。
    • 10. 发明授权
    • Negative photoresist composition including non-crosslinking chemistry
    • 负光致抗蚀剂组合物包括非交联化学
    • US07235342B2
    • 2007-06-26
    • US10766058
    • 2004-01-28
    • Wenjie LiPushkara R. Varanasi
    • Wenjie LiPushkara R. Varanasi
    • G03F7/038G03F7/30
    • G03F7/0382G03F7/0046Y10S430/106Y10S430/111Y10S430/115Y10S430/128
    • A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The composition includes: a radiation sensitive acid generator; a hydroxy-containing additive; and a resist polymer derived from at least one first monomer. The resist polymer may be further derived from a second monomer having an aqueous base soluble moiety. The hydroxy-containing additive has the structure of Q—OH, where Q may include one or more cyclic structures. Q—OH may have a primary alcohol structure. The acid generator is adapted to generate an acid upon exposure to radiation. The resist polymer is adapted to chemically react with the additive in the presence of the acid to generate a non-crosslinking reaction product that is insoluble in an aqueous alkaline developer solution.
    • 负性光致抗蚀剂组合物和通过使用负性光致抗蚀剂组合物构图基板的方法。 组合物包括:辐射敏感酸发生剂; 含羟基的添加剂; 和衍生自至少一种第一单体的抗蚀剂聚合物。 抗蚀剂聚合物可以进一步衍生自具有碱性水溶性部分的第二单体。 含羟基的添加剂具有Q-OH的结构,其中Q可以包括一个或多个环状结构。 Q-OH可以具有伯醇结构。 酸产生器适于在暴露于辐射时产生酸。 抗蚀剂聚合物适于在酸存在下与添加剂发生化学反应以产生不溶于碱性显影剂水溶液的非交联反应产物。