会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明授权
    • Halogen-assisted chemical vapor deposition of diamond
    • 金属辅助化学气相沉积金刚石
    • US5071677A
    • 1991-12-10
    • US528804
    • 1990-05-24
    • Donald E. PattersonRobert H. HaugeC. Judith ChuJohn L. Margrave
    • Donald E. PattersonRobert H. HaugeC. Judith ChuJohn L. Margrave
    • C23C16/26C23C16/27
    • C23C16/27C23C16/277Y10S427/103
    • The present invention is directed to a method for depositing diamond films and particles on a variety of substrates by flowing a gas or gas mixture capable of supplying (1) carbon, (2) hydrogen and (3) a halogen through a reactor over the substrate material. The reactant gases may be pre-mixed with an inert gas in order to keep the overall gas mixture composition low in volume percent of carbon and rich in hydrogen. Pre-treatment of the reactant gases to a high energy state is not required as it is in most prior art processes for chemical vapor deposition of diamond. Since pre-treatment is not required, the process may be applied to substrates of virtually any desired size, shape or configuration.The reactant gas mixture preferably is passed through a reactor, a first portion of which is heated to a temperature of from about 400.degree. C. to about 920.degree. C. and more preferably from about 800.degree. C. to about 920.degree. C. The substrate on which the diamond is to be grown is placed in the reactor in a zone that is maintained at a lower temperature of from about 250.degree. C. to about 750.degree. C., which is the preferred diamond growth temperature range. The process preferably is practiced at ambient pressures, although lower or higher pressures may be used. Significant amounts of pure diamond films and particles have been obtained in as little as eight hours. The purity of the diamond films and particles has been verified by Raman spectroscopy and powder x-ray diffraction techniques.
    • 本发明涉及通过使能够(1)碳,(2)氢和(3)卤素的气体或气体混合物通过反应器流过衬底的方式将金刚石膜和颗粒沉积在各种衬底上的方法 材料。 反应物气体可以与惰性气体预混合,以便使总体气体混合物组合物的碳体积百分比低并富含氢气。 不需要将反应物气体预处理至高能量状态,如在金刚石的化学气相沉积的大多数现有技术方法中。 由于不需要预处理,所以该方法可以应用于几乎任何所需尺寸,形状或构型的基底。 反应气体混合物优选通过反应器,其第一部分被加热到约400℃至约920℃,更优选约800℃至约920℃的温度。 将金刚石生长在其上的底物置于反应器中,该区域保持在约250℃至约750℃的较低温度,这是优选的金刚石生长温度范围。 该方法优选在环境压力下实施,尽管可以使用更低或更高的压力。 在短短8小时内就已经获得了大量的纯金刚石膜和颗粒。 通过拉曼光谱和粉末X射线衍射技术验证了金刚石膜和颗粒的纯度。