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1. 发明申请

US20070017636A1 Plasma source and plasma processing apparatus 有权
标题翻译：等离子体源和等离子体处理装置
公开(公告)号：US20070017636A1
公开(公告)日：2007-01-25
申请号：US10558692
申请日：2004-05-28
申请人： Toshio Goto , Masaru Hori , Nobuo Ishii , Shoji Den
发明人： Toshio Goto , Masaru Hori , Nobuo Ishii , Shoji Den
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： B82Y30/00 , B82Y40/00 , C01B32/162 , H01J37/32009 , H01J37/32596
摘要： A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).
摘要翻译：等离子体源（1）由供应气体的室（2）和设置在室（2）的气体流出侧的中空阴极电极构件（4）组成，并且具有多个的气体可以流过的电极孔（3）。在这种等离子体源（1）中，可以在中空阴极电极部件（4）的电极孔（3）中进行微阴极等离子体放电。

2. 发明申请

US20070034601A1 Surface treating method and surface-treating apparatus 审中-公开
标题翻译：表面处理方法和表面处理装置
公开(公告)号：US20070034601A1
公开(公告)日：2007-02-15
申请号：US10550020
申请日：2003-09-22
申请人： Toshio Goto , Masaru Hori , Nobuo Ishii , Shoji Den
发明人： Toshio Goto , Masaru Hori , Nobuo Ishii , Shoji Den
IPC分类号： C03C15/00 , H01L21/302 , B44C1/22
CPC分类号： C23F4/00 , B23H5/08 , C23F3/06 , H01L21/3065 , H01L21/31055
摘要： The surface of a material for an electronic device is flattened by irradiating the surface of the material with at least part of plasma components, while supplying a liquid to the surface of the material for an electronic device. There are provided a method of treating the surfaces for favorably flattening the surface of the material for an electronic device or of the substrate for an electronic device, while suppressing damage to the material or to the substrate, and an apparatus for treating the surfaces.
摘要翻译：用于电子设备的材料的表面通过用至少部分等离子体部件照射材料的表面而平坦化，同时将液体供应到用于电子设备的材料的表面。提供了一种处理表面以有利地平坦化用于电子设备的材料的表面或用于电子设备的基板的方法，同时抑制对材料或基板的损坏，以及用于处理表面的设备。

3. 发明授权

US07632379B2 Plasma source and plasma processing apparatus 有权
标题翻译：等离子体源和等离子体处理装置
公开(公告)号：US07632379B2
公开(公告)日：2009-12-15
申请号：US10558692
申请日：2004-05-28
申请人： Toshio Goto , Masaru Hori , Nobuo Ishii , Shoji Den
发明人： Toshio Goto , Masaru Hori , Nobuo Ishii , Shoji Den
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00
CPC分类号： B82Y30/00 , B82Y40/00 , C01B32/162 , H01J37/32009 , H01J37/32596
摘要： A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).
摘要翻译：等离子体源（1）由供应气体的室（2）和设置在室（2）的气体流出侧的中空阴极电极构件（4）构成，并且具有多个的气体可以流过的电极孔（3）。在这种等离子体源（1）中，可以在中空阴极电极部件（4）的电极孔（3）中进行微阴极等离子体放电。

4. 发明申请

US20080029030A1 Plasma Generator 审中-公开
标题翻译：等离子发生器
公开(公告)号：US20080029030A1
公开(公告)日：2008-02-07
申请号：US10589568
申请日：2005-01-26
申请人： Toshio Goto , Masaru Hori , Shoji Den , Mikio Nagai
发明人： Toshio Goto , Masaru Hori , Shoji Den , Mikio Nagai
IPC分类号： H01L21/205 , H01L21/304 , H01L21/3065 , H05H1/24
CPC分类号： H05H1/46 , H05H2001/4622 , H05H2001/463
摘要： [Object] To stably generate plasma at atmospheric pressure.[Solving Means] There are provided a tubular casing 10 into which a gas and a microwave are introduced, a hole 30 provided in a bottom surface of this casing, and a columnar conductor 40 which is provided in an axis direction of the casing, a bottom surface of the conductor 40 having a contour placed inside the contour of the hole. A minute gap A formed between the contour of a bottom surface 41 of the conductor 40 and the contour of the hole, a coaxial waveguide formed of the conductor and the casing, and an insulating film 22 formed at least on a contour portion forming the hole at the minute gap are provided. In the structure described above, the microwave is guided to the minute gap by the coaxial waveguide, and the gas is made to pass through the minute gap, so that the gas is placed in a plasma state at the minute gap. The microwave is a pulse wave and is duty-controlled, and the contour portion forming the hole 30 is cooled with a cooling medium from the inside of an electrode 20. Accordingly, the increase in plasma temperature can be prevented, and as a result, stable plasma can be generated.
摘要翻译： [对象]在大气压下稳定地产生等离子体。 [解决方案]设置有引入气体和微波的管状壳体10，设置在该壳体的底面的孔30和沿壳体的轴线方向设置的柱状导体40，导体40的底表面具有放置在孔的轮廓内的轮廓。形成在导体40的底面41的轮廓和孔的轮廓之间的微小间隙A，由导体形成的同轴波导和壳体，以及至少形成在形成孔的轮廓部分上的绝缘膜22 提供了微小间隙。在上述结构中，通过同轴波导将微波引导到微小间隙，使气体通过微小间隙，使得气体在微小间隙处被置于等离子体状态。微波是脉冲波并且是负责控制的，并且形成孔30的轮廓部分从电极20的内部用冷却介质冷却。因此，可以防止等离子体温度的升高，结果，可以产生稳定的等离子体。

5. 发明授权

US06501082B1 Plasma deposition apparatus and method with controller 失效
标题翻译：等离子体沉积设备及方法与控制器
公开(公告)号：US06501082B1
公开(公告)日：2002-12-31
申请号：US09527562
申请日：2000-03-16
申请人： Toshio Goto , Masaru Hori , Masafumi Ito , Nobuo Ishii , Satoru Kawakami
发明人： Toshio Goto , Masaru Hori , Masafumi Ito , Nobuo Ishii , Satoru Kawakami
IPC分类号： G21K510
CPC分类号： H01J37/32192 , H01J37/3233 , H01J37/32623
摘要： A controlled plasma deposition system and method are provided including a vacuum vessel. An electron adding mass spectrometer is connected to a vacuum vessel for carrying out a gas treatment for a semi-conductor wafer. In the mass spectrometer, a gas in the vacuum vessel is incorporated, and electrons are added to the particles in the gas. Then the value of negative ions obtained by ionizing the particles, for example specific radicals, is measured. Once measured, the information is forwarded to a controller that may optimize the plasma deposition method.
摘要翻译：提供了包括真空容器的受控等离子体沉积系统和方法。将电子加入质谱仪连接到用于对半导体晶片进行气体处理的真空容器。在质谱仪中，并入真空容器中的气体，并将电子加到气体中的颗粒中。然后测量通过电离粒子，例如特定基团获得的负离子的值。一旦测量，信息被转发到可优化等离子体沉积方法的控制器。

6. 发明申请

US20050087296A1 Processor 审中-公开
标题翻译：处理器
公开(公告)号：US20050087296A1
公开(公告)日：2005-04-28
申请号：US10509656
申请日：2003-03-26
申请人： Toshio Goto , Masaru Hori , Nobuo Ishii
发明人： Toshio Goto , Masaru Hori , Nobuo Ishii
IPC分类号： C23C16/48 , H01J37/32 , H01L21/00 , C23F1/00
CPC分类号： H01L21/67253 , C23C16/482 , H01J37/32935
摘要： A processing apparatus includes a vessel (1) which accommodates a target object (W), ultraviolet light-generating means (41) for outputting ultraviolet light (UV) toward an atmosphere (P) containing radicals in the vessel (1), ultraviolet light-receiving means (42) for receiving the ultraviolet light (UV) passing through the atmosphere (P), and analysis control means (43, 44) for obtaining a density of the radicals in the atmosphere (P) on the basis of an output signal from the ultraviolet light-receiving means (42), to control a process parameter. The density of the radicals can be held at a constant level, and process reproducibility can be improved.
摘要翻译：处理装置包括容纳目标物体（W）的容器（1），用于向容器（1）中含有自由基的气氛（P）输出紫外光（UV）的紫外线发光装置，紫外线 - 接收通过大气（P）的紫外线（UV）的接收装置（42），以及用于基于输出获得大气中的自由基密度的分析控制装置（43,44）来自紫外光接收装置（42）的信号，以控制处理参数。自由基的密度可以保持在恒定水平，并且可以提高工艺的再现性。

7. 发明申请

US20130220223A1 RADICAL GENERATOR AND MOLECULAR BEAM EPITAXY APPARATUS 有权
标题翻译：辐射发生器和分子束外观设备
公开(公告)号：US20130220223A1
公开(公告)日：2013-08-29
申请号：US13819284
申请日：2011-08-24
申请人： Masaru Hori , Hiroshi Amano , Hiroyuki Kano , Shoji Den , Koji Yamakawa
发明人： Masaru Hori , Hiroshi Amano , Hiroyuki Kano , Shoji Den , Koji Yamakawa
IPC分类号： C30B23/02 , H05H1/46
CPC分类号： H01J37/321 , C30B23/02 , C30B23/066 , C30B25/14 , C30B29/403 , H01J37/3178 , H01J37/32091 , H01J37/32357 , H01J37/3244 , H01J37/32541 , H01J37/3266 , H01J2237/006 , H01J2237/083 , H01J2237/327 , H01J2237/3321 , H05H1/30 , H05H1/46 , H05H2001/2462 , H05H2001/2468
摘要： [Object] To provide a radical generator which can produce radicals at higher density.[Means for Solution] The radical generator includes a supply tube 10 made of SUS, a hollow cylindrical plasma-generating tube 11 which is connected to the supply tube 10 and which is made of pyrolytic boron nitride (PBN). A cylindrical CCP electrode 13 is disposed outside the plasma-generating tube 11. A coil 12 is provided so as to wind about the outer circumference of the plasma-generating tube at the downstream end of the CCP electrode 13. A parasitic-plasma-preventing tube 15 made of a ceramic material is inserted into an opening of the supply tube 10 at the connection site between the supply tube 10 and the plasma-generating tube 11.
摘要翻译：提供一种能够以更高密度产生自由基的自由基发生器。 [解决方案]自由基发生器包括由SUS制成的供应管10，连接到供应管10并由热解氮化硼（PBN）制成的中空圆柱形等离子体产生管11。一个圆柱形的CCP电极13设置在等离子体发生管11的外部。线圈12设置成在CCP电极13的下游端围绕等离子体产生管的外周缠绕。一个等离子体等离子体防止在供给管10和等离子体产生管11之间的连接部位插入由陶瓷材料制成的管15供给管10的开口。

8. 发明申请

US20100201978A1 LIGHT SOURCE 有权
标题翻译：光源
公开(公告)号：US20100201978A1
公开(公告)日：2010-08-12
申请号：US12450402
申请日：2008-03-24
申请人： Masaru Hori , Hiroyuki Kano , Shoji Den
发明人： Masaru Hori , Hiroyuki Kano , Shoji Den
IPC分类号： G01N21/31
CPC分类号： H05H1/0025 , G01N21/15 , G01N21/3103 , G01N2021/158 , G01N2201/023 , G01N2201/0233 , G01N2201/061
摘要： To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere.The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode. The light source further includes a hole 47 axially penetrating the center portions of the first electrode, the insulating spacer, and the second electrode; and an electric discharge gas passage for introducing an electric discharge gas, along the inner wall of the cooling medium passage, to the back surface of the lens so that the electric discharge gas is reflected by the lens and flows through the hole.
摘要翻译：提供一种实现等离子体气氛的粒子密度的精确测定而不干扰等离子体气氛的状态的光源。本发明的光源包括管状壳体12; 用于使冷却介质流过其中的冷却介质通道30，所述通道沿着所述壳体的内壁设置; 设置在所述壳体的前端的透镜50; 第一电极44和第二电极45，其设置在壳体内并且在透镜之前垂直于壳体的轴线并且彼此平行; 以及设置在第一电极和第二电极之间的绝缘间隔件46。光源还包括轴向穿过第一电极，绝缘间隔物和第二电极的中心部分的孔47; 以及放电气体通道，用于沿着冷却介质通道的内壁将放电气体引导到透镜的背面，使得放电气体被透镜反射并流过孔。

9. 发明授权

US08310673B2 Light source 有权
标题翻译：光源
公开(公告)号：US08310673B2
公开(公告)日：2012-11-13
申请号：US12450402
申请日：2008-03-24
申请人： Masaru Hori , Hiroyuki Kano , Shoji Den
发明人： Masaru Hori , Hiroyuki Kano , Shoji Den
IPC分类号： G01J3/30
CPC分类号： H05H1/0025 , G01N21/15 , G01N21/3103 , G01N2021/158 , G01N2201/023 , G01N2201/0233 , G01N2201/061
摘要： To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere.The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode. The light source further includes a hole 47 axially penetrating the center portions of the first electrode, the insulating spacer, and the second electrode; and an electric discharge gas passage for introducing an electric discharge gas, along the inner wall of the cooling medium passage, to the back surface of the lens so that the electric discharge gas is reflected by thepslens and flows through the hole.
摘要翻译：提供一种实现等离子体气氛的粒子密度的精确测定而不干扰等离子体气氛的状态的光源。本发明的光源包括管状壳体12; 用于使冷却介质流过其中的冷却介质通道30，所述通道沿着所述壳体的内壁设置; 设置在所述壳体的前端的透镜50; 第一电极44和第二电极45，其设置在壳体内并且在透镜之前垂直于壳体的轴线并且彼此平行; 以及设置在第一电极和第二电极之间的绝缘间隔件46。光源还包括轴向穿过第一电极，绝缘间隔物和第二电极的中心部分的孔47; 以及放电气体通道，用于沿着冷却介质通道的内壁将放电气体引导到透镜的背面，使得放电气体被透镜反射并流过孔。

10. 发明授权

US09447518B2 Radical generator and molecular beam epitaxy apparatus 有权
标题翻译：自由基发生器和分子束外延装置
公开(公告)号：US09447518B2
公开(公告)日：2016-09-20
申请号：US13819284
申请日：2011-08-24
申请人： Masaru Hori , Hiroshi Amano , Hiroyuki Kano , Shoji Den , Koji Yamakawa
发明人： Masaru Hori , Hiroshi Amano , Hiroyuki Kano , Shoji Den , Koji Yamakawa
IPC分类号： C23C16/00 , H01L21/326 , C30B23/02 , H05H1/46 , H01J37/32 , C30B23/06 , H05H1/30 , H05H1/24
CPC分类号： H01J37/321 , C30B23/02 , C30B23/066 , C30B25/14 , C30B29/403 , H01J37/3178 , H01J37/32091 , H01J37/32357 , H01J37/3244 , H01J37/32541 , H01J37/3266 , H01J2237/006 , H01J2237/083 , H01J2237/327 , H01J2237/3321 , H05H1/30 , H05H1/46 , H05H2001/2462 , H05H2001/2468
摘要： A radical generator includes a supply tube, a plasma-generating tube, a coil winding about an outer circumference of the plasma-generating tube, for generating an inductively coupled plasma in the plasma-generating tube, an electrode for generating a capacitively coupled plasma in the plasma-generating tube and adding the capacitively coupled plasma to the inductively coupled plasma, and a parasitic-plasma-preventing tube including a dielectric material which extends from a bottom of the plasma-generating tube to an opening of the supply tube in a space between the bottom and the opening, and a tip part thereof is inserted into the supply tube to cover an inner wall of the supply tube for preventing a generation of a parasitic plasma between the electrode and the inner wall of the supply tube.
摘要翻译：自由基发生器包括供给管，等离子体产生管，围绕等离子体产生管的外圆周的线圈绕组，用于在等离子体发生管中产生电感耦合等离子体，用于产生电容耦合等离子体的电极等离子体发生管，并将电容耦合等离子体添加到电感耦合等离子体;以及寄生等离子体防止管，其包括从等离子体产生管的底部延伸到供应管的开口的电介质材料在底部和开口之间，并且其顶端部分插入供应管中以覆盖供应管的内壁，以防止在电极和供应管的内壁之间产生寄生等离子体。

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