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1. 发明申请

US20100116986A1 Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images 有权
标题翻译：标本检测设备和如何使电子束吸收当前图像
公开(公告)号：US20100116986A1
公开(公告)日：2010-05-13
申请号：US12691331
申请日：2010-01-21
申请人： Tomoharu Obuki , Hiroshi Toyama , Yasuhiro Mitsui , Munetoshi Fukui , Yasuhiko Nara , Tohru Ando , Katsuo Ooki , Tsutomu Saito , Masaaki Komori
发明人： Tomoharu Obuki , Hiroshi Toyama , Yasuhiro Mitsui , Munetoshi Fukui , Yasuhiko Nara , Tohru Ando , Katsuo Ooki , Tsutomu Saito , Masaaki Komori
IPC分类号： G01N23/225
CPC分类号： G01N23/225 , H01J2237/2449 , H01J2237/24564 , H01J2237/2817
摘要： An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency.In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.
摘要翻译：本发明的目的是获得清晰的吸收电流图像，而不涉及放大器在输入之间的增益差异，从吸收的电流通过使用多个探针检测并提高测量效率。在本发明中，使多个探针与试样接触。在用电子束照射样品的同时，测量在探针中流动的电流。至少两个探头的信号被输入到差分放大器。差分放大器的输出被放大。基于电子束的放大输出和扫描信息，产生吸收的当前图像。根据本发明，可以获得清晰的吸收电流图像而不涉及放大器在输入之间的增益差。因此，可以提高半导体器件的故障分析中的测量效率。

2. 发明授权

US07663104B2 Specimen inspection equipment and how to make electron beam absorbed current images 有权
标题翻译：试样检测设备和如何使电子束吸收当前图像
公开(公告)号：US07663104B2
公开(公告)日：2010-02-16
申请号：US12038079
申请日：2008-02-27
申请人： Tomoharu Obuki , Hiroshi Toyama , Yasuhiro Mitsui , Munetoshi Fukui , Yasuhiko Nara , Tohru Ando , Katsuo Ooki , Tsutomu Saito , Masaaki Komori
发明人： Tomoharu Obuki , Hiroshi Toyama , Yasuhiro Mitsui , Munetoshi Fukui , Yasuhiko Nara , Tohru Ando , Katsuo Ooki , Tsutomu Saito , Masaaki Komori
IPC分类号： G01N23/00 , G21K7/00 , G01R31/302 , G01R31/305
CPC分类号： G01N23/225 , H01J2237/2449 , H01J2237/24564 , H01J2237/2817
摘要： An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency.In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.
摘要翻译：本发明的目的是获得清晰的吸收电流图像，而不涉及放大器在输入之间的增益差异，从吸收的电流通过使用多个探针检测并提高测量效率。在本发明中，多个探针与试样接触。在用电子束照射样品的同时，测量在探针中流动的电流。至少两个探头的信号被输入到差分放大器。差分放大器的输出被放大。基于电子束的放大输出和扫描信息，产生吸收的当前图像。根据本发明，可以获得清晰的吸收电流图像而不涉及放大器在输入之间的增益差。因此，可以提高半导体器件的故障分析中的测量效率。

3. 发明授权

US08178840B2 Specimen inspection equipment and how to make the electron beam absorbed current images 有权
标题翻译：试样检查设备和如何使电子束吸收当前图像
公开(公告)号：US08178840B2
公开(公告)日：2012-05-15
申请号：US12691331
申请日：2010-01-21
申请人： Tomoharu Obuki , Hiroshi Toyama , Yasuhiro Mitsui , Munetoshi Fukui , Yasuhiko Nara , Tohru Ando , Katsuo Ooki , Tsutomu Saito , Masaaki Komori
发明人： Tomoharu Obuki , Hiroshi Toyama , Yasuhiro Mitsui , Munetoshi Fukui , Yasuhiko Nara , Tohru Ando , Katsuo Ooki , Tsutomu Saito , Masaaki Komori
IPC分类号： G01N23/225 , H01J37/28
CPC分类号： G01N23/225 , H01J2237/2449 , H01J2237/24564 , H01J2237/2817
摘要： An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency.In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.
摘要翻译：本发明的目的是获得清晰的吸收电流图像，而不涉及放大器在输入之间的增益差异，从吸收的电流通过使用多个探针检测并提高测量效率。在本发明中，使多个探针与试样接触。在用电子束照射样品的同时，测量在探针中流动的电流。至少两个探头的信号被输入到差分放大器。差分放大器的输出被放大。基于电子束的放大输出和扫描信息，产生吸收的当前图像。根据本发明，可以获得清晰的吸收电流图像而不涉及放大器在输入之间的增益差。因此，可以提高半导体器件的故障分析中的测量效率。

4. 发明申请

US20080203297A1 Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images 有权
标题翻译：标本检测设备和如何使电子束吸收当前图像
公开(公告)号：US20080203297A1
公开(公告)日：2008-08-28
申请号：US12038079
申请日：2008-02-27
申请人： Tomoharu OBUKI , Hiroshi Toyama , Yasuhiro Mitsui , Munetoshi Fukui , Yasuhiko Nara , Tohru Ando , Katsuo Ooki , Tsutomu Saito , Masaaki Komori
发明人： Tomoharu OBUKI , Hiroshi Toyama , Yasuhiro Mitsui , Munetoshi Fukui , Yasuhiko Nara , Tohru Ando , Katsuo Ooki , Tsutomu Saito , Masaaki Komori
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , H01J2237/2449 , H01J2237/24564 , H01J2237/2817
摘要： An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency.In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.
摘要翻译：本发明的目的是获得清晰的吸收电流图像，而不涉及放大器在输入之间的增益差异，从吸收的电流通过使用多个探针检测并提高测量效率。在本发明中，使多个探针与试样接触。在用电子束照射样品的同时，测量在探针中流动的电流。至少两个探头的信号被输入到差分放大器。差分放大器的输出被放大。基于电子束的放大输出和扫描信息，产生吸收的当前图像。根据本发明，可以获得清晰的吸收电流图像而不涉及放大器在输入之间的增益差。因此，可以提高半导体器件的故障分析中的测量效率。

5. 发明授权

US08713758B2 Opening/closing device 有权
标题翻译：开/关装置
公开(公告)号：US08713758B2
公开(公告)日：2014-05-06
申请号：US13698095
申请日：2011-05-02
申请人： Yasuhiro Mitsui , Hironobu Sayama
发明人： Yasuhiro Mitsui , Hironobu Sayama
IPC分类号： E05D11/06
CPC分类号： H04M1/0237 , G06F1/1615 , H04M1/0216 , Y10T16/544 , Y10T16/5448 , Y10T74/18944
摘要： An opening/closing device includes a fixed plate, a moving plate movable relative to the fixed plate, a slide plate formed having a groove, a hinge including a first shaft connected to the fixed plate, a third shaft connected to the moving plate, and a second shaft between the first and third shafts, and moves the moving plate between closed and open positions relative to the fixed plate, a slide arm including a fourth shaft connected to the moving plate and a fifth shaft connected slidably along the groove, and moves the moving plate between the closed and open positions, a link arm having one end connected to the second shaft and the other to the fifth shaft. The fifth shaft slides inside the groove as the link arm moves along with the moving of the hinge when the moving plate is moved between the closed and open positions.
摘要翻译：开闭装置包括固定板，相对于固定板可移动的移动板，形成有槽的滑动板，包括连接到固定板的第一轴的铰链，连接到移动板的第三轴，以及在第一和第三轴之间的第二轴，并且使移动板相对于固定板在关闭和打开位置之间移动，包括连接到移动板的第四轴的滑动臂和沿着凹槽可滑动地连接的第五轴，所述移动板在所述闭合位置和打开位置之间，连杆臂的一端连接到所述第二轴，而另一端连接到所述第五轴。当移动板在关闭位置和打开位置之间移动时，连杆臂随着铰链的移动而移动，第五轴在凹槽内滑动。

6. 发明授权

US08618520B2 Method and apparatus for processing a micro sample 有权
公开(公告)号：US08618520B2
公开(公告)日：2013-12-31
申请号：US13547942
申请日：2012-07-12
申请人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
发明人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
IPC分类号： G21K5/00
CPC分类号： H04L29/06 , G01N23/225 , H01J37/256 , H01J37/3056 , H01J2237/20 , H01J2237/202 , H01J2237/31745 , H04L67/16 , H04L69/329
摘要： An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.

7. 发明申请

US20130156354A1 SLIDING DEVICE FOR ELECTRONIC APPARATUS 有权
标题翻译：电子设备滑动装置
公开(公告)号：US20130156354A1
公开(公告)日：2013-06-20
申请号：US13818730
申请日：2011-08-29
申请人： Yasuhiro Mitsui
发明人： Yasuhiro Mitsui
IPC分类号： H04M1/02
CPC分类号： H04M1/0235 , G06F1/1624 , H04M1/0237
摘要： A sliding device for an electronic apparatus includes a contact piece projecting outward in a widthwise direction from a sliding plate and a contacted part with which the contact piece is caused to come into contact when the sliding plate is caused to slide with a maximum displacement in a rear direction relative to a base plate. The contact piece includes a partially cylindrical surface and a connecting surface. The contacted part includes a contacted shape part configured to be contacted by a boundary part of the partially cylindrical surface and the connecting surface to provide the sliding plate with a rotational force to cause a front direction end portion of the sliding plate to move in the bottom direction relative to a rear direction end portion of the sliding plate, and an engaged shape part with which the partially cylindrical surface and the connecting surface are caused to engage.
摘要翻译：一种用于电子设备的滑动装置，包括从滑动板沿宽度方向向外突出的接触片和当滑动板以最大位移滑动时使接触片接触的接触部分相对于基板的后方向。接触件包括部分圆柱形表面和连接表面。接触部分包括接触形状部分，其被构造成与部分圆柱形表面的边界部分和连接表面接触，以向滑动板提供旋转力，以使滑板的前方端部在底部移动相对于滑动板的后方端部的方向，以及与部分圆筒形表面和连接表面接合的接合形状部分。

8. 发明授权

US5877498A Method and apparatus for X-ray analyses 失效
标题翻译： X射线分析的方法和装置
公开(公告)号：US5877498A
公开(公告)日：1999-03-02
申请号：US893034
申请日：1997-07-15
申请人： Aritoshi Sugimoto , Yoshimi Sudo , Tokuo Kure , Ken Ninomiya , Katsuhiro Kuroda , Takashi Nishida , Hideo Todokoro , Yasuhiro Mitsui , Hiroyasu Shichi
发明人： Aritoshi Sugimoto , Yoshimi Sudo , Tokuo Kure , Ken Ninomiya , Katsuhiro Kuroda , Takashi Nishida , Hideo Todokoro , Yasuhiro Mitsui , Hiroyasu Shichi
IPC分类号： G01N23/225 , H01J37/256
CPC分类号： G01N23/2252 , H01J2237/2445 , H01J2237/2807
摘要： An X-ray analyzing method for inspecting opening states of fine holes comprises the steps of: irradiating a finely converged electron beam into a first fine hole, observing an X-ray emitted from the inside of said first fine hole in order to obtain an first X-ray analysis data about the residue substance existing at the bottom of said first fine hole; irradiating a finely converged electron beam into a second fine hole, observing an X-ray emitted from the inside of said second fine hole in order to obtain an second X-ray analysis data about the residue substance existing at the bottom of said second fine hole; and comparing said first X-ray analysis data with said second X-ray analysis data, forming a judgment as to whether or not a difference between said first and second analysis data is smaller than a predetermined threshold value and using an outcome of said judgment to determine the opening states of said first and second fine holes. The X-ray observations are carried out by detecting only the X-rays emitted within the angular range -.theta. to +.theta. where notation .theta. is an angle formed with a center axis of the irradiated electron beam and so defined that tan .theta. is equal to a/d whereas notations a and d are the radius and the depth of the fine holes.
摘要翻译：用于检查细孔的打开状态的X射线分析方法包括以下步骤：将精细会聚的电子束照射到第一细孔中，观察从所述第一细孔的内部发射的X射线，以获得第一细孔关于存在于所述第一细孔底部的残留物质的X射线分析数据; 将精细会聚的电子束照射到第二细孔中，观察从所述第二细孔的内部发射的X射线，以获得关于存在于所述第二细孔底部的残留物质的第二X射线分析数据 ; 以及将所述第一X射线分析数据与所述第二X射线分析数据进行比较，形成关于所述第一和第二分析数据之间的差是否小于预定阈值的判断，并且使用所述判断结果确定所述第一和第二细孔的打开状态。通过仅检测在角度范围θ至+θ内发射的X射线来进行X射线观察，其中符号θ是与照射的电子束的中心轴形成的角度，并且如此定义，tanθ等于 a / d，而符号a和d是细孔的半径和深度。

9. 发明授权

US5866905A Electron microscope 失效
标题翻译：电子显微镜
公开(公告)号：US5866905A
公开(公告)日：1999-02-02
申请号：US686740
申请日：1996-07-26
申请人： Hiroshi Kakibayashi , Yasuhiro Mitsui , Hideo Todokoro , Katsuhiro Kuroda , Masanari Koguchi , Kazutaka Tsuji , Tatsuo Makishima , Mikio Ichihashi , Shigeto Isakozawa , Ruriko Tsuneta , Kuniyasu Nakamura , Kensuke Sekihara , Jun Motoike
发明人： Hiroshi Kakibayashi , Yasuhiro Mitsui , Hideo Todokoro , Katsuhiro Kuroda , Masanari Koguchi , Kazutaka Tsuji , Tatsuo Makishima , Mikio Ichihashi , Shigeto Isakozawa , Ruriko Tsuneta , Kuniyasu Nakamura , Kensuke Sekihara , Jun Motoike
IPC分类号： H01J37/26 , H01J37/28
CPC分类号： H01J37/28 , G01N23/046 , G01R31/305 , G01N2223/419 , H01J2237/226 , H01J2237/2802 , H01J2237/2807
摘要： A scanning transmission electron microscope including an electron detection system having a scattering angle limiting aperture (for the inner angle) and a scattering angle limiting aperture (for the outer angle) between a specimen and an electron detector (comprising a scintillator and a light guide) and only one electron detector is installed.
摘要翻译：一种扫描透射电子显微镜，包括具有散射角限制孔径（内角）的电子检测系统和检体与电子检测器（包括闪烁体和光导体）之间的散射角限制孔径（外角）并且仅安装一个电子检测器。

10. 发明授权

US5744800A Defect observing electron microscope 失效
标题翻译：缺陷观察电子显微镜
公开(公告)号：US5744800A
公开(公告)日：1998-04-28
申请号：US477654
申请日：1995-06-07
申请人： Hiroshi Kakibayashi , Hisaya Murakoshi , Hidekazu Okuhira , Takashi Irie , Jiro Tokita , Keiichi Kanehori , Yasuhiro Mitsui
发明人： Hiroshi Kakibayashi , Hisaya Murakoshi , Hidekazu Okuhira , Takashi Irie , Jiro Tokita , Keiichi Kanehori , Yasuhiro Mitsui
IPC分类号： H01J37/20 , H01J37/26
CPC分类号： H01J37/26 , H01J2237/2617
摘要： A transmission electron microscope makes it possible to search for defects without applying an undesirable treatment to a specimen by using a reference specimen prepared separately from a specimen to be observed. A pair of specimen holders detachable from the column of the electron microscope are adjacently arranged at upper and lower stages respectively along an electron beam axis to position the specimens closely to each other in an electron beam illuminating position. The pair of holders can be independently set to or removed from the electron beam illuminating position. The specimen holders include devices for selectively finely adjusting the spacing between the specimens, the angle of the specimen with respect to the electron beam axis and with respect to a plane perpendicular to the electron beam axis.
摘要翻译：透射电子显微镜使得可以通过使用与要观察的样品分开制备的参考样品，来对样品进行不期望的处理来搜索缺陷。从电子显微镜柱分离的一对试样支架分别沿着电子束轴相邻地设置在上部和下部阶段，以使电极在照射位置彼此紧密地定位。该对保持器可以独立地设置在电子束照明位置或从电子束照射位置移除。样品架包括用于选择性地精细调节样品之间的间距，样品相对于电子束轴线的角度和相对于垂直于电子束轴线的平面的角度的装置。

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