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    • 3. 发明授权
    • Semiconductor device formed in a semiconductor layer provided on an insulating film
    • 半导体器件形成在设置在绝缘膜上的半导体层中
    • US06693328B1
    • 2004-02-17
    • US10303546
    • 2002-11-25
    • Shigeru KawanakaHideaki Nii
    • Shigeru KawanakaHideaki Nii
    • H01L2712
    • H01L29/78615H01L29/42384H01L29/4908Y10S257/901
    • A semiconductor device includes an insulating film provided on a semiconductor substrate and a semiconductor layer provided on the insulating film. An element separating insulating film separates element area. A first gate insulating film is provided on the semiconductor layer in the element area. A gate electrode is provided on the first gate insulating film. Source/drain diffusion layers are formed in the semiconductor layer sandwiching a channel area under the gate electrode therebetween. A potential applying section inducing a leak current which controls the potential of the semiconductor layer comprises a second gate insulating film provided on the semiconductor layer in the element area and a conductive film provided on the second gate insulating film and connected to the gate electrode. The potential applying section is configured so that a leak current through the second gate insulating film is larger than a leak current through the first gate insulating film.
    • 半导体器件包括设置在半导体衬底上的绝缘膜和设置在绝缘膜上的半导体层。 分离绝缘膜的元件分离元件区域。 第一栅极绝缘膜设置在元件区域中的半导体层上。 栅电极设置在第一栅绝缘膜上。 源极/漏极扩散层形成在半导体层中,夹着栅极之下的沟道区域。 诱导控制半导体层电位的漏电流的电位施加部包括设置在元件区域的半导体层上的第二栅极绝缘膜和设置在第二栅极绝缘膜上并连接到栅电极的导电膜。 电位施加部被配置为使得通过第二栅极绝缘膜的漏电流大于通过第一栅极绝缘膜的漏电流。
    • 7. 发明申请
    • Data collecting system and data transmitting method
    • 数据采集​​系统和数据传输方法
    • US20050131617A1
    • 2005-06-16
    • US10985967
    • 2004-11-12
    • Hideaki NiiIchiro Kawabuchi
    • Hideaki NiiIchiro Kawabuchi
    • G06G7/70G08C15/00G08C15/06G08C19/00H04L12/28
    • G08C15/06
    • A data collecting system includes a data collecting device and plural data processing devices connected to the data collecting device by a cascade connection. For example, each of the data processing devices individually executes an A/D conversion and other data process, and adds data obtained by the data process to a data transmitting signal to transmit it to the subsequent cascade-connection data processing device in sequence. The data processing device at the head of the cascade connection generates the data transmitting signal including a data processing period and a communication period, and transmits it to the subsequent data processing device. Each of the data processing devices executes the data process in the data processing period, and transmits data obtained by the data process to the subsequent data processing device in the communication period on the basis of the data transmitting signal.
    • 数据采集​​系统包括数据采集装置和通过级联连接连接到数据采集装置的多个数据处理装置。 例如,每个数据处理装置分别执行A / D转换和其他数据处理,并且将通过数据处理获得的数据附加到数据发送信号,以将其依次发送到后续级联连接数据处理装置。 级联连接头部的数据处理装置生成包含数据处理期间和通信期间的数据发送信号,发送给后续的数据处理装置。 数据处理装置中的每一个在数据处理期间执行数据处理,并且根据数据发送信号将通过数据处理获得的数据发送到通信期间的后续数据处理装置。
    • 8. 发明授权
    • Semiconductor device
    • 半导体器件
    • US06633069B2
    • 2003-10-14
    • US09081613
    • 1998-05-20
    • Hideaki NiiChihiro Yoshino
    • Hideaki NiiChihiro Yoshino
    • H01L2976
    • H01L21/8249H01L29/41708
    • A bipolar transistor has metal silicide as a base lead-out electrode instead of conventional polysilicon, and the metal silicide film extends to an edge of an etching stopper layer, to reduce an emitter resistance and restrain an occurrence of an emitter plug effect. Such bipolar transistor can be utilized in a CMOS semiconductor device. In this case, (1) commonly using a process of providing an active base region, a base lead-out electrode and a collector lead-out electrode of the bipolar transistor and a process of providing gate electrodes a MOS field effect transistor, (2) commonly using a process of adding a p-type impurity into the active base region and the base lead-out electrode and a process of executing an ion-implantation for providing high-concentration impurity diffused layers of pMOS transistors, (3) commonly using a process of providing an etching stopper layer and a process of providing side wall insulating films of gate electrodes, and (4) commonly using a silicidation process of the base lead-out electrode and the collector lead-out electrode and a silicidation process of electrodes of MOS transistors. In other embodiment of the bipolar transistor, a single insulating film exist between the base layer and the emitter electrode in the peripheral of the emitter opening. By this construction, the etching stopper film is not necessary resulting in reducing the base resistance.
    • 双极晶体管具有金属硅化物作为基极引出电极而不是常规的多晶硅,并且金属硅化物膜延伸到蚀刻停止层的边缘,以降低发射极电阻并抑制发射极插塞效应的发生。 这种双极晶体管可以用在CMOS半导体器件中。 在这种情况下,(1)通常使用提供有源基极区域的工艺,双极晶体管的基极引出电极和集电极引出电极以及提供栅电极MOS场效应晶体管的工艺(2 )通常使用将p型杂质添加到有源基极区域和基极引出电极中的过程以及执行用于提供pMOS晶体管的高浓度杂质扩散层的离子注入的过程,(3)通常使用 提供蚀刻停止层的工艺和提供栅电极的侧壁绝缘膜的工艺,以及(4)通常使用基极引出电极和集电极引出电极的硅化工艺和电极的硅化工艺 的MOS晶体管。 在双极晶体管的另一个实施例中,在发射极开口周边的基极层和发射极之间存在单个绝缘膜。 通过这种结构,不需要蚀刻阻挡膜,导致降低基极电阻