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1. 发明授权

US08325322B2 Optical correction device 有权
标题翻译：光学校正装置
公开(公告)号：US08325322B2
公开(公告)日：2012-12-04
申请号：US12700122
申请日：2010-02-04
申请人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
发明人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
IPC分类号： G03B27/68 , G03B27/52
CPC分类号： G02B7/008 , G02B7/1815 , G02B26/06 , G02B27/0025 , G03F7/70191 , G03F7/70308 , G03F7/70825 , G03F7/70891
摘要： The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
摘要翻译：本发明涉及具有用于影响光学校正装置中的温度分布的热致动器的光学校正装置。光学校正装置由至少两个部分元件构成，这些部分元素关于其传送热量的能力而不同。此外，本公开涉及影响光学元件中的温度分布的方法。

2. 发明授权

US07999916B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US07999916B2
公开(公告)日：2011-08-16
申请号：US12053993
申请日：2008-03-24
申请人： Tilmann Heil
发明人： Tilmann Heil
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70191
摘要： A microlithographic projection exposure apparatus is disclosed. The apparatus can have an illumination system for generating projection light, an absorption filter which has a varying absorption coefficient distribution, and a mask which is illuminated by the projection light. The mask can contain regions that differ from one another by the orientation of structures contained in them and whose transmissivity depends on the polarization state of the incident projection light. The absorption coefficient distribution of the absorption filter is determined so as to compensate at least partially for the dependence of the transmissivity of the region on the polarization state of the incident projection light.
摘要翻译：公开了一种微光刻投影曝光装置。该装置可以具有用于产生投影光的照明系统，具有变化的吸收系数分布的吸收滤光器和由投影光照亮的掩模。掩模可以包含彼此不同的区域，其中包含在其中的结构的取向，并且其透射率取决于入射的投影光的偏振状态。吸收滤光器的吸收系数分布被确定为至少部分地补偿该区域的透射率对入射投影光的偏振状态的依赖性。

3. 发明申请

US20080143992A1 Polarized radiation in lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20080143992A1
公开(公告)日：2008-06-19
申请号：US12010819
申请日：2008-01-30
申请人： Christian Wagner , Wilhelmus Petrus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
发明人： Christian Wagner , Wilhelmus Petrus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.

4. 发明授权

US07312852B2 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US07312852B2
公开(公告)日：2007-12-25
申请号：US11022938
申请日：2004-12-28
申请人： Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka
发明人： Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70191
摘要： A lithographic apparatus uses polarized light to improve the imaging properties, such as exposure latitude, while maintaining and extending the lifetime of an illumination system in the lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中照明系统的寿命。

5. 发明申请

US20100201958A1 OPTICAL CORRECTION DEVICE 有权
标题翻译：光学校正装置
公开(公告)号：US20100201958A1
公开(公告)日：2010-08-12
申请号：US12700122
申请日：2010-02-04
申请人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
发明人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
IPC分类号： G03B27/52 , G02B7/02
CPC分类号： G02B7/008 , G02B7/1815 , G02B26/06 , G02B27/0025 , G03F7/70191 , G03F7/70308 , G03F7/70825 , G03F7/70891
摘要： The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
摘要翻译：本发明涉及具有用于影响光学校正装置中的温度分布的热致动器的光学校正装置。光学校正装置由至少两个部分元件构成，这些部分元素关于其传送热量的能力而不同。此外，本公开涉及影响光学元件中的温度分布的方法。

6. 发明申请

US20060139612A1 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US20060139612A1
公开(公告)日：2006-06-29
申请号：US11101630
申请日：2005-04-08
申请人： Christian Wagner , Wilhelmus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
发明人： Christian Wagner , Wilhelmus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。

7. 发明申请

US20060139611A1 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US20060139611A1
公开(公告)日：2006-06-29
申请号：US11022938
申请日：2004-12-28
申请人： Christian Wagner , Wilhelmus De Boeij , Tilmann Heil , Damian Fiolka
发明人： Christian Wagner , Wilhelmus De Boeij , Tilmann Heil , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70191
摘要： A lithographic apparatus uses polarized light to improve the imaging properties, such as exposure latitude, while maintaining and extending the lifetime of an illumination system in the lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。

8. 发明授权

US07929116B2 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US07929116B2
公开(公告)日：2011-04-19
申请号：US12010819
申请日：2008-01-30
申请人： Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka , Roel De Jonge
发明人： Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka , Roel De Jonge
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。

9. 发明授权

US07800732B2 Projection exposure method and projection exposure apparatus for microlithography 有权
标题翻译：投影曝光法和微光刻投影曝光装置
公开(公告)号：US07800732B2
公开(公告)日：2010-09-21
申请号：US12643637
申请日：2009-12-21
申请人： Joerg Zimmermann , Heiko Feldmann , Tilmann Heil , Paul Graeupner , Ulrich Gebhardt
发明人： Joerg Zimmermann , Heiko Feldmann , Tilmann Heil , Paul Graeupner , Ulrich Gebhardt
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70333 , G03F9/7026
摘要： A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval. An active compensation of at least one portion of at least one imaging aberration induced by the change in the focus positions during the exposure time interval has the effect that the imaging quality is not significantly impaired by the alteration of the focusing during the exposure time interval.
摘要翻译：投影曝光方法，用于在布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像的布置在投影物镜的图像区域的区域中的辐射敏感基板的曝光包括曝光在曝光时间间隔期间在投影物镜的有效图像场中具有图案的图像的基板，并且还可以在曝光时间间隔期间在曝光时间间隔期间改变基板的表面与投影物镜的焦点表面之间的相对定位在曝光时间间隔期间，有效图像场中的图像点在掩模的图像的不同焦点位置被曝光的方式。在曝光时间间隔期间由聚焦位置的变化引起的至少一个成像像差的至少一部分的有效补偿具有这样的效果，即在曝光时间间隔期间聚焦改变不会显着地损害成像质量。

10. 发明申请

US20100157266A1 PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY 有权
标题翻译：投影曝光方法和投影曝光装置
公开(公告)号：US20100157266A1
公开(公告)日：2010-06-24
申请号：US12643637
申请日：2009-12-21
申请人： Joerg Zimmermann , Heiko Feldmann , Tilmann Heil , Paul Graeupner , Ulrich Gebhardt
发明人： Joerg Zimmermann , Heiko Feldmann , Tilmann Heil , Paul Graeupner , Ulrich Gebhardt
IPC分类号： G03B27/42
CPC分类号： G03F7/70333 , G03F9/7026
摘要： A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval. An active compensation of at least one portion of at least one imaging aberration induced by the change in the focus positions during the exposure time interval has the effect that the imaging quality is not significantly impaired by the alteration of the focusing during the exposure time interval.
摘要翻译：投影曝光方法，用于在布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像的布置在投影物镜的图像区域的区域中的辐射敏感基板的曝光包括曝光在曝光时间间隔期间在投影物镜的有效图像场中具有图案的图像的基板，并且还可以在曝光时间间隔期间在曝光时间间隔期间改变基板的表面与投影物镜的焦点表面之间的相对定位在曝光时间间隔期间，有效图像场中的图像点在掩模的图像的不同焦点位置被曝光的方式。在曝光时间间隔期间由聚焦位置的变化引起的至少一个成像像差的至少一部分的有效补偿具有这样的效果，即在曝光时间间隔期间聚焦改变不会显着地损害成像质量。

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