专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20140211184A1 Radiation Source 有权
标题翻译：辐射源
公开(公告)号：US20140211184A1
公开(公告)日：2014-07-31
申请号：US14241986
申请日：2012-07-27
申请人： Christian Wagner , Erik Roelof Loopstra
发明人： Christian Wagner , Erik Roelof Loopstra
IPC分类号： G03F7/20 , G02B27/28 , H05G2/00
CPC分类号： H05G2/008 , G02B27/283 , G03F7/70025 , G03F7/70033 , G03F7/70983 , H01S3/0064 , H01S3/2316 , H01S3/2333 , H05G2/003 , H05G2/005
摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam back toward the beam splitter.
摘要翻译：根据本发明的第一方面，提供了一种辐射源，包括：喷嘴，被配置为沿着轨迹朝着等离子体形成位置引导燃料液滴流（70）; 激光器，被配置为在等离子体形成位置处的燃料液滴处引导激光辐射，以在使用中产生辐射产生等离子体; 其中所述激光器包括：种子激光器（50），用于提供种子激光束（52）; 用于从种子激光器接收种子激光束的分束器（54）; 用于从分束器接收种子激光束并进行光放大的光放大器（58）位于所述光放大器下游的第一反射器（60），被配置为将所述种子激光束引导通过所述光放大器并且返回到所述分束器; 以及位于所述分束器的更下游的第二反射器（70），被配置为从所述分束器接收所述种子激光束并将所述种子激光束的至少一部分引导回所述分束器。

2. 发明授权

US08696347B2 System for post-treating and transferring preforms 有权
标题翻译：用于后处理和转移预制件的系统
公开(公告)号：US08696347B2
公开(公告)日：2014-04-15
申请号：US13133262
申请日：2008-12-12
申请人： Witold Neter , Helmut Thoemmes , Rainer Petry , Christian Wagner
发明人： Witold Neter , Helmut Thoemmes , Rainer Petry , Christian Wagner
IPC分类号： B29B11/08
CPC分类号： B29C45/7207 , B29C49/06 , B29C49/6427 , B29C2045/7214
摘要： A system for the post-treatment of preforms (9) produced by means of injection moulding, including a removal element (4) having at least one receiving element (5) for receiving a preform (9), and a device for moving the removal element (4) between two tool halves of an opened injection moulding mould and for moving the removal element (4) out of the opened injection moulding mould, a post-treatment element (6) having at least one post-treatment pin (7) having a pin-shaped passage element (7), of which one end can be connected to the environment or a vacuum or reduced-pressure source and of which the other end has an outlet (18) for a coolant, and a motion device with which the removal element (4) can be reciprocated relative to the post-treatment element (6) between a first position in which the post-treatment pin (7) is positioned within the receiving element (5) and a second position in which the post-treatment pin (7) is not positioned within the receiving element (5), wherein the removal element (4) and the post-treatment element (6) are so designed that in the first position coolant can be introduced by way of the coolant inlet into a preform held in the receiving element (5) in such a way that it can flow between the inside wall of the preform (9) and the outside wall of the pin-shaped passage element (7) to the coolant outlet (18) and can be discharged by way of the passage element (7).
摘要翻译：一种用于后处理通过注射成型制成的预成型件（9）的系统，包括具有用于容纳预成型件（9）的至少一个接收元件（5）的去除元件（4））以及用于移动所述移除装置在打开的注塑模具的两个工具半部之间的元件（4）和用于将所述移除元件（4）移出所述打开的注塑模具中的后处理元件（6），所述后处理元件（6）具有至少一个后处理销（7）具有销形通道元件（7），其一端可连接到环境或真空或减压源，另一端具有用于冷却剂的出口（18），以及具有其中所述移除元件（4）可以在所述后处理销（7）位于所述接收元件（5）内的第一位置和所述第二位置之间相对于所述后处理元件（6）往复运动，后处理销（7）不位于接收元件（5）内，其中r 表面元件（4）和后处理元件（6）被设计成使得在第一位置中，可以通过冷却剂入口将冷却剂引入保持在接收元件（5）中的预成型件中，使得其可以在预成型件（9）的内壁和销状通道元件（7）的外壁到冷却剂出口（18）之间流动并且可以通过通道元件（7）排出。

3. 发明申请

US20130287883A1 Injection-Moulding Machine with a Shut-Off Needle 审中-公开
标题翻译：注射成型机与关闭针
公开(公告)号：US20130287883A1
公开(公告)日：2013-10-31
申请号：US13979405
申请日：2012-01-02
申请人： Stefan Schweininger , Christian Wagner
发明人： Stefan Schweininger , Christian Wagner
IPC分类号： B29C45/23
CPC分类号： B29C45/231 , B29C45/281
摘要： This relates to an injection-moulding machine comprising a hot runner for feeding a melt into a mould, a shut-off needle for closing or opening the hot runner, a piston connected to the shut-off needle, dividing the housing into first and second chambers, and a covering plate with a first and a second fluid 72 outlet, wherein the housing has a first fluid inlet, which is in connection with the first chamber, and a second fluid inlet, which is in connection with the second chamber, which are arranged in such a way that fluid can be transferred via the first fluid outlet of the covering plate into the first fluid inlet of the housing and fluid can be transferred via the second fluid inlet of the housing, and so fluid can be applied to the piston from both sides.
摘要翻译：这涉及一种注射成型机，其包括用于将熔体输送到模具中的热流道，用于关闭或打开热流道的关闭针，连接到关闭针的活塞，将壳体分成第一和第二室和具有第一和第二流体72出口的盖板，其中壳体具有与第一室连接的第一流体入口和与第二室连接的第二流体入口，被布置成使得流体可以经由盖板的第一流体出口转移到壳体的第一流体入口中，并且流体可以经由壳体的第二流体入口传递，并且因此流体可以被施加到活塞从两侧。

4. 发明授权

US08405825B2 Method of detecting a particle and a lithographic apparatus 失效
标题翻译：检测颗粒和光刻设备的方法
公开(公告)号：US08405825B2
公开(公告)日：2013-03-26
申请号：US12904610
申请日：2010-10-14
申请人： Luigi Scaccabarozzi , Vadim Yevgenyevich Banine , Christian Wagner
发明人： Luigi Scaccabarozzi , Vadim Yevgenyevich Banine , Christian Wagner
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01N2021/95676 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要： A detector detects radiation from a mask to form an image, but the focal plane of the image is in front of the mask. Any particles arranged on the mask will be in focus. However, the pattern on the mask will be out of focus. It is therefore possible to detect the existence and location of particles on a mask having an arbitrary pattern. The depth of field of the detector is small and the focal plane is no further from the surface of the patterning device than two times the depth of field.
摘要翻译：检测器检测来自掩模的辐射以形成图像，但是图像的焦平面位于掩模的前面。布置在面罩上的任何颗粒将被聚焦。然而，面具上的图案将会失焦。因此可以检测具有任意图案的掩模上的颗粒的存在和位置。检测器的景深较小，焦平面不比图案形成装置的表面高两倍的景深。

5. 发明申请

US20130051588A1 Electroacoustic Transducer having Reduced Losses due to Transverse Emission and Improved Performance due to Suppression of Transverse Modes 有权
标题翻译：具有由于横向辐射而导致的减少的损耗和由于抑制横向模式而改进的性能的电声传感器
公开(公告)号：US20130051588A1
公开(公告)日：2013-02-28
申请号：US13520533
申请日：2010-09-15
申请人： Werner Ruile , Markus Mayer , Ulrike Rösler , Markus Hauser , Ingo Bleyl , Karl-Christian Wagner , Wolfgang Sauer , Michael Jakob , Thomas Ebner , Edgar Schmidhammer , Stefan Berek , Christoph Eggs
发明人： Werner Ruile , Markus Mayer , Ulrike Rösler , Markus Hauser , Ingo Bleyl , Karl-Christian Wagner , Wolfgang Sauer , Michael Jakob , Thomas Ebner , Edgar Schmidhammer , Stefan Berek , Christoph Eggs
IPC分类号： H04R17/00 , H04R31/00
CPC分类号： H03H9/25 , H03H3/08 , H03H9/02535 , H03H9/02858 , H03H9/14532 , H03H9/1455 , H03H9/1457 , Y10T29/42
摘要： An electroacoustic transducer has reduced loss due to acoustic waves emitted in the transverse direction. For this purpose, a transducer comprises a central excitation area, inner edge areas flanking the central excitation area, outer edge areas flanking the inner edge areas, and areas of the busbar flanking the outer edge areas. The longitudinal speed of the areas can be set so that the excitation profile of a piston mode is obtained.
摘要翻译：电声换能器由于在横向发射的声波而减少了损失。为此，换能器包括中心激励区域，位于中心激励区域侧面的内边缘区域，位于内边缘区域侧面的外边缘区域和位于外边缘区域侧面的汇流排区域。可以设定区域的纵向速度，使得获得活塞模式的激励曲线。

6. 发明申请

US20120286159A1 PARTICLE BEAM DEVICE HAVING A DETECTOR ARRANGEMENT 有权
标题翻译：具有检测器装置的颗粒光束装置
公开(公告)号：US20120286159A1
公开(公告)日：2012-11-15
申请号：US13430913
申请日：2012-03-27
申请人： Dietmar DÖNITZ , Christian WAGNER
发明人： Dietmar DÖNITZ , Christian WAGNER
IPC分类号： H01J37/26
CPC分类号： H01J37/28
摘要： A particle beam device has a first column with a first beam axis, the first column having a first particle beam generator and a first objective lens for focusing the first particle beam on an object. A second column with a second beam axis is provided, the second column having a second particle beam generator and a second objective lens for focusing the second particle beam on the object. A detector, having a detection axis, detects interacting particles and/or radiation. The first beam axis and the second beam axis define a first angle, different from 0° and from 180°. The first and second beam axes are situated in a first plane. The detection axis of the detector and the first beam axis are situated in a second plane. The first plane and the second plane define a second angle having an absolute value in the range of 65° to 80°.
摘要翻译：粒子束装置具有具有第一光束轴的第一列，第一列具有第一粒子束发生器和用于将第一粒子束聚焦在物体上的第一物镜。提供具有第二光束轴的第二列，第二列具有第二粒子束发生器和用于将第二粒子束聚焦在物体上的第二物镜。具有检测轴的检测器检测相互作用的颗粒和/或辐射。第一光束轴线和第二光束轴线限定不同于0°和180°的第一角度。第一和第二光束轴位于第一平面中。检测器和第一光束轴的检测轴位于第二平面中。第一平面和第二平面限定了绝对值在65°至80°范围内的第二角度。

7. 发明申请

US20110305789A1 SYSTEM FOR POST-TREATING AND TRANSFERRING PREFORMS 有权
标题翻译：后处理和转移预付系统
公开(公告)号：US20110305789A1
公开(公告)日：2011-12-15
申请号：US13133262
申请日：2008-12-12
申请人： Witold Neter , Helmut Thoemmes , Rainer Petry , Christian Wagner
发明人： Witold Neter , Helmut Thoemmes , Rainer Petry , Christian Wagner
IPC分类号： B29B11/08
CPC分类号： B29C45/7207 , B29C49/06 , B29C49/6427 , B29C2045/7214
摘要： A system for the post-treatment of preforms (9) produced by means of injection moulding, including a removal element (4) having at least one receiving element (5) for receiving a preform (9), and a device for moving the removal element (4) between two tool halves of an opened injection moulding mould and for moving the removal element (4) out of the opened injection moulding mould, a post-treatment element (6) having at least one post-treatment pin (7) having a pin-shaped passage element (7), of which one end can be connected to the environment or a vacuum or reduced-pressure source and of which the other end has an outlet (18) for a coolant, and a motion device with which the removal element (4) can be reciprocated relative to the post-treatment element (6) between a first position in which the post-treatment pin (7) is positioned within the receiving element (5) and a second position in which the post-treatment pin (7) is not positioned within the receiving element (5), wherein the removal element (4) and the post-treatment element (6) are so designed that in the first position coolant can be introduced by way of the coolant inlet into a preform held in the receiving element (5) in such a way that it can flow between the inside wall of the preform (9) and the outside wall of the pin-shaped passage element (7) to the coolant outlet (18) and can be discharged by way of the passage element (7).
摘要翻译：一种用于后处理通过注射成型制成的预成型件（9）的系统，包括具有用于容纳预成型件（9）的至少一个接收元件（5）的去除元件（4））以及用于移动所述移除装置在打开的注塑模具的两个工具半部之间的元件（4）和用于将所述移除元件（4）移出所述打开的注塑模具中的后处理元件（6），所述后处理元件（6）具有至少一个后处理销（7）具有销形通道元件（7），其一端可连接到环境或真空或减压源，另一端具有用于冷却剂的出口（18），以及具有其中所述移除元件（4）可以在所述后处理销（7）位于所述接收元件（5）内的第一位置和所述第二位置之间相对于所述后处理元件（6）往复运动，后处理销（7）不位于接收元件（5）内，其中r 表面元件（4）和后处理元件（6）被设计成使得在第一位置中，可以通过冷却剂入口将冷却剂引入保持在接收元件（5）中的预成型件中，使得其可以在预成型件（9）的内壁和销状通道元件（7）的外壁到冷却剂出口（18）之间流动并且可以通过通道元件（7）排出。

8. 发明授权

US07663741B2 Lithographic apparatus, device manufacturing method, calibration method and computer program product 失效
标题翻译：光刻设备，器件制造方法，校准方法和计算机程序产品
公开(公告)号：US07663741B2
公开(公告)日：2010-02-16
申请号：US10929882
申请日：2004-08-31
申请人： Hans Van Der Laan , Christian Wagner
发明人： Hans Van Der Laan , Christian Wagner
IPC分类号： G01B9/00 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70666 , G03F7/70516
摘要： To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.
摘要翻译：为了校准光刻设备，对于投影系统的可用操纵器的多个不同设置来测量空中图像中的对比度。操纵器的适当设置被确定为给出最大对比度值的那些。

9. 发明申请

US20090167459A1 DUPLEXER 审中-公开
标题翻译：双机
公开(公告)号：US20090167459A1
公开(公告)日：2009-07-02
申请号：US12161772
申请日：2007-01-31
申请人： Michael Jakob , Gholamreza Dadgar Javid , Maximilian Pitschi , Karl-Christian Wagner , Juergen Kiwitt
发明人： Michael Jakob , Gholamreza Dadgar Javid , Maximilian Pitschi , Karl-Christian Wagner , Juergen Kiwitt
IPC分类号： H03H9/70 , H03H7/38 , H03H9/72
CPC分类号： H03H9/706 , H03H9/725
摘要： A duplexer is described herein. The duplexer includes a transmission branch configured to allow passage of signals in a transmission band. The duplexer also includes a reception branch configured to allow passage of signals in a reception band. The duplexer also includes a band rejection filter in the transmission branch configured to produce a short circuit to an electrical ground in a stopband. The stopband at least partially overlaps the reception band.
摘要翻译：这里描述了双工器。双工器包括被配置为允许传输频带中的信号通过的传输分支。双工器还包括被配置为允许接收频带中的信号通过的接收分支。双工器还包括传输分支中的带阻滤波器，其被配置为产生在阻带中的电接地的短路。阻挡带至少部分地与接收频带重叠。

10. 发明申请

US20080055740A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTION EXPOSURE METHOD 审中-公开
标题翻译：具有自适应镜像和投射曝光方法的目标投影目标
公开(公告)号：US20080055740A1
公开(公告)日：2008-03-06
申请号：US11925359
申请日：2007-10-26
申请人： Christian Wagner , Michael Gerhard , Gerald Richter
发明人： Christian Wagner , Michael Gerhard , Gerald Richter
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B17/08 , G02B26/06 , G02B26/0825 , G02B27/0025 , G02B27/0043 , G03F7/70225 , G03F7/70266
摘要： A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are mated to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.
摘要翻译：用于微光刻的反射折射投射物镜具有至少一个可变形的弯曲镜，并且可调节可变形反射镜的元件。调整元件与给定的图像错误及其校正相匹配。本发明适用于散光，由于透镜加热，压实等引起的四重波前变形。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式