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1. 发明授权

US07990622B2 Projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影目标
公开(公告)号：US07990622B2
公开(公告)日：2011-08-02
申请号：US12896128
申请日：2010-10-01
申请人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
发明人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
IPC分类号： G02B1/06 , G02B3/12 , G02B27/02
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译：微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

2. 发明申请

US20100265478A1 PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 有权
标题翻译：微波投影曝光安装投影镜头系统
公开(公告)号：US20100265478A1
公开(公告)日：2010-10-21
申请号：US12825001
申请日：2010-06-28
申请人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Bärbel Schwaer , Olaf Rogalsky , Arif Kazi
发明人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Bärbel Schwaer , Olaf Rogalsky , Arif Kazi
IPC分类号： G03B27/68
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
摘要翻译：微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

3. 发明申请

US20080239503A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的投影目标
公开(公告)号：US20080239503A1
公开(公告)日：2008-10-02
申请号：US11971328
申请日：2008-01-09
申请人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
发明人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
IPC分类号： G02B3/12 , G03B27/52
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译：微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

4. 发明授权

US5377685A Ultrasound catheter with mechanically steerable beam 失效
标题翻译：超声波导管与机械导向梁
公开(公告)号：US5377685A
公开(公告)日：1995-01-03
申请号：US169306
申请日：1993-12-17
申请人： Arif Kazi , Jeanne Rougeot , Lynn L. Li , Louis D. Dufour
发明人： Arif Kazi , Jeanne Rougeot , Lynn L. Li , Louis D. Dufour
IPC分类号： A61B8/12 , G01S15/89
CPC分类号： A61B8/12 , A61B8/445 , A61B8/4461 , G01S15/8936 , G01S15/894 , G01S15/899
摘要： The catheter has a mechanically steerable beam which can be directed at a variable angle with respect to an axis of rotation of the catheter. The ultrasonic transducer can be mounted in a pivoting head and steered by shape memory alloy wires subject to controlled ohmic heating. A feedback system including a marker wire embedded in a capsule wall of the catheter's outer tube can be used to determine the beam angle.
摘要翻译：导管具有可相对于导管的旋转轴线以可变角度定向的机械可操纵的梁。超声波换能器可以安装在旋转头中，并通过形状记忆合金线进行控制，受控于欧姆加热。可以使用包括嵌入导管外管的胶囊壁中的标记线的反馈系统来确定束角。

5. 发明申请

US20110080569A1 OPTICAL ELEMENT AND METHOD 有权
标题翻译：光学元件和方法
公开(公告)号：US20110080569A1
公开(公告)日：2011-04-07
申请号：US12966552
申请日：2010-12-13
申请人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
发明人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03F7/70891 , G02B7/028 , G02B27/0068 , G03F7/70266
摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
摘要翻译：本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。

6. 发明申请

US20110019169A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的投影目标
公开(公告)号：US20110019169A1
公开(公告)日：2011-01-27
申请号：US12896128
申请日：2010-10-01
申请人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
发明人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
IPC分类号： G03B27/52
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译：微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

7. 发明申请

US20080150965A1 Method and Device For Determining Optical Overlaps With Ar Objects 有权
标题翻译：用于确定Ar对象的光学重叠的方法和装置
公开(公告)号：US20080150965A1
公开(公告)日：2008-06-26
申请号：US11817571
申请日：2006-02-25
申请人： Rainer Bischoff , Arif Kazi
发明人： Rainer Bischoff , Arif Kazi
IPC分类号： G06T7/00
CPC分类号： G06T15/20 , G02B27/01 , G02B27/0101 , G02B2027/0127 , G02B2027/0138 , G02B2027/014 , G06T7/70 , G06T19/006 , G06T7/004
摘要： The invention relates to a method for overlaying AR objects on an environmental image representing the environment. According to said invention, a depth image of the environment is recorded from a point of vision; the representation of an AR object to be placed in the environmental image is modified in terms of how it appears from the point of vision at a pre-defined spot in the environmental image; it is determined how the parts of the AR object facing the point of vision are arranged in relation to an associated image point of the depth image, from the point of vision; at least the representation of parts of the AR object is modified in a pre-determined manner in relation to the apparent depth in the image; and the thus processed AR object is overlayed on the environmental image. The invention also relates to a device for overlaying AR objects on an environmental image displaying the environment, said device comprising corresponding elements for carrying out said method.
摘要翻译：本发明涉及一种用于在表示环境的环境图像上重叠AR对象的方法。根据所述发明，从视野记录环境的深度图像; 根据环境图像中预先定义的视点从视觉角度出发，修改放置在环境图像中的AR对象的表示; 确定面对视点的AR对象的部分是如何相对于深度图像的相关图像点从视点安排的; 至少AR对象的部分的表示相对于图像中的表观深度以预定的方式被修改; 并且将这样处理的AR对象重叠在环境图像上。本发明还涉及用于在显示环境的环境图像上重叠AR对象的装置，所述装置包括用于执行所述方法的相应元件。

8. 发明授权

US08891172B2 Optical element and method 有权
标题翻译：光学元件及方法
公开(公告)号：US08891172B2
公开(公告)日：2014-11-18
申请号：US12402015
申请日：2009-03-11
申请人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
发明人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
IPC分类号： G02B9/00 , G03F7/20 , G02B27/00 , G02B7/02
CPC分类号： G03F7/70891 , G02B7/028 , G02B27/0068 , G03F7/70266
摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
摘要翻译：本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。

9. 发明授权

US07830611B2 Projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影目标
公开(公告)号：US07830611B2
公开(公告)日：2010-11-09
申请号：US11971328
申请日：2008-01-09
申请人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
发明人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
IPC分类号： G02B1/06 , G02B3/02 , G02B27/02
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译：微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

10. 发明授权

US07818091B2 Process and device for determining the position and the orientation of an image reception means 有权
标题翻译：用于确定图像接收装置的位置和取向的处理和装置
公开(公告)号：US07818091B2
公开(公告)日：2010-10-19
申请号：US10952313
申请日：2004-09-28
申请人： Arif Kazi , Rainer Bischoff
发明人： Arif Kazi , Rainer Bischoff
IPC分类号： G05B15/00 , G05B19/00
CPC分类号： B25J9/1697 , G05B2219/36167 , G05B2219/39045 , G05B2219/39046 , G05B2219/39057 , G05B2219/39114 , G05B2219/39449 , G05B2219/39451 , G06T7/73 , G06T2207/30244
摘要： A process and a device are provided for determining the pose as the entirety of the position and the orientation of an image reception device. The process is characterized in that the pose of the image reception device is determined with the use of at least one measuring device that is part of a robot. The device is characterized by a robot with an integrated measuring device that is part of the robot for determining the pose of the image reception device.
摘要翻译：提供了一种处理和装置，用于将姿势确定为图像接收装置的整体位置和方向。该过程的特征在于，使用作为机器人的一部分的至少一个测量装置来确定图像接收装置的姿态。该装置的特征在于具有集成测量装置的机器人，其是机器人的一部分，用于确定图像接收装置的姿态。

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