专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07929116B2 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US07929116B2
公开(公告)日：2011-04-19
申请号：US12010819
申请日：2008-01-30
申请人： Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka , Roel De Jonge
发明人： Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka , Roel De Jonge
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。

2. 发明授权

US07345740B2 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US07345740B2
公开(公告)日：2008-03-18
申请号：US11101630
申请日：2005-04-08
申请人： Christian Wagner , Wilhelmus Petrus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
发明人： Christian Wagner , Wilhelmus Petrus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。

3. 发明申请

US20080143992A1 Polarized radiation in lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20080143992A1
公开(公告)日：2008-06-19
申请号：US12010819
申请日：2008-01-30
申请人： Christian Wagner , Wilhelmus Petrus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
发明人： Christian Wagner , Wilhelmus Petrus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.

4. 发明授权

US07312852B2 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US07312852B2
公开(公告)日：2007-12-25
申请号：US11022938
申请日：2004-12-28
申请人： Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka
发明人： Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70191
摘要： A lithographic apparatus uses polarized light to improve the imaging properties, such as exposure latitude, while maintaining and extending the lifetime of an illumination system in the lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中照明系统的寿命。

5. 发明申请

US20060139612A1 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US20060139612A1
公开(公告)日：2006-06-29
申请号：US11101630
申请日：2005-04-08
申请人： Christian Wagner , Wilhelmus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
发明人： Christian Wagner , Wilhelmus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。

6. 发明申请

US20060139611A1 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US20060139611A1
公开(公告)日：2006-06-29
申请号：US11022938
申请日：2004-12-28
申请人： Christian Wagner , Wilhelmus De Boeij , Tilmann Heil , Damian Fiolka
发明人： Christian Wagner , Wilhelmus De Boeij , Tilmann Heil , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70191
摘要： A lithographic apparatus uses polarized light to improve the imaging properties, such as exposure latitude, while maintaining and extending the lifetime of an illumination system in the lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。

7. 发明授权

US09316920B2 Illumination system of a microlithographic projection exposure apparatus with a birefringent element 有权
标题翻译：具有双折射元件的微光刻投影曝光装置的照明系统
公开(公告)号：US09316920B2
公开(公告)日：2016-04-19
申请号：US12717696
申请日：2010-03-04
申请人： Damian Fiolka , Daniel Walldorf , Ingo Saenger
发明人： Damian Fiolka , Daniel Walldorf , Ingo Saenger
IPC分类号： G03B27/72 , G03F7/20
CPC分类号： G03F7/702 , G03F7/70116 , G03F7/70566
摘要： The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.
摘要翻译：本公开涉及微光刻投影曝光装置的照明系统。照明系统包括具有多个镜单元和在光传播方向上布置在镜装置前面的至少一个元件以产生入射在不同镜单元上的至少两种不同偏振态的反射镜装置。反射镜单元彼此独立地移位，以改变由反射镜装置反射的光的角度分布。

8. 发明授权

US09304405B2 Microlithography illumination system and microlithography illumination optical unit 有权
标题翻译：微光刻照明系统和微光刻照明光学单元
公开(公告)号：US09304405B2
公开(公告)日：2016-04-05
申请号：US12974436
申请日：2010-12-21
申请人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
发明人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
摘要翻译：用于微光刻的照明光学单元用照明光照亮物场。该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。

9. 发明授权

US09235137B2 Illumination optical unit for microlithography 有权
标题翻译：用于微光刻的照明光学单元
公开(公告)号：US09235137B2
公开(公告)日：2016-01-12
申请号：US13370829
申请日：2012-02-10
申请人： Damian Fiolka , Ralf Stuetzle
发明人： Damian Fiolka , Ralf Stuetzle
IPC分类号： G03B27/72 , G03F7/20 , G02B27/09 , G21K1/06 , G21K1/16
CPC分类号： G03F7/70233 , G02B27/0905 , G02B27/0977 , G03F7/70075 , G03F7/70116 , G03F7/70175 , G03F7/702 , G03F7/70566 , G21K1/06 , G21K1/16 , G21K2201/06 , G21K2201/064 , G21K2201/067
摘要： An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.
摘要翻译：照明光学单元包括集光镜，其在照明光学单元的操作期间产生施加到第一刻面光学元件的偏振分布。存在施加具有不同极化的辐射的至少两个第一小面元件。第一刻面光学元件具有至少一个第一状态，其中第一面元件的反射表面的法向矢量被选择为使得在照明光学单元的操作期间在物场的位置处产生第一预定偏振分布。

10. 发明授权

US09128389B2 Method for modifying a polarization distribution in microlithographic projection exposure apparatus, and microlithographic projection exposure apparatus 有权
标题翻译：用于修改微光刻投影曝光装置中的偏光分布的方法，以及微光刻投影曝光装置
公开(公告)号：US09128389B2
公开(公告)日：2015-09-08
申请号：US13010145
申请日：2011-01-20
申请人： Damian Fiolka
发明人： Damian Fiolka
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70566
摘要： The disclosure relates to a method for modifying a polarization distribution in a microlithographic projection exposure apparatus, and to a microlithographic projection exposure apparatus. The projection exposure apparatus has an illumination device and a projection objective. The illumination device has an optical axis and a correction arrangement having a lambda/4 plate arranged rotatably about the optical axis and/or a lambda/2 plate arranged rotatably about the optical axis. The method includes determining a polarization distribution in a predetermined plane of the projection exposure apparatus, and rotating the lambda/4 plate and/or the lambda/2 plate about the optical axis so that a local variation of the polarization distribution is reduced after rotation in comparison with the state before the rotating.
摘要翻译：本公开涉及一种用于修改微光刻投影曝光装置中的偏振分布的方法，以及微光刻投影曝光装置。投影曝光装置具有照明装置和投影物镜。照明装置具有光轴和具有围绕光轴可旋转地设置的λ/ 4板和/或围绕光轴可旋转地设置的λ/ 2板的校正装置。该方法包括确定投影曝光设备的预定平面中的偏振分布，以及围绕光轴旋转λ/ 4板和/或λ/ 2板，使得在旋转之后偏振分布的局部变化减小与旋转前的状态进行比较。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式