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    • 1. 发明授权
    • Atom probes, atom probe specimens, and associated methods
    • 原子探针,原子探针标本和相关方法
    • US07884323B2
    • 2011-02-08
    • US12064020
    • 2006-08-15
    • Thomas F. KellyJoseph H. BuntonScott A. Wiener
    • Thomas F. KellyJoseph H. BuntonScott A. Wiener
    • G01N23/00
    • G01N23/22
    • The present invention relates generally to atom probes, atom probe specimens, and associated methods. For example, certain aspects are directed toward methods for analyzing a portion of a specimen that includes selecting a region of interest and moving a portion of material in a border region proximate to the region of interest so that at least a portion of the region of interest protrudes relative to at least a portion of the border region. The method further includes analyzing a portion of the region of interest. Other aspects of the invention are directed toward a method for applying photonic energy in an atom probe process by passing photonic energy through a lens system separated from a photonic device and spaced apart from the photonic device. Yet other aspects of the invention are directed toward a method for reflecting photonic energy off an outer surface of an electrode onto a specimen.
    • 本发明一般涉及原子探针,原子探针试样和相关方法。 例如,某些方面涉及用于分析样本的一部分的方法,所述方法包括选择感兴趣区域并移动靠近感兴趣区域的边界区域中的材料的一部分,使得感兴趣区域的至少一部分 相对于边界区域的至少一部分突出。 该方法还包括分析感兴趣区域的一部分。 本发明的其它方面涉及通过使光子能量通过从光子器件分离并与光子器件间隔开的透镜系统来在原子探测过程中施加光子能量的方法。 本发明的其它方面涉及将光子能量从电极的外表面反射到样本上的方法。
    • 2. 发明申请
    • Atom Probes, Atom Probe Specimens, and Associated Methods
    • 原子探针,原子探针样品和相关方法
    • US20080308728A1
    • 2008-12-18
    • US12064020
    • 2006-08-15
    • Thomas F. KellyJoseph H. BuntonScott A. Wiener
    • Thomas F. KellyJoseph H. BuntonScott A. Wiener
    • G01N23/00
    • G01N23/22
    • The present invention relates generally to atom probes, atom probe specimens, and associated methods. For example, certain aspects are directed toward methods for analyzing a portion of a specimen that includes selecting a region of interest and moving a portion of material in a border region proximate to the region of interest so that at least a portion of the region of interest protrudes relative to at least a portion of the border region. The method further includes analyzing a portion of the region of interest. Other aspects of the invention are directed toward a method for applying photonic energy in an atom probe process by passing photonic energy through a lens system separated from a photonic device and spaced apart from the photonic device. Yet other aspects of the invention are directed toward a method for reflecting photonic energy off an outer surface of an electrode onto a specimen.
    • 本发明一般涉及原子探针,原子探针试样和相关方法。 例如,某些方面涉及用于分析样本的一部分的方法,所述方法包括选择感兴趣区域并移动靠近感兴趣区域的边界区域中的材料的一部分,使得感兴趣区域的至少一部分 相对于边界区域的至少一部分突出。 该方法还包括分析感兴趣区域的一部分。 本发明的其它方面涉及通过使光子能量通过从光子器件分离并与光子器件间隔开的透镜系统来在原子探测过程中施加光子能量的方法。 本发明的其它方面涉及将光子能量从电极的外表面反射到样本上的方法。
    • 6. 发明申请
    • ATOM PROBE COMPONENT TREATMENTS
    • 原子探针组分处理
    • US20090138995A1
    • 2009-05-28
    • US11917672
    • 2006-06-16
    • Thomas F. KellyDavid J. LarsonRichard L. MartensKeith J. ThompsonRobert M. UlfigScott A. Wiener
    • Thomas F. KellyDavid J. LarsonRichard L. MartensKeith J. ThompsonRobert M. UlfigScott A. Wiener
    • G12B21/00
    • H01J37/3056H01J37/32853H01J37/32862
    • The present invention relates to treatments for atom probe components. For example, certain aspects are directed toward processes for treating an atom probe component that includes removing material from a surface of the atom probe component (e.g., using an ion beam, a plasma, a chemical etching process, and/or photonic energy). Another aspect of the invention is directed toward a method for treating an atom probe specimen that includes using a computing device to automatically control a voltage used in an ion sputtering process. Still other aspects of the invention are directed toward methods for treating an atom probe component that includes introducing photonic energy proximate to a surface of the atom probe component, annealing at least a portion of a surface of the atom probe component, coating at least a portion of a surface of the atom probe component, and/or cooling at least a portion of the atom probe component.
    • 本发明涉及原子探针成分的处理。 例如,某些方面涉及用于处理原子探针组分的方法,其包括从原子探针组分的表面除去材料(例如,使用离子束,等离子体,化学蚀刻工艺和/或光能)。 本发明的另一方面涉及一种用于处理原子探针样品的方法,其包括使用计算装置自动控制在离子溅射工艺中使用的电压。 本发明的其它方面涉及用于处理原子探针组分的方法,所述方法包括将光子能引入到原子探针组分的表面附近,退火至少部分原子探针组分的表面,涂覆至少一部分 的原子探针组分的表面,和/或冷却原子探针组分的至少一部分。