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    • 1. 发明授权
    • Positive-type O-quinone diazide containing photoresist compositions
    • 含有正型O-醌二叠氮化物的光致抗蚀剂组合物
    • US4174222A
    • 1979-11-13
    • US881260
    • 1978-02-27
    • Takashi KomineAkira YokotaHisashi NakaneShingo AsaumiNoboru Okazaki
    • Takashi KomineAkira YokotaHisashi NakaneShingo AsaumiNoboru Okazaki
    • G03F7/022G03C1/54
    • G03F7/022
    • A gallic acid alkyl ester or a gallic acid aryl ester is reacted in an inert solvent with 3 equivalents of naphthoquinone-(1,2)-diazido-(2)-sulfonyl chloride in the presence of an alkali to effect sulfonylation of 3 hydroxyl groups in the gallic acid moiety whereby a photodecomposable naphthoquinone-(1,2)-diazido-(2)-sulfonic acid ester is obtained. The new naphthoquinonediazido derivative thus obtained is mixed with an alkali-soluble phenol resin such as m-cresol novolac resin or phenol novolac resin to prepare a positive-type photoresist composition having high sensitivity and high resolving power as well as excellent dimensional accuracy and etching-resistance. In addition, this composition forms a good photosensitive film and can be a good ink receptor.
    • 没食子酸烷基酯或没食子酸芳基酯在惰性溶剂中与3当量萘醌 - (1,2) - 叠氮基 - (2) - 磺酰氯在碱存在下反应,以实现3个羟基的磺酰化 在没食子酸部分中得到可光分解的萘醌 - (1,2) - 二叠氮基 - (2) - 磺酸酯。 将由此获得的新的萘醌二叠氮基衍生物与间甲酚酚醛清漆树脂或苯酚酚醛清漆树脂等碱溶性酚树脂混合,制备具有高灵敏度和高分辨能力的正型光致抗蚀剂组合物,以及优异的尺寸精度和蚀刻 - 抵抗性。 此外,该组合物形成良好的感光膜,并且可以是良好的油墨受体。