专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5707783A Mixtures of mono- and DI- or polyfunctional silanes as silylating agents for top surface imaging 失效
标题翻译：单 - 和二 - 或多官能硅烷的混合物，用作顶表面成像的甲硅烷化剂
公开(公告)号：US5707783A
公开(公告)日：1998-01-13
申请号：US566666
申请日：1995-12-04
申请人： Craig M. Stauffer , William R. Peterson
发明人： Craig M. Stauffer , William R. Peterson
IPC分类号： G03F7/26 , G03C5/56 , G03C1/60
CPC分类号： G03F7/265
摘要： Top surface imaging by silylation of organic photoresists for use in lithographic techniques for the manufacture of microelectronic devices is improved by the use of certain mixtures of organosilane silylating agents. The mixture includes a monofunctional silane in combination with a di- or polyfunctional silane, selected such that the boiling points are the same or very close to each other to facilitate a vapor-phase reaction. Silylation with this mixture provides effective penetration of the silane into the resist without causing so much lowering of the glass transition temperature of the resist that the resist flows under the processing steps and distorts the pattern.
摘要翻译：通过使用有机硅烷甲硅烷化剂的某些混合物来改进用于制备微电子器件的光刻技术的有机光致抗蚀剂的甲硅烷基化的顶表面成像。该混合物包括与二官能或多官能硅烷组合的单官能硅烷，其选择为使得沸点彼此相同或非常接近以促进气相反应。用这种混合物进行硅烷化可以有效地将硅烷渗透到抗蚀剂中，而不会导致抗蚀剂的玻璃化转变温度降低，抗蚀剂在加工步骤下流动并扭曲图案。

2. 发明授权

US5556733A Thermal development diazo copying material 失效
标题翻译：热开发重氮复制材料
公开(公告)号：US5556733A
公开(公告)日：1996-09-17
申请号：US205565
申请日：1994-03-04
申请人： Shigeru Kusakata , Masanori Rimoto
发明人： Shigeru Kusakata , Masanori Rimoto
IPC分类号： B41M5/323 , G03C1/52 , G03C1/60 , G03C1/61 , G03C5/18 , G03F7/021
CPC分类号： G03C1/52
摘要： A thermal development diazo copying material is composed of a support, a diazo layer which contains a diazo compound, and a coupler layer which contains a coupling component, an alkali-soluble resin and a thermofusible material, which are overlaid on the support.
摘要翻译：热显影重氮复制材料由载体，含有重氮化合物的重氮层和包含重叠在载体上的偶联组分，碱溶性树脂和热熔性材料的成色剂层组成。

3. 发明授权

US5427887A Light-sensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5427887A
公开(公告)日：1995-06-27
申请号：US106699
申请日：1993-08-16
申请人： Satoshi Konuma , Toshiyuki Matsumura , Akihisa Murata , Shigeo Tsuji
发明人： Satoshi Konuma , Toshiyuki Matsumura , Akihisa Murata , Shigeo Tsuji
IPC分类号： G03F7/021 , G03C1/60
CPC分类号： G03F7/021 , Y10S430/111
摘要： Disclosed is a light-sensitive composition which comprises(A) a diazo resin and(B) an alkali-soluble and swellable polymer compound, said polymer compound being a vinyl copolymer containing, as a constitutional unit, 0.1 to 10 mole % of a structure derived from an ester of acrylic acid or methacrylic acid having an alkyl group with 8 or more carbon atoms.
摘要翻译：公开了一种感光性组合物，其包含（A）重氮树脂和（B）碱溶性和可溶胀的聚合物化合物，所述高分子化合物是含有作为结构单元的结构的0.1〜10摩尔％衍生自具有8个或更多个碳原子的烷基的丙烯酸或甲基丙烯酸的酯。

4. 发明授权

US5246981A Aqueous emulsion 失效
标题翻译：水乳液
公开(公告)号：US5246981A
公开(公告)日：1993-09-21
申请号：US651383
申请日：1991-03-06
申请人： Seiji Kawamoto , Keiichi Kamda , Shoji Seki
发明人： Seiji Kawamoto , Keiichi Kamda , Shoji Seki
IPC分类号： C09D5/20 , B41N1/14 , C08F2/22 , C08F291/00 , C09D5/02 , C09D133/04 , C09D133/20 , C09D133/26 , C09D151/00 , C09J7/04 , D21H19/00 , D21H19/58 , D21H27/00 , G03C1/60
CPC分类号： G03C1/60 , B41N1/14 , C08F291/00 , D21H19/58 , Y10S525/902
摘要： An aqueous emulsion comprising a copolymer having a two-layer structure is produced by polymerizing at least one aqueous vinyl monomer component (II) in the presence of a seed emulsion (I) comprising seeds composed of a copolymer containing 10-50% by weight of (meth)acrylonitrile as a monomer unit. This aqueous emulsion has heat resistance, solvent resistance, and anti-blocking property, and can be used as an undercoating agent, an agent for treating a back side, a binder for diazo photosensitive paper, a binder for an offset master, and the like.

5. 发明授权

US4842979A Black color heat-sensitive diazo microcapsule recording material with benzoylacetic amide coupler 失效
标题翻译：黑色热敏重氮微胶囊记录材料与苯甲酰乙酰胺偶合剂
公开(公告)号：US4842979A
公开(公告)日：1989-06-27
申请号：US129350
申请日：1987-11-30
申请人： Sadao Ishige , Toshimasa Usami , Hiroshi Kamikawa , Toshiharu Tanaka
发明人： Sadao Ishige , Toshimasa Usami , Hiroshi Kamikawa , Toshiharu Tanaka
IPC分类号： B41M5/323 , B41M5/28 , B41M5/30 , B41M5/337 , C07C235/80 , G03C1/00 , G03C1/58 , G03C1/60 , G03C1/61 , G03C5/18 , G03C7/36
CPC分类号： B41M5/3375 , C07C235/80 , G03C1/002 , G03C1/58 , G03C5/18 , G03C7/362
摘要： A heat-sensitive recording material comprising a support having provided thereon a heat-sensitive layer containing microcapsules containing at least one diazonium salt capable of azo-coupling with 2-hydroxy-3-naphthoic acid anilide to develop a blue color, a 2-hydroxy-3-naphthoic acid amide derivative, a benzoylacetic amide derivative represented by the following formula and a basic substance: ##STR1## wherein X represents a hydrogen atom, a halogen atom, a lower alkyl group or an alkoxy, aralkyloxy, phenoxy or acylamino group having up to 18 carbon atoms; Y represents an alkyl or aralkyl group having from 7 to 18 carbon atoms, an alkoxy, aralkyloxy, phenoxy, naphthyloxy, alkylthio, aralkylthio or phenylthio group having from 6 to 18 carbon atoms, a naphthylthio group, a sulfonyloxy group, a sulfamoyl gorup, a ureido group, a thioureido group or an acylamino group; X' and Y' each represents a hydrogen atom, a halogen atom, a lower alkyl group or a lower alkoxy group; and Y and Y' may combine to form a substituted or unsubstituted benzene ring. The material has excellent preservability before heat recording, provides a high color density upon heat recording, and develops a black color fixable with light.
摘要翻译：一种热敏记录材料，其包括在其上设置有包含含有至少一种能够与2-羟基-3-萘甲酸苯胺偶氮偶联的重氮盐以形成蓝色的微胶囊的热敏层的载体，2-羟基 -3-萘甲酸酰胺衍生物，下式表示的苯甲酰基乙酰胺衍生物和碱性物质：其中X表示氢原子，卤素原子，低级烷基或烷氧基，芳烷氧基，苯氧基或酰氨基具有多达18个碳原子; Y表示碳原子数为7〜18的烷基或芳烷基，碳原子数6〜18的烷氧基，芳烷氧基，苯氧基，萘氧基，烷硫基，芳烷硫基或苯硫基，萘硫基，磺酰氧基，氨磺酰基，脲基，硫脲基或酰氨基; X'和Y'各自表示氢原子，卤素原子，低级烷基或低级烷氧基; 并且Y和Y'可以结合形成取代或未取代的苯环。该材料在热记录之前具有优异的保存性，在加热记录时提供高的色彩密度，并且可以发展出可用光固定的黑色。

6. 发明授权

US4777111A Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element 失效
标题翻译：具有重氮对比度增强层的摄影元件以及在底层光致抗蚀剂层中产生图像的方法
公开(公告)号：US4777111A
公开(公告)日：1988-10-11
申请号：US28980
申请日：1987-03-23
申请人： David B. Blumel , Albert S. Deutsch
发明人： David B. Blumel , Albert S. Deutsch
IPC分类号： G03F7/09 , G03C1/52 , G03C1/60 , G03F7/26
CPC分类号： G03F7/091
摘要： This invention relates to a composition and method for enhancing the contrast of images of an underlying photolithographic layer. A photographic element, including a photoresist layer, is applied to a substrate. The photoresist layer contains a contrast-enhancing layer including at least one light-sensitive compound capable of producing acidic photoproducts upon exposure to actinic radiation, at least one indicator dye that changes color on exposure to acidic conditions and at least one polymeric binder soluble in water or weakly alkaline aqueous solutions. The photographic element is exposed to active radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer. The photographic element is exposed to actinic radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer. The photographic element is developed in an aqueous photoresist developer, whereby the contrast enhancement layer is stripped from the photoresist layer by the developer.
摘要翻译：本发明涉及用于增强底层光刻层的图像的对比度的组合物和方法。将包括光致抗蚀剂层的照相元件施加到基底上。光致抗蚀剂层包含对比度增强层，其包括至少一种能够在暴露于光化辐射时产生酸性光产物的光敏化合物，至少一种在暴露于酸性条件下改变颜色的指示剂染料和至少一种可溶于水的聚合物粘合剂或弱碱性水溶液。照相元件暴露于足以引起对比度增强层的漂白和曝光光致抗蚀剂层的有效辐射。照相元件暴露于足以引起对比度增强层的光漂白和光致抗蚀剂层的曝光的光化辐射。将照相元件在水性光致抗蚀剂显影剂中显影，由此通过显影剂将对比度增强层从光致抗蚀剂层剥离。

7. 发明授权

US4762767A Negatively operating photoresist composition, with radiation-absorbing additives 失效
标题翻译：负光操作的光刻胶组合物，具有辐射吸收添加剂
公开(公告)号：US4762767A
公开(公告)日：1988-08-09
申请号：US857663
申请日：1986-04-30
申请人： Gunther Haas , Karl H. Neisius
发明人： Gunther Haas , Karl H. Neisius
IPC分类号： G03F7/016 , C07C67/00 , C07C241/00 , C07C245/08 , C09B29/08 , G03F7/004 , G03F7/008 , G03F7/012 , G03F7/038 , G03F7/09 , G03C1/60 , G03C1/70 , G03C1/71
CPC分类号： C09B29/0813 , G03F7/0085 , G03F7/091
摘要： New aminoazobenzene derivatives of the general formula I ##STR1## in which R and R' independently of one another denote hydrogen, alkyl with up to 4 C atoms or halogen,X denotes hydrogen or O--Y andY denotes alkyl or acyl with in each case up to 4 C atoms or optionally substituted aryl with up to 10 C atoms,are outstandingly suitable as radiation-absorbing substances in negatively operating photoresist compositions.
摘要翻译：其中R和R'彼此独立地表示氢，具有至多4个C原子的烷基或卤素，X表示氢或OY并且Y表示烷基或酰基，通式I的新氨基偶氮苯衍生物每个情况高达4个C原子或任选取代的具有多达10 C原子的芳基，非常适合作为负极光刻胶组合物中的辐射吸收物质。

8. 发明授权

US4738915A Positive-working O-quinone diazide photoresist composition with 2,3,4-trihydroxybenzophenone 失效
标题翻译：具有2,3,4-三羟基二苯甲酮的正性O-醌二叠氮化合物光致抗蚀剂组合物
公开(公告)号：US4738915A
公开(公告)日：1988-04-19
申请号：US32952
申请日：1987-03-31
申请人： Takashi Komine , Shingo Asaumi , Akira Yokota , Hisashi Nakane
发明人： Takashi Komine , Shingo Asaumi , Akira Yokota , Hisashi Nakane
IPC分类号： G03C1/72 , G03F7/022 , H01L21/027 , G03C1/60
CPC分类号： G03F7/022
摘要： The invention provides an improvement over the conventional positive-working photoresist compositions comprising a novolac resin and an ester compound between 2,3,4-trihydroxybenzophenone and naphthoquinone-1,2-diazido-5-sulfonic acid in respect of scum formation in development and resistance of the patterned photoresist layer against heat and dry etching. The inventive composition comprises, in addition to the novolac resin and the ester compounds, 2,3,4-trihydroxybenzophenone in a specified amount relative to the ester compounds as a part of the photosensitive component which may be a reaction product obtained by the esterification reaction for the synthesis of the ester compounds containing unesterified 2,3,4-trihydroxybenzophenone.
摘要翻译：本发明相对于在开发中的浮渣形成方面，相对于包含酚醛清漆树脂和2,3,4-三羟基二苯甲酮与萘醌-1,2-二叠氮基-5-磺酸之间的酯化合物的常规正性光致抗蚀剂组合物的改进，图案化的光致抗蚀剂层对热和干蚀刻的电阻。除酚醛清漆树脂和酯化合物之外，本发明组合物还包含相对于作为感光组分的一部分的酯化合物的特定量的2,3,4-三羟基二苯甲酮，其可以是通过酯化反应获得的反应产物用于合成含有未酯化的2,3,4-三羟基二苯甲酮的酯化合物。

9. 发明授权

US4735880A Photosensitive composition and pattern forming process using same 失效
标题翻译：光敏组合物和图案形成方法使用相同
公开(公告)号：US4735880A
公开(公告)日：1988-04-05
申请号：US852750
申请日：1986-04-16
申请人： Hajime Morishita , Saburo Nonogaki , Nobuaki Hayashi , Shoichi Uchino , Masahiro Nishizawa , Kiyoshi Miura , Osamu Sasaya , Yoshifumi Tomita
发明人： Hajime Morishita , Saburo Nonogaki , Nobuaki Hayashi , Shoichi Uchino , Masahiro Nishizawa , Kiyoshi Miura , Osamu Sasaya , Yoshifumi Tomita
IPC分类号： G03F7/038 , G03C1/08 , G03C1/60 , G03C5/18 , G03F7/28 , H01J9/227 , G03C5/34 , G03F7/08 , G03F7/26
CPC分类号： G03C1/60 , G03F7/28
摘要： A photosensitive composition comprising (1) at least one diazonium compound selected from among salts and double salts of diazonium ions represented by the general formulas: ##STR1## wherein A stands for a substituent selected from among ##STR2## wherein R.sub.1 and R.sub.2 each stand for an alkyl or benzyl group with the proviso that the total number of carbon atoms of R.sub.1 and R.sub.2 is 8 to 16, and (2) at least one nitrate selected from the group consisting of calcium nitrate and magnesium nitrate and a pattern forming process using such a composition.This composition gets sticky upon exposure to light.
摘要翻译：一种光敏组合物，其包含（1）至少一种选自以下通式表示的重氮盐的盐和复盐中的重氮化合物：其中A代表选自下述的取代基：[II] 其中R1和R2各自代表烷基或苄基，条件是R1和R2的碳原子总数为8-16，和（2）至少一种硝酸盐，其选自硝酸钙和硝酸镁和使用这种组合物的图案形成方法。这种组合物在曝光时变得粘稠。

10. 发明授权

US4724195A Perfluoroalkyl group-containing copolymers and reproduction layers produced therefrom 失效
标题翻译：由其制备的含全氟烷基的共聚物和再生层
公开(公告)号：US4724195A
公开(公告)日：1988-02-09
申请号：US742394
申请日：1985-06-07
申请人： Werner H. Muller , Arnold Schneller
发明人： Werner H. Muller , Arnold Schneller
IPC分类号： C08F20/00 , C08F20/10 , C08F20/22 , C08F20/26 , C08F212/00 , C08F212/14 , C08F220/24 , C08F220/30 , C08F220/34 , C08F220/40 , G03F7/004 , G03F7/023 , G03C1/60 , G03C1/68 , G03C1/71
CPC分类号： G03F7/0046 , C08F212/14 , C08F220/24 , C08F220/30 , G03F7/0233
摘要： Copolymers comprising perfluoroalkyl groups, reproduction layers containing these copolymers and use thereof for waterless offset printing. The novel perfluoroalkyl group-containing copolymers are prepared from at least two different monomers, monomer (a) comprising acryloyl or methacryloyl groups and phenolic OH groups and monomer (b) comprising acryloyloxy, methacryloyloxy or vinyl groups and a perfluoroalkyl group. Monomer component (a) can, for example, be prepared from a hydroxybenzoic acid by esterification with a hydroxyalkyl-acrylate. The novel copolymers are, in particular, used as binders in radiation-sensitive reproduction layers which additionally contain at least one radiation-sensitive compound. Reproduction layers of this kind are used as radiation-sensitive coatings of support materials for printing plates used in waterless offset printing.
摘要翻译：包含全氟烷基的共聚物，含有这些共聚物的再生层及其用于无水胶版印刷的用途。新型含全氟烷基的共聚物由至少两种不同的单体制备，包括丙烯酰基或甲基丙烯酰基的单体（a）和酚OH基团以及包含丙烯酰氧基，甲基丙烯酰氧基或乙烯基的全氟烷基和全氟烷基的单体（b）。单体组分（a）可以例如通过用羟基烷基 - 丙烯酸酯酯化由羟基苯甲酸制备。特别地，新型共聚物用作另外含有至少一种辐射敏感性化合物的辐射敏感性再生层中的结合剂。这种复制层用作无水胶版印刷中使用的印版的支撑材料的辐射敏感涂层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式