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1. 发明授权

US5442229A Metal lead-film carrier assembly having a plurality of film carriers, and film carrier-semiconductor chip assembly and semiconductor device containing such metal lead-film carrier assembly 失效
标题翻译：具有多个膜载体的金属铅膜载体组件和包含这种金属引线膜载体组件的膜载体 - 半导体芯片组件和半导体装置
公开(公告)号：US5442229A
公开(公告)日：1995-08-15
申请号：US118646
申请日：1993-09-10
申请人： Takao Mori , Satoshi Yoshida , Tadahiko Nishimukai , Kenji Yamaguchi
发明人： Takao Mori , Satoshi Yoshida , Tadahiko Nishimukai , Kenji Yamaguchi
IPC分类号： H01L21/60 , H01L23/495 , H01L23/50 , H01L25/04 , H01L25/18 , H01L23/48 , H01L29/44 , H01L29/52 , H01L29/60
CPC分类号： H01L24/81 , H01L23/49572 , H01L2224/13111 , H01L2224/13144 , H01L2224/16145 , H01L2224/73253 , H01L2224/81801 , H01L2924/01014 , H01L2924/01029 , H01L2924/01033 , H01L2924/0104 , H01L2924/0105 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/014 , H01L2924/07802 , H01L2924/14 , H01L2924/15153 , H01L2924/15165 , H01L2924/15312 , H01L2924/16195 , H01L2924/30105 , H01L2924/30107
摘要： A method of assembling a semiconductor chip on a tape carrier has the steps of stacking, on a film carrier having a first group of metal leads, another film carrier having a second group of metal leads and bonding the two film carriers together by adhesive to form a laminated structure. The first and second groups of metal leads are so disposed that they do not contact and do not cross one another. The tips of the metal leads of the two groups are bonded to the electrodes on the semiconductor chip. The metal leads are formed in advance on the corresponding film carriers by etching. By stacking the plurality of film carriers, the connection pitch can be reduced while eliminating a necessity for reducing the thickness of each lead.
摘要翻译：将半导体芯片组装在带载体上的方法具有以下步骤：在具有第一组金属引线的薄膜载体上堆叠具有第二组金属引线的另一薄膜载体，并通过粘合剂将两个薄膜载体粘合在一起形成层压结构。金属引线的第一组和第二组被布置成使它们不接触并且不互相交叉。两组的金属引线的尖端接合到半导体芯片上的电极。金属引线通过蚀刻预先形成在相应的载体上。通过堆叠多个薄膜载体，可以减少连接间距，而不需要减少每个导线的厚度。

2. 发明授权

US09172904B2 Information processing apparatus displaying indices of video contents, information processing method and information processing program 有权
标题翻译：信息处理装置显示视频内容的索引，信息处理方法和信息处理程序
公开(公告)号：US09172904B2
公开(公告)日：2015-10-27
申请号：US13360631
申请日：2012-01-27
申请人： Kenji Yamaguchi , Masaki Sato , Hidehito Taniura
发明人： Kenji Yamaguchi , Masaki Sato , Hidehito Taniura
IPC分类号： H04N5/77 , G11B27/10 , H04N9/82
CPC分类号： G11B27/105 , H04N5/772 , H04N9/8227
摘要： In order to quicken switching of indices and reduce the time required for display after switching, a mobile phone includes a video content specifying portion to specify at least one video content, an index element generating portion to generate a thumbnail for a video content when accepting a generation instruction and to stop generation of the thumbnail when accepting a cancellation instruction, an index element generation requesting portion, in response to the event that a video content is specified by the video content specifying portion, to output a generation instruction including identification information identifying the specified video content to the index element generating portion, and a cancellation instructing portion to output a cancellation instruction to stop generation of the thumbnail for the already specified video content when a new video content is specified before completion of generation of the thumbnail for the already specified video content.
摘要翻译：为了加快索引的切换和减少切换后显示所需的时间，移动电话包括指定至少一个视频内容的视频内容指定部分，当接收到视频内容时生成用于视频内容的缩略图的索引元素生成部分响应于由视频内容指定部分指定了视频内容的事件，生成指示，并且在接收到取消指令时停止生成缩略图，索引元素生成请求部分，输出包含识别信息的识别信息的生成指令指定视频内容到索引元素生成部分，以及消除指示部分，在已经指定的缩略图的生成完成之前指定新的视频内容时，输出取消指令以停止生成已经指定的视频内容的缩略图视频内容

3. 发明授权

US08986069B2 Polishing apparatus and polishing method 有权
标题翻译：抛光设备和抛光方法
公开(公告)号：US08986069B2
公开(公告)日：2015-03-24
申请号：US13459421
申请日：2012-04-30
申请人： Tamami Takahashi , Masaya Seki , Hiroaki Kusa , Kenji Yamaguchi , Masayuki Nakanishi
发明人： Tamami Takahashi , Masaya Seki , Hiroaki Kusa , Kenji Yamaguchi , Masayuki Nakanishi
IPC分类号： B24B9/00 , B24B1/00 , B24B21/00 , B24B9/06 , B24B37/04 , B24B37/30
CPC分类号： B24B21/002 , B24B9/065 , B24B21/004 , B24B21/008 , B24B21/20 , B24B27/0076 , B24B37/042 , B24B37/30 , B24B41/068 , B24B49/00 , Y10T428/24777
摘要： A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.
摘要翻译：抛光装置抛光基板的周边。该抛光装置包括：旋转保持机构，被配置为水平地保持基板并旋转基板;设置在基板周围的多个抛光头组件;多个胶带供给和恢复机构，被配置为向多个抛光头组件提供研磨带，并回收抛光带以及多个移动机构，其构造成沿着由旋转保持机构保持的基板的径向方向移动多个研磨头组件。胶带供给和回收机构在基板的径向方向上位于多个研磨头组件的外侧，并且胶带供给和回收机构被固定就位。

4. 发明授权

US08187055B2 Polishing apparatus and polishing method 有权
标题翻译：抛光设备和抛光方法
公开(公告)号：US08187055B2
公开(公告)日：2012-05-29
申请号：US12292662
申请日：2008-11-24
申请人： Tamami Takahashi , Masaya Seki , Hiroaki Kusa , Kenji Yamaguchi , Masayuki Nakanishi
发明人： Tamami Takahashi , Masaya Seki , Hiroaki Kusa , Kenji Yamaguchi , Masayuki Nakanishi
IPC分类号： B24B1/00 , B24B49/00
CPC分类号： B24B21/002 , B24B9/065 , B24B21/004 , B24B21/008 , B24B21/20 , B24B27/0076 , B24B37/042 , B24B37/30 , B24B41/068 , B24B49/00 , Y10T428/24777
摘要： A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.
摘要翻译：抛光装置抛光基板的周边。该抛光装置包括：旋转保持机构，被配置为水平地保持基板并旋转基板;设置在基板周围的多个抛光头组件;多个胶带供给和恢复机构，被配置为向多个抛光头组件提供研磨带，并回收抛光带以及多个移动机构，其构造成沿着由旋转保持机构保持的基板的径向方向移动多个研磨头组件。胶带供给和回收机构在基板的径向方向上位于多个研磨头组件的外侧，并且胶带供给和回收机构被固定就位。

5. 发明授权

US07691910B2 Acidic zirconia sol and production method of the same 有权
标题翻译：酸性氧化锆溶胶及其制备方法相同
公开(公告)号：US07691910B2
公开(公告)日：2010-04-06
申请号：US11918134
申请日：2006-04-11
申请人： Yutaka Ohmori , Hirokazu Kato , Kenji Yamaguchi
发明人： Yutaka Ohmori , Hirokazu Kato , Kenji Yamaguchi
IPC分类号： C09K3/00
CPC分类号： C01G25/02 , B82Y30/00 , C01P2004/64
摘要： There is provided an acidic zirconia sol having compatibility of particle properties and binding properties, and a production method of the same.The present invention relates to a production method of an acidic zirconia sol containing zirconia particles having a particle diameter of less than 20 nm in a content of 10 to 50% by mass, based on the mass of all zirconia particles including: a first process in which an alkaline zirconia sol (A) and a zirconium salt (B) are mixed in a mass ratio (Bs/As) ranging from 0.2 to 5.0 of a mass of a solid content (Bs) which is converted into an amount of ZrO2 in the zirconium salt (B) to a mass of a solid content (As) which is converted into an amount of ZrO2 in the alkaline zirconia sol (A); and a second process in which the resultant mixture is reacted at 80 to 250° C. to produce an acidic zirconia sol.
摘要翻译：提供了具有颗粒性质和结合性质的相容性的酸性氧化锆溶胶及其制备方法。本发明涉及以氧化锆粒子的质量计，含有10〜50质量％的粒径小于20nm的氧化锆粒子的酸性氧化锆溶胶的制造方法，其特征在于，包括：将碱土金属氧化锆溶胶（A）和锆盐（B）以质量比（Bs / As）为0.2〜5.0，以固体成分（Bs）的质量比转化成ZrO 2的量在碱性氧化锆溶胶（A）中将锆盐（B）转化为一定量的ZrO 2的固体成分（As）的质量; 和第二种方法，其中所得混合物在80-250℃反应生成酸性氧化锆溶胶。

6. 发明申请

US20100037801A1 Process for Producing Elongated-Shaped Silica Sol 审中-公开
标题翻译：生产细长二氧化硅溶胶的方法
公开(公告)号：US20100037801A1
公开(公告)日：2010-02-18
申请号：US12449214
申请日：2007-02-01
申请人： Yutaka Ohmori , Hirotomo Itou , Kenji Yamaguchi
发明人： Yutaka Ohmori , Hirotomo Itou , Kenji Yamaguchi
IPC分类号： C04B14/04
CPC分类号： C01B33/1465 , B82Y30/00 , C01P2004/64 , C01P2006/10 , C01P2006/22 , C01P2006/40 , C09C1/3045
摘要： There is provided a method for producing an elongated-shaped silica sol comprising the following steps: (a) adding an aqueous solution containing a water soluble Ca salt and/or Mg salt to an aqueous colloidal solution of active silicic acid with an SiO2 concentration of 1 to 6% by mass and a pH of 2 to 5 in a mass ratio of CaO and/or MgO to SiO2 in the active silicic acid of 1500 to 15,000 ppm, and mixing; (b) adding alkali metal hydroxide, a water soluble organic base, or water soluble silicate thereof to an aqueous solution obtained through (a) in a determined molar ratio to SiO2, and mixing; (c) heating a mixture obtained through (b) at 85 to 200° C. for 0.5 to 20 hours so as to obtain a colloidal solution; (d) removing, from the colloidal solution obtained through (c), part of water and at least part of anions derived from the aqueous solution containing the water soluble Ca salt and/or Mg salt; and (e) heating a colloidal solution obtained through (d) at a temperature of 80 to 195° C. that is lower than a heating temperature in (c) for 0.5 to 20 hours.
摘要翻译：提供了一种生产细长形硅溶胶的方法，包括以下步骤：（a）将含有水溶性Ca盐和/或Mg盐的水溶液加入到活性硅酸的水溶胶体溶液中，SiO 2浓度为 1〜6质量％，活性硅酸中CaO和/或MgO与SiO 2的质量比为1500〜15000ppm的pH为2〜5，混合; （b）将碱金属氢氧化物，水溶性有机碱或其水溶性硅酸盐添加到通过（a）以与SiO 2确定的摩尔比获得的水溶液中，并混合; （c）在85〜200℃下加热通过（b）得到的混合物0.5〜20小时，得到胶体溶液; （d）从通过（c）获得的胶体溶液中除去部分水和至少部分源自含有水溶性Ca盐和/或Mg盐的水溶液的阴离子; 和（e）将（d）得到的胶体溶液在（c）中的加热温度低于80〜195℃的温度下加热0.5〜20小时。

7. 发明申请

US20090117828A1 Polishing apparatus and substrate processing apparatus 有权
标题翻译：抛光装置和基板处理装置
公开(公告)号：US20090117828A1
公开(公告)日：2009-05-07
申请号：US10581669
申请日：2005-02-23
申请人： Akihisa Hongo , Kenya Ito , Kenji Yamaguchi , Masayuki Nakanishi
发明人： Akihisa Hongo , Kenya Ito , Kenji Yamaguchi , Masayuki Nakanishi
IPC分类号： B24B49/04 , B24B1/04 , B24B49/12 , B24B9/02 , B24B57/02
CPC分类号： B24B37/02 , B24B9/065 , B24B21/002
摘要： The present invention relates to a polishing apparatus for removing surface roughness produced at a peripheral portion of a substrate, or for removing a film formed on a peripheral portion of a substrate. The polishing apparatus includes a housing (3) for forming a polishing chamber (2) therein, a rotational table (1) for holding and rotating a substrate (W), a polishing tape supply mechanism (6) for supplying a polishing tape (5) into the polishing chamber (2) and supplied to the polishing chamber (2), a polishing head (35) for pressing the polishing tape (5) against a bevel portion of the substrate (W), a liquid supply (50) for supplying a liquid to a front surface and a rear surface of the substrate (W), and a regulation mechanism (16) for making an internal pressure of the polishing chamber (2) being set to be lower than an external pressure of the polishing chamber (2).
摘要翻译：本发明涉及一种用于去除在基板的周边部分产生的表面粗糙度或用于去除形成在基板的周边部分上的膜的抛光装置。抛光装置包括用于在其中形成研磨室（2）的壳体（3），用于保持和旋转基底（W）的旋转台（1），用于供应研磨带（5）的研磨带供给机构）到抛光室（2）中并供给到抛光室（2），用于将抛光带（5）压靠在基板（W）的斜面部分上的抛光头（35）将液体供给到所述基板（W）的前表面和后表面;以及调节机构（16），用于使所述研磨室（2）的内部压力被设定为低于所述研磨室（2）。

8. 发明申请

US20080138272A1 Method for Producing Metal Oxide Sol 有权
标题翻译：生产金属氧化物溶胶的方法
公开(公告)号：US20080138272A1
公开(公告)日：2008-06-12
申请号：US11660086
申请日：2005-08-08
申请人： Yutaka Ohmori , Hirokazu Kato , Yoshinari Koyama , Kenji Yamaguchi
发明人： Yutaka Ohmori , Hirokazu Kato , Yoshinari Koyama , Kenji Yamaguchi
IPC分类号： C01B13/18 , C01F17/00 , C01F5/00 , C01F7/02 , C01F11/06 , C01G9/02 , C01G51/04 , C01G49/02 , C01G29/00 , C01G23/04 , C01G25/02 , C01G19/02
CPC分类号： B01J13/0047 , B01J21/06 , B01J21/066 , B01J23/10 , B01J35/0013 , B01J37/10 , B82Y30/00 , C01B13/366 , C01F7/448 , C01F17/0043 , C01G1/02 , C01G25/02 , C01G30/004 , C01P2002/72 , C01P2004/04 , C01P2004/50 , C01P2004/64 , C01P2006/10 , C01P2006/22 , C09C1/407
摘要： It is an object to provide a method for producing stable alkaline metal oxide sols having a uniform particle size distribution. The method comprises the steps of: heating a metal compound at a temperature of 60° C. to 110° C. in an aqueous medium that contains a carbonate of quaternary ammonium; and carrying out hydrothermal processing at a temperature of 110° C. to 250° C. The carbonate of quaternary ammonium is (NR4)2CO3 or NR4HCO3 in which R represents a hydrocarbon group, or a mixture thereof. The metal compound is one, or two or more metal compounds selected from a group of compounds based on a metal having a valence that is bivalent, trivalent, or tetravalent.
摘要翻译：本发明的目的是提供一种具有均匀粒度分布的稳定的碱金属氧化物溶胶的制造方法。该方法包括以下步骤：在含有季铵盐的水性介质中，在60℃至110℃的温度下加热金属化合物; 并在110℃至250℃的温度下进行水热处理。季铵盐的碳酸盐为（NR 4）2 CO 3，或其中R表示烃基的NR 4或NR 4 HCO 3，或其混合物。金属化合物是选自基于具有二价，三价或四价的价数的金属的一组或两种以上的金属化合物。

9. 发明申请

US20060203310A1 Exposure head controller and image formation device 审中-公开
标题翻译：曝光头控制器和图像形成装置
公开(公告)号：US20060203310A1
公开(公告)日：2006-09-14
申请号：US11370382
申请日：2006-03-02
申请人： Kenji Yamaguchi , Mitsukazu Kurose , Nozomu Inoue , Ken Ikuma
发明人： Kenji Yamaguchi , Mitsukazu Kurose , Nozomu Inoue , Ken Ikuma
IPC分类号： G03F3/08
CPC分类号： H04N1/40031 , H04N1/4015
摘要： Provided is an exposure head controller for controlling a plurality of light-emitting elements arranged in a first direction and exposing a plurality of pixels, including: an exposure data generator for generating, based on pixel exposure data for exposing the respective pixels, a plurality of area exposure data for respectively exposing a plurality of areas in which the respective pixels are divided in a second direction intersecting with the first direction; and an exposure controller for exposing the plurality of pixels by controlling the plurality of light-emitting elements and exposing the plurality of areas based on the area exposure data.
摘要翻译：提供了一种用于控制沿第一方向布置的多个发光元件并暴露多个像素的曝光头控制器，包括：曝光数据发生器，用于基于用于曝光各个像素的像素曝光数据产生多个像素，区域曝光数据，用于分别在与第一方向相交的第二方向上分别曝光各像素分割的多个区域; 以及曝光控制器，用于通过控制多个发光元件并基于区域曝光数据曝光多个区域来曝光多个像素。

10. 发明申请

US20060145490A1 Collision energy-absorbing material for vehicle and collision energy-absorbing structure of vehicle using the material 审中-公开
标题翻译：车辆碰撞能量吸收材料和使用该材料的车辆碰撞能量吸收结构
公开(公告)号：US20060145490A1
公开(公告)日：2006-07-06
申请号：US10524776
申请日：2003-08-27
申请人： Kenji Yamaguchi , Yoshihiro Yamamoto , Taro Kiguchi , Masahiko Sameshima , Takashi Hamamoto
发明人： Kenji Yamaguchi , Yoshihiro Yamamoto , Taro Kiguchi , Masahiko Sameshima , Takashi Hamamoto
IPC分类号： B60R19/18
CPC分类号： B60R19/18 , B60R21/04 , B60R21/0428 , B60R21/34 , B60R2019/186 , B60R2019/1866 , B60R2019/1873 , B60R2019/1886 , B60R2021/0414 , B60R2021/0435
摘要： There are provided a vehicle impact energy absorbing member which is arranged as an impact energy absorbing member of a simple construction capable of absorbing impact energy with high efficiency, and which is capable of improving the pedestrian protection performance as well as the passenger protection performance, and a vehicle impact energy absorbing structure using the vehicle impact energy absorbing member. More specifically, a compression energy absorbing member 10 using compression deformation and a buckling energy absorbing member 20 using buckling deformation are provided. Impact energy applied to a vehicle body is absorbed by a combination of the two energy absorbing members 10 and 20. Buckling energy absorbing portions 11a and 11b are also provided which have a buckling characteristic such that a peak value of impact force is equal to or smaller than a set value and in which a setting is made such that at least one of impact timing for starting absorption of impact energy and peak value timing for making the impact force have a peak value after collision is changed in a stepping manner or continuously. Impact energy applied to the vehicle body is absorbed by buckling deformation of the buckling energy absorbing portions 11a and 11b.
摘要翻译：提供了一种车辆冲击能量吸收构件，其被布置为能够以高效率吸收冲击能量的简单结构的冲击能量吸收构件，并且能够改善行人保护性能以及乘客保护性能，以及使用车辆冲击能量吸收构件的车辆冲击能量吸收结构。更具体地，提供使用压缩变形的压缩能量吸收构件10和使用屈曲变形的屈曲能量吸收构件20。施加到车体的冲击能量被两个能量吸收构件10和20的组合吸收。还提供了弯曲能量吸收部分11a和11b，其具有使冲击力的峰值等于或小于设定值的弯曲特性，并且其中设置使得至少一个冲击正时为冲击力的开始吸收和使冲击力具有碰撞后的峰值的峰值时间以步进方式或连续地改变。施加到车体的冲击能量被屈曲能量吸收部分11a和11b的屈曲变形所吸收。

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