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1. 发明授权

US5369486A Position detector for detecting the position of an object using a diffraction grating positioned at an angle 失效
$Position detector for detecting the position of an object using a diffraction grating positioned at an angle$
标题翻译：位置检测器，用于使用位于一定角度的衍射光栅来检测物体的位置
公开(公告)号：US5369486A
公开(公告)日：1994-11-29
申请号：US947383
申请日：1992-09-21
申请人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
发明人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object. The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.
摘要翻译：位置检测器包括设置在物体表面上的衍射光栅，用于照射衍射光栅的照明系统，用于检测衍射光栅衍射的衍射光的检测系统，以及用于检测与物体有关的位置信息的处理系统。照明系统发射由衍射光栅衍射并彼此干涉的第一对光束，并且发射由衍射光栅衍射并且彼此干涉的第二对光束。第一对光束沿着沿衍射光栅延伸的第一方向延伸的平面入射在衍射光栅上。第二对光束沿着沿衍射光栅延伸的第二方向延伸的平面入射在衍射光栅上。第一和第二方向与光栅线方向不同。检测系统检测干扰光并从其产生第一和第二拍拍信号。处理系统从第一拍子信号的相位状态和相对于第二拍摄信号的相位状态相对于第二方向检测关于第一方向的位置信息。

2. 发明授权

US5751426A Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object 失效
$Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object$
标题翻译：位置偏差测量装置和测量形成在同一物体上的多个衍射光栅之间的位置偏差的方法
公开(公告)号：US5751426A
公开(公告)日：1998-05-12
申请号：US460708
申请日：1995-06-02
申请人： Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Hiroshi Osawa , Koichi Sentoku , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Hiroshi Osawa , Koichi Sentoku , Toshihiko Tsuji , Takahiro Matsumoto
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object include an illumination optical system for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system for forming at least one interference light beam from the plurality of diffracted light beams, a detector for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.
摘要翻译：用于测量形成在同一物体上的多个衍射光栅之间的位置偏差的装置和方法包括用光束照射多个衍射光栅的照明光学系统，光学系统的照明产生多个衍射光束来自多个衍射光栅的干涉光学系统，用于形成来自多个衍射光束的至少一个干涉光束，用于检测至少一个干涉光束的检测器，检测结果作为测量的基础多个衍射光栅之间的位置偏差，以及用于测量照明光学系统和多个衍射光栅之间的相对位置关系的测量部分。

3. 发明授权

US5610718A Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes 失效
$Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes$
标题翻译：用于检测彼此靠近布置的第一和第二衍射光栅之间的相对位移的装置和方法，其中所述光栅具有不同的间距尺寸
公开(公告)号：US5610718A
公开(公告)日：1997-03-11
申请号：US297511
申请日：1994-08-29
申请人： Koichi Sentoku , Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh
发明人： Koichi Sentoku , Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A method and device for measuring the relative displacement between first and second diffraction gratings includes an interference optical system forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first detector for detecting the first interference ray of light to generate a first detection signal, a second detector for detecting the second interference ray of light to generate a second detection signal, and signal processing section for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.
摘要翻译：用于测量第一和第二衍射光栅之间的相对位移的方法和装置包括干涉光学系统，其形成从第一和第二衍射光栅衍射的光的第一和第二干涉光线，并且将第一和第二干涉光线分离在其偏振方向的差异的基础，用于检测第一干涉光线以产生第一检测信号的第一检测器，用于检测第二干涉光线以产生第二检测信号的第二检测器，以及信号处理部分用于检测第一和第二检测信号之间的相位差，并且用于基于相位差确定第一和第二衍射光栅之间的相对位移。

4. 发明授权

US5432603A Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected 失效
标题翻译：光学外差干涉测量装置和方法以及使用该光学外差干涉测量装置和方法的曝光装置和装置制造方法，其中检测到拍子信号之间的相位差
公开(公告)号：US5432603A
公开(公告)日：1995-07-11
申请号：US153038
申请日：1993-11-17
申请人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
IPC分类号： G03F9/00 , G01B9/02
CPC分类号： G03F9/70
摘要： An optical element comprised of a plurality of polarizing beam splitters is provided on the optical path of a two-frequency linearly polarized laser beam source, and the optical element divides a light beam from the two-frequency linearly polarized laser beam source into two light beams, whereafter these two light beams are incident on diffraction gratings provided on a mask and a wafer, respectively. A pair of mirrors are provided vertically above the mask, and a pair of lenses, a pair of polarizing plates and a pair of photoelectric detectors are arranged in succession in the directions of reflection of the pair of mirrors. The outputs of the two photoelectric detectors become beat signals, and the phase difference between these beat signals is measured, whereby the alignment of the mask and wafer is effected. Since the optical element is comprised of a plurality of polarizing beam splitters, leak-in light included in each light beam is reduced.
摘要翻译：在双频线性偏振激光束源的光路上设置由多个偏振分束器构成的光学元件，光学元件将来自双频线性偏振激光束源的光束分成两束光束之后，这两个光束分别入射到设置在掩模和晶片上的衍射光栅上。一对镜子垂直地设置在掩模上方，并且一对透镜，一对偏振片和一对光电检测器沿着该对反射镜的反射方向相继布置。两个光电检测器的输出变为差拍信号，并且测量这些拍频信号之间的相位差，从而实现掩模和晶片的对准。由于光学元件由多个偏振分束器组成，因此减少了包括在每个光束中的泄漏光。

5. 发明授权

US5585923A Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means 失效
标题翻译：在通过误差检测装置的误差检测的基础上校正误差的同时测量位置偏差的方法和装置
公开(公告)号：US5585923A
公开(公告)日：1996-12-17
申请号：US314444
申请日：1994-09-28
申请人： Noriyuki Nose , Takeshi Miyachi , Kenji Saitoh , Koichi Sentoku , Takahiro Matsumoto
发明人： Noriyuki Nose , Takeshi Miyachi , Kenji Saitoh , Koichi Sentoku , Takahiro Matsumoto
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/70
摘要： A method and apparatus for measuring the relative positional deviation between first and second diffraction gratings formed on an object includes determining the relative positional deviation of the first and second diffraction gratings while detecting and correcting an error produced in relation to detection of the positional deviation of the first and second diffraction gratings.
摘要翻译：用于测量形成在物体上的第一和第二衍射光栅之间的相对位置偏差的方法和装置包括确定第一和第二衍射光栅的相对位置偏差，同时检测和校正相对于检测到的位置偏差的检测产生的误差第一和第二衍射光栅。

6. 发明授权

US5465148A Apparatus and method for detecting the relative positional deviation between two diffraction gratings 失效
$Apparatus and method for detecting the relative positional deviation between two diffraction gratings$
标题翻译：用于检测两个衍射光栅之间的相对位置偏差的装置和方法
公开(公告)号：US5465148A
公开(公告)日：1995-11-07
申请号：US139143
申请日：1993-10-21
申请人： Takahiro Matsumoto , Noriyuki Nose , Kenji Saito , Koichi Sentoku
发明人： Takahiro Matsumoto , Noriyuki Nose , Kenji Saito , Koichi Sentoku
IPC分类号： G01B9/02 , G01B11/24 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70633 , G03F9/70
摘要： A first Savart plate and an object to be measured are arranged on the light path of a Zeeman light source. The object to be measured is constructed of a diffraction grating on a mask and a diffraction grating on a wafer. A second Savart plate, a deflection plate and a photoelectric detector are sequentially arranged in the light path for the diffracted beams from the measured object. The output of the photoelectric detector is connected to a phase-difference unit to detect the phase difference between two beat signals. Herein, the light is split into two beams by the Savart plate. After a diffraction is caused by the diffraction gratings, thereafter, the beams are re-synthesized by the Savart plates. The two beams travel on the same light path, thereby improving a measurement accuracy.
摘要翻译：第一萨瓦特板和待测对象被布置在塞曼光源的光路上。要测量的对象由掩模上的衍射光栅和晶片上的衍射光栅构成。第二萨瓦特板，偏转板和光电检测器依次布置在来自测量对象的衍射光束的光路中。光电检测器的输出连接到相位差单元，以检测两个差拍信号之间的相位差。这里，萨瓦特板将光分成两束。衍射由衍射光栅引起之后，光束由Savart板重新合成。两个光束在相同的光路上行进，从而提高测量精度。

7. 发明授权

US5321502A Measuring method and measuring apparatus 失效
标题翻译：测量方法和测量仪器
公开(公告)号：US5321502A
公开(公告)日：1994-06-14
申请号：US910457
申请日：1992-07-08
申请人： Takahiro Matsumoto , Minoru Yoshii , Kenji Saito , Hiroyasu Nose , Koichi Sentoku , Seiji Takeuchi
发明人： Takahiro Matsumoto , Minoru Yoshii , Kenji Saito , Hiroyasu Nose , Koichi Sentoku , Seiji Takeuchi
IPC分类号： G01B9/02 , G03F9/00
CPC分类号： G01B9/02007 , G01B9/02003 , G03F9/7049 , G01B2290/30 , G01B2290/70
摘要： A measuring arrangement includes forming first and second pairs of light beams each having a low frequency light beam and a high frequency light beam. Both pairs of light beams generate beat signals of the same frequency. The low frequency light beam of either pair and the high frequency of the other pair pass through a predetermined optical path to cause phase changes in the same direction. Beat signals are generated by superposing the first and second beam pair to provide measurement information on the phase changes.
摘要翻译：测量装置包括形成第一和第二对光束，每对光束具有低频光束和高频光束。两对光束产生相同频率的节拍信号。任一对的低频光束和另一对的高频光束通过预定的光路以引起相同方向的相位变化。通过叠加第一和第二波束对来产生节拍信号以提供关于相位变化的测量信息。

8. 发明授权

US5682239A Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters 失效
$Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters$
标题翻译：用于通过利用入射在来自第一和第二发光体的光栅的光束的光学外差干涉来检测基板上的衍射光栅的位置偏差的装置
公开(公告)号：US5682239A
公开(公告)日：1997-10-28
申请号：US528817
申请日：1995-09-15
申请人： Takahiro Matsumoto , Kenji Saitoh , Koichi Sentoku
发明人： Takahiro Matsumoto , Kenji Saitoh , Koichi Sentoku
IPC分类号： G01B9/02 , G01B11/00 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70633 , G03F9/70
摘要： Apparatus for detecting a positional deviation of two diffraction gratings of each of first and second pairs of diffraction gratings formed on a substrate, by utilizing an optical heterodyne interference method. The apparatus includes a first light emitter for emitting a pair of coherent light beams having different frequencies close to a first frequency, a second light emitter for emitting a pair of coherent light beams having different frequencies close to a second frequency, different from the first frequency, a four-way radiating unit radiating the two pairs of light beams in four directions and for causing a selected pair of the light beams to be incident on a corresponding one of the first and second pairs of the diffraction gratings such that corresponding beam spots overlap with each other, a splitter for splitting diffracted light beams from the diffraction gratings according to frequencies of the diffracted light beams, to separate a first diffracted light beam, which is diffracted from the first pair of diffraction gratings in a diffraction direction, and a second diffracted light beam, which is diffracted from the second pair of diffraction gratings in the same diffraction direction, a beat signal detector for detecting beat signals respectively corresponding to the split light beams, and a deviation detecting unit for receiving the detected beat signals and for detecting a positional deviation in a predetermined direction of two diffraction gratings of each of the first and second pairs, from the beat signals respectively corresponding to the two diffraction gratings of a corresponding one of the first and second pairs.
摘要翻译：用于通过利用光学外差干扰法检测形成在基板上的第一和第二对衍射光栅中的每一个的两个衍射光栅的位置偏差的装置。该装置包括用于发射具有接近于第一频率的不同频率的一对相干光束的第一光发射器，用于发射具有接近第二频率的不同频率的一对相干光束的第二光发射器，其不同于第一频率，四路辐射单元，其在四个方向上辐射两对光束，并且使所选择的一对光束入射在第一和第二对衍射光栅中的相应一个上，使得相应的光束点重叠彼此分离，用于根据衍射光束的频率从衍射光栅分离衍射光束，以在衍射方向上分离从第一对衍射光栅衍射的第一衍射光束，以及第二衍射光束衍射光束在相同的衍射光谱中衍射自第二对衍射光栅 n是用于检测分别对应于分割光束的拍频信号的拍频信号检测器，以及用于接收所检测到的拍频信号并检测第一和第二声道中的每一个的两个衍射光栅的预定方向的位置偏差的偏差检测单元从分别对应于第一和第二对应的一个的两个衍射光栅的拍子信号对。

9. 发明授权

US5625453A System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating 失效
$System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating$
标题翻译：用于检测衍射光栅之间的相对位置偏差和用于测量构成衍射光栅的线的宽度的系统和方法
公开(公告)号：US5625453A
公开(公告)日：1997-04-29
申请号：US328884
申请日：1994-10-26
申请人： Takahiro Matsumoto , Yoshiaki Ohtsu , Kenji Saitoh , Koichi Sentoku
发明人： Takahiro Matsumoto , Yoshiaki Ohtsu , Kenji Saitoh , Koichi Sentoku
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/70
摘要： A deviation detecting system for detecting a relative positional deviation between first and second diffraction gratings, includes a light source, an illuminating device for projecting first and second light beams from the light source, having different directions of polarization, onto the first and second diffraction gratings along different directions, a first signal detecting device for detecting a first interference light signal from the first diffraction grating, being based on a combination of diffraction light of the first light beam and diffraction light of the second light beam, a second signal detecting device for detecting a second interference light signal from the second diffraction grating, being based on a combination of diffraction light of the first light beam and diffraction light of the second light, a first phase difference detecting device for detecting a phase difference between the first and second interference light signals and, a second phase difference detecting device for producing third and fourth interference light signals for correction of a phase error involved in the detected phase difference, and for detecting a phase difference between the third and fourth interference light signals. The phase error is produced by the first and second diffraction gratings which affect the phase in dependence upon the state of polarization of light impinging thereon. Also provided is a determining device for determining the relative positional deviation between the first and second diffraction gratings on the basis of a phase difference as detected by the first and second phase difference detecting device.
摘要翻译：用于检测第一和第二衍射光栅之间的相对位置偏差的偏差检测系统包括光源，用于将具有不同偏振方向的来自光源的第一和第二光束投射到第一和第二衍射光栅上的照明装置沿着不同方向，第一信号检测装置，用于基于第一光束的衍射光和第二光束的衍射光的组合来检测来自第一衍射光栅的第一干涉光信号，第二信号检测装置，用于基于第一光束的衍射光和第二光的衍射光的组合，检测来自第二衍射光栅的第二干涉光信号;第一相位差检测装置，用于检测第一和第二干涉之间的相位差光信号和第二相位差检测用于产生用于校正所检测到的相位差中涉及的相位误差的第三和第四干涉光信号，以及用于检测第三和第四干涉光信号之间的相位差。相位误差由第一和第二衍射光栅产生，这些衍射光栅根据入射到其上的光的偏振状态影响相位。还提供了一种用于基于由第一和第二相位差检测装置检测的相位差来确定第一和第二衍射光栅之间的相对位置偏差的确定装置。

10. 发明授权

US5550635A Rotational deviation detecting method and system using a periodic pattern 失效
标题翻译：旋转偏差检测方法和使用周期性模式的系统
公开(公告)号：US5550635A
公开(公告)日：1996-08-27
申请号：US330736
申请日：1994-10-28
申请人： Kenji Saitoh , Koichi Sentoku , Takahiro Matsumoto
发明人： Kenji Saitoh , Koichi Sentoku , Takahiro Matsumoto
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00 , G01B9/02
CPC分类号： G03F7/70616 , G03F7/70633 , G03F9/7049
摘要： A deviation detecting system for detecting a rotational deviation of an object, includes a pattern formed on the object and having a periodicity, a light source for providing light, a detecting device for projecting the light from the light source onto the pattern and for detecting at least two diffraction lights from the pattern with a predetermined detection plane, and a determining device for determining a rotational deviation of the object with respect to a predetermined axis, on the basis of the positions of incidence of the diffraction lights upon the detection plane as detected through the detection by the detecting device.
摘要翻译：用于检测物体的旋转偏差的偏差检测系统包括形成在物体上并且具有周期性的图案，用于提供光的光源;检测装置，用于将来自光源的光投射到图案上并用于在基于具有预定检测平面的图案的至少两个衍射光，以及用于基于检测到的检测平面上的衍射光的入射位置来确定物体相对于预定轴的旋转偏差的确定装置通过检测装置的检测。

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