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1. 发明授权

US5432603A Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected 失效
标题翻译：光学外差干涉测量装置和方法以及使用该光学外差干涉测量装置和方法的曝光装置和装置制造方法，其中检测到拍子信号之间的相位差
公开(公告)号：US5432603A
公开(公告)日：1995-07-11
申请号：US153038
申请日：1993-11-17
申请人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
IPC分类号： G03F9/00 , G01B9/02
CPC分类号： G03F9/70
摘要： An optical element comprised of a plurality of polarizing beam splitters is provided on the optical path of a two-frequency linearly polarized laser beam source, and the optical element divides a light beam from the two-frequency linearly polarized laser beam source into two light beams, whereafter these two light beams are incident on diffraction gratings provided on a mask and a wafer, respectively. A pair of mirrors are provided vertically above the mask, and a pair of lenses, a pair of polarizing plates and a pair of photoelectric detectors are arranged in succession in the directions of reflection of the pair of mirrors. The outputs of the two photoelectric detectors become beat signals, and the phase difference between these beat signals is measured, whereby the alignment of the mask and wafer is effected. Since the optical element is comprised of a plurality of polarizing beam splitters, leak-in light included in each light beam is reduced.
摘要翻译：在双频线性偏振激光束源的光路上设置由多个偏振分束器构成的光学元件，光学元件将来自双频线性偏振激光束源的光束分成两束光束之后，这两个光束分别入射到设置在掩模和晶片上的衍射光栅上。一对镜子垂直地设置在掩模上方，并且一对透镜，一对偏振片和一对光电检测器沿着该对反射镜的反射方向相继布置。两个光电检测器的输出变为差拍信号，并且测量这些拍频信号之间的相位差，从而实现掩模和晶片的对准。由于光学元件由多个偏振分束器组成，因此减少了包括在每个光束中的泄漏光。

2. 发明授权

US5751426A Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object 失效
$Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object$
标题翻译：位置偏差测量装置和测量形成在同一物体上的多个衍射光栅之间的位置偏差的方法
公开(公告)号：US5751426A
公开(公告)日：1998-05-12
申请号：US460708
申请日：1995-06-02
申请人： Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Hiroshi Osawa , Koichi Sentoku , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Hiroshi Osawa , Koichi Sentoku , Toshihiko Tsuji , Takahiro Matsumoto
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object include an illumination optical system for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system for forming at least one interference light beam from the plurality of diffracted light beams, a detector for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.
摘要翻译：用于测量形成在同一物体上的多个衍射光栅之间的位置偏差的装置和方法包括用光束照射多个衍射光栅的照明光学系统，光学系统的照明产生多个衍射光束来自多个衍射光栅的干涉光学系统，用于形成来自多个衍射光束的至少一个干涉光束，用于检测至少一个干涉光束的检测器，检测结果作为测量的基础多个衍射光栅之间的位置偏差，以及用于测量照明光学系统和多个衍射光栅之间的相对位置关系的测量部分。

3. 发明授权

US5610718A Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes 失效
$Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes$
标题翻译：用于检测彼此靠近布置的第一和第二衍射光栅之间的相对位移的装置和方法，其中所述光栅具有不同的间距尺寸
公开(公告)号：US5610718A
公开(公告)日：1997-03-11
申请号：US297511
申请日：1994-08-29
申请人： Koichi Sentoku , Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh
发明人： Koichi Sentoku , Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A method and device for measuring the relative displacement between first and second diffraction gratings includes an interference optical system forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first detector for detecting the first interference ray of light to generate a first detection signal, a second detector for detecting the second interference ray of light to generate a second detection signal, and signal processing section for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.
摘要翻译：用于测量第一和第二衍射光栅之间的相对位移的方法和装置包括干涉光学系统，其形成从第一和第二衍射光栅衍射的光的第一和第二干涉光线，并且将第一和第二干涉光线分离在其偏振方向的差异的基础，用于检测第一干涉光线以产生第一检测信号的第一检测器，用于检测第二干涉光线以产生第二检测信号的第二检测器，以及信号处理部分用于检测第一和第二检测信号之间的相位差，并且用于基于相位差确定第一和第二衍射光栅之间的相对位移。

4. 发明授权

US5369486A Position detector for detecting the position of an object using a diffraction grating positioned at an angle 失效
$Position detector for detecting the position of an object using a diffraction grating positioned at an angle$
标题翻译：位置检测器，用于使用位于一定角度的衍射光栅来检测物体的位置
公开(公告)号：US5369486A
公开(公告)日：1994-11-29
申请号：US947383
申请日：1992-09-21
申请人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
发明人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object. The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.
摘要翻译：位置检测器包括设置在物体表面上的衍射光栅，用于照射衍射光栅的照明系统，用于检测衍射光栅衍射的衍射光的检测系统，以及用于检测与物体有关的位置信息的处理系统。照明系统发射由衍射光栅衍射并彼此干涉的第一对光束，并且发射由衍射光栅衍射并且彼此干涉的第二对光束。第一对光束沿着沿衍射光栅延伸的第一方向延伸的平面入射在衍射光栅上。第二对光束沿着沿衍射光栅延伸的第二方向延伸的平面入射在衍射光栅上。第一和第二方向与光栅线方向不同。检测系统检测干扰光并从其产生第一和第二拍拍信号。处理系统从第一拍子信号的相位状态和相对于第二拍摄信号的相位状态相对于第二方向检测关于第一方向的位置信息。

5. 发明授权

US5321502A Measuring method and measuring apparatus 失效
标题翻译：测量方法和测量仪器
公开(公告)号：US5321502A
公开(公告)日：1994-06-14
申请号：US910457
申请日：1992-07-08
申请人： Takahiro Matsumoto , Minoru Yoshii , Kenji Saito , Hiroyasu Nose , Koichi Sentoku , Seiji Takeuchi
发明人： Takahiro Matsumoto , Minoru Yoshii , Kenji Saito , Hiroyasu Nose , Koichi Sentoku , Seiji Takeuchi
IPC分类号： G01B9/02 , G03F9/00
CPC分类号： G01B9/02007 , G01B9/02003 , G03F9/7049 , G01B2290/30 , G01B2290/70
摘要： A measuring arrangement includes forming first and second pairs of light beams each having a low frequency light beam and a high frequency light beam. Both pairs of light beams generate beat signals of the same frequency. The low frequency light beam of either pair and the high frequency of the other pair pass through a predetermined optical path to cause phase changes in the same direction. Beat signals are generated by superposing the first and second beam pair to provide measurement information on the phase changes.
摘要翻译：测量装置包括形成第一和第二对光束，每对光束具有低频光束和高频光束。两对光束产生相同频率的节拍信号。任一对的低频光束和另一对的高频光束通过预定的光路以引起相同方向的相位变化。通过叠加第一和第二波束对来产生节拍信号以提供关于相位变化的测量信息。

6. 发明授权

US5333050A Measuring method and apparatus for meausring the positional relationship of first and second gratings 失效
标题翻译：测量第一和第二光栅的位置关系的方法和装置
公开(公告)号：US5333050A
公开(公告)日：1994-07-26
申请号：US675277
申请日：1991-03-26
申请人： Noriyuki Nose , Kenji Saitoh , Koichi Sentoku , Minoru Yoshii
发明人： Noriyuki Nose , Kenji Saitoh , Koichi Sentoku , Minoru Yoshii
IPC分类号： G03F7/20 , G03F9/00 , G01B11/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： Disclosed is a method and apparatus for measuring a relative positional deviation between a first pattern and a second pattern, printed on an article such as a semiconductor wafer at different moments, the measurement being based on detection of interference of diffraction lights from at least one of the first and second printed patterns.
摘要翻译：公开了一种用于测量在不同时刻印刷在诸如半导体晶片的物品上的第一图案和第二图案之间的相对位置偏差的方法和装置，该测量是基于检测衍射光从至少一个第一和第二印刷图案。

7. 发明授权

US5861952A Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position 失效
标题翻译：包括光束的强度调制和在检查位置散射的光的检测的光学检查方法和装置
公开(公告)号：US5861952A
公开(公告)日：1999-01-19
申请号：US984509
申请日：1992-12-02
申请人： Toshihiko Tsuji , Kyoichi Miyazaki , Seiji Takeuchi , Minoru Yoshii , Noriyuki Nose
发明人： Toshihiko Tsuji , Kyoichi Miyazaki , Seiji Takeuchi , Minoru Yoshii , Noriyuki Nose
IPC分类号： G01N21/94 , G01B9/02 , G01N21/88
CPC分类号： G01N21/94
摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.
摘要翻译：具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。激光束随后被半反射镜分开。其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。

8. 发明授权

US5486919A Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern 失效
标题翻译：用于在具有图案的基板上检查颗粒（如果有的话）的检查方法和装置
公开(公告)号：US5486919A
公开(公告)日：1996-01-23
申请号：US76951
申请日：1993-06-15
申请人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
发明人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
IPC分类号： G01J9/02 , G01J9/04 , G01N21/88 , G01N21/94 , G03F7/20 , G01B9/02
CPC分类号： G03F7/70616 , G01N21/88 , G01N21/94 , G03F7/7065 , G03F7/70916 , G01J2009/0261 , G01J9/04 , G01N2021/4792 , G01N21/8806
摘要： Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.
摘要翻译：公开了一种检查方法和装置：其中（i）具有第一偏振状态和第一波长的第一光，以及（ii）具有与第一偏振态不同的第二极化状态的第二光，以及第二波长，与第一波长不同; 至少第一个光被投射到检查的位置; 并且检测基于第二光产生的外差干涉光和在检查位置上散射并且具有从第一极化状态通过散射改变其偏振状态的光。

9. 发明授权

US5461474A Inspection apparatus for detecting foreign matter on a surface to be inspected, and an exposure apparatus and a device manufacturing method using the same 失效
标题翻译：用于检测被检查表面上的异物的检查装置，以及曝光装置及使用其的装置制造方法
公开(公告)号：US5461474A
公开(公告)日：1995-10-24
申请号：US266512
申请日：1994-06-27
申请人： Minoru Yoshii , Noriyuki Nose , Masayuki Suzuki , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
发明人： Minoru Yoshii , Noriyuki Nose , Masayuki Suzuki , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66
CPC分类号： G01N21/956 , G01N21/94
摘要： When inspecting the presence of foreign matter on a surface to be inspected by scanning the surface with a light beam from a light source utilizing a scanning system, and receiving scattered light from the surface by a detector, a correlation is utilized between a signal representing first scattered light obtained from the detector when the light beam scans a first line on the surface, and a signal representing second scattered light obtained from the detector when the light beam scans a second line displaced from the first line by a predetermined amount in a direction orthogonal to the direction of the first line.
摘要翻译：当通过利用扫描系统的来自光源的光束扫描表面并通过检测器接收来自表面的散射光来检查要检查的表面上的异物的存在时，在表示第一当光束扫描表面上的第一条线时，从检测器获得的散射光，以及当光束沿正交方向扫描从第一条线移位预定量的第二条线时，从检测器获得的第二散射光的信号到第一行的方向。

10. 发明授权

US5767962A Inspection system and device manufacturing method using the same 失效
标题翻译：检验系统和装置制造方法采用该方法
公开(公告)号：US5767962A
公开(公告)日：1998-06-16
申请号：US755352
申请日：1996-11-25
申请人： Masayuki Suzuki , Noriyuki Nose , Minoru Yoshii , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
发明人： Masayuki Suzuki , Noriyuki Nose , Minoru Yoshii , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
IPC分类号： G01N21/88 , G01B11/30 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/66 , G01N21/00
CPC分类号： G01N21/94
摘要： An inspection system includes a light source, a scanning device for scanning a surface to be inspected, with light from the light source, wherein the scanning device includes an optical member disposed with inclination with respect to a primary scan direction, the optical member being adapted to provide a convergent light being converged to form a spot at a distance changeable with the position of a scan, and a light receiving device for receiving scattered light from the surface.
摘要翻译：检查系统包括光源，用于扫描来自光源的光的扫描装置，其中所述扫描装置包括相对于主扫描方向倾斜设置的光学构件，所述光学构件适于以提供会聚的光会聚在一起形成与扫描位置可变的距离的光点，以及用于接收来自表面的散射光的光接收装置。

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