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1. 发明授权

US5321502A Measuring method and measuring apparatus 失效
标题翻译：测量方法和测量仪器
公开(公告)号：US5321502A
公开(公告)日：1994-06-14
申请号：US910457
申请日：1992-07-08
申请人： Takahiro Matsumoto , Minoru Yoshii , Kenji Saito , Hiroyasu Nose , Koichi Sentoku , Seiji Takeuchi
发明人： Takahiro Matsumoto , Minoru Yoshii , Kenji Saito , Hiroyasu Nose , Koichi Sentoku , Seiji Takeuchi
IPC分类号： G01B9/02 , G03F9/00
CPC分类号： G01B9/02007 , G01B9/02003 , G03F9/7049 , G01B2290/30 , G01B2290/70
摘要： A measuring arrangement includes forming first and second pairs of light beams each having a low frequency light beam and a high frequency light beam. Both pairs of light beams generate beat signals of the same frequency. The low frequency light beam of either pair and the high frequency of the other pair pass through a predetermined optical path to cause phase changes in the same direction. Beat signals are generated by superposing the first and second beam pair to provide measurement information on the phase changes.
摘要翻译：测量装置包括形成第一和第二对光束，每对光束具有低频光束和高频光束。两对光束产生相同频率的节拍信号。任一对的低频光束和另一对的高频光束通过预定的光路以引起相同方向的相位变化。通过叠加第一和第二波束对来产生节拍信号以提供关于相位变化的测量信息。

2. 发明授权

US5432603A Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected 失效
标题翻译：光学外差干涉测量装置和方法以及使用该光学外差干涉测量装置和方法的曝光装置和装置制造方法，其中检测到拍子信号之间的相位差
公开(公告)号：US5432603A
公开(公告)日：1995-07-11
申请号：US153038
申请日：1993-11-17
申请人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
IPC分类号： G03F9/00 , G01B9/02
CPC分类号： G03F9/70
摘要： An optical element comprised of a plurality of polarizing beam splitters is provided on the optical path of a two-frequency linearly polarized laser beam source, and the optical element divides a light beam from the two-frequency linearly polarized laser beam source into two light beams, whereafter these two light beams are incident on diffraction gratings provided on a mask and a wafer, respectively. A pair of mirrors are provided vertically above the mask, and a pair of lenses, a pair of polarizing plates and a pair of photoelectric detectors are arranged in succession in the directions of reflection of the pair of mirrors. The outputs of the two photoelectric detectors become beat signals, and the phase difference between these beat signals is measured, whereby the alignment of the mask and wafer is effected. Since the optical element is comprised of a plurality of polarizing beam splitters, leak-in light included in each light beam is reduced.
摘要翻译：在双频线性偏振激光束源的光路上设置由多个偏振分束器构成的光学元件，光学元件将来自双频线性偏振激光束源的光束分成两束光束之后，这两个光束分别入射到设置在掩模和晶片上的衍射光栅上。一对镜子垂直地设置在掩模上方，并且一对透镜，一对偏振片和一对光电检测器沿着该对反射镜的反射方向相继布置。两个光电检测器的输出变为差拍信号，并且测量这些拍频信号之间的相位差，从而实现掩模和晶片的对准。由于光学元件由多个偏振分束器组成，因此减少了包括在每个光束中的泄漏光。

3. 发明授权

US5541729A Measuring apparatus utilizing diffraction of reflected and transmitted light 失效
$Measuring apparatus utilizing diffraction of reflected and transmitted light$
标题翻译：利用衍射反射和透射光的测量装置
公开(公告)号：US5541729A
公开(公告)日：1996-07-30
申请号：US47655
申请日：1993-04-19
申请人： Seiji Takeuchi , Minoru Yoshii , Hiroyasu Nose
发明人： Seiji Takeuchi , Minoru Yoshii , Hiroyasu Nose
IPC分类号： G01B9/02 , G01B11/00 , G01D5/38 , G02B27/28 , G03F9/00
CPC分类号： G01B9/02007 , G01B9/02003 , G01B9/02027 , G01D5/38 , G03F9/7049 , G01B2290/15 , G01B2290/30 , G01B2290/45 , G01B2290/70
摘要： In measuring apparatus for detecting relative displacement of a diffraction grating, a light beam is separated in an optical unit such as polarizing beam splitter into a reflected light beam and a transmitted light beam which beams are projected onto the diffraction grating. The diffracted light of the reflected and transmitted light beams are deflected by a deflection unit to be projected again onto the diffraction grating for rediffraction. The rediffracted light of the reflected and transmitted light beams are combined in the polarizing beam splitter and a detector detects the interference state of the combined rediffracted light. The deflection unit deflects the diffracted light beams of the reflected light and transmitted light so that they reenter the diffraction grating after traveling along the same optical path in the directions opposite to each other. The apparatus provides a simple configuration that prevents reduction of light intensity and provides the same optical path for both reference and displacement measuring light beams so that errors caused by fluctuation in air and heterogeneity in optical components are cancelled.
摘要翻译：在用于检测衍射光栅的相对位移的测量装置中，光束在诸如偏振分束器的光学单元中被分离为反射光束和透射光束，该光束被投射到衍射光栅上。反射和透射光束的衍射光被偏转单元偏转，以再次投影到衍射光栅上以进行红移。反射和透射光束的再衍射光组合在偏振分束器中，检测器检测组合的红光的干涉状态。偏转单元使反射光的衍射光和透射光偏转，使得它们沿相同的光路在彼此相反的方向上行进之后重新进入衍射光栅。该装置提供了防止光强降低的简单结构，并为参考和位移测量光束提供相同的光路，从而消除由空气波动和光学部件中的异质性引起的误差。

4. 发明授权

US5404220A Measuring method and measuring apparatus for determining the relative displacement of a diffraction grating with respect to a plurality of beams 失效
$Measuring method and measuring apparatus for determining the relative displacement of a diffraction grating with respect to a plurality of beams$
标题翻译：用于确定衍射光栅相对于多个光束的相对位移的测量方法和测量装置
公开(公告)号：US5404220A
公开(公告)日：1995-04-04
申请号：US955979
申请日：1992-10-02
申请人： Seiji Takeuchi , Tetsuharu Nishimura , Minoru Yoshii , Hiroyasu Nose , Koh Ishizuka
发明人： Seiji Takeuchi , Tetsuharu Nishimura , Minoru Yoshii , Hiroyasu Nose , Koh Ishizuka
IPC分类号： G01B9/02 , G01D5/38 , G03F9/00
CPC分类号： G01D5/38 , G03F9/7049
摘要： A method and an apparatus for measuring a very small displacement of an object. The first and second beat signals are produced by light beams of different frequencies diffracted by a diffraction grating. The phase difference between the first and second beat signals is detected, thereby measuring the relative displacement of the diffraction grating.
摘要翻译：一种用于测量物体的非常小位移的方法和装置。第一和第二拍频信号由衍射光栅衍射的不同频率的光束产生。检测第一和第二拍动信号之间的相位差，从而测量衍射光栅的相对位移。

5. 发明授权

US5448356A Detecting device using a semiconductor light source emitting at least one laser beam in at least one predetermined direction 失效
标题翻译：使用在至少一个预定方向上发射至少一个激光束的半导体光源的检测装置
公开(公告)号：US5448356A
公开(公告)日：1995-09-05
申请号：US9731
申请日：1993-01-27
申请人： Minoru Yoshii , Hiroyasu Nose , Seiji Takeuchi
发明人： Minoru Yoshii , Hiroyasu Nose , Seiji Takeuchi
IPC分类号： G01B11/00 , G01D5/38 , H01L21/027 , H01L21/30 , G01B9/02
CPC分类号： G01D5/38
摘要： A device for detecting the displacement of an object is provided with a semiconductor laser having an active layer for emitting laser beams in two directions, mirrors for directing the laser beams toward a diffraction grating provided on the object, and a detector for receiving the interfering lights diffracted by the diffraction grating. The active layer of the semiconductor laser is arranged substantially parallel to the diffraction grating, to save space, also to enable light deflection such that the spreading direction of the light beams from the semiconductor laser coincides with the direction of pitch of the diffraction grating. The diffraction grating is irradiated with an improved efficiency, giving diffracted lights with higher intensity to the detector and improving the S/N ratio of detection. The space between the semiconductor laser and the object is reduced, thus reducing the entire volume of system.
摘要翻译：用于检测物体的位移的装置设置有半导体激光器，其具有用于在两个方向上发射激光束的有源层，用于将激光束引向设置在物体上的衍射光栅的反射镜，以及用于接收干扰光的检测器衍射光栅衍射。半导体激光器的有源层被布置成基本上平行于衍射光栅，以节省空间，同时也能使光偏转，使得来自半导体激光器的光束的扩展方向与衍射光栅的节距方向一致。以提高的效率照射衍射光栅，给予检测器更高强度的衍射光，并提高检测的S / N比。半导体激光器和物体之间的空间减小，从而减小系统的整体体积。

6. 发明授权

US5751426A Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object 失效
$Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object$
标题翻译：位置偏差测量装置和测量形成在同一物体上的多个衍射光栅之间的位置偏差的方法
公开(公告)号：US5751426A
公开(公告)日：1998-05-12
申请号：US460708
申请日：1995-06-02
申请人： Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Hiroshi Osawa , Koichi Sentoku , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Hiroshi Osawa , Koichi Sentoku , Toshihiko Tsuji , Takahiro Matsumoto
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object include an illumination optical system for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system for forming at least one interference light beam from the plurality of diffracted light beams, a detector for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.
摘要翻译：用于测量形成在同一物体上的多个衍射光栅之间的位置偏差的装置和方法包括用光束照射多个衍射光栅的照明光学系统，光学系统的照明产生多个衍射光束来自多个衍射光栅的干涉光学系统，用于形成来自多个衍射光束的至少一个干涉光束，用于检测至少一个干涉光束的检测器，检测结果作为测量的基础多个衍射光栅之间的位置偏差，以及用于测量照明光学系统和多个衍射光栅之间的相对位置关系的测量部分。

7. 发明授权

US5610718A Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes 失效
$Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes$
标题翻译：用于检测彼此靠近布置的第一和第二衍射光栅之间的相对位移的装置和方法，其中所述光栅具有不同的间距尺寸
公开(公告)号：US5610718A
公开(公告)日：1997-03-11
申请号：US297511
申请日：1994-08-29
申请人： Koichi Sentoku , Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh
发明人： Koichi Sentoku , Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A method and device for measuring the relative displacement between first and second diffraction gratings includes an interference optical system forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first detector for detecting the first interference ray of light to generate a first detection signal, a second detector for detecting the second interference ray of light to generate a second detection signal, and signal processing section for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.
摘要翻译：用于测量第一和第二衍射光栅之间的相对位移的方法和装置包括干涉光学系统，其形成从第一和第二衍射光栅衍射的光的第一和第二干涉光线，并且将第一和第二干涉光线分离在其偏振方向的差异的基础，用于检测第一干涉光线以产生第一检测信号的第一检测器，用于检测第二干涉光线以产生第二检测信号的第二检测器，以及信号处理部分用于检测第一和第二检测信号之间的相位差，并且用于基于相位差确定第一和第二衍射光栅之间的相对位移。

8. 发明授权

US5369486A Position detector for detecting the position of an object using a diffraction grating positioned at an angle 失效
$Position detector for detecting the position of an object using a diffraction grating positioned at an angle$
标题翻译：位置检测器，用于使用位于一定角度的衍射光栅来检测物体的位置
公开(公告)号：US5369486A
公开(公告)日：1994-11-29
申请号：US947383
申请日：1992-09-21
申请人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
发明人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object. The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.
摘要翻译：位置检测器包括设置在物体表面上的衍射光栅，用于照射衍射光栅的照明系统，用于检测衍射光栅衍射的衍射光的检测系统，以及用于检测与物体有关的位置信息的处理系统。照明系统发射由衍射光栅衍射并彼此干涉的第一对光束，并且发射由衍射光栅衍射并且彼此干涉的第二对光束。第一对光束沿着沿衍射光栅延伸的第一方向延伸的平面入射在衍射光栅上。第二对光束沿着沿衍射光栅延伸的第二方向延伸的平面入射在衍射光栅上。第一和第二方向与光栅线方向不同。检测系统检测干扰光并从其产生第一和第二拍拍信号。处理系统从第一拍子信号的相位状态和相对于第二拍摄信号的相位状态相对于第二方向检测关于第一方向的位置信息。

9. 发明授权

US5333050A Measuring method and apparatus for meausring the positional relationship of first and second gratings 失效
标题翻译：测量第一和第二光栅的位置关系的方法和装置
公开(公告)号：US5333050A
公开(公告)日：1994-07-26
申请号：US675277
申请日：1991-03-26
申请人： Noriyuki Nose , Kenji Saitoh , Koichi Sentoku , Minoru Yoshii
发明人： Noriyuki Nose , Kenji Saitoh , Koichi Sentoku , Minoru Yoshii
IPC分类号： G03F7/20 , G03F9/00 , G01B11/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： Disclosed is a method and apparatus for measuring a relative positional deviation between a first pattern and a second pattern, printed on an article such as a semiconductor wafer at different moments, the measurement being based on detection of interference of diffraction lights from at least one of the first and second printed patterns.
摘要翻译：公开了一种用于测量在不同时刻印刷在诸如半导体晶片的物品上的第一图案和第二图案之间的相对位置偏差的方法和装置，该测量是基于检测衍射光从至少一个第一和第二印刷图案。

10. 发明授权

US5519686A Encoder for controlling measurements in the range of a few angstroms 失效
标题翻译：用于控制几埃范围内测量的编码器
公开(公告)号：US5519686A
公开(公告)日：1996-05-21
申请号：US438079
申请日：1995-05-08
申请人： Yoshihiro Yanagisawa , Yuko Morikawa , Hiroshi Matsuda , Haruki Kawada , Kunihiro Sakai , Hisaaki Kawade , Ken Eguchi , Eigo Kawakami , Toshimitsu Kawasa , Minoru Yoshii , Kenji Saitoh , Akihiko Yamano , Hiroyasu Nose
发明人： Yoshihiro Yanagisawa , Yuko Morikawa , Hiroshi Matsuda , Haruki Kawada , Kunihiro Sakai , Hisaaki Kawade , Ken Eguchi , Eigo Kawakami , Toshimitsu Kawasa , Minoru Yoshii , Kenji Saitoh , Akihiko Yamano , Hiroyasu Nose
IPC分类号： G01B7/00 , G01D5/244 , G01D5/245 , G01Q10/00 , G01Q20/04 , G01Q60/00 , G01Q60/10 , G01Q70/06 , G11B9/00 , G11B7/00
CPC分类号： G01D5/244 , G01B7/003 , G01D5/2451 , G11B9/1418 , G11B9/1427 , G11B9/1481 , B82Y10/00 , G01Q10/06 , G01Q60/16 , G01Q80/00 , G11B9/1472 , Y10S977/851 , Y10S977/861 , Y10S977/947
摘要： An encoder includes an electrically conductive reference scale having surface steps formed at predetermined positions; an electrically conductive probe having a tip disposed opposed to the reference scale; wherein the reference scale and the probe are relatively movable in a direction different from the opposing direction of the tip of the probe and the reference scale; a portion for applying an electrical voltage to between the reference scale and the probe; a portion for detecting a change in a tunnel current between the reference scale and the probe, to between which the electric voltage is applied by the voltage applying portion at the time of the relative movement between the scale and the probe, the detecting portion detecting the change in the tunnel current when the probe passes a position opposed to a surface step of the reference scale; and portion for detecting the amount of the relative movement between the scale and probe, on the basis of the detection by the change detecting portion.
摘要翻译：编码器包括具有形成在预定位置处的表面台阶的导电参考标尺; 导电探针，其具有与参考标尺相对设置的尖端; 其中所述参考标尺和所述探针在与所述探针的尖端和所述参考标尺的相反方向不同的方向上相对移动; 用于将电压施加到参考标尺和探针之间的部分; 用于检测参考标尺和探针之间的隧道电流变化的部分，在标尺和探头之间的相对移动时由电压施加部施加电压，检测部分检测当探针经过与参考刻度的表面台阶相对的位置时隧道电流的变化; 以及用于根据变化检测部分的检测来检测标尺和探针之间的相对移动量的部分。

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