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    • 4. 发明授权
    • X-ray mask structure, process for production thereof, apparatus and
method for X-ray exposure with the X-ray mask structure, and
semiconductor device produced by the X-ray exposure method
    • X射线掩模结构,其制造方法,用X射线掩模结构X射线曝光的装置和方法以及通过X射线曝光方法制造的半导体器件
    • US5553110A
    • 1996-09-03
    • US345395
    • 1994-11-18
    • Koichi SentokuKenji SaitoKeiko ChibaHiroshi Maehara
    • Koichi SentokuKenji SaitoKeiko ChibaHiroshi Maehara
    • G03F7/20C30B33/00G03F1/22H01L21/027H01L21/302H01L21/3065H01L39/00
    • G03F1/22Y10S430/167Y10S430/168
    • An X-ray mask structure for X-ray lithography comprises a pattern, an X-ray transmissive film for holding the pattern, and a frame for supporting the X-ray transmissive film, wherein a light-scattering prevention film is formed on at least a part of the surface of the X-ray transmissive film and/or of the pattern, and the light scattering prevention film may be a flat coating film formed on at least one of the top face and the back face of the X-ray transmissive film and having a refractive index substantially equal to the refractive index of the X-ray transmissive film. A process for producing the X-ray mask structure comprises steps of forming a flat coating film having a refractive index substantially the same as that of the X-ray transmissive film on at least one of the top face and the back face of the X-ray transmissive film, and forming a pattern at least on the top face of the X-ray transmissive film. An X-ray exposure apparatus comprises an X-ray source, and the X-ray mask structure, and conducts transcription of the pattern formed on the x-ray mask structure onto a transcription-receiving member by projecting X-rays through the X-ray mask structure to the transcription receiving member.
    • 用于X射线光刻的X射线掩模结构包括图案,用于保持图案的X射线透射膜和用于支撑X射线透射膜的框架,其中至少形成光散射防止膜 X射线透过膜表面的一部分和/或图案的一部分,光散射防止膜可以是形成在X射线透射性的上表面和背面的至少一面上的平坦的涂膜 并且具有基本上等于X射线透射膜的折射率的折射率。 一种X射线掩模结构体的制造方法,其特征在于,在上述X射线掩模结构的上表面和背面的至少一面上,形成与X射线透过膜的折射率基本相同的折射率的平面涂膜, 并且至少在X射线透射膜的顶面上形成图案。 X射线曝光装置包括X射线源和X射线掩模结构,并且通过X射线X射线透过X射线掩模结构将X射线掩模结构上形成的图案转印到转录接收部件上, 射线掩模结构。
    • 7. 发明授权
    • Electronic apparatus
    • 电子仪器
    • US08564941B2
    • 2013-10-22
    • US12827088
    • 2010-06-30
    • Manabu WatabeKenji Saito
    • Manabu WatabeKenji Saito
    • H05K5/00H05K7/00G06F1/16
    • G06F1/1616
    • An electronic apparatus includes a keyboard unit, a first circuit board, and a first electronic component. The keyboard unit includes a plate that includes a front surface and a bottom surface facing each other and a first coupling portion protruding from the bottom surface, and a plurality of keys provided on the front surface side of the plate. The first circuit board is provided to face the bottom surface via the first coupling portion and includes a second coupling portion to be coupled with the first coupling portion and a first front surface as a surface on a side that faces the bottom surface. The first electronic component is mounted on the first front surface of the first circuit board.
    • 电子设备包括键盘单元,第一电路板和第一电子元件。 键盘单元包括:板,其包括彼此面对的前表面和底表面;以及从底表面突出的第一联接部分和设置在板的前表面侧上的多个键。 第一电路板经由第一联接部分设置为面对底面,并且包括与第一联接部分联接的第二联接部分和作为面向底面的一侧上的表面的第一前表面。 第一电子部件安装在第一电路板的第一前表面上。