专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130159944A1 FLARE MAP CALCULATING METHOD AND RECORDING MEDIUM 有权
标题翻译： FLARE MAP计算方法和记录介质
公开(公告)号：US20130159944A1
公开(公告)日：2013-06-20
申请号：US13615691
申请日：2012-09-14
申请人： Taiga UNO , Toshiya KOTANI , Satoshi TANAKA
发明人： Taiga UNO , Toshiya KOTANI , Satoshi TANAKA
IPC分类号： G06F17/50
CPC分类号： G03F7/70941 , G03F1/70
摘要： A flare map calculating method of an embodiment calculates an optical image intensity distribution in each division region set in a pattern region. Furthermore, an average value of the optical image intensity distribution is calculated in each division region. A pattern or plural patterns, which has a pattern density corresponding to the average value, is calculated as a corresponding density pattern in each division region. Furthermore, a density map, which represents a pattern density distribution within the pattern region, is generated based on the corresponding density pattern, and a flare map representing a flare intensity distribution within the pattern region is calculated by convolution integral of the density map and a point spread function.
摘要翻译：实施例的耀斑映射计算方法计算在图案区域中设置的每个划分区域中的光学图像强度分布。此外，在每个划分区域中计算出光学图像强度分布的平均值。在每个划分区域中计算具有对应于平均值的图案密度的图案或多个图案作为相应的浓度图案。此外，基于对应的浓度模式生成表示图案区域内的图案密度分布的密度图，并且通过密度图和a的卷积积分来计算表示图案区域内的耀斑强度分布的耀斑图点扩散功能。

2. 发明申请

US20120054695A1 Pattern Verification Method, Pattern Verification System, Mask Manufacturing Method and Semiconductor Device Manufacturing Method 审中-公开
标题翻译：模式验证方法，模式验证系统，掩模制造方法和半导体器件制造方法
公开(公告)号：US20120054695A1
公开(公告)日：2012-03-01
申请号：US13289630
申请日：2011-11-04
申请人： Kyoko IZUHA , Shigeki NOJIMA , Toshiya KOTANI , Satoshi TANAKA
发明人： Kyoko IZUHA , Shigeki NOJIMA , Toshiya KOTANI , Satoshi TANAKA
IPC分类号： G06F17/50
CPC分类号： G03F7/70441 , G03F1/36
摘要： A pattern verification method comprising preparing a desired pattern and a mask pattern forming the desired pattern on a substrate, defining at least one evaluation point on an edge of the desired pattern, defining at least one process parameter to compute the transferred/formed pattern, defining a reference value and a variable range for each of the process parameters, computing a positional displacement for each first points corresponding to the evaluation point, first points computed using correction mask pattern and a plurality of combinations of parameter values obtained by varying the process parameters within the variable range or within the respective variable ranges, the positional displacement being displacement between first point and the evaluation point, computing a statistics of the positional displacements for each of the evaluation points, and outputting information modifying the mask pattern according to the statistics.
摘要翻译：一种图案验证方法，包括在衬底上制备期望图案和形成期望图案的掩模图案，在期望图案的边缘上限定至少一个评估点，限定至少一个工艺参数以计算所转印/形成的图案，定义对于每个过程参数的参考值和可变范围，计算与评估点相对应的每个第一点的位置位移，使用校正掩模图案计算的第一点和通过改变其中的处理参数而获得的参数值的多个组合可变范围或在各个可变范围内，位置偏移是第一点和评估点之间的位移，计算每个评估点的位置偏移的统计，以及根据统计信息输出修改掩模图案的信息。

3. 发明申请

US20110029937A1 PATTERN EVALUATING METHOD, PATTERN GENERATING METHOD, AND COMPUTER PROGRAM PRODUCT 审中-公开
标题翻译：模式评估方法，图案生成方法和计算机程序产品
公开(公告)号：US20110029937A1
公开(公告)日：2011-02-03
申请号：US12836235
申请日：2010-07-14
申请人： Katsuyoshi KODERA , Satoshi TANAKA , Toshiya KOTANI , Shigeki NOJIMA , Soichi INOUE
发明人： Katsuyoshi KODERA , Satoshi TANAKA , Toshiya KOTANI , Shigeki NOJIMA , Soichi INOUE
IPC分类号： G06F17/50
CPC分类号： G03F7/70441
摘要： A pattern evaluating method includes generating a proximity pattern that affects a resolution performance of a circuit pattern around a lithography target pattern of the circuit pattern to be formed on the substrate, generating distribution information on a distribution of an influence degree to the resolution performance of the circuit pattern by using the lithography target pattern, calculating the influence degree to the resolution performance of the circuit pattern by the proximity pattern as a score by comparing the distribution information with the proximity pattern, and evaluating whether the proximity pattern is placed at an appropriate position in accordance with the circuit pattern based on the score.
摘要翻译：模式评估方法包括：生成接近图案，其影响围绕要形成在基板上的电路图案的光刻目标图案周围的电路图案的分辨率性能，产生关于影响程度分布的分布信息，通过使用光刻目标图案，通过将分布信息与接近图案进行比较，计算通过邻近图案作为分数的电路图案的分辨率性能的影响程度，以及评估接近图案是否位于适当位置根据电路图案的分数。

4. 发明申请

US20110065028A1 PATTERN GENERATING METHOD, MANUFACTURING METHOD OF MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE 审中-公开
标题翻译：图案生成方法，掩模制造方法和半导体器件的制造方法
公开(公告)号：US20110065028A1
公开(公告)日：2011-03-17
申请号：US12874756
申请日：2010-09-02
申请人： Katsuyoshi KODERA , Satoshi TANAKA , Toshiya KOTANI , Soichi INOUE
发明人： Katsuyoshi KODERA , Satoshi TANAKA , Toshiya KOTANI , Soichi INOUE
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/36
摘要： According to the embodiments, each of a main pattern of a mask to be transferred onto a substrate by using a lithography process, a first assist pattern that improves a resolution of an on-substrate pattern obtained by transferring the main pattern onto the substrate, and a second assist pattern that suppresses a transfer property of the first assist pattern onto the substrate is placed as a mask pattern.
摘要翻译：根据实施例，通过使用光刻工艺将要转印到基板上的掩模的主图案，提高通过将主图案转印到基板上而获得的基板上图案的分辨率的第一辅助图案，以及将第一辅助图案的转印特性抑制在基板上的第二辅助图案作为掩模图案。

5. 发明申请

US20080301621A1 MASK PATTERN CORRECTING METHOD 有权
标题翻译：掩模图校正方法
公开(公告)号：US20080301621A1
公开(公告)日：2008-12-04
申请号：US12129167
申请日：2008-05-29
申请人： Kazuya FUKUHARA , Tatsuhiko HIGASHIKI , Toshiya KOTANI , Satoshi TANAKA , Takashi SATO , Akiko MIMOTOGI , Masaki SATAKE
发明人： Kazuya FUKUHARA , Tatsuhiko HIGASHIKI , Toshiya KOTANI , Satoshi TANAKA , Takashi SATO , Akiko MIMOTOGI , Masaki SATAKE
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： In a model-based OPC which makes a suitable mask correction for each mask pattern using an optical image intensity simulator, a mask pattern is divided into subregions and the model of optical image intensity simulation is changed according to the contents of the pattern in each subregion. When the minimum dimensions of the mask pattern are smaller than a specific threshold value set near the exposure wavelength, the region is calculated using a high-accuracy model and the other regions are calculated using a high-speed model.
摘要翻译：在基于模型的OPC中，使用光学图像强度模拟器对每个掩模图案进行适当的掩模校正，将掩模图案划分为子区域，并且根据每个子区域中的图案的内容来改变光学图像强度模拟模型。当掩模图案的最小尺寸小于在曝光波长附近设置的特定阈值时，使用高精度模型计算该区域，并且使用高速模型计算其它区域。

6. 发明申请

US20130251388A1 IMAGE FORMING APPARATUS AND NON-TRANSITORY COMPUTER READABLE MEDIUM 有权
标题翻译：图像形成装置和非计算机可读介质
公开(公告)号：US20130251388A1
公开(公告)日：2013-09-26
申请号：US13549096
申请日：2012-07-13
申请人： Satoshi TANAKA
发明人： Satoshi TANAKA
IPC分类号： G03G15/00
CPC分类号： G03G15/0189 , G03G15/5058
摘要： An image forming apparatus includes a preliminary toner image forming unit, a detecting unit, an adjusting unit, an obtaining unit, an activation grasping unit, a determining unit, and a preparation unit. The preliminary toner image forming unit causes an inactive image forming unit to form a preliminary toner image and causes the preliminary toner image to be transferred onto a transfer body. The detecting unit detects the preliminary toner image. The adjusting unit adjusts quality of a toner image. The obtaining unit obtains information regarding an image to be output. The activation grasping unit grasps an estimated activation timing. The determining unit determines whether a time period until the estimated activation timing has become equal to an image quality adjustment period. The preparation unit causes the preliminary toner image forming unit to transfer the preliminary toner image and causes the adjusting unit to adjust the quality of the toner image.
摘要翻译：图像形成装置包括初步调色剂图像形成单元，检测单元，调节单元，获取单元，启动抓取单元，确定单元和准备单元。初步调色剂图像形成单元使无效图像形成单元形成初步调色剂图像，并使初步调色剂图像转印到转印体上。检测单元检测初步调色剂图像。调节单元调节调色剂图像的质量。获取单元获得关于要输出的图像的信息。激活握持单元抓住估计的启动时序。确定单元确定直到估计的激活定时已经变成等于图像质量调整周期的时间段。准备单元使初步调色剂图像形成单元传送预调色剂图像，并使调节单元调节调色剂图像的质量。

7. 发明申请

US20130214603A1 ELECTRONIC DEVICE, IMAGE PROCESSING APPARATUS, AND DEVICE CONTROL METHOD 有权
标题翻译：电子设备，图像处理设备和设备控制方法
公开(公告)号：US20130214603A1
公开(公告)日：2013-08-22
申请号：US13755375
申请日：2013-01-31
申请人： Satoshi TANAKA
发明人： Satoshi TANAKA
IPC分类号： H02J9/04
CPC分类号： H02J9/04 , H02J9/061 , Y10T307/625
摘要： An electronic device includes a detecting unit configured to detect cut-off of a main power supply; a power storage unit configured to store power; a sensing unit configured to sense an amount of remaining power of the power storage unit; a determining unit configured to determine whether a functional operation designated by a user is completed with the amount of remaining power sensed by the sensing unit in a cut-off condition of the main power supply detected by the detecting unit; and an operation control unit configured to control execution of the functional operation in the cut-off condition when the determining unit determines that the functional operation is completed with the amount of remaining power.
摘要翻译：电子设备包括：检测单元，被配置为检测主电源的截止; 配置为存储电力的蓄电单元; 感测单元，被配置为感测所述蓄电单元的剩余电力的量; 确定单元，被配置为确定由所述检测单元检测到的所述主电源的切断状态中由所述感测单元感测到的剩余功率的量是否完成了用户指定的功能操作; 以及操作控制单元，被配置为当所述确定单元确定所述功能操作以剩余功率量完成时，控制所述切断状态下的功能操作的执行。

8. 发明申请

US20130164010A1 CONTROL APPARATUS AND METHOD, IMAGE FORMING APPARATUS AND SYSTEM, AND NON-TRANSITORY COMPUTER READABLE MEDIUM 有权
标题翻译：控制装置和方法，图像形成装置和系统以及非终端计算机可读介质
公开(公告)号：US20130164010A1
公开(公告)日：2013-06-27
申请号：US13478643
申请日：2012-05-23
申请人： Satoshi TANAKA
发明人： Satoshi TANAKA
IPC分类号： G03G15/16
CPC分类号： G03G15/0189 , G03G15/1675 , G03G2215/0129
摘要： A control apparatus includes the following elements. A page specifying unit specifies, concerning image data representing images included in plural pages, among the plural pages, plural pages including images each having a similarity which is equal to or greater than a predetermined threshold. A controller controls a transfer bias to be applied to a transfer device which transfers a toner image formed on an image carrier onto a medium. The controller performs control, for the plural pages specified by the page specifying unit, such that each of values of the transfer bias to be applied to the transfer device when toner images corresponding to the plural pages specified by the page specifying unit are transferred onto the medium is within a predetermined range.
摘要翻译：控制装置包括以下元件。页面指定单元指定关于多个页面中包含的图像数据的图像数据，多个页面包括各自具有等于或大于预定阈值的相似度的图像。控制器控制将转印偏压施加到将形成在图像载体上的调色剂图像转印到介质上的转印装置。控制器对由页面指定单元指定的多个页面进行控制，使得当与由页面指定单元指定的多个页面相对应的调色剂图像被转印到传送设备上时，将要应用于传送设备的传送偏压的每个值介质在预定范围内。

9. 发明申请

US20110260796A1 BIAS CIRCUIT, POWER AMPLIFIER, AND CURRENT MIRROR CIRCUIT 有权
标题翻译：偏置电路，功率放大器和电流反射器电路
公开(公告)号：US20110260796A1
公开(公告)日：2011-10-27
申请号：US13089454
申请日：2011-04-19
申请人： Satoshi TANAKA , Fuminori MORISAWA , Makoto TABEI
发明人： Satoshi TANAKA , Fuminori MORISAWA , Makoto TABEI
IPC分类号： H03F3/04
CPC分类号： H03F1/301 , G05F3/262 , H03F3/193 , H03F2200/18
摘要： There is provided a bias circuit that can operate even at low voltage and control a current reflecting a change in drain voltage. A first current mirror circuit for feeding back a drain terminal current of an FET which receives an output of an operational amplifier at a gate terminal to an input terminal of the operational amplifier and a second current mirror circuit are coupled in parallel. A variable voltage is coupled to the first current mirror circuit, and a fixed voltage is coupled to the second current mirror circuit. Even if the variable voltage becomes lower than the threshold voltage of FETs configuring the first current mirror circuit, the second current mirror circuit feeds back the current to the input terminal of the operational amplifier with reliability.
摘要翻译：提供了即使在低电压下也能够工作并且控制反映漏极电压变化的电流的偏置电路。用于将接收栅极端的运算放大器的输出的FET的漏极端子电流反馈到运算放大器的输入端的第一电流镜电路和第二电流镜电路并联。可变电压耦合到第一电流镜电路，并且固定电压耦合到第二电流镜电路。即使可变电压变得低于构成第一电流镜电路的FET的阈值电压，第二电流镜电路可靠地将电流反馈到运算放大器的输入端。

10. 发明申请

US20090293038A1 METHOD AND CORRECTION APPARATUS FOR CORRECTING PROCESS PROXIMITY EFFECT AND COMPUTER PROGRAM PRODUCT 审中-公开
标题翻译：校正过程逼近效应和计算机程序产品的方法和校正装置
公开(公告)号：US20090293038A1
公开(公告)日：2009-11-26
申请号：US12470334
申请日：2009-05-21
申请人： Shimon MAEDA , Suigen KYOH , Satoshi TANAKA
发明人： Shimon MAEDA , Suigen KYOH , Satoshi TANAKA
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A process proximity effect (PPE) correction method includes providing corrected cells arranged in a place/route arrangement, the corrected cells being obtained by correcting design data of a semiconductor device based on correction value for correcting PPE correction, determining whether a cell arrangement of the corrected cells is registered or not based on environmental profiles, conducting lithography verification if the corrected cells includes the cell arrangement not registered in the environmental profiles, the verification being performed on the corrected cells, wherein the corrected cell to be conducted the verification corresponds to the cell arrangement not registered, determining whether error is found or not in the verification, correcting the corrected cell to which the verification is conducted if the error is found and registering the cell arrangement in the environmental profiles, and registering the cell arrangement of the corrected cell if the error is not found.
摘要翻译：过程接近效应（PPE）校正方法包括提供以位置/路线布置布置的校正单元，校正单元是通过基于用于校正PPE校正的校正值校正半导体器件的设计数据而获得的，校正单元是否基于环境简档进行登记，如果校正单元包括没有注册在环境简档中的单元布置，则对校正单元执行验证，其中要进行验证的校正单元对应于单元布置未注册，确定验证中是否存在错误，如果发现错误，则校正进行验证的修正单元，并将该单元布置注册到环境配置文件中，以及登记修正单元的单元布置如果没有找到错误。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式