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1. 发明申请

US20050133717A1 Method for manufacturing a split probe 失效
标题翻译：分离探针的制造方法
公开(公告)号：US20050133717A1
公开(公告)日：2005-06-23
申请号：US10822994
申请日：2004-04-13
申请人： Shoji Sadayama , Yoshiharu Shirakawabe , Kazutaka Takahashi
发明人： Shoji Sadayama , Yoshiharu Shirakawabe , Kazutaka Takahashi
IPC分类号： G01B15/00 , B25B9/02 , B82B3/00 , G01N23/00 , G01Q30/04 , G01Q60/16 , G01Q60/38 , G01Q60/40 , G01Q70/00 , G01Q70/10 , G01Q70/16
CPC分类号： G01Q20/04 , G01Q70/10
摘要： In order to provide a simple method for manufacturing a more finely detailed split probe with less damage being incurred, by tilting the whole of the microcantilever 6, it is possible to easily determine the center of the probe tip and decide processing position. Channel processing 1 and 2 is carried out using a small focused ion beam current over an extremely narrow range of the processing position. A channel 3 spanning a broad range connected to the channels 1 and 2 is processed using a focused ion beam current larger than the aforementioned focused ion beam current used at the channel processing of the channels 1 and 2, and the electrodes are cut.
摘要翻译：为了提供一种用于制造具有较少损伤的更精细的分割探针的简单方法，通过使整个微型悬臂梁6倾斜，可以容易地确定探针尖端的中心并确定加工位置。在处理位置的极窄范围内使用小的聚焦离子束电流进行通道处理1和2。使用大于在通道1和2的通道处理中使用的上述聚焦离子束电流的聚焦离子束电流来处理跨越与通道1和2连接的宽范围的通道3，并且切断电极。

2. 发明授权

US07494575B2 Method for manufacturing a split probe 失效
标题翻译：分离探针的制造方法
公开(公告)号：US07494575B2
公开(公告)日：2009-02-24
申请号：US10822994
申请日：2004-04-13
申请人： Shoji Sadayama , Yoshiharu Shirakawabe , Kazutaka Takahashi
发明人： Shoji Sadayama , Yoshiharu Shirakawabe , Kazutaka Takahashi
IPC分类号： C23C14/34 , C23F1/00
CPC分类号： G01Q20/04 , G01Q70/10
摘要： A method of manufacturing a split probe tip on a cantilever comprises providing a cantilever having a surface on which is formed a probe that projects outwardly from the surface at one end of the cantilever, irradiating and scanning a tip of the probe with a focused particle beam directed in a direction that is inclined relative to the surface of the cantilever to obtain an image of the probe tip, and determining the center of the probe tip from the image of the probe tip. Then a first channel is formed in the probe tip at the center thereof by irradiating and scanning the center of the probe tip with a focused particle beam to form a split probe tip having two spaced-apart probe tip parts. The forming step comprises using the focused particle beam to form a first channel section that extends radially inwardly from a periphery of the probe tip, and then using the focused particle beam to form a second channel section that extends radially inwardly from the periphery of the probe tip at a location opposite the first channel section and that connects to the first channel section to define therewith the first channel.
摘要翻译：在悬臂上制造分割探针尖端的方法包括提供具有表面的悬臂，其上形成有从悬臂的一端从表面向外突出的探针，用聚焦粒子束照射和扫描探针的尖端指向相对于悬臂的表面倾斜的方向以获得探针尖端的图像，并且从探针尖端的图像确定探针尖端的中心。然后，通过用聚焦粒子束照射和扫描探针尖端的中心，在探针尖端的中央形成第一通道，以形成具有两个间隔开的探针尖端部分的分离探针尖端。成形步骤包括使用聚焦的粒子束形成从探针尖端的周边径向向内延伸的第一通道部分，然后使用聚焦的粒子束形成从探针的周边径向向内延伸的第二通道部分尖端在与第一通道部分相对的位置处并且连接到第一通道部分以与第一通道部分限定第一通道。

3. 发明授权

US07823470B2 Cantilever and cantilever manufacturing method 有权
标题翻译：悬臂和悬臂制造方法
公开(公告)号：US07823470B2
公开(公告)日：2010-11-02
申请号：US11709495
申请日：2007-02-22
申请人： Masatsugu Shigeno , Osamu Matsuzawa , Naoya Watanabe , Amiko Nihei , Akira Inoue , Yoshiharu Shirakawabe , Hiroshi Muramatsu , Yuji Yamamoto
发明人： Masatsugu Shigeno , Osamu Matsuzawa , Naoya Watanabe , Amiko Nihei , Akira Inoue , Yoshiharu Shirakawabe , Hiroshi Muramatsu , Yuji Yamamoto
IPC分类号： G01Q70/00 , G01Q70/10 , G01B21/30
CPC分类号： G01R1/06738 , B33Y80/00 , G01Q70/10 , G01Q70/16 , G01R1/06727 , G01R1/07342 , G01R3/00 , Y10T29/49007
摘要： A cantilever includes: a lever portion; a holder portion supporting the proximal end of the lever portion; a probe portion arranged at the distal end of the lever portion and having a spherical surface to face a sample; and a retaining portion fixed to the distal end of the lever portion and retaining the probe portion to surround a periphery of the probe portion. There is provided a cantilever allowing mounting of a probe portion with little effect in a short time without using any adhesive.
摘要翻译：悬臂包括：杠杆部分; 支撑杆部的近端的保持部; 探针部分，布置在所述杆部分的远端并且具有面对样品的球形表面; 以及保持部，其固定到所述杆部的前端部，并且保持所述探针部包围所述探针部的周边。提供了一种悬臂，允许在短时间内几乎没有使用任何粘合剂的情况下安装探针部分。

4. 发明授权

US06932504B2 Heated self-detecting type cantilever for atomic force microscope 有权
标题翻译：原子力显微镜加热自检型悬臂
公开(公告)号：US06932504B2
公开(公告)日：2005-08-23
申请号：US10395683
申请日：2003-03-24
申请人： Hiroshi Takahashi , Yoshiharu Shirakawabe , Tadashi Arai
发明人： Hiroshi Takahashi , Yoshiharu Shirakawabe , Tadashi Arai
IPC分类号： G01K7/02 , G01B7/16 , G01K1/18 , G01Q60/00 , G01Q60/36 , G01Q60/38 , G01B7/28
CPC分类号： G01Q60/58 , G01K1/18 , G01Q20/04 , Y10S977/867
摘要： A self-detecting type cantilever for an atomic force microscope (AFM) has an electro-flexural conversion element for converting a flexural amount of the cantilever into an electric current or voltage, a temperature measurement element disposed at a front end portion of the cantilever for measuring a temperature, and a heating element disposed at the front end portion of the cantilever for heating the temperature measurement element. The temperature measurement element and the heating element are superposed with each other on a main face of the cantilever via an electrical insulating layer. As a result, even if the amount of electric energy supplied to the heating element is reduced, it is possible to effectively supply an amount of heat necessary for measurement to the temperature measurement element. Therefore, by minimizing the heat to be supplied to a sample and the cantilever, the respondency of measurement is improved and temperature measurement can be performed with a high degree of accuracy.
摘要翻译：用于原子力显微镜（AFM）的自检型悬臂具有用于将悬臂的弯曲量转换为电流或电压的电 - 弯曲转换元件，设置在悬臂的前端部的温度测量元件，测量温度，以及设置在悬臂前端部分的加热元件，用于加热温度测量元件。温度测量元件和加热元件经由电绝缘层彼此重叠在悬臂的主面上。结果，即使供给到加热元件的电能量减少，也可以有效地向测量元件供给测量所需的热量。因此，通过将供给到样品和悬臂的热量最小化，可以提高测量的响应度，并且可以以高精度进行温度测量。

5. 发明授权

US06388252B1 Self-detecting type of SPM probe and SPM device 有权
标题翻译：自检型SPM探头和SPM装置
公开(公告)号：US06388252B1
公开(公告)日：2002-05-14
申请号：US09197584
申请日：1998-11-19
申请人： Hiroshi Takahashi , Yoshiharu Shirakawabe , Nobuhiro Shimizu , Michel Despont
发明人： Hiroshi Takahashi , Yoshiharu Shirakawabe , Nobuhiro Shimizu , Michel Despont
IPC分类号： G01N2300
CPC分类号： G01Q60/38 , G01Q20/04 , G01Q70/06 , Y10S977/873
摘要： A self-detecting type of SPM probe can eliminate influences of a leak current between piezo-resistors each other, between another piezo-resistors opposite to each other, or between the piezo-resistor and the other one, or of a carrier generated by irradiation of light thereto over the piezo-resistors by forming impurity diffusion layers each consisting of a conductive type (n− well regions) reverse to a conductive type of a semiconductor substrate (p-type silicon substrate) on each interface between each of the piezo-resistors and the semiconductor substrate respectively to insulate the elements from one another.
摘要翻译： SPM探头的自检型可以消除压电电阻之间，彼此相对的另一个压电电阻之间或压敏电阻与另一压电电阻之间的泄漏电流的影响，或消除由辐射产生的载体通过在每个压电元件之间的每个界面上形成杂质扩散层，每个杂质扩散层由与导电类型的半导体衬底（p型硅衬底）的导电类型相反的导电类型（n-阱区）构成，电阻器和半导体衬底，以使元件彼此绝缘。

6. 发明授权

US06211540B1 Semiconductor strain sensor and scanning probe microscope using the semiconductor strain sensor 有权
标题翻译：半导体应变传感器和扫描探针显微镜使用半导体应变传感器
公开(公告)号：US06211540B1
公开(公告)日：2001-04-03
申请号：US09173035
申请日：1998-10-15
申请人： Hiroshi Takahashi , Nobuhiro Shimizu , Yoshiharu Shirakawabe , Susumu Ichihara , Michel Despont
发明人： Hiroshi Takahashi , Nobuhiro Shimizu , Yoshiharu Shirakawabe , Susumu Ichihara , Michel Despont
IPC分类号： H01L2982
CPC分类号： G01Q20/04 , G01Q70/16 , Y10S977/873
摘要： A semiconductor strain sensor comprises a semiconductor cantilever probe having a free end and a surface portion for undergoing deformation due to a displacement of the free end. A Schottky junction is disposed on the surface portion of the semiconductor cantilever probe and is positioned to undergo a change in electrical characteristic in response to the deformation of the surface portion. The amount of displacement of the free end of the cantilever probe is detected on the basis of a change in the electrical characteristic of the Schottky junction.
摘要翻译：半导体应变传感器包括具有自由端的半导体悬臂探针和由于自由端位移而发生变形的表面部分。肖特基结设置在半导体悬臂探针的表面部分上并且被定位成响应于表面部分的变形而经历电特性的变化。基于肖特基结的电特性的变化来检测悬臂探头的自由端的位移量。

7. 发明申请

US20060011467A1 Method of manufacturing the multi-tip probe, a multi-tip probe, and surface characteristic analysis apparatus 审中-公开
标题翻译：多尖头探针的制造方法，多头探针，表面特性分析装置
公开(公告)号：US20060011467A1
公开(公告)日：2006-01-19
申请号：US11230901
申请日：2005-09-20
申请人： Yoshiharu Shirakawabe , Hiroshi Takahashi , Tadashi Arai
发明人： Yoshiharu Shirakawabe , Hiroshi Takahashi , Tadashi Arai
IPC分类号： C23C14/00 , C23C14/32
CPC分类号： G01Q70/16 , G01N23/00 , G01N23/225 , G01Q70/06 , G01Q70/12 , G01R3/00 , Y10T29/49007
摘要： In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function for enabling positioning to be performed in such a manner that there is no influence on measurement in electrical measurements at an extremely small region using this microscopic multi-tip probe, and there are provided the steps of making a cantilever 1 formed with a plurality of electrodes 3 using lithographic techniques, and forming microscopic electrodes 6 minute in pitch by sputtering or gas-assisted etching a distal end of the cantilever 1 using a focused charged particle beam or using CVD.
摘要翻译：为了建立能够制造具有亚微米间隔的多尖端探针并提供这种微观多尖头探针的加工技术，提供了一种用于半导体器件等的最外表面分析装置，其具有使得能够进行定位的功能使用这种显微多头探针在极小区域的电测量中对测量没有影响，并且提供了使用光刻技术制造形成有多个电极3的悬臂1的步骤，以及通过溅射或使用聚焦的带电粒子束或使用CVD气化辅助蚀刻悬臂1的远端来形成6分钟的间距的微观电极。

8. 发明授权

US06953519B2 Method of manufacturing the multi-tip probe, a multi-tip probe, and surface characteristic analysis apparatus 有权
标题翻译：多尖头探针的制造方法，多头探针，表面特性分析装置
公开(公告)号：US06953519B2
公开(公告)日：2005-10-11
申请号：US10651526
申请日：2003-08-29
申请人： Yoshiharu Shirakawabe , Hiroshi Takahashi , Tadashi Arai
发明人： Yoshiharu Shirakawabe , Hiroshi Takahashi , Tadashi Arai
IPC分类号： G01Q10/04 , G01Q20/04 , G01Q60/10 , G01Q60/16 , G01Q60/24 , G01Q60/32 , G01Q60/38 , G01Q70/06 , G01R1/073 , G01R3/00 , H01L21/66 , C23C14/32 , C23F1/00
CPC分类号： G01Q70/16 , G01N23/00 , G01N23/225 , G01Q70/06 , G01Q70/12 , G01R3/00 , Y10T29/49007
摘要： In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function for enabling positioning to be performed in such a manner that there is no influence on measurement in electrical measurements at an extremely small region using this microscopic multi-tip probe, and there are provided the steps of making a cantilever 1 formed with a plurality of electrodes 3 using lithographic techniques, and forming microscopic electrodes 6 minute in pitch by sputtering or gas-assisted etching a distal end of the cantilever 1 using a focused charged particle beam or using CVD.
摘要翻译：为了建立能够制造具有亚微米间隔的多尖端探针并提供这种微观多尖头探针的加工技术，提供了一种用于半导体器件等的最外表面分析装置，其具有使得能够进行定位的功能使用这种显微多头探针在极小区域的电测量中对测量没有影响，并且提供了使用光刻技术制造形成有多个电极3的悬臂1的步骤，以及通过溅射或使用聚焦的带电粒子束或使用CVD气化辅助蚀刻悬臂1的远端来形成6分钟的间距的微观电极。

9. 发明授权

US06664540B2 Microprobe and sample surface measuring apparatus 有权
标题翻译：微探针和样品表面测量仪
公开(公告)号：US06664540B2
公开(公告)日：2003-12-16
申请号：US09778459
申请日：2001-02-07
申请人： Nobuhiro Shimizu , Yoshiharu Shirakawabe , Hiroshi Takahashi , Chiaki Yasumuro
发明人： Nobuhiro Shimizu , Yoshiharu Shirakawabe , Hiroshi Takahashi , Chiaki Yasumuro
IPC分类号： G01N2300
CPC分类号： G01Q10/045 , G01N23/046 , G01N2223/419 , G01Q20/04 , G01Q60/38 , Y10S977/873
摘要： A microprobe has a cantilever having a first lever portion having a free end portion, a second lever portion having a front end portion from which the first lever portion projects, and a support portion for supporting the second lever portion. A piezoresistive element is disposed on the second lever portion for bending the second lever portion.
摘要翻译：微探针具有悬臂，其具有具有自由端部的第一杆部分，具有第一杆部分突出的前端部的第二杆部分和用于支撑第二杆部分的支撑部分。压阻元件设置在第二杆部分上，用于弯曲第二杆部分。

10. 发明授权

US06171437B2 Semiconductor manufacturing device 失效
标题翻译：半导体制造装置
公开(公告)号：US06171437B2
公开(公告)日：2001-01-09
申请号：US09197585
申请日：1998-11-23
申请人： Nobuhiro Shimizu , Akira Inoue , Yoshiharu Shirakawabe
发明人： Nobuhiro Shimizu , Akira Inoue , Yoshiharu Shirakawabe
IPC分类号： H05H100
CPC分类号： H01L21/67126 , H01L21/67086 , H01L21/68721
摘要： A semiconductor manufacturing device comprises a holder having sealing members and supporting a semiconductor substrate so that an open space is formed above the semiconductor substrate and a sealed space is formed below the semiconductor substrate. The semiconductor substrate has a first main surface exposed to the open space and a second main surface exposed to the sealed space. When the holder is immersed in an etching solution, the first main surface of the semiconductor substrate is exposed to the etching solution and subjected to wet etching while the etching solution does not flow into the sealed space.
摘要翻译：半导体制造装置包括具有密封构件并支撑半导体衬底的保持器，使得在半导体衬底上方形成开放空间，并且在半导体衬底之下形成密封空间。半导体衬底具有暴露于开放空间的第一主表面和暴露于密封空间的第二主表面。当保持器浸入蚀刻溶液中时，半导体衬底的第一主表面暴露于蚀刻溶液中，并且在蚀刻溶液不流入密封空间的过程中进行湿蚀刻。

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