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1. 发明申请

US20060163223A1 Methods and apparatus for truncating an image formed with coherent radiation 有权
标题翻译：用于截断用相干辐射形成的图像的方法和装置
公开(公告)号：US20060163223A1
公开(公告)日：2006-07-27
申请号：US11040739
申请日：2005-01-21
申请人： Shiyu Zhang , Igor Landau , Arnold Lungershausen , David Markle , Casey Donaher
发明人： Shiyu Zhang , Igor Landau , Arnold Lungershausen , David Markle , Casey Donaher
IPC分类号： B23K26/06
CPC分类号： B23K26/0738 , B23K26/066 , B23K26/082 , B23K2101/40
摘要： Methods and apparatus for truncating an image formed with coherent radiation. The optical relay system is adapted to form a line image at the image plane. The image is truncated by a variable aperture at or near the aperture plane conjugate to the image plane, to block progressively increasing portions of an incident coherent radiation beam used to form the line image. An apodizing pupil filter having a maximum transmission or reflection in the center and a transmission or reflection profile that varies with direction corresponding to long direction of the line image is provided in the pupil plane. The apodization is designed to prevent hot-spots from forming in the truncated image and ensures a relatively smooth, flat intensity profile. Thus, one end or another of a coherent line image scanned over a substrate can be truncated during scanning without substantially changing the image intensity extending into the product area.
摘要翻译：用于截断用相干辐射形成的图像的方法和装置。光学继电器系统适于在图像平面处形成线图像。图像被与图像平面共轭的孔径平面处或附近的可变孔截断，以阻止逐渐增加用于形成线图像的入射相干辐射束的部分。在瞳孔平面中设置有在中心具有最大透射或反射的变迹瞳孔滤光器以及与线图像的长方向相对应的方向变化的透射或反射图。该变迹被设计成防止在截断图像中形成热点并确保相对光滑，平坦的强度分布。因此，在扫描期间扫描的相干线图像的一端或另一端可以在扫描期间被截断，而基本上不改变延伸到产品区域中的图像强度。

2. 发明申请

US20060113290A1 Heated chuck for laser thermal processing 有权
标题翻译：加热卡盘用于激光热处理
公开(公告)号：US20060113290A1
公开(公告)日：2006-06-01
申请号：US11001954
申请日：2004-12-01
申请人： Iqbal Shareef , Igor Landau , David Markle , Somit Talwar , Michael Thompson , Ivelin Angelov , Senquan Zhou
发明人： Iqbal Shareef , Igor Landau , David Markle , Somit Talwar , Michael Thompson , Ivelin Angelov , Senquan Zhou
IPC分类号： B23K26/00 , B23K26/02
CPC分类号： B23K26/703
摘要： A chuck for supporting a wafer and maintaining a constant background temperature across the wafer during laser thermal processing (LTP) is disclosed. The chuck includes a heat sink and a thermal mass in the form of a heater module. The heater module is in thermal communication with the heat sink, but is physically separated therefrom by a thermal insulator layer. The thermal insulator maintains a substantially constant power loss at least equal to the maximum power delivered by the laser, less that lost by radiation and convection. A top plate is arranged atop the heater module, supports the wafer to be processed, and provides a contamination barrier. The heater module is coupled to a power supply that is adapted to provide varying amounts of power to the heater module to maintain the heater module at the constant background temperature even when the wafer experiences a spatially and temporally varying heat load from an LTP laser beam. Thus, heat from the laser is transferred from the wafer to the heat sink via the heater module and the insulator layer. In the absence of any laser heating, heat is also transferred from the heater module to the wafer as needed to maintain the constant background temperature.
摘要翻译：公开了一种用于在激光热处理（LTP）期间支撑晶片并在晶片上保持恒定的背景温度的卡盘。卡盘包括散热器和加热器模块形式的热质量。加热器模块与散热器热连通，但是通过绝热层在物理上与其分离。热绝缘体保持至少等于由激光器传递的最大功率的基本恒定的功率损耗，而不是由辐射和对流损失。顶板布置在加热器模块的顶部，支撑要处理的晶片，并提供污染屏障。加热器模块耦合到电源，其适于向加热器模块提供变化量的功率，以将加热器模块保持在恒定的背景温度，即使当晶片经历来自LTP激光束的空间上和时间上变化的热负载时。因此，来自激光器的热量通过加热器模块和绝缘体层从晶片传递到散热器。在没有激光加热的情况下，根据需要也从加热器模块转移到晶片以保持恒定的背景温度。

3. 发明申请

US20070004232A1 Laser thermal processing chuck with a thermal compensating heater module 有权
标题翻译：激光热处理卡盘配有热补偿加热器模块
公开(公告)号：US20070004232A1
公开(公告)日：2007-01-04
申请号：US11002043
申请日：2004-12-01
申请人： Iqbal Shareef , Igor Landau , David Markle , Somit Talwar , Michael Thompson , Ivelin Angelov , Senquan Zhou
发明人： Iqbal Shareef , Igor Landau , David Markle , Somit Talwar , Michael Thompson , Ivelin Angelov , Senquan Zhou
IPC分类号： C23C16/00
CPC分类号： H01L21/67109 , B23K26/10 , B23K26/702 , B23K26/703 , H01L2924/0002 , H01L2924/00
摘要： Chuck methods and apparatus for supporting a semiconductor substrate and maintaining it at a substantially constant background temperature even when subject to a spatially and temporally varying thermal load. Chuck includes a thermal compensating heater module having a sealed chamber containing heater elements, a wick, and an alkali metal liquid/vapor. The chamber employs heat pipe principles to equalize temperature differences in the module. The spatially varying thermal load is quickly made uniform by thermal conductivity of the heater module. Heatsinking a constant amount of heat from the bottom of the heater module accommodates large temporal variations in the thermal heat load. Constant heat loss is preferably made to be at least as large as the maximum variation in the input heat load, less heat lost through radiation and convection, thus requiring a heat input through electrical heating elements. This allows for temperature control of the chuck, and hence the substrate.
摘要翻译：用于支撑半导体衬底并将其保持在基本上恒定的背景温度的Chuck方法和装置，即使在经受空间和时间变化的热负载时。卡盘包括一个热补偿加热器模块，其具有包含加热元件，芯和碱金属液体/蒸气的密封腔。该室采用热管原理来均衡模块中的温差。空间变化的热负荷通过加热器模块的热导率快速地均匀。从加热器模块的底部散热恒定的热量可以适应热负荷的大的时间变化。恒定的热损失优选地至少与输入热负荷的最大变化一样大，通过辐射和对流损失的热量较少，因此需要通过电加热元件的热输入。这允许卡盘的温度控制，从而允许基板的温度控制。

4. 发明申请

US20070051708A1 Laser scanning apparatus and methods for thermal processing 有权
标题翻译：激光扫描装置及热处理方法
公开(公告)号：US20070051708A1
公开(公告)日：2007-03-08
申请号：US11592770
申请日：2006-11-03
申请人： Somit Talwar , David Markle
发明人： Somit Talwar , David Markle
IPC分类号： B23K26/06
CPC分类号： B23K26/0604 , B23K26/032 , B23K26/04 , B23K26/043 , B23K26/0643 , B23K26/0738 , B23K26/08 , B23K26/082 , B23K2101/40 , H01L21/268 , H01L21/324 , H01L22/10
摘要： Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
摘要翻译：公开了用扫描激光辐射热处理衬底的装置和方法。该装置包括连续辐射源和在衬底上形成图像的光学系统。相对于基板表面扫描图像，使得处理区域中的每个点接收足以热处理该区域的辐射脉冲。

5. 发明申请

US20060252282A1 Laser thermal annealing of lightly doped silicon substrates 有权
公开(公告)号：US20060252282A1
公开(公告)日：2006-11-09
申请号：US11481458
申请日：2006-07-06
申请人： Somit Talwar , David Markle
发明人： Somit Talwar , David Markle
IPC分类号： H01L21/00
CPC分类号： H01L21/268 , B23K26/0604 , B23K26/0608 , B23K26/60 , B23K2101/40 , H01L21/2026
摘要： Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of long-wavelength annealing radiation is substantial, and then irradiating the substrate with the annealing radiation to generate a temperature capable of annealing the substrate.

6. 发明申请

US20140353412A1 HERBAL GRINDER AND RESERVOIR 有权
标题翻译：草坪磨坊和储藏室
公开(公告)号：US20140353412A1
公开(公告)日：2014-12-04
申请号：US14290577
申请日：2014-05-29
申请人： Matthew Grumbacher , David Markle
发明人： Matthew Grumbacher , David Markle
IPC分类号： A47J42/40 , A24C5/40
CPC分类号： A24C5/40 , A47J42/24 , B02C18/08
摘要： An herbal grinder and reservoir having a conical shape wherein said herbal grinder comprises a top grinding cap and a grinding section comprising a plurality of grinding knives; and wherein said grinding section comprises a plate having a drop through pattern for allowing ground material to exit the grinding section and fall into the reservoir.
摘要翻译：一种具有圆锥形状的草药研磨机和储器，其中所述草药研磨机包括顶部研磨盖和包括多个研磨刀的研磨部分; 并且其中所述研磨部分包括具有滴通图案的板，用于允许研磨材料离开所述研磨部分并落入所述储存器。

7. 发明申请

US20060091120A1 Recycling optical systems and methods for thermal processing 审中-公开
标题翻译：回收光学系统和热处理方法
公开(公告)号：US20060091120A1
公开(公告)日：2006-05-04
申请号：US11257291
申请日：2005-10-24
申请人： David Markle
发明人： David Markle
IPC分类号： B23K26/00
CPC分类号： B23K26/04 , B23K26/032 , B23K26/043 , B23K26/0604 , B23K26/0643 , B23K26/0738 , B23K26/08 , B23K26/082 , B23K2101/40
摘要： Recycling optical systems and methods for thermal processing of substrates using same are disclosed. The recycling optical system collects radiation provided to the substrate via an annealing radiation beam and reflected from the substrate. The recycling optical system collects the reflected radiation and returns the collected reflected radiation back through the system as recycled radiation. The recycled radiation is returned to the same region of the substrate from which it reflected—preferably to within the thermal diffusion distance associated with scanning the radiation beam over the substrate. The recycling system preserves the polarization and the incidence angle of the directly incident radiation, while avoiding returning radiation back to the source where it might cause radiation source instability. The delivery of recycled radiation to the substrate improves the uniformity of the annealing process, particularly in the case where the substrate includes features that cause varying amounts of absorption over the substrate surface.
摘要翻译：公开了用于使用其的基板的热处理的回收光学系统和方法。回收光学系统通过退火辐射束收集提供给基板的辐射并从基板反射。回收光学系统收集反射的辐射并将收集的反射辐射作为再循环辐射返回通过系统。再循环的辐射返回到其反射的基底的相同区域，优选地反射到与在衬底上扫描辐射束相关联的热扩散距离内。回收系统保留了直接入射辐射的极化和入射角，同时避免了将辐射返回到可能导致辐射源不稳定的源。将再循环辐射递送到衬底提高退火过程的均匀性，特别是在衬底包括在衬底表面上引起变化量的吸收的特征的情况下。

8. 发明申请

US20050067384A1 Laser thermal annealing of lightly doped silicon substrates 有权
标题翻译：轻掺杂硅衬底的激光热退火
公开(公告)号：US20050067384A1
公开(公告)日：2005-03-31
申请号：US10674106
申请日：2003-09-29
申请人： Somit Talwar , Michael Thompson , Boris Grek , David Markle
发明人： Somit Talwar , Michael Thompson , Boris Grek , David Markle
IPC分类号： B23K26/06 , B23K26/42 , H01L21/20 , H01L21/268 , B23K26/00 , H01L21/336 , H01L21/477 , H01L21/26
CPC分类号： H01L21/268 , B23K26/0604 , B23K26/0608 , B23K26/60 , H01L21/2026
摘要： Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of long-wavelength annealing radiation is substantial, and then irradiating the substrate with the annealing radiation to generate a temperature capable of annealing the substrate.
摘要翻译：使用在室温基本上不吸收衬底的退火辐射束来进行衬底的激光热退火（LTA）的设备和方法。该方法利用了在一些衬底（例如未掺杂的硅衬底）中吸收长波长辐射（1微米或更大）的吸收是温度的强函数的事实。该方法包括将衬底加热到长波长退火辐射的吸收显着的临界温度，然后用退火辐射照射衬底以产生能够退火衬底的温度。

9. 外观设计

USD762091S1 Grinder bottom 有权
标题翻译：研磨机底部
公开(公告)号：USD762091S1
公开(公告)日：2016-07-26
申请号：US29492231
申请日：2014-05-29
申请人： Matthew Grumbacher , David Markle
设计人： Matthew Grumbacher , David Markle

10. 发明申请

US20050189329A1 Laser thermal processing with laser diode radiation 审中-公开
标题翻译：激光二极管辐射激光热处理
公开(公告)号：US20050189329A1
公开(公告)日：2005-09-01
申请号：US10838076
申请日：2004-05-03
申请人： Somit Talwar , David Markle
发明人： Somit Talwar , David Markle
IPC分类号： B23K26/00 , B23K26/06 , B23K26/067 , B23K26/073 , B23K26/08 , G03B20060101 , H01L21/20 , H01L21/268
CPC分类号： B23K26/0608 , B23K26/0604 , B23K26/067 , B23K26/073 , B23K26/0853 , B23K2101/40 , H01L21/268
摘要： A method and apparatus for performing laser thermal processing (LTP) using one or more two-dimensional arrays of laser diodes and corresponding one or more LTP optical systems to form corresponding one or more line images. The line images are scanned across a substrate, e.g., by moving the substrate relative to the one or more line images. The apparatus also includes one or more recycling optical systems arranged to re-image reflected annealing radiation back onto the substrate. The use of one or more recycling optical systems greatly improves the heating efficiency and uniformity during LTP.
摘要翻译：一种使用一个或多个激光二极管阵列和对应的一个或多个LTP光学系统进行激光热处理（LTP）的方法和装置，以形成对应的一个或多个线图像。线图像跨基板扫描，例如通过相对于一个或多个线图像移动基板。该装置还包括一个或多个再循环光学系统，其布置成将反射的退火辐射重新映射回衬底上。使用一个或多个再循环光学系统大大提高了LTP期间的加热效率和均匀性。

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