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1. 外观设计

USD762091S1 Grinder bottom 有权
标题翻译：研磨机底部
公开(公告)号：USD762091S1
公开(公告)日：2016-07-26
申请号：US29492231
申请日：2014-05-29
申请人： Matthew Grumbacher , David Markle
设计人： Matthew Grumbacher , David Markle

2. 发明申请

US20050189329A1 Laser thermal processing with laser diode radiation 审中-公开
标题翻译：激光二极管辐射激光热处理
公开(公告)号：US20050189329A1
公开(公告)日：2005-09-01
申请号：US10838076
申请日：2004-05-03
申请人： Somit Talwar , David Markle
发明人： Somit Talwar , David Markle
IPC分类号： B23K26/00 , B23K26/06 , B23K26/067 , B23K26/073 , B23K26/08 , G03B20060101 , H01L21/20 , H01L21/268
CPC分类号： B23K26/0608 , B23K26/0604 , B23K26/067 , B23K26/073 , B23K26/0853 , B23K2101/40 , H01L21/268
摘要： A method and apparatus for performing laser thermal processing (LTP) using one or more two-dimensional arrays of laser diodes and corresponding one or more LTP optical systems to form corresponding one or more line images. The line images are scanned across a substrate, e.g., by moving the substrate relative to the one or more line images. The apparatus also includes one or more recycling optical systems arranged to re-image reflected annealing radiation back onto the substrate. The use of one or more recycling optical systems greatly improves the heating efficiency and uniformity during LTP.
摘要翻译：一种使用一个或多个激光二极管阵列和对应的一个或多个LTP光学系统进行激光热处理（LTP）的方法和装置，以形成对应的一个或多个线图像。线图像跨基板扫描，例如通过相对于一个或多个线图像移动基板。该装置还包括一个或多个再循环光学系统，其布置成将反射的退火辐射重新映射回衬底上。使用一个或多个再循环光学系统大大提高了LTP期间的加热效率和均匀性。

3. 发明申请

US20050045604A1 Laser thermal processing with laser diode radiation 有权
标题翻译：激光二极管辐射激光热处理
公开(公告)号：US20050045604A1
公开(公告)日：2005-03-03
申请号：US10653625
申请日：2003-09-02
申请人： Somit Talwar , David Markle
发明人： Somit Talwar , David Markle
IPC分类号： B23K26/00 , B23K26/06 , B23K26/073 , G03B20060101 , H01L21/20
CPC分类号： B23K26/0604 , B23K26/073 , B23K2101/40
摘要： A method and apparatus for performing laser thermal processing (LTP) using a two-dimensional array of laser diodes to form a line image, which is scanned across a substrate. The apparatus includes a two-dimensional array of laser diodes, the radiation from which is collimated in one plane using a cylindrical lens array, and imaged onto the substrate as a line image using an anomorphic, telecentric optical imaging system. The apparatus also includes a scanning substrate stage for supporting a substrate to be LTP processed. The laser diode radiation beam is incident on the substrate at angles at or near the Brewster's angle for the given substrate material and the wavelength of the radiation beam, which is linearly P-polarized. The use of a two-dimensional laser diode array allows for a polarized radiation beam of relatively high energy density to be delivered to the substrate, thereby allowing for LTP processing with good uniformity, reasonably short dwell times, and thus reasonably high throughput.
摘要翻译：一种使用激光二极管的二维阵列进行激光热处理（LTP）的方法和装置，以形成跨越衬底扫描的线像。该装置包括激光二极管的二维阵列，使用柱面透镜阵列在一个平面中准直的辐射，并使用异常远心光学成像系统作为线图像成像到基板上。该装置还包括用于支撑待处理LTP的衬底的扫描衬底台。对于给定的衬底材料，激光二极管辐射束以布鲁斯特角度或附近的角度入射到衬底上，并且是线性P偏振的辐射束的波长。使用二维激光二极管阵列允许将相对较高能量密度的偏振辐射束输送到衬底，从而允许具有良好均匀性，合理短暂停留时间以及因此合理高的通量的LTP处理。

4. 发明授权

US09737092B2 Herbal grinder and reservoir 有权
公开(公告)号：US09737092B2
公开(公告)日：2017-08-22
申请号：US14290577
申请日：2014-05-29
申请人： Matthew Grumbacher , David Markle
发明人： Matthew Grumbacher , David Markle
IPC分类号： A47J42/40 , A24C5/40 , B02C18/08 , A47J42/24
CPC分类号： A24C5/40 , A47J42/24 , B02C18/08
摘要： An herbal grinder and reservoir having a conical shape wherein said herbal grinder comprises a top grinding cap and a grinding section comprising a plurality of grinding knives; and wherein said grinding section comprises a plate having a drop through pattern for allowing ground material to exit the grinding section and fall into the reservoir.

5. 外观设计

USD762090S1 Grinder top 有权
标题翻译：研磨机顶部
公开(公告)号：USD762090S1
公开(公告)日：2016-07-26
申请号：US29492222
申请日：2014-05-29
申请人： Matthew Grumbacher , David Markle
设计人： Matthew Grumbacher , David Markle

6. 发明申请

US20070004232A1 Laser thermal processing chuck with a thermal compensating heater module 有权
标题翻译：激光热处理卡盘配有热补偿加热器模块
公开(公告)号：US20070004232A1
公开(公告)日：2007-01-04
申请号：US11002043
申请日：2004-12-01
申请人： Iqbal Shareef , Igor Landau , David Markle , Somit Talwar , Michael Thompson , Ivelin Angelov , Senquan Zhou
发明人： Iqbal Shareef , Igor Landau , David Markle , Somit Talwar , Michael Thompson , Ivelin Angelov , Senquan Zhou
IPC分类号： C23C16/00
CPC分类号： H01L21/67109 , B23K26/10 , B23K26/702 , B23K26/703 , H01L2924/0002 , H01L2924/00
摘要： Chuck methods and apparatus for supporting a semiconductor substrate and maintaining it at a substantially constant background temperature even when subject to a spatially and temporally varying thermal load. Chuck includes a thermal compensating heater module having a sealed chamber containing heater elements, a wick, and an alkali metal liquid/vapor. The chamber employs heat pipe principles to equalize temperature differences in the module. The spatially varying thermal load is quickly made uniform by thermal conductivity of the heater module. Heatsinking a constant amount of heat from the bottom of the heater module accommodates large temporal variations in the thermal heat load. Constant heat loss is preferably made to be at least as large as the maximum variation in the input heat load, less heat lost through radiation and convection, thus requiring a heat input through electrical heating elements. This allows for temperature control of the chuck, and hence the substrate.
摘要翻译：用于支撑半导体衬底并将其保持在基本上恒定的背景温度的Chuck方法和装置，即使在经受空间和时间变化的热负载时。卡盘包括一个热补偿加热器模块，其具有包含加热元件，芯和碱金属液体/蒸气的密封腔。该室采用热管原理来均衡模块中的温差。空间变化的热负荷通过加热器模块的热导率快速地均匀。从加热器模块的底部散热恒定的热量可以适应热负荷的大的时间变化。恒定的热损失优选地至少与输入热负荷的最大变化一样大，通过辐射和对流损失的热量较少，因此需要通过电加热元件的热输入。这允许卡盘的温度控制，从而允许基板的温度控制。

7. 发明申请

US20060255017A1 Methods and apparatus for remote temperature measurement of a specular surface 有权
标题翻译：用于远程测量镜面的方法和装置
公开(公告)号：US20060255017A1
公开(公告)日：2006-11-16
申请号：US11129971
申请日：2005-05-16
申请人： David Markle
发明人： David Markle
IPC分类号： B23K26/04
CPC分类号： G01K11/125 , G01J5/0003 , G01J5/58 , G01J2005/0077
摘要： Methods and apparatus for remotely measuring the temperature of a specular surface are disclosed. The method includes taking two different measurements of P-polarized radiation emitted from the surface at or near the Brewster angle associated with the surface. The first measurement (SA) collects and detects a first amount of radiation emitted directly from a surface portion using a collection optical system. The second measurement (SB) includes the first amount of radiation and adds a quantity of radiation collected at or near the Brewster angle and reflected from the surface. This is accomplished with a retro optical system with a round-trip transmission t2 that retro-reflects a quantity of radiation received from the surface portion back to the same surface portion where it is reflected and combined with the first amount of radiation collected by the collection optical system. Measurements SA and SB and the transmission, t2, are used to determine the surface emissivity (ξ). A calibration curve is then used that relates the ratio of the first measurement SA to the surface emissivity ξ, (SA/ξ), to surface temperature. The calibration curve is then used to determine the surface temperature from the SA/ξ value.
摘要翻译：公开了用于远程测量镜面温度的方法和装置。该方法包括在与表面相关联的布鲁斯特角处或附近从表面发射的P偏振辐射的两种不同测量。第一测量（SA）使用收集光学系统收集并检测从表面部分直接发射的第一量的辐射。第二测量（SB）包括第一辐射量并且增加在布鲁斯特角度处或附近收集的辐射量并从表面反射。这是通过具有往返传输t 2的复古光学系统实现的，其将从表面部分接收的辐射量反射回到与其反射并与其组合的相同表面部分由收集光学系统收集的第一量的辐射。测量SA和SB以及透射率t 2 2用于确定表面发射率（xi）。然后使用将第一测量SA与表面发射率xi（SA / xi）的比率与表面温度相关联的校准曲线。然后使用校准曲线从SA / xi值确定表面温度。

8. 发明申请

US20060246694A1 Laser thermal annealing of lightly doped silicon substrates 有权
公开(公告)号：US20060246694A1
公开(公告)日：2006-11-02
申请号：US11478171
申请日：2006-06-29
申请人： Somit Talwar , Michael Thompson , Boris Grek , David Markle
发明人： Somit Talwar , Michael Thompson , Boris Grek , David Markle
IPC分类号： H01L21/20 , H01L21/36 , B23K26/00
CPC分类号： H01L21/268 , B23K26/0604 , B23K26/0608 , B23K26/60 , H01L21/2026
摘要： Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of long-wavelength annealing radiation is substantial, and then irradiating the substrate with the annealing radiation to generate a temperature capable of annealing the substrate.

9. 发明申请

US20060059546A1 Single sign-on identity and access management and user authentication method and apparatus 审中-公开
标题翻译：单点登录身份和访问管理以及用户认证方法和设备
公开(公告)号：US20060059546A1
公开(公告)日：2006-03-16
申请号：US11218115
申请日：2005-09-01
申请人： David Nester , Jeffrey Cyr , David Markle
发明人： David Nester , Jeffrey Cyr , David Markle
IPC分类号： H04L9/32
CPC分类号： H04L63/0815 , H04L63/102
摘要： A single sign-on authentication and access management apparatus and method is provided for computer networked digital content providers interconnected in a communication network. A single application service provider coupled to the application servers and a user computer includes an entitlements database interfaced with an authorization server for storing data utilized by the authorization server to responding to user requests to grant or deny access to user requested content.
摘要翻译：为在通信网络中相互连接的计算机网络数字内容提供商提供单一登录认证和访问管理装置和方法。耦合到应用服务器和用户计算机的单个应用服务提供商包括与授权服务器接口的授权数据库，用于存储由授权服务器使用的数据以响应用户请求来授权或拒绝对用户请求的内容的访问。

10. 发明申请

US20050103998A1 Laser thermal annealing of lightly doped silicon substrates 有权
公开(公告)号：US20050103998A1
公开(公告)日：2005-05-19
申请号：US10762861
申请日：2004-01-22
申请人： Somit Talwar , David Markle
发明人： Somit Talwar , David Markle
IPC分类号： B23K26/06 , B23K26/42 , H01L21/20 , H01L21/268 , H01L21/339 , G01J5/02 , H01L21/26 , H01L21/42
CPC分类号： H01L21/268 , B23K26/0604 , B23K26/0608 , B23K26/60 , B23K2101/40 , H01L21/2026
摘要： Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of long-wavelength annealing radiation is substantial, and then irradiating the substrate with the annealing radiation to generate a temperature capable of annealing the substrate.

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