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1. 发明申请

US20060113290A1 Heated chuck for laser thermal processing 有权
标题翻译：加热卡盘用于激光热处理
公开(公告)号：US20060113290A1
公开(公告)日：2006-06-01
申请号：US11001954
申请日：2004-12-01
申请人： Iqbal Shareef , Igor Landau , David Markle , Somit Talwar , Michael Thompson , Ivelin Angelov , Senquan Zhou
发明人： Iqbal Shareef , Igor Landau , David Markle , Somit Talwar , Michael Thompson , Ivelin Angelov , Senquan Zhou
IPC分类号： B23K26/00 , B23K26/02
CPC分类号： B23K26/703
摘要： A chuck for supporting a wafer and maintaining a constant background temperature across the wafer during laser thermal processing (LTP) is disclosed. The chuck includes a heat sink and a thermal mass in the form of a heater module. The heater module is in thermal communication with the heat sink, but is physically separated therefrom by a thermal insulator layer. The thermal insulator maintains a substantially constant power loss at least equal to the maximum power delivered by the laser, less that lost by radiation and convection. A top plate is arranged atop the heater module, supports the wafer to be processed, and provides a contamination barrier. The heater module is coupled to a power supply that is adapted to provide varying amounts of power to the heater module to maintain the heater module at the constant background temperature even when the wafer experiences a spatially and temporally varying heat load from an LTP laser beam. Thus, heat from the laser is transferred from the wafer to the heat sink via the heater module and the insulator layer. In the absence of any laser heating, heat is also transferred from the heater module to the wafer as needed to maintain the constant background temperature.
摘要翻译：公开了一种用于在激光热处理（LTP）期间支撑晶片并在晶片上保持恒定的背景温度的卡盘。卡盘包括散热器和加热器模块形式的热质量。加热器模块与散热器热连通，但是通过绝热层在物理上与其分离。热绝缘体保持至少等于由激光器传递的最大功率的基本恒定的功率损耗，而不是由辐射和对流损失。顶板布置在加热器模块的顶部，支撑要处理的晶片，并提供污染屏障。加热器模块耦合到电源，其适于向加热器模块提供变化量的功率，以将加热器模块保持在恒定的背景温度，即使当晶片经历来自LTP激光束的空间上和时间上变化的热负载时。因此，来自激光器的热量通过加热器模块和绝缘体层从晶片传递到散热器。在没有激光加热的情况下，根据需要也从加热器模块转移到晶片以保持恒定的背景温度。

2. 发明申请

US20070004232A1 Laser thermal processing chuck with a thermal compensating heater module 有权
标题翻译：激光热处理卡盘配有热补偿加热器模块
公开(公告)号：US20070004232A1
公开(公告)日：2007-01-04
申请号：US11002043
申请日：2004-12-01
申请人： Iqbal Shareef , Igor Landau , David Markle , Somit Talwar , Michael Thompson , Ivelin Angelov , Senquan Zhou
发明人： Iqbal Shareef , Igor Landau , David Markle , Somit Talwar , Michael Thompson , Ivelin Angelov , Senquan Zhou
IPC分类号： C23C16/00
CPC分类号： H01L21/67109 , B23K26/10 , B23K26/702 , B23K26/703 , H01L2924/0002 , H01L2924/00
摘要： Chuck methods and apparatus for supporting a semiconductor substrate and maintaining it at a substantially constant background temperature even when subject to a spatially and temporally varying thermal load. Chuck includes a thermal compensating heater module having a sealed chamber containing heater elements, a wick, and an alkali metal liquid/vapor. The chamber employs heat pipe principles to equalize temperature differences in the module. The spatially varying thermal load is quickly made uniform by thermal conductivity of the heater module. Heatsinking a constant amount of heat from the bottom of the heater module accommodates large temporal variations in the thermal heat load. Constant heat loss is preferably made to be at least as large as the maximum variation in the input heat load, less heat lost through radiation and convection, thus requiring a heat input through electrical heating elements. This allows for temperature control of the chuck, and hence the substrate.
摘要翻译：用于支撑半导体衬底并将其保持在基本上恒定的背景温度的Chuck方法和装置，即使在经受空间和时间变化的热负载时。卡盘包括一个热补偿加热器模块，其具有包含加热元件，芯和碱金属液体/蒸气的密封腔。该室采用热管原理来均衡模块中的温差。空间变化的热负荷通过加热器模块的热导率快速地均匀。从加热器模块的底部散热恒定的热量可以适应热负荷的大的时间变化。恒定的热损失优选地至少与输入热负荷的最大变化一样大，通过辐射和对流损失的热量较少，因此需要通过电加热元件的热输入。这允许卡盘的温度控制，从而允许基板的温度控制。

3. 发明申请

US20060246694A1 Laser thermal annealing of lightly doped silicon substrates 有权
公开(公告)号：US20060246694A1
公开(公告)日：2006-11-02
申请号：US11478171
申请日：2006-06-29
申请人： Somit Talwar , Michael Thompson , Boris Grek , David Markle
发明人： Somit Talwar , Michael Thompson , Boris Grek , David Markle
IPC分类号： H01L21/20 , H01L21/36 , B23K26/00
CPC分类号： H01L21/268 , B23K26/0604 , B23K26/0608 , B23K26/60 , H01L21/2026
摘要： Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of long-wavelength annealing radiation is substantial, and then irradiating the substrate with the annealing radiation to generate a temperature capable of annealing the substrate.

4. 发明申请

US20050067384A1 Laser thermal annealing of lightly doped silicon substrates 有权
标题翻译：轻掺杂硅衬底的激光热退火
公开(公告)号：US20050067384A1
公开(公告)日：2005-03-31
申请号：US10674106
申请日：2003-09-29
申请人： Somit Talwar , Michael Thompson , Boris Grek , David Markle
发明人： Somit Talwar , Michael Thompson , Boris Grek , David Markle
IPC分类号： B23K26/06 , B23K26/42 , H01L21/20 , H01L21/268 , B23K26/00 , H01L21/336 , H01L21/477 , H01L21/26
CPC分类号： H01L21/268 , B23K26/0604 , B23K26/0608 , B23K26/60 , H01L21/2026
摘要： Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of long-wavelength annealing radiation is substantial, and then irradiating the substrate with the annealing radiation to generate a temperature capable of annealing the substrate.
摘要翻译：使用在室温基本上不吸收衬底的退火辐射束来进行衬底的激光热退火（LTA）的设备和方法。该方法利用了在一些衬底（例如未掺杂的硅衬底）中吸收长波长辐射（1微米或更大）的吸收是温度的强函数的事实。该方法包括将衬底加热到长波长退火辐射的吸收显着的临界温度，然后用退火辐射照射衬底以产生能够退火衬底的温度。

5. 发明申请

US20050189340A1 Silicon layer for uniformizing temperature during photo-annealing 有权
标题翻译：用于光退火期间的均匀化温度的硅层
公开(公告)号：US20050189340A1
公开(公告)日：2005-09-01
申请号：US10787688
申请日：2004-02-26
申请人： Somit Talwar , Michael Thompson
发明人： Somit Talwar , Michael Thompson
IPC分类号： A21B1/00 , A21B1/22 , F27B5/14 , H01L21/265 , H01L21/268 , H01L21/324 , H01L21/8238
CPC分类号： H01L21/324 , H01L21/26513 , H01L21/268 , H01L21/2686
摘要： An apparatus and method for uniformizing the temperature distribution across a semiconductor wafer during radiation annealing of process regions formed in the wafer is disclosed. The method includes forming a silicon layer atop the upper surface of the wafer and irradiating the layer with one or more pulses of radiation having wavelengths that are substantially absorbed by the silicon layer. The silicon layer acts to uniformly absorb the one or more radiation pulses and then transfers the heat from the absorbed radiation to the process regions across the wafer.
摘要翻译：公开了一种用于使晶片中形成的工艺区域的辐射退火过程中半导体晶片温度分布均匀化的装置和方法。该方法包括在晶片的上表面顶部形成硅层，并用一个或多个辐射脉冲照射具有基本被硅层吸收的波长的辐射。硅层用于均匀地吸收一个或多个辐射脉冲，然后将热量从吸收的辐射传送到晶片上的处理区域。

6. 发明申请

US20060237403A1 Heat shield for thermal processing 有权
标题翻译：用于热处理的隔热罩
公开(公告)号：US20060237403A1
公开(公告)日：2006-10-26
申请号：US11112647
申请日：2005-04-22
申请人： Iqbal Shareef , Boris Grek , Michael Thompson
发明人： Iqbal Shareef , Boris Grek , Michael Thompson
IPC分类号： B23K26/00
CPC分类号： B23K26/703
摘要： A heat shield (10) that facilitates thermally processing a substrate (22) with a radiation beam (150) is disclosed. The heat shield is in the form of a cooled plate adapted to allow the radiation beam to communicate with the substrate upper surface (20) over a radiation beam path (BP), either through an aperture or a transparent region. The heat shield has an operating position that forms a relatively small gap (170) between the lower surface (54) of the heat shield and the upper surface of the wafer. The gap is sized such that the formation of convection cells (200) is suppressed during substrate surface irradiation. If convection cells do form, they are kept out of the radiation beam path. This prevents the radiation beam from wandering from the desired radiation beam path, which in turn allows for uniform heating of the substrate during thermal processing.
摘要翻译：公开了一种有助于用辐射束（150）热处理衬底（22）的隔热罩（10）。隔热板是冷却板的形式，其适于允许辐射束通过光圈或透明区域在辐射束路径（BP）上与衬底上表面（20）连通。隔热罩具有在隔热罩的下表面（54）和晶片的上表面之间形成相对小的间隙（170）的操作位置。间隙的尺寸使得在衬底表面照射期间抑制形成对流电池（200）。如果形成对流电池，则它们被保持在辐射束路径之外。这防止辐射束从所需的辐射束路径移动，这又允许在热处理期间对衬底的均匀加热。

7. 发明申请

US20200215465A1 METHOD AND APPARATUS FOR CATCHING SILT 审中-公开
公开(公告)号：US20200215465A1
公开(公告)日：2020-07-09
申请号：US16733775
申请日：2020-01-03
申请人： David Hart , Michael Thompson , Timothy Pierzynski
发明人： David Hart , Michael Thompson , Timothy Pierzynski
IPC分类号： B01D29/23 , B01D35/157 , F16K51/00
摘要： A silt and debris catching apparatus comprises a housing component and a catchment component. The housing component is adapted to fit within a valve box assembly. The catchment component is coupled to the housing component and includes a filter. The filter retains material that enters the valve box assembly.

8. 外观设计

USD715522S1 Shoe sole 有权
公开(公告)号：USD715522S1
公开(公告)日：2014-10-21
申请号：US29428051
申请日：2012-07-25
申请人： Scott Tucker , Michael Thompson , Darren Zrubek , Keegan Rehfeldt
设计人： Scott Tucker , Michael Thompson , Darren Zrubek , Keegan Rehfeldt

9. 发明申请

US20120128324A1 3D AUTHORING TOOL ENSURING NO BUFFER UNDERRUN UPON JUMPS 有权
标题翻译： 3D作者工具在JUMPS上确保没有BUFFER UNDERRUN
公开(公告)号：US20120128324A1
公开(公告)日：2012-05-24
申请号：US13298599
申请日：2011-11-17
申请人： Yoshikazu Takashima , Michael Thompson
发明人： Yoshikazu Takashima , Michael Thompson
IPC分类号： H04N9/80 , H04N5/93
CPC分类号： G11B27/3027 , G11B20/10 , G11B20/10527 , G11B27/105 , G11B2020/1062 , G11B2020/10814 , G11B2020/10925 , G11B2020/10944 , G11B2220/235 , G11B2220/2541 , H04N13/161 , H04N13/189
摘要： Systems and methods are provided to implement a technique for providing 3D content, such as on optical media like Blu-ray® discs. In one implementation, a 3D authoring tool executing on a computer system manages how to construct an image for replication where the image handles jumps without buffer underruns, the jumps caused by layer switching or by moving from or to branches in a multi-branch story line.
摘要翻译：提供了系统和方法来实现用于提供3D内容的技术，例如在诸如Blu-ray光盘的光学介质上。在一个实现中，在计算机系统上执行的3D创作工具管理如何构建用于复制的图像，其中图像处理跳转而不会造成缓冲区不足，由层切换引起的跳转或者从多分支故事线中的分支移动。

10. 发明授权

US07995096B1 Visual security operations system 有权
标题翻译：视觉安全操作系统
公开(公告)号：US07995096B1
公开(公告)日：2011-08-09
申请号：US09667625
申请日：2000-09-22
申请人： Christopher Cressy , Michael Thompson , Douglas H. Cox
发明人： Christopher Cressy , Michael Thompson , Douglas H. Cox
IPC分类号： H04N7/18
CPC分类号： G08B13/19691
摘要： A security alarm monitor is disclosed that uses a combination of three dimensional (3D) and two dimensional (2D) visualization to display the status of security devices and allow the operator to respond to alarms. The alarm monitor console includes 3D and 2D display areas, either in a split screen on a single monitor or on dual monitors. The 3D display area uses a photo-realistic representation of a facility and overlays iconic or 3D representations of the security devices showing their locations, coverage areas, and alarm status. The 2D display area shows a map, architectural drawing, image-based overhead view, or combination or the three for a facility and security device icons. The alarm representations in the 2D and 3D display areas are synchronized. The 3D display gives a dynamic view of the facility or compound. When an alarm occurs, the 3D display flies to preprogrammed view of the alarm location, issues a preprogrammed audio alert, and animates the alarm icon to indicate its status.
摘要翻译：公开了一种使用三维（3D）和二维（2D）可视化的组合来显示安全设备的状态并允许操作者响应报警的安全报警监视器。报警监视器控制台包括3D和2D显示区域，无论是在单个显示器上还是在双显示器上分屏。 3D显示区域使用设施的照片真实表示，并覆盖安全设备的图标或3D表示，显示其位置，覆盖区域和报警状态。 2D显示区域显示地图，建筑图纸，基于图像的俯视视图或组合，或三者用于设施和安全设备图标。 2D和3D显示区域中的报警表示是同步的。 3D显示屏可以给出设施或化合物的动态视图。当发生报警时，3D显示屏将飞行到报警位置的预编程视图，发出预编程的音频警报，并激活报警图标以指示其状态。

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