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1. 发明授权

US06943124B1 Two step exposure to strengthen structure of polyimide or negative tone photosensitive material 失效
标题翻译：两步曝光加强聚酰亚胺或负色感光材料的结构
公开(公告)号：US06943124B1
公开(公告)日：2005-09-13
申请号：US10197327
申请日：2002-07-17
申请人： Shin-Rung Lu , Ho-Ku Lan
发明人： Shin-Rung Lu , Ho-Ku Lan
IPC分类号： H01L21/302 , H01L21/31
CPC分类号： H01L21/31144 , G03F7/0382 , G03F7/11 , G03F7/2024 , H01L21/0274
摘要： A method is provided for forming features in a polyimide layer that is employed as an insulating layer or buffer layer during the fabrication of semiconductor devices or chip packaging structures. A pattern is formed in a photosensitive layer that has a high film retention after the development step and a crosslinked network that strengthens and stabilizes it for subsequent processing. The process involves exposing a negative tone photosensitive layer with a first exposure dose that is less than the normal dose used to image the material. The exposed layer is developed to provide a scum free substrate. A second exposure dose then strengthens the formed image by crosslinking unreacted components. First and second exposure doses are determined from a plot of film thickness loss vs. exposure energy. The method applies to photosensitive polyimide precursors as well as negative photoresists that are crosslinked by free radical or chemical amplification mechanisms.
摘要翻译：提供了一种用于在半导体器件或芯片封装结构的制造期间用作绝缘层或缓冲层的聚酰亚胺层中形成特征的方法。在显影步骤后具有高膜保留性的感光层和形成强化稳定性的交联网络进行后续处理的图案形成。该方法包括以低于用于成像材料的正常剂量的第一曝光剂量曝光负色调感光层。曝光层被开发以提供无浮渣衬底。然后第二次曝光剂量通过交联未反应的组分来增强形成的图像。第一和第二曝光剂量由薄膜厚度损失与曝光能量的关系曲线确定。该方法适用于光敏聚酰亚胺前体以及通过自由基或化学扩增机制交联的负性光致抗蚀剂。

2. 发明授权

US6021921A Liquid dispensing system and method for dispensing 失效
标题翻译：液体分配系统和分配方法
公开(公告)号：US6021921A
公开(公告)日：2000-02-08
申请号：US957913
申请日：1997-10-27
申请人： Ho-Ku Lan , Chen-Cheng Kuo , Hung-Chih Chen , Shih-Shiung Chen
发明人： Ho-Ku Lan , Chen-Cheng Kuo , Hung-Chih Chen , Shih-Shiung Chen
IPC分类号： B67D7/02 , B67D7/78 , B67D5/08
CPC分类号： B67D7/0238 , B67D7/0261 , B67D7/78 , Y10T137/3109 , Y10T137/3127
摘要： The present invention discloses a liquid dispensing system and a method for dispensing liquid that includes two hermetically sealed tanks each having a liquid container with a conduit pipe connecting the two containers. A differential pressure exists between the two tanks such that a process liquid can be fed from the second container into a dispensing nozzle under the differential pressure and the gravity of the liquid without the need of a pumping system. The problems of gel formation normally observed in conventional dispensing systems can be eliminated. A high viscosity, short shelf life liquid can be most suitably dispensed by the present invention novel dispensing system and method.
摘要翻译：本发明公开了一种液体分配系统和分配液体的方法，该液体包括两个气密密封的罐，每个液体容器具有连接两个容器的导管的液体容器。在两个罐之间存在差压，使得处理液体可以在压差和液体的重力下从第二容器进入分配喷嘴，而不需要泵送系统。可以消除在常规分配系统中通常观察到的凝胶形成的问题。通过本发明新颖的分配系统和方法可以最适当地分配高粘度，短的保质期液体。

3. 发明授权

US5807787A Method for reducing surface leakage current on semiconductor intergrated circuits during polyimide passivation 失效
标题翻译：在聚酰亚胺钝化期间减少半导体集成电路上的表面泄漏电流的方法
公开(公告)号：US5807787A
公开(公告)日：1998-09-15
申请号：US755862
申请日：1996-12-02
申请人： Wen-Jui Fu , Ho-Ku Lan , Ying-Chen Chao
发明人： Wen-Jui Fu , Ho-Ku Lan , Ying-Chen Chao
IPC分类号： H01L21/311 , H01C21/4762
CPC分类号： H01L21/31138 , Y10S438/974
摘要： A method is achieved for reducing the surface leakage current between adjacent bonding pads on integrated circuit substrates after forming a patterned polyimide passivation layer. When the polyimide layer is patterned to open contacts areas over the bonding pads, plasma ashing in oxygen is used to remove residual polyimide that otherwise causes high contact resistance, and poor chip yield. This plasma ashing also modifies the insulating layer between bonding pads resulting in an unwanted increase in surface leakage currents between bonding pads. The passivation process is improved by using a thermal treatment step in either a nitrogen or air ambient after the plasma ashing to essentially eliminate the increased surface leakage current and improve chip yield.
摘要翻译：在形成图案化的聚酰亚胺钝化层之后，实现了一种降低集成电路基板上的相邻焊盘之间的表面泄漏电流的方法。当将聚酰亚胺层图案化以在接合焊盘上打开接触区域时，使用氧气中的等离子体灰化来除去残留的聚酰亚胺，否则会导致高接触电阻和较差的芯片产量。该等离子体灰化还修改接合焊盘之间的绝缘层，导致焊盘之间的表面泄漏电流的不期望的增加。通过在等离子体灰化之后在氮气或空气环境中使用热处理步骤来基本上消除增加的表面泄漏电流并提高芯片产量来改善钝化过程。

4. 发明申请

US20060201848A1 Method for reducing mask precipitation defects 审中-公开
标题翻译：降低掩模沉淀缺陷的方法
公开(公告)号：US20060201848A1
公开(公告)日：2006-09-14
申请号：US11079617
申请日：2005-03-14
申请人： Ting-Yu Lin , Yi-Ming Dai , Chi-Hung Liao , Li-Kong Turn , Louie Liu , Ho-Ku Lan , Hsiang Liu
发明人： Ting-Yu Lin , Yi-Ming Dai , Chi-Hung Liao , Li-Kong Turn , Louie Liu , Ho-Ku Lan , Hsiang Liu
IPC分类号： B65D85/00
CPC分类号： G03F7/70741 , G03F1/66 , H01L21/67017 , H01L21/6735
摘要： In a container for transporting a reticle during a semiconductor manufacturing process, the reticle including a base made of isolating material and a metallic layer deposited onto a surface of the base, disclosed is a method for isolating and removing environmental contaminants which includes filling the container with inert gas, thereby purging the environmental contaminants, as well as inlet and outlet features to allow for the purging of clean inert gas and impurities.
摘要翻译：在半导体制造过程中用于运输掩模版的容器中，包括由绝缘材料制成的基底和沉积在基底表面上的金属层的掩模版是一种用于分离和去除环境污染物的方法，其包括用容器惰性气体，从而清除环境污染物，以及入口和出口特征，以便清洁惰性气体和杂质。

5. 发明申请

US20050191563A1 Method and system for reducing and monitoring precipitated defects on masking reticles 有权
标题翻译：用于减少和监测掩蔽掩模版上沉淀的缺陷的方法和系统
公开(公告)号：US20050191563A1
公开(公告)日：2005-09-01
申请号：US10787698
申请日：2004-02-26
申请人： Yi-Ming Dai , Ting-Yu Lin , Ho-Ku Lan , Li-Kong Turn , Heng-Hsin Liu , Louie Liu , Tony Wu , Chi-Hung Liao
发明人： Yi-Ming Dai , Ting-Yu Lin , Ho-Ku Lan , Li-Kong Turn , Heng-Hsin Liu , Louie Liu , Tony Wu , Chi-Hung Liao
IPC分类号： G03F7/00 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70866 , G03F7/70741 , G03F7/70983
摘要： A method and system is disclosed for reducing and monitoring precipitated defects on mask reticles. A predetermined gas is provided into an environment surrounding the reticle assembly for reducing a formation of the precipitated defects around the mask reticle caused by photolithography under a light source having a small wavelength.
摘要翻译：公开了用于减少和监测掩模掩模版上的沉淀缺陷的方法和系统。预定的气体被提供到标线组件周围的环境中，用于减少在具有小波长的光源下通过光刻产生的掩模掩模版周围的沉淀缺陷的形成。

6. 发明授权

US5989754A Photomask arrangement protecting reticle patterns from electrostatic discharge damage (ESD) 失效
标题翻译：保护掩模版图案免受静电放电损坏（ESD）的光掩模布置
公开(公告)号：US5989754A
公开(公告)日：1999-11-23
申请号：US923980
申请日：1997-09-05
申请人： Shih-Shiung Chen , Ming-Fa Chen , Ho-Ku Lan , Ying-Chen Chao
发明人： Shih-Shiung Chen , Ming-Fa Chen , Ho-Ku Lan , Ying-Chen Chao
IPC分类号： G03F1/00 , G03F1/40 , G03F9/00
CPC分类号： G03F1/40
摘要： A photomask arrangement is disclosed to prevent the reticle patterns of a photomask from peeling caused by electrostatic discharge damage. The photomask includes: a substrate; a plurality of metal shielding layers formed on the surface of the substrate to provide the reticle patterns, wherein each two of the metal shielding layers are spaced apart by a clear scribe line; and a plurality of metal lines formed on the clear scribe line to connect the adjacent metal shielding layers, thereby increasing the effective surface area of the reticle patterns.
摘要翻译：公开了一种光掩模布置，以防止光掩模的掩模版图案由静电放电损坏引起的剥离。光掩模包括：基底; 形成在所述基板表面上的多个金属屏蔽层，以提供所述标线图案，其中每个所述金属屏蔽层通过清晰的划线间隔开; 以及形成在清晰划线上的多条金属线，以连接相邻的金属屏蔽层，从而增加标线图案的有效表面积。

7. 发明授权

US5869219A Method for depositing a polyimide film 失效
标题翻译：淀积聚酰亚胺薄膜的方法
公开(公告)号：US5869219A
公开(公告)日：1999-02-09
申请号：US964899
申请日：1997-11-05
申请人： Chen-Cheng Kuo , Ho-Ku Lan , Hung-Chih Chen , Shih-Shiung Chen
发明人： Chen-Cheng Kuo , Ho-Ku Lan , Hung-Chih Chen , Shih-Shiung Chen
IPC分类号： B05D3/04 , G03F7/075 , G03F7/16 , H01L21/312 , H01L23/31 , H01L23/532 , G03C1/492 , B05D5/12
CPC分类号： H01L23/5329 , B05D3/0486 , G03F7/0751 , G03F7/16 , G03F7/162 , H01L21/312 , H01L23/3171 , H01L2924/0002 , Y10S430/136 , Y10S438/909
摘要： The present invention discloses a method for coating a polyimide precursor on an electronic structure incorporating the use of a silicon coupling agent without any bubble defect in the film deposited. The method can be carried out by flowing at least one inert gas through a deposition chamber and thereby keeping the relative humidity in the chamber at below 25% to carry away the formation of any water molecules and water vapor to prevent the formation of bubbles in the film deposited.
摘要翻译：本发明公开了一种在电子结构上涂覆聚酰亚胺前体的方法，所述电子结构结合使用硅偶联剂，而在所沉积的膜中没有任何气泡缺陷。该方法可以通过使至少一种惰性气体通过沉积室进行，从而将室内的相对湿度保持在25％以下，从而携带任何水分子和水蒸汽的形成，以防止在电影存放。

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