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1. 发明申请

US20180164676A1 ANTI-ESD PHOTOMASK AND METHOD OF FORMING THE SAME 审中-公开
公开(公告)号：US20180164676A1
公开(公告)日：2018-06-14
申请号：US15419338
申请日：2017-01-30
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
发明人： Chun-Hung Kung , Hao-Zhang Lai
IPC分类号： G03F1/40 , H05F1/02
CPC分类号： G03F1/40 , H05F1/02
摘要： The present disclosure provides an anti-ESD photomask and method of the same. In the method, a substrate is provided first. Then, a light-shielding layer is formed on a portion of the substrate, in which the light-shielding layer includes a Mo-containing layer. Next, a surface treatment operation is performed to convert a surface of the portion of the substrate and a surface of the light-shielding layer into a non-conductive layer.

2. 发明申请

US20170255102A1 PATTERN TRIMMING COMPOSITIONS AND METHODS 有权
公开(公告)号：US20170255102A1
公开(公告)日：2017-09-07
申请号：US15062701
申请日：2016-03-07
申请人： Rohm and Haas Electronic Materials LLC
发明人： Kevin Rowell , Cong Liu , Cheng Bai Xu , Irvinder Kaur , Jong Keun Park
IPC分类号： G03F7/40
CPC分类号： G03F7/405 , G03F1/40 , G03F7/11 , G03F7/30 , G03F7/325 , H01L21/0273 , H01L21/0274
摘要： Photoresist pattern trimming compositions comprise: a polymer that is soluble in a 0.26 normality aqueous tetramethylammonium hydroxide solution; and a solvent system, wherein the solvent system comprises one or more monoether solvents in a combined amount of from 50 to 98 wt % based on the solvent system. The compositions find particular applicability in the manufacture of semiconductor devices.

3. 发明授权

US08772737B2 Conductive element for electrically coupling an EUVL mask to a supporting chuck 有权
标题翻译：用于将EUVL掩模电耦合到支撑卡盘的导电元件
公开(公告)号：US08772737B2
公开(公告)日：2014-07-08
申请号：US13623804
申请日：2012-09-20
申请人： Applied Materials Israel, Ltd.
发明人： Igor Krivts (Krayvitz) , Israel Avneri , Yoram Uziel , Nir Ben-David Dodzin , Ido Holcman , Itzak Yair , Yosi Basson
IPC分类号： H01J37/20 , H01L21/683 , G03F1/14 , G03F1/40 , G03F1/22
CPC分类号： H01J37/20 , F16B17/00 , G01N23/18 , G03F1/22 , G03F1/40 , H01J2237/0044 , H01J2237/20 , H01J2237/2008 , H01L21/6831 , Y10T279/23 , Y10T403/70
摘要： A coupling module may include an upper portion that defines an aperture, mask contact elements, chuck contact elements and an intermediate element that is connected between the mask contact elements and the upper portion. A shape and a size of the aperture may correspond to a shape and size of a pattern transfer area of an extreme ultra violet (EUVL) mask. The coupling module may be shaped and sized so that once the mask contact elements contact the upper portion of the EUVL mask, the chuck contact elements contact a chuck that supports the mask. The coupling module may further provide at least one conductive path between the upper portion of the EUVL mask and the chuck when the EUVL mask is positioned on the chuck.
摘要翻译：耦合模块可以包括限定孔的上部，掩模接触元件，卡盘接触元件和连接在掩模接触元件和上部之间的中间元件。孔径的形状和尺寸可以对应于极紫外（EUVL）掩模的图案转移区域的形状和尺寸。耦合模块的形状和尺寸可以使得一旦掩模接触元件接触EUVL掩模的上部，卡盘接触元件就接触支撑掩模的卡盘。当EUVL掩模位于卡盘上时，耦合模块还可以在EUVL掩模的上部和卡盘之间提供至少一个导电路径。

4. 发明授权

US08383301B2 Methods of fabricating reticles with subdivided blocking regions 有权
标题翻译：制造具有细分阻挡区域的掩模版的方法
公开(公告)号：US08383301B2
公开(公告)日：2013-02-26
申请号：US13305987
申请日：2011-11-29
申请人： J. Brett Rolfson
发明人： J. Brett Rolfson
IPC分类号： G03F1/00 , G03F1/40
CPC分类号： G03F1/00 , G03F1/32 , G03F1/40
摘要： Methods for designing, fabricating, and using attenuated phase shift reticles, or photomasks are disclosed. Methods are also disclosed for subdividing the radiation blocking regions of previously fabricated reticles of previously existing designs. The methods may include forming radiation blocking regions that are subdivided, by cut lines, into discrete, spaced apart sections with dimensions (e.g., surface area, etc.) configured to minimize or eliminate the buildup of electrostatic energy by the radiation blocking regions and/or the discharge of electrostatic energy from the radiation blocking regions and the damage that may be caused by such electrostatic discharge. The methods may include configuring the reticle to prevent radiation from passing through the cut lines between adjacent sections of a subdivided radiation blocking region.
摘要翻译：公开了设计，制造和使用衰减相移掩模版或光掩模的方法。还公开了用于细分先前存在的设计的先前制造的掩模版的辐射阻挡区域的方法。所述方法可以包括将辐射阻挡区域形成为通过切割线细分成具有尺寸（例如，表面积等）的离散且间隔开的部分，其被配置成最小化或消除由辐射阻挡区域产生的静电能量和/ 或者从辐射阻挡区域放出静电能和由这种静电放电引起的损坏。所述方法可以包括配置掩模版以防止辐射穿过细分辐射阻挡区域的相邻部分之间的切割线。

5. 发明授权

US08268515B2 Mask blank and method of manufacturing a transfer mask 有权
标题翻译：掩模毛坯和制造转印掩模的方法
公开(公告)号：US08268515B2
公开(公告)日：2012-09-18
申请号：US12567515
申请日：2009-09-25
申请人： Osamu Nozawa
发明人： Osamu Nozawa
IPC分类号： G03F1/20
CPC分类号： G03F1/40 , G03F1/32 , G03F1/38 , G03F1/54 , G03F1/80
摘要： A mask blank having, on a light-transmissive substrate, a light-shielding film made of a material mainly containing chromium, and adapted to use a resist film for electron beam writing when forming a transfer pattern in the light-shielding film. In the mask blank, an etching mask film made of a material containing a nitride or oxynitride of silicon is formed on an upper surface of the light-shielding film and a conductive mask film made of a conductive material dry-etchable with a fluorine-based gas and a mixed gas of chlorine and oxygen is formed on an upper surface of the etching mask film.
摘要翻译：在透光性基板上具有由主要含有铬的材料构成的遮光膜，并且在遮光膜中形成转印图案时适用于电子束写入用的抗蚀剂膜的掩模坯料。在掩模坯料中，在遮光膜的上表面上形成由包含硅的氮化物或氧氮化物的材料制成的蚀刻掩模膜，以及由导电材料制成的导电掩模膜，该导电掩模膜可用氟基气体和氯和氧的混合气体形成在蚀刻掩模膜的上表面上。

6. 发明授权

US07960077B2 Reflective-type mask blank for EUV lithography 有权
标题翻译： EUV光刻用反射型掩模板
公开(公告)号：US07960077B2
公开(公告)日：2011-06-14
申请号：US12694860
申请日：2010-01-27
申请人： Yoshiaki Ikuta , Toshiyuki Uno , Ken Ebihara
发明人： Yoshiaki Ikuta , Toshiyuki Uno , Ken Ebihara
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/38 , G03F1/40 , G03F7/70708 , G21K2201/067 , Y10T428/31616
摘要： A reflective mask blank for EUV lithography including a substrate having a front surface and a rear surface, a reflective layer formed over the front surface of the substrate, an absorbing layer formed over the reflective layer, and a chucking layer formed on the rear surface of the substrate and positioned to chuck the substrate to an electrostatic chuck. The substrate has a non-conducting portion which eliminates electrical conduction between the reflective layer and the chucking layer and electrical conduction between the absorbing layer and the chucking layer, and the non-conducting portion is formed by forming a portion of the substrate covered with one or more covering members and preventing formation of the reflective layer and the absorbing layer.
摘要翻译：一种用于EUV光刻的反射掩模板，包括具有前表面和后表面的基板，形成在基板的前表面上的反射层，形成在反射层上的吸收层，以及形成在反射层的后表面上的夹持层基板并定位成将基板夹持到静电卡盘。衬底具有不导电部分，其消除了反射层和夹持层之间的电传导以及吸收层和夹持层之间的电传导，并且非导电部分通过形成覆盖有一个衬底的衬底的一部分而形成或更多的覆盖构件，并且防止反射层和吸收层的形成。

7. 发明授权

US07922501B2 Substrate earthing mechanism for use in charged-particle beam writing apparatus 有权
标题翻译：用于带电粒子束写入装置的基板接地机构
公开(公告)号：US07922501B2
公开(公告)日：2011-04-12
申请号：US11692414
申请日：2007-03-28
申请人： Yoshiro Yamanaka , Hideo Saito , Mitsunori Hayashi
发明人： Yoshiro Yamanaka , Hideo Saito , Mitsunori Hayashi
IPC分类号： H01R13/648
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/40 , G03F1/78 , H01J37/02 , H01J2237/022
摘要： A substrate earthing mechanism includes a plate-like spring extending toward a substrate in a direction parallel to a surface of the substrate, and a contact portion coupled to a tip end of the plate-like spring for coming into contact with the substrate to thereby provide electrical conduction therebetween. The plate spring and the contact portion are laid out so that a contact position at which the contact portion is in contact with the substrate and a layout position of the plate-like spring are substantially the same in position as each other in a direction at right angles to the substrate surface in the state that the plate spring is out of its elastic deformation.
摘要翻译：基板接地机构包括在与基板的表面平行的方向上朝向基板延伸的板状弹簧，以及与板状弹簧的前端部接合以与基板接触的接触部，其间导电。平板弹簧和接触部分布置成使得接触部分与基板接触的接触位置和板状弹簧的布局位置在右侧方向上彼此基本相同的位置在板弹簧脱离其弹性变形的状态下与基板表面成角度。

8. 发明申请

US20100266939A1 Lithographic Mask and Method of Forming a Lithographic Mask 有权
标题翻译：平版印刷掩模和形成平版印刷掩模的方法
公开(公告)号：US20100266939A1
公开(公告)日：2010-10-21
申请号：US12761876
申请日：2010-04-16
申请人： Haiko Rolff , Carla Byloos , Christoph Noelscher , Nicolo Morgana , Roderick Koehle , Molela Moukara , Ralf Neubauer , Rainer Pforr , Dominique Savignac
发明人： Haiko Rolff , Carla Byloos , Christoph Noelscher , Nicolo Morgana , Roderick Koehle , Molela Moukara , Ralf Neubauer , Rainer Pforr , Dominique Savignac
IPC分类号： G03F1/00
CPC分类号： G03F1/40 , G03F1/26 , G03F1/30 , G03F1/32
摘要： A lithographic mask comprises a first layer including grooves, a second layer including regions, sections and a groove-like structure that encloses the sections. The first and second layers are formed so as to reduce electrical potential differences within the second layer. A method of forming a lithographic mask includes forming first and second layers to dispose the second layer over the first layer, patterning the second layer to comprise sections, a region, and a groove-like structure enclosing the sections, and forming grooves in the first layer at portions not covered by the second layer. The first and second layers are formed to reduce potential differences within the second layers during the step of forming the grooves in the first layer.
摘要翻译：平版印刷掩模包括包括凹槽的第一层，包含区域的第二层和包围区段的凹槽状结构。形成第一层和第二层以便减小第二层内的电位差。形成光刻掩模的方法包括形成第一层和第二层以将第二层设置在第一层上，将第二层图案化以包括封闭这些区段的区段，区域和沟槽状结构，以及在第一层中形成凹槽层在未被第二层覆盖的部分。形成第一层和第二层，以在形成第一层中的槽的步骤期间减小第二层内的电位差。

9. 发明授权

US07327013B2 Stencil mask with charge-up prevention and method of manufacturing the same 失效
标题翻译：具有防止充电的模板面罩及其制造方法
公开(公告)号：US07327013B2
公开(公告)日：2008-02-05
申请号：US10743522
申请日：2003-12-23
申请人： Takeshi Shibata , Kyoichi Suguro
发明人： Takeshi Shibata , Kyoichi Suguro
IPC分类号： H01L29/06
CPC分类号： G03F1/20 , G03F1/40
摘要： A drive unit is described for switching circuit breakers on and off, in particular disconnecting switches and/or grounding switches of medium-voltage switchgear. The drive unit includes a reversible d.c. motor and a switching device containing two separately drivable and interlocked reversing switches, one assigned to each direction of rotation of the d.c. motor, their contacts performing the current reversal on the windings of the d.c. motor as required to reverse the direction of rotation. The drive unit further includes power contactors whose contacts have the required switching capacity for load switching. The all-or-nothing relays and safety switches are implemented by uniform low-power relays representing the direction of rotation, each having at least two electrically isolated relay contacts connected in parallel and also having an equalizing capacitor connected in parallel to each. Such drive units are used in connection with switchgear for power transmission and distribution.
摘要翻译：在模板掩模中，导电薄膜在其中具有第一开口。在除了第一开口之外的导电薄膜的区域中形成绝缘膜。在绝缘膜上形成导电支撑。第二个开口穿过导电支撑和绝缘膜并到达导电薄膜的表面。导电构件形成在第二开口中。导电构件电连接导电支撑件和导电薄膜。

10. 发明授权

US07074526B2 Photomask covered with light-transmissive and electrically-conductive polymer material 有权
标题翻译：光掩模覆盖有透光和导电的聚合物材料
公开(公告)号：US07074526B2
公开(公告)日：2006-07-11
申请号：US10456667
申请日：2003-06-05
申请人： Yoji Hata
发明人： Yoji Hata
IPC分类号： G03F9/00
CPC分类号： G03F1/48 , G03F1/40
摘要： A photomask by which no electrostatic damage or damage of a mask pattern due to electrification is produced. The photomask has a substrate; mask patterns formed on the substrate, which are made of a light blocking material and are covered with a light-transmissive and electrically conductive polymer material. Even the mask patterns which are isolated from each other on the substrate are electrically conductive with each other. Typically, the mask patterns are covered with an electrically conductive film made of the light-transmissive and electrically conductive polymer material. The electrically conductive film may have a thickness by which when foreign particles land on the electrically conductive film, an optical image of the foreign particles is defocused on a sample to be exposed in the exposure process, so that shapes of the foreign particles are not transferred. In this case, a pellicle, which is conventionally provided on the substrate, is unnecessary.
摘要翻译：不产生静电损伤或由于带电导致的掩模图案损坏的光掩模。光掩模具有基板; 形成在基板上的掩模图案，其由遮光材料制成并且被透光和导电的聚合物材料覆盖。即使在基板上彼此隔离的掩模图案彼此导电。通常，掩模图案被由透光和导电聚合物材料制成的导电膜覆盖。导电膜可以具有当外来颗粒落在导电膜上时的厚度，外来颗粒的光学图像在曝光过程中在要暴露的样品上散焦，使得外来颗粒的形状不被转印。在这种情况下，通常设置在基板上的防护薄膜组件是不必要的。

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