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1. 发明授权

US07776506B2 Coating compositions for photoresists 有权
标题翻译：光刻胶的涂料组合物
公开(公告)号：US07776506B2
公开(公告)日：2010-08-17
申请号：US11651090
申请日：2007-01-08
申请人： Deyan Wang , Peter Trefonas, III , Michael K. Gallagher
发明人： Deyan Wang , Peter Trefonas, III , Michael K. Gallagher
IPC分类号： G03C1/76 , G03C1/492 , G03C1/494 , G03C5/00
CPC分类号： G03F7/11 , G03F7/0392 , G03F7/2041
摘要： In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
摘要翻译：一方面，本发明涉及包含树脂组分的涂料组合物，其中树脂组分的主要部分包含至少基本上不含氟的一种或多种树脂。本发明的涂料组合物可用作光致抗蚀剂外涂层，包括浸渍光刻加工。

2. 发明授权

US07773162B2 Signing film 有权
标题翻译：签名电影
公开(公告)号：US07773162B2
公开(公告)日：2010-08-10
申请号：US11771100
申请日：2007-06-29
申请人： Uwe Nendel
发明人： Uwe Nendel
IPC分类号： G02F1/13 , G03C1/76 , G03C1/492 , G03C1/494
CPC分类号： B42D25/318 , B41M3/144 , B41M3/148 , B42D25/00 , B42D25/387 , G03G21/043 , Y10S428/915 , Y10S428/917
摘要： There is described a signing film wherein provided on a background of the signing film is a decorative printing which forms a security feature and which fluoresces when viewed under UV light. So that the decorative printing which fluoresces under UV light is not to be perceived when viewing the surface of the signing film at different viewing angles in ambient light, it is proposed that the background of the signing film has at least two background layers and between them the decorative printing comprising a lacquer which contains a high-viscosity binding agent and is mixed with pigments which fluoresce under UV light, so that after the printing operation and the drying operation it is of a small layer thickness as a consequence of the high viscosity.
摘要翻译：描述了一种签名膜，其中在签名膜的背景上提供了形成安全特征并在UV光下观察时发荧光的装饰性印刷。因此，在环境光下以不同的视角观看签名膜的表面时，不会感觉到在UV光下发荧光的装饰性印刷物，所以建议签字膜的背景至少有两个背景层和它们之间该装饰性印刷品包含含有高粘度粘合剂的漆，并与在紫外光下发荧光的颜料混合，使得在印刷操作和干燥操作之后，由于粘度高而具有小层厚度。

3. 发明授权

US07713678B2 Resist material and electron beam recording resist material 失效
标题翻译：抗蚀材料和电子束记录抗蚀材料
公开(公告)号：US07713678B2
公开(公告)日：2010-05-11
申请号：US11921327
申请日：2006-05-26
申请人： Yasuo Hosoda
发明人： Yasuo Hosoda
IPC分类号： G03C1/76 , G03C1/494 , G03C1/492 , G03C5/00
CPC分类号： G03F7/0043 , G03F7/2059
摘要： The invention mainly intends to provide a resist material that is high in the sensitivity to light and an electron beam and enables to form a clear and fine pattern with less exposure. In order to achieve the object, the invention provides a resist material comprising a metal compound, wherein a metal element constituting the metal compound is a 14th group or 15th group metal element and the metal compound is a stoichiometrically incomplete compound.
摘要翻译：本发明主要提供一种对光和电子束的灵敏度高的抗蚀剂材料，能够以较少的曝光形成清晰细致的图案。为了达到上述目的，本发明提供了包含金属化合物的抗蚀剂材料，其中构成金属化合物的金属元素是第14族或第15族金属元素，金属化合物是化学计量不完全的化合物。

4. 发明授权

US07498115B2 Photoresist compositions 有权
标题翻译：光刻胶组合物
公开(公告)号：US07498115B2
公开(公告)日：2009-03-03
申请号：US11294816
申请日：2005-12-06
申请人： Joan M. Mintz , Michael J. Kaufman , Norman S. Jessiman
发明人： Joan M. Mintz , Michael J. Kaufman , Norman S. Jessiman
IPC分类号： G03C1/492 , G03C1/494 , G03C1/76
CPC分类号： G03F7/0045 , G03F7/0048 , G03F7/0382 , G03F7/0392
摘要： Photoresists of the invention contain an added acid reaction component together with one or more resins and a photoactive component. Preferred photoresists of the invention can provide processes substrates such as microelectronic wafers with desired iso-dense bias values. Particularly preferred photoresists of the invention are chemically-amplified positive-acting resists and contain an ester-based solvent such as ethyl lactate or propylene glycol methyl ether acetate in addition to the acid reaction component.
摘要翻译：本发明的光刻胶含有一种添加的酸反应组分以及一种或多种树脂和光活性组分。本发明优选的光刻胶可以提供具有所需等密度偏差值的工艺衬底例如微电子晶片。本发明的特别优选的光致抗蚀剂除酸反应组分外，也是化学扩增的正性作用抗蚀剂，并含有乳酸或乙二醇甲基醚乙酸酯等酯类溶剂。

5. 发明授权

US07416831B2 Substrate for lithographic printing plate precursor 失效
标题翻译：平版印刷版原版底物
公开(公告)号：US07416831B2
公开(公告)日：2008-08-26
申请号：US10922782
申请日：2004-08-20
申请人： Koji Hayashi , Eiji Hayajawa , Yasushi Miyamoto , Hideo Sakurai
发明人： Koji Hayashi , Eiji Hayajawa , Yasushi Miyamoto , Hideo Sakurai
IPC分类号： G03C1/492 , B32B15/08
CPC分类号： B41N1/083 , B41C1/1016 , B41C2201/04 , B41C2201/10 , B41C2210/02 , B41C2210/04 , B41C2210/08 , B41C2210/22 , B41C2210/24 , B41N3/038 , Y10T428/31678 , Y10T428/31692 , Y10T428/31699
摘要： Substrates for imageable elements are disclosed. The substrates comprise, in order, an aluminum or aluminum alloy support, a silicate layer, and a layer of interlayer material. The interlayer material is a co-polymer that comprise (1) phosphonic acid groups and/or phosphate groups and (2) acid groups and/or groups that comprise ethylene glycol or polyethylene glycol side chains. Imageable elements that comprise an imageable layer over the interlayer material are useful as lithographic printing plate precursors.
摘要翻译：公开了可成像元件的基板。基材依次包括铝或铝合金载体，硅酸盐层和中间层材料层。中间层材料是包含（1）膦酸基团和/或磷酸酯基团的共聚物和（2）包含乙二醇或聚乙二醇侧链的酸基团和/或基团。在中间层材料上形成可成像层的可成像元件可用作平版印刷版前体。

6. 发明授权

US07390610B2 Color forming composition 有权
标题翻译：成色组合物
公开(公告)号：US07390610B2
公开(公告)日：2008-06-24
申请号：US11253772
申请日：2005-10-18
申请人： Michael J. Day
发明人： Michael J. Day
IPC分类号： G03C1/494 , G03C1/492 , G03C1/76
CPC分类号： B41M5/323 , B41M5/3275 , B41M5/333 , B41M5/3372
摘要： The present disclosure discloses a color former phase. According to one exemplary embodiment discussed herein, an exemplary color former phase includes at least one color former, a radiation absorber, and an acrylic resin, in which the color former, the radiation absorber, and the acrylic resin form an amorphous solid.
摘要翻译：本公开公开了一种着色剂相。根据本文讨论的一个示例性实施方案，示例性的着色剂相包括至少一种成色剂，辐射吸收剂和丙烯酸树脂，其中成色剂，辐射吸收剂和丙烯酸树脂形成无定形固体。

7. 发明授权

US07323285B2 Extruded slipping layer for thermal donor 失效
标题翻译：热供体的挤压滑动层
公开(公告)号：US07323285B2
公开(公告)日：2008-01-29
申请号：US11274463
申请日：2005-11-15
申请人： David G. Foster , Narasimharao Dontula , Maurice L. Gray , William H. Simpson
发明人： David G. Foster , Narasimharao Dontula , Maurice L. Gray , William H. Simpson
IPC分类号： G03C8/00 , G03C1/492 , G03C1/494 , B41M5/00 , B05D1/02
CPC分类号： B41M5/41 , Y10S428/913 , Y10S430/136 , Y10S430/165 , Y10T428/31
摘要： A thermal donor element having a dye layer on an extruded substrate, wherein the extruded substrate includes a polyester-containing material and a slip agent, but does not contain silica particles, is disclosed.
摘要翻译：一种在挤出基板上具有染料层的供热体元件，其中挤出的基材包括含聚酯的材料和增滑剂，但不包含二氧化硅颗粒。

8. 发明授权

US07306899B2 Method for manufacturing photoresist having nanoparticles 有权
公开(公告)号：US07306899B2
公开(公告)日：2007-12-11
申请号：US11492283
申请日：2006-07-24
申请人： MeiLing Wu
发明人： MeiLing Wu
IPC分类号： G03C5/00 , G03C1/76 , G03C1/492 , G03C1/494
CPC分类号： G03F7/0007 , G03F7/0047
摘要： An exemplary method for manufacturing photoresist includes the steps of: adding a metal salt into an aqueous solution, whereby the aqueous solution contains metallic ions (211); adding a sulfide containing sulfur ions (231) into the aqueous solution; adding a polymerizable surfactant (220) into the aqueous solution thereby forming metallic ion reverse micelles (210) and sulfur ion reverse micelles (230); reacting the metallic ion reverse micelles and the sulfur ion reverse micelles to create monomeric sulfureted metal nanoparticle reverse micelles (240); aggregating the monomeric sulfureted metal nanoparticle reverse micelles to polymeric macromolecular nanoparticles; and doping the polymeric macromolecules nanoparticles into a base material in order to obtain the photoresist having sulfureted metal nanoparticles. A diameter of the nanoparticles is in the range from 1×10−9 meters to 1×10−7 meters.

9. 发明授权

US07198884B2 Heat stable photocurable resin composition for dry film resist 失效
标题翻译：用于干膜抗蚀剂的热稳定的光固化树脂组合物
公开(公告)号：US07198884B2
公开(公告)日：2007-04-03
申请号：US10520701
申请日：2003-07-01
申请人： Hidetaka Oka , Masaki Ohwa , James Philip Taylor
发明人： Hidetaka Oka , Masaki Ohwa , James Philip Taylor
IPC分类号： G03C1/805 , G03C1/494 , G03C1/492 , G03C1/76
CPC分类号： G03F7/029 , G03F7/027 , G03F7/092 , G03F7/105 , G03F7/11 , G03F7/161 , Y10S430/111
摘要： The invention relates to a process for preparing a dry film resist by forming a photocurable resin composition onto a support film with a thickness of 1 to 50 μm and optionally laminate a protective film onto the photocurable composition layer to obtain a dry film resist; whereby the photocurable resin is formed from a homogeneous mixture comprising (a) from 20–90 wt % of an alkaline soluble binder oligomer or polymer; (b) from 5 to 60 wt % of one or more photopolymerizable monomers which are compatible with the oligomers and polymers of component (a); (c) from 0.01 to 20% by weight of one or more photoinitiators; (d) from 0 to 20% by weight of additives and/or assistants; and (e) from 0.1 to 10% by weight of a leuco triphenylmethane dye of the formula (I), wherein R1 is a residue selected from (II), R2 is C1–C12 alkyl or phenyl which may be mono-, di- or tri-substituted by C1–C6 alkyl, trifluoromethyl, C1-6 alkoxy, C1-6 alkylthio, halogen and nitro; R3 is hydrogen or C1–C12 alkyl; R4 to R9 independently of one another are hydrogen or C1–C12 alkyl; X is O, S, NH or N—C1–C12-alkyl; (a) to (e) being 100% by weight. The above composition is useful to avoid unfavourable colour generation during the heat lamination
摘要翻译：本发明涉及一种制备干膜抗蚀剂的方法，该方法是将光固化性树脂组合物形成在厚度为1〜50μm的载体膜上，任选地将保护膜层叠在光固化性组合物层上，得到干膜抗蚀剂; 由此可光固化树脂由包含（a）20-90重量％的碱溶性粘合剂低聚物或聚合物的均匀混合物形成; （b）5至60重量％的与组分（a）的低聚物和聚合物相容的一种或多种可光聚合单体; （c）0.01至20重量％的一种或多种光引发剂; （d）0至20重量％的添加剂和/或助剂; 和（e）0.1至10重量％的式（I）的无色三苯甲烷染料，其中R 1是选自（II），R 2 O / 是C 1 -C 12烷基或可以被C 1 -C 1亚烷基取代的苯基， C 1-6烷基，三氟甲基，C 1-6烷氧基，C 1-6烷基硫基，卤素和硝基; R 3是氢或C 1 -C 12烷基; R 3是氢或C 1 -C 12烷基; R 9与R 9彼此独立地是氢或C 1 -C 12烷基; X是O，S，NH或N-C 1 -C 12 - 烷基; （a）至（e）为100重量％。上述组合物可用于在热层压期间避免不利的颜色产生

10. 发明申请

US20060108063A1 Sheet with anti-counterfeit functions and manufacturing method for same, article, authentication card, bar code label and authentication system 失效
标题翻译：具有防伪功能和制造方法的纸张，文章，认证卡，条形码标签和认证系统
公开(公告)号：US20060108063A1
公开(公告)日：2006-05-25
申请号：US11280735
申请日：2005-11-17
申请人： Seiji Umemoto , Miki Shiraogawa , Takahiro Fukuoka , Naoki Takahashi , Kentarou Takeda
发明人： Seiji Umemoto , Miki Shiraogawa , Takahiro Fukuoka , Naoki Takahashi , Kentarou Takeda
IPC分类号： G03C1/492
CPC分类号： B42D25/364 , B41M3/14 , B41M7/0045 , B42D25/00 , B42D25/328 , B42D2033/26 , G03C5/08
摘要： A sheet with anti-counterfeit functions for making counterfeiting highly difficult in the case where authentication information is recorded using the properties of cholesteric liquid crystal is provided. A cholesteric liquid crystal layer 110 having a selective reflected wavelength band in at least the visible light region is provided in such a manner that this cholesteric liquid crystal layer 110 is a single layer of which thickness is approximately uniform, and an authentication region 112 of which selective reflected wavelength band is different is provided in at least one place. Preferably, an adhesive layer 130 is provided on one side of the cholesteric liquid crystal layer 110. Preferably, a base 120 is provided between the cholesteric liquid crystal layer 110 and the adhesive layer 130. Preferably, a light absorbing layer 140 is provided on adhesive layer 130 of the cholesteric liquid crystal layer 110.
摘要翻译：提供了在使用胆甾型液晶的性质记录认证信息的情况下，具有防伪功能的纸张，其制造伪造非常困难。至少在可见光区域具有选择性反射波长带的胆甾型液晶层110以这样的方式被提供，使得该胆甾醇型液晶层110是厚度近似均匀的单层，其认证区域112 选择性反射波长带在至少一个地方是不同的。优选地，粘合剂层130设置在胆甾型液晶层110的一侧。优选地，在胆甾醇型液晶层110和粘合剂层130之间设置基底120.优选地，在粘合剂上设置光吸收层140 胆甾型液晶层110的层130。

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