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1. 发明授权

US5277539A Substrate conveying apparatus 失效
标题翻译：基板输送装置
公开(公告)号：US5277539A
公开(公告)日：1994-01-11
申请号：US58791
申请日：1993-05-10
申请人： Shin Matsui , Takao Kariya , Nobutoshi Mizusawa , Ryuichi Ebinuma , Shunichi Uzawa
发明人： Shin Matsui , Takao Kariya , Nobutoshi Mizusawa , Ryuichi Ebinuma , Shunichi Uzawa
IPC分类号： G03F7/20 , H01L21/677 , H01L21/68 , B65G47/24
CPC分类号： G03F7/70691 , H01L21/67766 , H01L21/67778 , H01L21/68
摘要： A substrate conveying apparatus usable with a semiconductor manufacturing apparatus wherein a pattern of a mask is transferred onto a semiconductor wafer by exposing the semiconductor wafer to synchrotron orbital radiation or other exposure energy through a mask. The conveying apparatus transfers the semiconductor wafer to and from a wafer chuck while the surface thereof extends vertically, and/or transfers the wafer to and from a wafer cassette which contains a plurality of wafers horizontally. The apparatus includes a conveying hand having a gimbal mechanism for supporting the semiconductor wafer to assure the semiconductor wafer transfer to and from the wafer chuck while the wafer is vertical. When the semiconductor wafer is transferred to and from a wafer cassette, the apparatus is provided with a correcting mechanism for correcting the attitude of the conveying hand to prevent the semiconductor wafer from contacting the wafer cassette.
摘要翻译：一种可用于半导体制造装置的基板输送装置，其中通过将半导体晶片暴露于同步加速器轨道辐射或通过掩模的其他曝光能量将掩模的图案转印到半导体晶片上。输送装置将晶片卡盘的表面向垂直方向延伸和/或从晶片卡盘传送半导体晶片，和/或将晶片从包含多个晶片的晶片盒水平地传送到晶片盒。该装置包括具有用于支撑半导体晶片的万向架机构的传送手，以确保半导体晶片在晶片垂直时传送到晶片卡盘。当将半导体晶片转移到晶片盒或从晶片盒转移时，该装置设置有校正机构，用于校正传送手的姿态以防止半导体晶片接触晶片盒。

2. 发明授权

US5999589A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5999589A
公开(公告)日：1999-12-07
申请号：US140679
申请日：1998-08-26
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.
摘要翻译：基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

3. 发明授权

US5883932A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5883932A
公开(公告)日：1999-03-16
申请号：US464225
申请日：1995-06-05
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.
摘要翻译：一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

4. 发明授权

US5930324A Exposure apparatus and device manufacturing method using the same 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US5930324A
公开(公告)日：1999-07-27
申请号：US831867
申请日：1997-04-02
申请人： Shin Matsui , Ryuichi Ebinuma , Yuji Chiba , Yutaka Tanaka
发明人： Shin Matsui , Ryuichi Ebinuma , Yuji Chiba , Yutaka Tanaka
IPC分类号： G03F7/20 , G03F9/00 , H01L21/30
CPC分类号： G03F7/702 , G03F7/70691 , G03F7/70841 , G03F9/7015
摘要： An exposure apparatus for exposing a wafer to a mask with radiation light to thereby transfer a pattern of the mask onto the wafer, includes a light emitting portion for emitting the radiation light, a stepper major assembly having a wafer stage portion for holding the wafer and being supported by a supporting system separate from the light emitting portion, an alignment measuring portion for alignment measurement for the wafer and the mask and being supported by a supporting system separate from the stepper major assembly, and a correcting system for correcting attitude of the alignment measuring portion with respect to an optical axis of the radiation light.
摘要翻译：一种曝光装置，用于将辐射光将晶片曝光于掩模，从而将掩模图案转印到晶片上，包括用于发射辐射光的发光部分，具有用于保持晶片的晶片台部分的步进主要组件，由与发光部分分开的支撑系统支撑，对准测量部分，用于晶片和掩模的对准测量，并由与步进主要组件分离的支撑系统支撑;以及校正系统，用于校正对准姿态测量部分相对于辐射光的光轴。

5. 发明授权

US07566422B2 Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus 失效
标题翻译：带有储存氦气的储罐的曝光装置和使用曝光装置的制造装置的方法
公开(公告)号：US07566422B2
公开(公告)日：2009-07-28
申请号：US11201142
申请日：2005-08-11
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05D16/00 , C23C14/00
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

6. 发明授权

US07218383B2 Holding system, exposure apparatus, and device manufacturing method 有权
标题翻译：保持系统，曝光装置和装置制造方法
公开(公告)号：US07218383B2
公开(公告)日：2007-05-15
申请号：US11555711
申请日：2006-11-02
申请人： Shin Matsui
发明人： Shin Matsui
IPC分类号： G03B27/58
CPC分类号： G03F7/70783 , G03B27/58 , G03F7/70708
摘要： A holding system, provided on a movable stage, for holding an object from above, against gravity. The holding system includes at least one holding portion adapted to be in contact with the object, to hold the object from above, and at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto.
摘要翻译：一种保持系统，设置在可移动的台上，用于从上方保持物体以防止重力。保持系统包括适于与物体接触的至少一个保持部分，用于将物体从上方夹持，以及至少一个吸引部分，用于向上吸引物体的有限部分而不与其接触。

7. 发明授权

US07187432B2 Holding system, exposure apparatus, and device manufacturing method 有权
标题翻译：保持系统，曝光装置和装置制造方法
公开(公告)号：US07187432B2
公开(公告)日：2007-03-06
申请号：US10987148
申请日：2004-11-15
申请人： Shin Matsui
发明人： Shin Matsui
IPC分类号： G03B27/58
CPC分类号： G03F7/70783 , G03B27/58 , G03F7/70708
摘要： A holding system for holding an object from above, against gravity. The holding system includes at least one holding portion adapted to be in contact with the object, to hold the object from above, at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto, and a gap measuring unit for measuring a gap between the object and the at least one attracting portion. The attraction force of the attracting portion is controlled on the basis of the measurement made by the gap measuring unit.
摘要翻译：用于从上方保持物体的反作用力的保持系统。保持系统包括适于与物体接触的至少一个保持部分，用于从上方保持物体，至少一个吸引部分用于向上吸引物体的有限部分而不与其接触;以及间隙测量单元，用于测量所述物体与所述至少一个吸引部分之间的间隙。基于由间隙测量单元进行的测量来控制吸引部分的吸引力。

8. 发明授权

US06225637B1 Electron beam exposure apparatus 失效
标题翻译：电子束曝光装置
公开(公告)号：US06225637B1
公开(公告)日：2001-05-01
申请号：US08954520
申请日：1997-10-20
申请人： Shigeru Terashima , Masato Muraki , Masahiko Okunuki , Akira Miyake , Shin Matsui
发明人： Shigeru Terashima , Masato Muraki , Masahiko Okunuki , Akira Miyake , Shin Matsui
IPC分类号： H01J37302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/045 , H01J2237/31767
摘要： An electron beam exposure apparatus for projecting an image formed by electron beams onto a wafer via a reduction electron optical system, irradiates collimated electron beams toward an aperture board having an arcuated aperture sandwiched between two arcs having, as the center, the axis of the reduction electron optical system, and exposes the wafer with electron beams having an arcuated sectional shape that have been transmitted through the aperture.
摘要翻译：一种用于通过还原电子光学系统将由电子束形成的图像投影到晶片上的电子束曝光装置，将准直的电子束照射到具有弧形孔的孔板，该弧形孔夹在两个弧之间，该弧之间以中心为中心电子光学系统，并且使具有已经透过该孔的弧形截面形状的电子束曝光晶片。

9. 发明申请

US20100081355A1 SUBSTRATE HOLDING APPARATUS, CARRIER, SUBSTRATE PROCESSING APPARATUS, AND IMAGE DISPLAY DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：基板保持装置，载体，基板处理装置和图像显示装置的制造方法
公开(公告)号：US20100081355A1
公开(公告)日：2010-04-01
申请号：US12568396
申请日：2009-09-28
申请人： Masato INOUE , Shin Matsui , Yasuo Kato
发明人： Masato INOUE , Shin Matsui , Yasuo Kato
IPC分类号： H01J9/00
CPC分类号： H01J9/241
摘要： An apparatus comprises a carrier configured to hold a mask containing a magnetic material and a substrate by magnetically attracting the mask via the substrate, and a controller configured to control the carrier, the carrier including a permanent electromagnet and a first contact, the permanent electromagnet including a variable-polarity magnet, a coil electrically connected to the first contact and generates a magnetic field for changing the polarity of the variable-polarity magnet by an electric current supplied via the first contact, and a fixed-polarity magnet. The controller includes a second contact which is in contact with the first contact and supplies an electric current to the coil via the first contact, a sensor unit which senses a contact state between the first contact and the second contact, and a current supply unit which supplies an electric current to the coil via the first contact and the second contact.
摘要翻译：一种装置，包括：载体，被配置为通过经由衬底磁吸引掩模来保持包含磁性材料和基底的掩模;以及控制器，被配置为控制载体，所述载体包括永久电磁体和第一接触，所述永磁电动机包括一个可变极性磁体，一个电连接到该第一触点的线圈，并产生用于通过经由该第一触点提供的电流来改变该可变极性磁体的极性的磁场和一个固定极性的磁体。所述控制器包括与所述第一接触件接触并且经由所述第一接触件向所述线圈提供电流的第二接触件，感测所述第一接触件和所述第二接触件之间的接触状态的传感器单元和电流供应单元，经由第一触点和第二触点向线圈供给电流。

10. 发明申请

US20100079054A1 PROCESSING APPARATUS AND IMAGE DISPLAY DEVICE 审中-公开
标题翻译：处理装置和图像显示装置
公开(公告)号：US20100079054A1
公开(公告)日：2010-04-01
申请号：US12568056
申请日：2009-09-28
申请人： Masato INOUE , Shin Matsui , Akira Kodama
发明人： Masato INOUE , Shin Matsui , Akira Kodama
IPC分类号： H01J1/62 , B05C11/00
CPC分类号： H05B33/10 , C23C14/042 , C23C14/56
摘要： The present invention provides a processing apparatus including a processing unit configured to process a processing object in a processing chamber by bringing a mask into contact with the processing object at a predetermined position, a base configured to hold the processing object on a holding surface, a structure configured to connect the base in a portion opposite to the holding surface of the base, and a driving unit configured to change a processing position of the processing object by pivoting the structure about a rotation shaft parallel to the holding surface of the base, the processing unit including an operation unit configured to perform, at an identical position, a fixing process and a release process, and a deposition processing unit configured to perform a deposition process on the processing object while the mask is in contact with the processing object.
摘要翻译：本发明提供一种处理装置，包括：处理单元，被配置为通过使掩模与预定位置处理对象接触来处理处理室中的处理对象;基部，被配置为将处理对象保持在保持面上; 结构构造成在与基座的保持表面相对的部分中连接基部;以及驱动单元，其构造成通过围绕平行于基部的保持表面的旋转轴枢转结构来改变处理对象的处理位置，处理单元，其包括被配置为在相同位置执行定影处理和释放处理的操作单元，以及沉积处理单元，被配置为在所述掩模与所述处理对象接触的同时对所述处理对象执行沉积处理。

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