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1. 发明授权

US5760881A Exposure apparatus with light shielding portion for plotosensitive elements 失效
标题翻译：具有光敏元件遮光部分的曝光装置
公开(公告)号：US5760881A
公开(公告)日：1998-06-02
申请号：US540458
申请日：1995-10-10
申请人： Seiji Miyazaki , Kei Nara , Hiroshi Shirasu , Tsuyoshi Narabe
发明人： Seiji Miyazaki , Kei Nara , Hiroshi Shirasu , Tsuyoshi Narabe
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/72
CPC分类号： G03F7/70066 , G03F7/70216 , G03F7/70358 , G03F9/70
摘要： An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.
摘要翻译：一种曝光装置，具有照明光学系统，用于将来自光源的光束照射到掩模的图案区域，用于通过通过掩模的光束将图案区域的图像转印到感光基板上，具有多个设置在彼此对应的位置处的掩模和感光基板上的第一参考标记和第二参考标记的集合，以及用于屏蔽朝向第二参考标记辐射的光束的遮光装置，由此可以重新 - 通过防止掩模上的第一参考标记叠加在感光基板上的第二参考标记上或者被转印到靠近第二参考标记的部分上，从而在后处理中使用第二参考标记。

2. 发明授权

US5798822A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5798822A
公开(公告)日：1998-08-25
申请号：US950964
申请日：1997-10-15
申请人： Seiji Miyazaki , Hiroshi Shirasu , Kazuaki Saiki , Tsuyoshi Narabe
发明人： Seiji Miyazaki , Hiroshi Shirasu , Kazuaki Saiki , Tsuyoshi Narabe
IPC分类号： G03F7/207 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70358 , G03F9/7026
摘要： A pair of reference plates is so arranged as to have a predetermined positional relationship on a carriage that integrally holds a mask and a photosensitive substrate such that the mask and the photosensitive substrate oppose each other on two sides of a projecting optical system. By periodically detecting the positional relationship between the reference plates in the optical axis direction, a variation with time occurring in the detection characteristics of position detecting devices is detected. Both stable image formation characteristics and a high throughput are realized by correcting a driving signal to be supplied to a driving device in accordance with the detected variation.
摘要翻译：一对参考板被布置为在一体地保持掩模和感光基板的托架上具有预定的位置关系，使得掩模和感光基板在投影光学系统的两侧彼此相对。通过周期性地检测基准板在光轴方向上的位置关系，检测位置检测装置的检测特性中随时间的变化。通过根据检测到的变化来校正要提供给驱动装置的驱动信号，实现稳定的图像形成特性和高吞吐量。

3. 发明授权

US6049372A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US6049372A
公开(公告)日：2000-04-11
申请号：US881902
申请日：1997-06-23
申请人： Kinya Kato , Hiroshi Shirasu , Yukio Kakizaki , Kei Nara
发明人： Kinya Kato , Hiroshi Shirasu , Yukio Kakizaki , Kei Nara
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70775 , G03F9/70
摘要： Apparatus and methods are disclosed for transferring a pattern defined by a mask onto a surface of a substrate. The apparatus includes an illumination optical system for illuminating the pattern on the mask. A projection optical system forms an erect image of the pattern on the substrate. For exposure, the mask and substrate are movable together in a scanning direction relative to the projection optical system. First and second relative-displacement measuring systems, the first being separated from the second by a predetermined distance perpendicular to the scanning direction, measure displacement of the mask relative to the substrate in the scanning direction. First and second detection systems detect displacement of the mask and substrate, respectively, in the direction perpendicular to the scanning direction. A position-adjusting system adjusts the position of at least one of the mask and substrate. A calculation system calculates a position-adjusting amount based on outputs from the first and second relative-displacement measuring systems and from the first and second detection systems. A control system controls the position-adjusting system based on an output from the calculation system.
摘要翻译：公开了用于将由掩模限定的图案转印到基板的表面上的装置和方法。该装置包括用于照亮掩模上的图案的照明光学系统。投影光学系统在基板上形成图案的直立图像。为了曝光，掩模和基板可相对于投影光学系统沿扫描方向一起移动。第一和第二相对位移测量系统，第一和第二相对位移测量系统，其中第一相对位移测量系统从垂直于扫描方向的预定距离与第二相对位移测量系统分离，测量掩模相对于基板在扫描方向第一和第二检测系统分别在与扫描方向垂直的方向上检测掩模和基板的位移。位置调整系统调整至少一个掩模和基底的位置。计算系统基于来自第一和第二相对位移测量系统以及第一和第二检测系统的输出来计算位置调整量。控制系统根据计算系统的输出控制位置调整系统。

4. 发明授权

US5657130A Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US5657130A
公开(公告)日：1997-08-12
申请号：US408714
申请日：1995-03-22
申请人： Hiroshi Shirasu , Kazuaki Saiki , Seiji Miyazaki , Susumu Mori
发明人： Hiroshi Shirasu , Kazuaki Saiki , Seiji Miyazaki , Susumu Mori
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F7/70216 , G03F7/70275 , G03F7/70358 , G03F7/70791 , G03F9/70
摘要： In an exposure apparatus and method, a mask and a substrate are scanned in synchronism with each other so that the pattern of the mask may be transferred onto the substrate through a projection optical system. First beams of light are irradiated to least two locations on the mask spaced apart in a direction intersecting the scanning direction of the mask. The reflected light thereof is received, and the positions of the points on the mask to which the beam of light has been irradiated are detected in the direction of the optical axis of the projection optical system. In addition, second beams of light are irradiated to at least two locations on the substrate spaced apart in the scanning direction, and the reflected light thereof is received. The positions of the points on the substrate to which the second beam of light has been irradiated are also detected in the direction of the optical axis of the projection optical system are detected. The posture of at least one of the mask and the substrate is adjusted on the basis of the positions detected with the first and second beams.
摘要翻译：在曝光装置和方法中，掩模和基板彼此同步地扫描，使得掩模的图案可以通过投影光学系统被转印到基板上。第一光束照射在与掩模的扫描方向相交的方向间隔开的掩模上的至少两个位置。在投影光学系统的光轴的方向上检测其反射光，并且在光束照射的掩模上的点的位置被检测。此外，第二光束照射到沿扫描方向间隔开的基板上的至少两个位置，并且其反射光被接收。检测到在投影光学系统的光轴的方向上检测到已经照射第二光束的基板上的点的位置。基于由第一和第二光束检测到的位置来调整掩模和基板中的至少一个的姿势。

5. 发明授权

US08704431B2 Discharge lamp, light source apparatus, exposure apparatus, and exposure apparatus manufacturing method 有权
标题翻译：放电灯，光源装置，曝光装置和曝光装置的制造方法
公开(公告)号：US08704431B2
公开(公告)日：2014-04-22
申请号：US13462454
申请日：2012-05-02
申请人： Hiroshi Shirasu , Yasuo Aoki , Motoo Koyama , Takayuki Kikuchi
发明人： Hiroshi Shirasu , Yasuo Aoki , Motoo Koyama , Takayuki Kikuchi
IPC分类号： H01J61/52
CPC分类号： F21V19/006 , G03F7/70016 , H01J5/56 , H01J61/523 , H01J61/822
摘要： A light source apparatus is equipped with a discharge lamp, which has a glass tube that forms a light emitting part and a base member that is coupled thereto, and a mounting apparatus that holds the discharge lamp via the base member. Therein, the base member has a flange part that contacts positioning plate of the mounting apparatus, and a fixed part that is urged with a pressing force that presses the flange part to the positioning plate. Furthermore, the mounting apparatus has a fixing arm that urges the fixed part by a compression coil spring.
摘要翻译：光源装置配备有放电灯，其具有形成发光部的玻璃管和与其连接的基座部件，以及通过基座部件保持放电灯的安装装置。其特征在于，所述基座部件具有与所述安装装置的定位板接触的凸缘部以及将所述凸缘部压向所述定位板的按压力而被推压的固定部。此外，安装装置具有通过压缩螺旋弹簧推压固定部的固定臂。

6. 发明申请

US20110043784A1 OBJECT MOVING APPARATUS, OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS, OBJECT INSPECTING APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：对象移动装置，对象处理装置，曝光装置，对象检查装置和装置制造方法
公开(公告)号：US20110043784A1
公开(公告)日：2011-02-24
申请号：US12855181
申请日：2010-08-12
申请人： Yasuo AOKI , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
发明人： Yasuo AOKI , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
IPC分类号： G03B27/58 , B65G47/00 , B65G43/00
CPC分类号： G03F7/707 , B65G49/065 , G03F1/82 , G03F7/70791 , G03F7/70816 , H01L21/67784 , H01L21/68 , H01L21/6838
摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.
摘要翻译：基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

7. 发明授权

US07372544B2 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US07372544B2
公开(公告)日：2008-05-13
申请号：US11797605
申请日：2007-05-04
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/32 , G03B27/42 , G03B27/44 , G03B27/54
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
摘要翻译：曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场元素。所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体辐射图。多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

8. 发明申请

US20070216885A1 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US20070216885A1
公开(公告)日：2007-09-20
申请号：US11797605
申请日：2007-05-04
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/32
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
摘要翻译：曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场元素。所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体辐射图。多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

9. 发明授权

US5920378A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5920378A
公开(公告)日：1999-07-06
申请号：US853389
申请日：1997-05-09
申请人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
发明人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70791 , G03F9/70
摘要： A projection exposure apparatus includes off-axis type plate alignment systems which make it possible to reduce alignment time and thereby increase throughput. Exposure of large photosensitive plates is made possible without increasing the length of the plate stage stroke. Multiple fiducial mark members including fiducial mark members in different positions on a plate stage are utilized. Multiple off-axis type plate alignment systems are used to observe the multiple fiducial marks.
摘要翻译：投影曝光装置包括离轴型板对准系统，其能够缩短对准时间，从而提高生产量。大型感光板的曝光是可能的，而不会增加平板台面行程的长度。使用了多个基准标记，其中包括在平台上不同位置的基准标记成员。多个离轴型板对准系统用于观察多个基准标记。

10. 发明授权

US4319238A Camera display device 失效
标题翻译：相机显示设备
公开(公告)号：US4319238A
公开(公告)日：1982-03-09
申请号：US116393
申请日：1980-01-29
申请人： Akira Ogasawara , Ken Utagawa , Kunihisa Hoshino , Hiroshi Shirasu
发明人： Akira Ogasawara , Ken Utagawa , Kunihisa Hoshino , Hiroshi Shirasu
IPC分类号： G03B13/36 , G01D7/00 , G01R13/40 , G02B7/28 , G03B3/10 , G03B17/18 , G09G3/00
CPC分类号： G01R13/404 , G03B17/18 , G03B3/10
摘要： A display device for a camera uses at least two display elements to display visual information such as focus information. Signals are produced, the relative phases of which indicate in-focus or out of focus conditions.
摘要翻译：用于照相机的显示装置使用至少两个显示元件来显示例如焦点信息的视觉信息。产生信号，其相对相位表示对焦或不在焦点条件。

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