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1. 发明授权

US08699001B2 Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method 有权
标题翻译：物体移动装置，物体处理装置，曝光装置，物体检查装置和装置的制造方法
公开(公告)号：US08699001B2
公开(公告)日：2014-04-15
申请号：US12855181
申请日：2010-08-12
申请人： Yasuo Aoki , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
发明人： Yasuo Aoki , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
IPC分类号： G03B27/58 , G03F7/20 , H01L21/677 , B65G49/06
CPC分类号： G03F7/707 , B65G49/065 , G03F1/82 , G03F7/70791 , G03F7/70816 , H01L21/67784 , H01L21/68 , H01L21/6838
摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.
摘要翻译：基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

2. 发明申请

US20110043784A1 OBJECT MOVING APPARATUS, OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS, OBJECT INSPECTING APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：对象移动装置，对象处理装置，曝光装置，对象检查装置和装置制造方法
公开(公告)号：US20110043784A1
公开(公告)日：2011-02-24
申请号：US12855181
申请日：2010-08-12
申请人： Yasuo AOKI , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
发明人： Yasuo AOKI , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
IPC分类号： G03B27/58 , B65G47/00 , B65G43/00
CPC分类号： G03F7/707 , B65G49/065 , G03F1/82 , G03F7/70791 , G03F7/70816 , H01L21/67784 , H01L21/68 , H01L21/6838
摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.
摘要翻译：基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

3. 发明授权

US5581075A Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area 失效
标题翻译：多光束扫描投影曝光装置和方法，具有大面积均匀曝光的光束监视和控制
公开(公告)号：US5581075A
公开(公告)日：1996-12-03
申请号：US446509
申请日：1995-05-22
申请人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
发明人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
IPC分类号： G03F7/20 , G01J1/32
CPC分类号： G03F7/7005 , G03F7/70091 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.
摘要翻译：曝光装置包括多个用于产生多个光束的照明光学系统，分别对应于多个照明光学系统设置的多个投影光学系统，分别为多个照明设置的多个光强度检测器用于检测多个光束的各个强度的光学系统，用于改变多个光束的各个强度的光强度改变装置，以及用于控制光强度改变装置的控制装置，并且使多个光束的强度均匀化光束达到基本上固定的水平。

4. 发明授权

US06266131B1 Exposure apparatus 有权
标题翻译：曝光装置
公开(公告)号：US06266131B1
公开(公告)日：2001-07-24
申请号：US09309709
申请日：1999-05-11
申请人： Tomohide Hamada , Hiroshi Shirasu
发明人： Tomohide Hamada , Hiroshi Shirasu
IPC分类号： G03B2742
CPC分类号： G03F7/70691 , G02F1/1303 , G03B27/58 , G03F7/70358
摘要： A method of transferring a pattern of a mask onto an object through a projection system, includes the steps of providing a carriage having a mask holder surface adapted to hold the mask in a position which is angularly displaced from a horizontal position by a predetermined angle and an object holder surface adapted to the object in a position which is angularly displaced from the horizontal position by the predetermined angle, the carriage being movable in a first direction; transferring the pattern onto the object, the projection system being located between the mask and the object during the transfer operation; moving the carriage so that the projection system comes to a position out of a place between the mask holder surface and the object holder surface; and conveying the object from the object holder surface.
摘要翻译：通过投影系统将掩模图案转印到物体上的方法包括以下步骤：提供具有掩模保持器表面的托架，所述托架表面适于将掩模保持在与水平位置成角度地移位预定角度的位置，以及所述物体保持器表面适于在与所述水平位置成角度地移位预定角度的位置处，所述托架能够沿第一方向移动; 将图案转移到物体上，投影系统在转印操作期间位于掩模和物体之间; 移动滑架使得投影系统进入位于掩模保持器表面和物体保持器表面之间的位置; 并从物体保持器表面传送物体。

5. 发明授权

US5920378A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5920378A
公开(公告)日：1999-07-06
申请号：US853389
申请日：1997-05-09
申请人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
发明人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70791 , G03F9/70
摘要： A projection exposure apparatus includes off-axis type plate alignment systems which make it possible to reduce alignment time and thereby increase throughput. Exposure of large photosensitive plates is made possible without increasing the length of the plate stage stroke. Multiple fiducial mark members including fiducial mark members in different positions on a plate stage are utilized. Multiple off-axis type plate alignment systems are used to observe the multiple fiducial marks.
摘要翻译：投影曝光装置包括离轴型板对准系统，其能够缩短对准时间，从而提高生产量。大型感光板的曝光是可能的，而不会增加平板台面行程的长度。使用了多个基准标记，其中包括在平台上不同位置的基准标记成员。多个离轴型板对准系统用于观察多个基准标记。

6. 发明授权

US06570641B2 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US06570641B2
公开(公告)日：2003-05-27
申请号：US09955116
申请日：2001-09-19
申请人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kato
发明人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kato
IPC分类号： G03B2118
CPC分类号： G03F7/70775 , G03F7/70358 , G03F7/70716 , G03F9/70
摘要： The projection exposure apparatus can include an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.
摘要翻译：投影曝光装置可以包括照射光学系统，用于以掩模形式的一部分掩模图案照射预定形状的曝光辐射通量，固定支撑件，固定在固定支架上的投影光学系统，用于投影图像的图像掩模图案的照明部分到基板上，以及滑架，用于一体地保持掩模和基板，滑架可相对于投影光学系统沿预定方向移动，连续地将基板与由曝光辐射通量。投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

7. 发明授权

US5923409A Scanning-type exposure apparatus including a vertically disposed holder surface and method thereof 失效
标题翻译：包括垂直设置的保持器表面的扫描型曝光装置及其方法
公开(公告)号：US5923409A
公开(公告)日：1999-07-13
申请号：US917226
申请日：1997-08-25
申请人： Tomohide Hamada , Hiroshi Shirasu
发明人： Tomohide Hamada , Hiroshi Shirasu
IPC分类号： G03B27/58 , G03F7/20 , G03B27/42 , G03B27/62
CPC分类号： G03F7/70691 , G03B27/58 , G03F7/70358 , G02F1/1303
摘要： In a scanning-type exposure apparatus, a mask and a light-sensitive substrate are disposed substantially vertically in opposed relation to each other, with an optical projection system disposed between the mask and the substrate. Optical projection system includes a plurality of optical elements for projecting an equal-size, erected image of a mask pattern onto the light-sensitive substrate, and these optical elements are arranged in a predetermined direction. A scanning device scanningly moves the mask and the light-sensitive substrate in synchronism with each other relative to the optical projection system in a direction which is perpendicular to both of the predetermined direction and an optical axis of the optical projection system.
摘要翻译：在扫描型曝光装置中，掩模和感光基板以彼此相对的方式大致垂直地设置，并且光学投影系统设置在掩模和基板之间。光学投影系统包括多个光学元件，用于将相同尺寸的竖立的掩模图案的图像投影到感光基板上，并且这些光学元件沿预定方向布置。扫描装置相对于光学投影系统在垂直于光学投影系统的预定方向和光轴的方向上彼此同步地扫描地移动掩模和感光基板。

8. 发明授权

US5523574A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5523574A
公开(公告)日：1996-06-04
申请号：US448659
申请日：1995-05-24
申请人： Tomohide Hamada , Hiroshi Shirasu
发明人： Tomohide Hamada , Hiroshi Shirasu
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G21K5/00
CPC分类号： G03F7/70358 , G03F9/70
摘要： An exposure apparatus has an illumination system for illuminating a mask with a light beam, a projection optical system for projecting a mask pattern on a photosensitive substrate and a carriage for integrally holding the mask and the photosensitive substrate. The exposure apparatus further has a detection system for detecting a change in attitude of the carriage and a correction system for correcting a positional deviation between the mask and the photosensitive substrate on the basis of a detected result of the detection system.
摘要翻译：曝光装置具有用于用光束照射掩模的照明系统，用于在感光基板上投射掩模图案的投影光学系统和用于整体地保持掩模和感光基板的滑架。曝光装置还具有用于检测滑架的姿态变化的检测系统和用于基于检测系统的检测结果校正掩模和感光基板之间的位置偏差的校正系统。

9. 发明授权

US06317196B1 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US06317196B1
公开(公告)日：2001-11-13
申请号：US09209270
申请日：1998-12-11
申请人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kats
发明人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kats
IPC分类号： G03B2118
CPC分类号： G03F7/70775 , G03F7/70358 , G03F7/70716 , G03F9/70
摘要： A projection exposure apparatus is provided. The projection exposure apparatus includes an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system to successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.
摘要翻译：提供投影曝光装置。投影曝光装置包括：照射光学系统，用于以掩模形式曝光掩模图案的一部分，其具有预定形状的曝光辐射通量;固定支架;固定在固定支架上的投影光学系统，用于投射照明图像掩模图案的一部分到基板上，以及滑架，用于一体地保持掩模和基板，托架可相对于投影光学系统沿预定方向移动，以使基板与由曝光辐射通量。投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

10. 发明授权

US09178155B2 Flexible substrate, manufacturing method of display element, and manufacturing apparatus of display element 有权
标题翻译：柔性基板，显示元件的制造方法以及显示元件的制造装置
公开(公告)号：US09178155B2
公开(公告)日：2015-11-03
申请号：US12576752
申请日：2009-10-09
申请人： Kei Nara , Tomohide Hamada , Masaki Kato , Tohru Kiuchi
发明人： Kei Nara , Tomohide Hamada , Masaki Kato , Tohru Kiuchi
IPC分类号： B05D5/12 , B65G47/26 , B65G1/133 , H01L51/00 , H01L51/52 , H01L51/56
CPC分类号： H01L51/00 , H01L51/52 , H01L51/56 , H01L2251/5338 , Y10T428/24479
摘要： In a manufacturing apparatus of display element, a display element is formed in a flexible substrate that has a first surface and a second surface that is an opposite surface thereof, and this manufacturing apparatus of display element includes a transportation section that transports the flexible substrate in a predetermined direction that intersects with a width direction of the flexible substrate; a first partition wall formation section that forms a first partition wall for a display element in the first surface; and a second partition wall formation section that forms a second partition wall in the second surface.
摘要翻译：在显示元件的制造装置中，显示元件形成在柔性基板中，该柔性基板具有作为其相对表面的第一表面和第二表面，并且该显示元件的制造装置包括：输送柔性基板的输送部与柔性基板的宽度方向相交的预定方向; 第一分隔壁形成部，其形成第一表面中的显示元件的第一分隔壁; 以及在所述第二表面中形成第二隔壁的第二分隔壁形成部。

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