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    • 10. 发明授权
    • Semiconductor device including a TFT having large-grain polycrystalline active layer, LCD employing the same and method of fabricating them
    • 包括具有大晶粒多晶有源层的TFT的半导体器件,以及使用其的制造方法的半导体器件
    • US06274888B1
    • 2001-08-14
    • US09479919
    • 2000-01-10
    • Kenkichi SuzukiTetsuya NagataMichiko TakahashiMasakazu SaitoToshio OginoMasanobu Miyano
    • Kenkichi SuzukiTetsuya NagataMichiko TakahashiMasakazu SaitoToshio OginoMasanobu Miyano
    • H01L2904
    • H01L21/02672G02F1/13454H01L21/02675H01L21/02691H01L21/2022H01L21/2026H01L27/1277H01L27/1285H01L27/1296H01L29/04H01L29/66757H01L29/78675
    • A semiconductor device has a thin film transistor including an insulating substrate, an island made of a polycrystalline semiconductor material and disposed on the insulating substrate, a conductive layer made of the polycrystalline semiconductor material and at least one of metals and metallic silicides and surrounding the island, a source region and a drain region spaced from the source region, the source region and the drain region being formed in said island, a gate electrode disposed on the island with an insulating film interposed between the island and the gate electrode, the gate facing a spacing between the source region and the drain region. The polycrystalline semiconductor material forming the island and the conductive layer are fabricated by initially annealing a first amorphous semiconductor material deposited on the insulating substrate with a crystallization-inducing layer made of the at least one of metals and metallic silicides and having a hole corresponding to the island, the crystallization-inducing layer being disposed on a surface of the amorphous semiconductor material on at least one of a substrate side thereof and a side thereof opposite from the substrate side, and then by depositing a second amorphous semiconductor material on the first amorphous semiconductor and annealing the second amorphous semiconductor material.
    • 半导体器件具有薄膜晶体管,其包括绝缘基板,由多晶半导体材料制成并设置在绝缘基板上的岛,由多晶半导体材料制成的导电层和金属和金属硅化物中的至少一个并且围绕该岛 源极区域和漏极区域与源极区域间隔开,源极区域和漏极区域形成在所述岛状中,栅极电极设置在岛上,绝缘膜插入在岛状物和栅极电极之间,栅极面对 源极区域和漏极区域之间的间隔。 形成岛和导电层的多晶半导体材料通过用沉积在绝缘基板上的第一非晶半导体材料用由金属和金属硅化物中的至少一种制成的结晶诱导层进行初始退火而制造,并具有对应于 岛,所述结晶诱导层设置在所述非晶半导体材料的表面上的与所述基板侧相对的基板侧和侧面中的至少一个上,然后通过在所述第一非晶半导体上沉积第二非晶半导体材料 以及退火所述第二非晶半导体材料。