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1. 发明授权

US08882824B2 Expanding vascular stent 有权
标题翻译：扩张血管支架
公开(公告)号：US08882824B2
公开(公告)日：2014-11-11
申请号：US12922676
申请日：2010-04-20
申请人： Sang-Ho Kim , Jong-Chae Park , Eun-Jin Kim , Il-Gyun Shin , Dong-Gon Kim , Han-Ki Kim
发明人： Sang-Ho Kim , Jong-Chae Park , Eun-Jin Kim , Il-Gyun Shin , Dong-Gon Kim , Han-Ki Kim
IPC分类号： A61F2/06 , A61F2/915
CPC分类号： A61F2/915 , A61F2002/91525 , A61F2002/91575 , A61F2230/0013
摘要： An expanding vascular stent is disclosed that is inserted into a blood vessel in the human body and expands the blood vessel. The stent is configured in such a way that adjacent rows, each of which is comprised of a plurality of identical cells, are symmetrically arranged, in an out of phase manner. When the stent is expanded in the radial direction, the adjacent rows are expanded in opposite directions, maintaining their linearly symmetrical state. Therefore, the reduction in the length of the stent can be minimized. Since the stent has also a great degree of flexibility, when it is inserted into the blood vessel, it can minimize the damage to the blood vessel wall.
摘要翻译：公开了一种扩张的血管支架，其被插入到人体的血管中并使血管膨胀。支架被配置成使得相邻的行由各个相同的单元构成，以相位方式对称地排列。当支架在径向方向上扩张时，相邻排沿相反方向膨胀，保持其线性对称状态。因此，可以使支架长度的减小最小化。由于支架也具有很大的灵活性，所以当插入到血管中时，可以使对血管壁的损伤最小化。

2. 发明申请

US20110257727A1 Expanding Vascular Stent 有权
标题翻译：扩张血管支架
公开(公告)号：US20110257727A1
公开(公告)日：2011-10-20
申请号：US12922676
申请日：2010-04-20
申请人： Sang-Ho Kim , Jong-Chae Park , Eun-Jin Kim , Il-Gyun Shin , Dong-Gon Kim , Han-Ki Kim
发明人： Sang-Ho Kim , Jong-Chae Park , Eun-Jin Kim , Il-Gyun Shin , Dong-Gon Kim , Han-Ki Kim
IPC分类号： A61F2/82
CPC分类号： A61F2/915 , A61F2002/91525 , A61F2002/91575 , A61F2230/0013
摘要： An expanding vascular stent is disclosed that is inserted into a blood vessel in the human body and expands the blood vessel. The stent is configured in such a way that adjacent rows, each of which is comprised of a plurality of identical cells, are symmetrically arranged, in an out of phase manner. When the stent is expanded in the radial direction, the adjacent rows are expanded in opposite directions, maintaining their linearly symmetrical state. Therefore, the reduction in the length of the stent can be minimized. Since the stent has also a great degree of flexibility, when it is inserted into the blood vessel, it can minimize the damage to the blood vessel wall.
摘要翻译：公开了一种扩张的血管支架，其被插入到人体的血管中并使血管膨胀。支架被配置成使得相邻的行由各个相同的单元构成，以相位方式对称地排列。当支架在径向方向上扩张时，相邻排沿相反方向膨胀，保持其线性对称状态。因此，可以使支架长度的减小最小化。由于支架也具有很大的灵活性，所以当插入到血管中时，可以使对血管壁的损伤最小化。

3. 发明申请

US20120303132A1 STENT FOR BILE DUCT 审中-公开
公开(公告)号：US20120303132A1
公开(公告)日：2012-11-29
申请号：US13513566
申请日：2009-12-03
申请人： Sang-Ho Kim , Il-gyun Shin , Han-Ki Kim , Do-Hyun Park , Hwa-Sub Song , Jong-Chae Park
发明人： Sang-Ho Kim , Il-gyun Shin , Han-Ki Kim , Do-Hyun Park , Hwa-Sub Song , Jong-Chae Park
IPC分类号： A61F2/90
CPC分类号： A61F2/90 , A61F2/07 , A61F2/848 , A61F2002/041 , A61F2002/8483 , A61F2220/0008 , A61F2220/0016 , A61F2230/0054
摘要： The present invention relates to a stent which is inserted into a stenosed bile duct to enlarge the bile duct. The stent includes a plurality of hooks which extend outwards from the main body of the stent at a predetermined angle and are spaced apart from each other. Therefore, when the stent is inserted into the bile duct, the hooks that extend outwards from the main body at a predetermined angle are hooked to the inner surface of the bile duct, thus preventing the stent from slipping relative to the bile duct.
摘要翻译：本发明涉及一种插入狭窄胆管以扩大胆管的支架。支架包括多个钩，其以预定角度从支架的主体向外延伸并且彼此间隔开。因此，当将支架插入胆管中时，以预定的角度从主体向外延伸的钩钩到胆管的内表面，从而防止支架相对于胆管滑动。

4. 发明申请

US20060254513A1 Catalyst enhanced chemical vapor deposition apparatus and deposition method using the same 有权
标题翻译：催化剂增强化学气相沉积装置及其沉积方法
公开(公告)号：US20060254513A1
公开(公告)日：2006-11-16
申请号：US11405552
申请日：2006-04-18
申请人： Hee-Cheol Kang , Kazuo Furuno , Han-Ki Kim , Myoung-Soo Kim
发明人： Hee-Cheol Kang , Kazuo Furuno , Han-Ki Kim , Myoung-Soo Kim
IPC分类号： C23C16/00
CPC分类号： C23C16/44 , C23C16/46
摘要： A catalyst-enhanced chemical vapor deposition (CECVD) apparatus and a deposition method, in which tension is applied to a catalyst wire in order to prevent the catalyst wire from sagging due to thermal deformation, and additional gas is used to prevent foreign material from being generated. The CECVD apparatus may be constructed with a process chamber, a showerhead to introduce process gas into process chamber, a tensile catalyst wire structure provided in the process chamber to decompose the gas introduced from the showerhead, and a substrate on which the gas decomposed by the catalyst wire structure is deposited, so that the tension is applied to a catalyst wire in order to prevent the catalyst wire from sagging due to thermal deformation, and additional gas is used to prevent foreign material from being generated, thereby eliminating occurrences of non-uniform temperatures of a substrate and non-uniform film growth, and concomitantly enhancing the durability of the catalyst wire.
摘要翻译：催化剂增强化学气相沉积（CECVD）装置和沉积方法，其中向催化剂丝施加张力以防止催化剂丝由于热变形而下垂，并且使用另外的气体来防止异物生成。 CECVD装置可以构造有处理室，将工艺气体引入处理室的喷头，设置在处理室中的分解从喷头引入的气体的拉伸催化剂丝线结构以及由其分解的气体催化剂丝线结构被沉积，使得张力被施加到催化剂丝上，以防止催化剂丝由于热变形而下垂，并且使用额外的气体来防止产生异物，从而消除不均匀的发生底物的温度和不均匀的膜生长，并且伴随地提高催化剂丝的耐久性。

5. 发明申请

US20060269671A1 Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure 有权
标题翻译：催化增强化学气相沉积装置具有有效的灯丝排列结构
公开(公告)号：US20060269671A1
公开(公告)日：2006-11-30
申请号：US11439350
申请日：2006-05-24
申请人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
发明人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
IPC分类号： C23C16/00
CPC分类号： C23C16/45565 , C23C16/44
摘要： The present invention provides a catalytic enhanced chemical vapor deposition (CVD) apparatus capable of maximizing efficiency of gas use to 80% or more, and obtaining a uniform thin film by efficiently arranging filaments mounted on a shower head of the catalytic enhanced CVD apparatus, thereby uniformly decomposing a deposition source gas. The present invention also provides a method for fabricating an organic electroluminescent device with an inorganic film formed through the catalytic enhanced CVD apparatus.
摘要翻译：本发明提供一种催化增强化学气相沉积（CVD）装置，其能够将气体使用效率最大化到80％以上，并且通过有效地布置安装在催化增强CVD装置的喷头上的细丝，获得均匀的薄膜，由此均匀分解沉积源气体。本发明还提供一种通过催化增强CVD装置形成无机膜的有机电致发光器件的制造方法。

6. 发明申请

US20060121816A1 Method of manufacturing organic light emitting device by using mirror shaped target sputtering apparatus 审中-公开
标题翻译：使用镜像靶溅射装置制造有机发光器件的方法
公开(公告)号：US20060121816A1
公开(公告)日：2006-06-08
申请号：US11171498
申请日：2005-07-01
申请人： Kyu-Sung Lee , Han-Ki Kim , Do-Geun Kim , Myung-Soo Huh , Seok-Heon Jeong
发明人： Kyu-Sung Lee , Han-Ki Kim , Do-Geun Kim , Myung-Soo Huh , Seok-Heon Jeong
IPC分类号： H01J9/24 , H01J9/00
CPC分类号： H01L51/5203 , C23C14/352 , H01L51/0008 , H01L51/0021
摘要： A method of manufacturing an organic light emitting device by using a facing target sputtering apparatus is provided. The method includes forming a first electrode on a substrate; forming an organic film on the first electrode; and forming a second electrode on the organic film by using a facing target sputtering apparatus. Accordingly, an electrode film is formed on the organic light emitting device at a low temperature without deterioration of the electrode film due to plasma, it is possible to improve light emitting efficiency and electro-optical characteristics of the organic light emitting device.
摘要翻译：提供了一种通过使用面对靶溅射装置制造有机发光器件的方法。该方法包括在基板上形成第一电极; 在第一电极上形成有机膜; 以及通过使用面对靶溅射装置在所述有机膜上形成第二电极。因此，在低温下在有机发光器件上形成电极膜，而不会由于等离子体而导致电极膜的劣化，可以提高有机发光器件的发光效率和电光特性。

7. 发明申请

US20050194475A1 Inductively coupled plasma chemical vapor deposition apparatus 审中-公开
标题翻译：电感耦合等离子体化学气相沉积装置
公开(公告)号：US20050194475A1
公开(公告)日：2005-09-08
申请号：US11070232
申请日：2005-03-03
申请人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee , Seok-Heon Jeong
发明人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee , Seok-Heon Jeong
IPC分类号： C23C16/507 , B05B5/025 , C23C16/455 , H01L21/285 , H01L21/31
CPC分类号： H01J37/3244 , C23C16/042 , C23C16/45563 , C23C16/507 , H01J37/321 , H01J37/3211
摘要： An inductively coupled plasma chemical vapor deposition apparatus comprises a reaction gas spray nozzle capable of evenly spraying reaction gas onto a rectangular substrate, a radio frequency (RF) antenna capable of uniformly forming a plasma source in a rectangular shape, and a rectangular mask maintained at a low temperature so as to uniformly form a thin film on the rectangular substrate used for a flat panel display device.
摘要翻译：电感耦合等离子体化学气相沉积装置包括能够将反应气体均匀地喷射到矩形基板上的反应气体喷嘴，能够均匀地形成矩形形状的等离子体源的射频（RF）天线和维持在低温，以便在用于平板显示装置的矩形基板上均匀地形成薄膜。

8. 发明申请

US20060228827A1 Method of fabricating organic light emitting device 有权
公开(公告)号：US20060228827A1
公开(公告)日：2006-10-12
申请号：US11400474
申请日：2006-04-06
申请人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
发明人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
IPC分类号： H01L21/00 , H01L51/40
CPC分类号： C23C16/45565 , C23C16/45574 , C23C16/5096 , H01L51/5253
摘要： Methods of fabricating an organic light emitting device using plasma and/or thermal decomposition are provided. An insulating layer is formed by reacting first and second radicals. The first radical is formed by passing a first gas through a plasma generating region and a heating body, and the second radical is formed by passing a second gas through the heating body. The methods improve the characteristics of the resulting insulating layer and increase the use efficiency of the source gas by substantially decomposing the source gas. The insulating layer can be a passivation layer formed on an organic light emitting device. The methods use plasma apparatuses such as an inductively coupled plasma chemical vapor deposition (ICP-CVD) apparatuses or plasma enhanced chemical vapor deposition (PECVD) apparatuses.

9. 发明授权

US08383208B2 Method of fabricating organic light emitting device 有权
标题翻译：制造有机发光装置的方法
公开(公告)号：US08383208B2
公开(公告)日：2013-02-26
申请号：US11400474
申请日：2006-04-06
申请人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
发明人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
IPC分类号： H05H1/24 , C23C16/00 , H05B3/00
CPC分类号： C23C16/45565 , C23C16/45574 , C23C16/5096 , H01L51/5253
摘要： Methods of fabricating an organic light emitting device using plasma and/or thermal decomposition are provided. An insulating layer is formed by reacting first and second radicals. The first radical is formed by passing a first gas through a plasma generating region and a heating body, and the second radical is formed by passing a second gas through the heating body. The methods improve the characteristics of the resulting insulating layer and increase the use efficiency of the source gas by substantially decomposing the source gas. The insulating layer can be a passivation layer formed on an organic light emitting device. The methods use plasma apparatuses such as an inductively coupled plasma chemical vapor deposition (ICP-CVD) apparatuses or plasma enhanced chemical vapor deposition (PECVD) apparatuses.
摘要翻译：提供了使用等离子体和/或热分解制造有机发光器件的方法。通过使第一和第二自由基反应形成绝缘层。通过使第一气体通过等离子体生成区域和加热体而形成第一基团，通过使第二气体通过加热体而形成第二自由基。该方法通过基本分解源气体来改善所得绝缘层的特性并提高源气体的使用效率。绝缘层可以是形成在有机发光器件上的钝化层。该方法使用诸如感应耦合等离子体化学气相沉积（ICP-CVD）装置或等离子体增强化学气相沉积（PECVD）装置之类的等离子体装置。

10. 发明授权

US08052795B2 Catalyst enhanced chemical vapor deposition apparatus and deposition method using the same 有权
标题翻译：催化剂增强化学气相沉积装置及其沉积方法
公开(公告)号：US08052795B2
公开(公告)日：2011-11-08
申请号：US11405552
申请日：2006-04-18
申请人： Hee-Cheol Kang , Kazuo Furuno , Han-Ki Kim , Myoung-Soo Kim
发明人： Hee-Cheol Kang , Kazuo Furuno , Han-Ki Kim , Myoung-Soo Kim
IPC分类号： C23C16/00
CPC分类号： C23C16/44 , C23C16/46
摘要： A catalyst-enhanced chemical vapor deposition (CECVD) apparatus and a deposition method, in which tension is applied to a catalyst wire in order to prevent the catalyst wire from sagging due to thermal deformation, and additional gas is used to prevent foreign material from being generated. The CECVD apparatus may be constructed with a process chamber, a showerhead to introduce process gas into process chamber, a tensile catalyst wire structure provided in the process chamber to decompose the gas introduced from the showerhead, and a substrate on which the gas decomposed by the catalyst wire structure is deposited, so that the tension is applied to a catalyst wire in order to prevent the catalyst wire from sagging due to thermal deformation, and additional gas is used to prevent foreign material from being generated, thereby eliminating occurrences of non-uniform temperatures of a substrate and non-uniform film growth, and concomitantly enhancing the durability of the catalyst wire.
摘要翻译：催化剂增强化学气相沉积（CECVD）装置和沉积方法，其中向催化剂丝施加张力以防止催化剂丝由于热变形而下垂，并且使用另外的气体来防止异物生成。 CECVD装置可以构造有处理室，将工艺气体引入处理室的喷头，设置在处理室中的分解从喷头引入的气体的拉伸催化剂丝线结构以及由其分解的气体催化剂丝线结构被沉积，使得张力被施加到催化剂丝上，以防止催化剂丝由于热变形而下垂，并且使用额外的气体来防止产生异物，从而消除不均匀的发生底物的温度和不均匀的膜生长，并且伴随地提高催化剂丝的耐久性。

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