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    • 5. 发明授权
    • Semiconductor light emitting device
    • 半导体发光器件
    • US08779412B2
    • 2014-07-15
    • US13553344
    • 2012-07-19
    • Sang Heon HanDo Young RheeJong Hyun LeeJin Young LimYoung Sun Kim
    • Sang Heon HanDo Young RheeJong Hyun LeeJin Young LimYoung Sun Kim
    • H01L33/00H01L29/06
    • H01L33/06H01L33/32
    • There is provided a semiconductor light emitting device including: first and second conductivity type semiconductor layers; and an active layer disposed between the first and second conductivity type semiconductor layers and having a structure in which a plurality of quantum barrier layers and a plurality of quantum well layers are alternately disposed, wherein at least one of the plurality of quantum well layers includes a first region in which band gap energy is reduced through a first slope and a second region in which band gap energy is reduced through a second slope different from the first slope. The influence of polarization is minimized by adjusting the shape of the band gap of the quantum well layer, crystallinity and internal quantum efficiency can be enhanced.
    • 提供一种半导体发光器件,包括:第一和第二导电类型半导体层; 以及设置在第一和第二导电类型半导体层之间并且具有多个量子势垒层和多个量子阱层交替设置的结构的有源层,其中多个量子阱层中的至少一个包括 带隙能量通过第一斜率​​减小的第一区域和通过不同于第一斜率的第二斜率使带隙能量减小的第二区域。 通过调整量子阱层的带隙的形状,极化的影响被最小化,可以提高结晶度和内部量子效率。
    • 10. 发明授权
    • Method of manufacturing light emitting diode and light emitting diode manufactured thereby
    • 由此制造发光二极管和发光二极管的方法
    • US08685772B2
    • 2014-04-01
    • US13344298
    • 2012-01-05
    • Dong Ju LeeHeon Ho LeeHyun Wook ShimYoung Sun Kim
    • Dong Ju LeeHeon Ho LeeHyun Wook ShimYoung Sun Kim
    • H01L33/02
    • H01L33/0075H01L33/007H01L33/32
    • There is provided a method of manufacturing a light emitting diode and a light emitting diode manufactured by the same. The method includes growing a first conductivity type nitride semiconductor layer and an undoped nitride semiconductor layer on a substrate sequentially in a first reaction chamber; transferring the substrate having the first conductivity type nitride semiconductor layer and the undoped nitride semiconductor layer grown thereon to a second reaction chamber; growing an additional first conductivity type nitride semiconductor layer on the undoped nitride semiconductor layer in the second reaction chamber; growing an active layer on the additional first conductivity type nitride semiconductor layer; and growing a second conductivity type nitride semiconductor layer on the active layer.
    • 提供了一种制造发光二极管的方法和由其制造的发光二极管。 该方法包括在第一反应室中顺序地在衬底上生长第一导电型氮化物半导体层和未掺杂的氮化物半导体层; 将具有第一导电型氮化物半导体层和其上生长的未掺杂氮化物半导体层的衬底转移到第二反应室; 在第二反应室中的未掺杂的氮化物半导体层上生长附加的第一导电型氮化物半导体层; 在附加的第一导电型氮化物半导体层上生长活性层; 以及在所述有源层上生长第二导电型氮化物半导体层。