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    • 7. 发明授权
    • Method and device for mutual contacting of two wafers
    • 两片晶片相互接触的方法和装置
    • US07882997B2
    • 2011-02-08
    • US11572105
    • 2005-07-11
    • Elke ZakelGhassem Azdasht
    • Elke ZakelGhassem Azdasht
    • B23K37/04
    • H01L24/26H01L24/80H01L24/83H01L25/50H01L2224/83224H01L2224/83801H01L2924/01015H01L2924/01033H01L2924/01057H01L2924/19043
    • A method and a device for the mutual contacting of two wafer-type component composite configurations made of multiple identical components which are implemented coherently, in particular a semiconductor wafer (12) with a functional component wafer (14), to produce electronic assemblies on the wafer level, in which the component composite configurations are each situated on a receptacle unit (11; 13) and the contact pressure necessary for the contacting between contact metallizations of the component composite configurations to be connected to one another is generated in such a way that a vacuum is generated in a contact chamber which receives the component composite configurations and is delimited by the receptacle units, and the contacting of the contact metallizations is performed by a rear energy impingement of a component composite configuration.
    • 一种用于相互接触的两个晶片型部件复合结构相互接触的方法和装置,所述两个晶片型部件复合结构由相干地实现的多个相同部件,特别是具有功能部件晶片(14)的半导体晶片(12)制成,以在其上产生电子组件 晶片级,其中部件复合结构各自位于插座单元(11; 13)上,并且以相互连接的部件复合结构的接触金属化之间的接触所需的接触压力被产生,使得 在接收室中产生真空,该接触室接收组件复合结构,并由容器单元限定,并且接触金属化的接触通过组件复合构造的后能量冲击来执行。
    • 8. 发明申请
    • Method And Device For Alternately Contacting Two Wafers
    • 用于交替接触两个晶片的方法和装置
    • US20070272991A1
    • 2007-11-29
    • US10581819
    • 2004-12-02
    • Elke ZakelGhassem Azdasht
    • Elke ZakelGhassem Azdasht
    • H01L21/00B23K1/00H01L29/66
    • H01L23/10B23K26/57B23K35/262B23K35/3013B23K2101/40H01L21/50H01L25/0657H01L25/50H01L2224/16H01L2924/01079
    • A method and device for alternately contacting two wafer-like component composite arrangements (12, 14) consisting of a plurality of cohesively designed similar components, in particular of a semiconductor wafer with a function component wafer for manufacturing electronic modules on a wafer level, in which the two component composite arrangements, each provided with contact metallizations on their opposing contact surfaces (38, 39), are brought into a coverage position with their contact metallizations to form contact pairs, in which position the contact metallizations that are to be joined together are pressed against one another, the contact metallizations being thereby contacted by exposing the rear of one of the component composite arrangements (12) to laser radiation (20), the wavelength of the laser radiation being selected as a function of the degree of absorption of the component composite arrangement exposed to laser radiation at the rear, so that a transmission of the laser radiation through the component composite arrangement exposed to the laser radiation at the rear is essentially suppressed or an absorption of the laser radiation takes place essentially in the contact metallizations of one or both component composite arrangements.
    • 交替地接触由多个内聚设计的类似部件组成的两个晶片状部件复合布置(12,14)的方法和装置,特别是具有用于在晶片级上制造电子模块的功能元件晶片的半导体晶片, 其中每个在其相对的接触表面(38,39)上设置有接触金属化的双组分复合布置通过它们的接触金属化进入覆盖位置,以形成接触对,在该位置上将要接合在一起的接触金属化 因此,通过将组件复合装置(12)中的一个的后部暴露于激光辐射(20),接触金属化从而接触,激光辐射的波长被选择为吸收程度的函数 组件复合布置暴露在后面的激光辐射,使得传输 通过暴露于后方的激光辐射的组分复合布置的激光辐射基本上被抑制,或者激光辐射的吸收基本上在一个或两个组件复合布置的接触金属化中发生。