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1. 发明申请

US20050031502A1 Erosion resistance of EUV source electrodes 有权
标题翻译： EUV源电极的耐腐蚀性
公开(公告)号：US20050031502A1
公开(公告)日：2005-02-10
申请号：US10638261
申请日：2003-08-07
申请人： Robert Bristol , Arun Ramamoorthy , Bryan Rice
发明人： Robert Bristol , Arun Ramamoorthy , Bryan Rice
IPC分类号： B01J19/08 , H05G2/00
CPC分类号： H05G2/003
摘要： Erosion of material in an electrode in a plasma-produced extreme ultraviolet (EUV) light source may be reduced by treating the surface of the electrode. Grooves may be provided in the electrode surface to increase re-deposition of electrode material in the grooves. The electrode surface may be coated with a porous material to reduce erosion due to brittle destruction. The electrode surface may be coated with a pseudo-alloy to reduce erosion from surface waves caused by the plasma in molten material on the surface of the electrode.
摘要翻译：可以通过处理电极的表面来减少等离子体产生的极紫外（EUV）光源中的电极中的材料的侵蚀。沟槽可以设置在电极表面中以增加沟槽中的电极材料的再沉积。电极表面可以用多孔材料涂覆以减少由于脆性破坏引起的侵蚀。电极表面可以涂覆有假合金，以减少由电极表面上的熔融材料中的等离子体引起的表面波的侵蚀。

2. 发明授权

US07413586B2 In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles 有权
标题翻译：极紫外（EUV）光罩的工具和工具外保护
公开(公告)号：US07413586B2
公开(公告)日：2008-08-19
申请号：US10789670
申请日：2004-02-27
申请人： Arun Ramamoorthy , Robert Bristol
发明人： Arun Ramamoorthy , Robert Bristol
IPC分类号： F26B7/00 , G03B27/58 , G03B27/42 , B65D85/48 , G03F9/00 , A47L13/15 , D02G3/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/62 , G03F1/66 , G03F7/70741 , G03F7/70916
摘要： A reticle carrier for an Extreme Ultraviolet (EUV) reticle may include nested grids of electret fibers to provide active protection from contamination without a power supply. The reticle carrier may include in-line sensors for in-situ monitoring of contamination. Grids of electret fibers may also be used in an EUV pellicle.
摘要翻译：用于极紫外（EUV）掩模版的掩模版载体可以包括驻极体纤维的嵌套栅格，以在没有电源的情况下提供主动防止污染。标线载体可以包括用于原位监测污染物的在线传感器。驻极体纤维网格也可用于EUV防护薄膜。

3. 发明授权

US07446329B2 Erosion resistance of EUV source electrodes 有权
标题翻译： EUV源电极的耐腐蚀性
公开(公告)号：US07446329B2
公开(公告)日：2008-11-04
申请号：US10638261
申请日：2003-08-07
申请人： Robert Bristol , Arun Ramamoorthy , Bryan J. Rice
发明人： Robert Bristol , Arun Ramamoorthy , Bryan J. Rice
IPC分类号： H01J35/00
CPC分类号： H05G2/003
摘要： Erosion of material in an electrode in a plasma-produced extreme ultraviolet (EUV) light source may be reduced by treating the surface of the electrode. Grooves may be provided in the electrode surface to increase re-deposition of electrode material in the grooves. The electrode surface may be coated with a porous material to reduce erosion due to brittle destruction. The electrode surface may be coated with a pseudo-alloy to reduce erosion from surface waves caused by the plasma in molten material on the surface of the electrode.
摘要翻译：可以通过处理电极的表面来减少等离子体产生的极紫外（EUV）光源中的电极中的材料的侵蚀。沟槽可以设置在电极表面中以增加沟槽中的电极材料的再沉积。电极表面可以用多孔材料涂覆以减少由于脆性破坏引起的侵蚀。电极表面可以涂覆有假合金，以减少由电极表面上的熔融材料中的等离子体引起的表面波的侵蚀。

4. 发明申请

US20050191565A1 In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles 有权
标题翻译：极紫外（EUV）光罩的工具和工具外保护
公开(公告)号：US20050191565A1
公开(公告)日：2005-09-01
申请号：US10789670
申请日：2004-02-27
申请人： Arun Ramamoorthy , Robert Bristol
发明人： Arun Ramamoorthy , Robert Bristol
IPC分类号： G03F1/14 , G03F7/20 , G03F9/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/62 , G03F1/66 , G03F7/70741 , G03F7/70916
摘要： A reticle carrier for an Extreme Ultraviolet (EUV) reticle may include nested grids of electret fibers to provide active protection from contamination without a power supply. The reticle carrier may include in-line sensors for in-situ monitoring of contamination. Grids of electret fibers may also be used in an EUV pellicle.
摘要翻译：用于极紫外（EUV）掩模版的掩模版载体可以包括驻极体纤维的嵌套网格，以在没有电源的情况下提供主动防止污染。标线载体可以包括用于原位监测污染物的在线传感器。驻极体纤维网格也可用于EUV防护薄膜。

5. 发明申请

US20080174749A1 In-tool and Out-of-Tool Protection of Extreme Ultraviolet (EUV) Reticles 审中-公开
标题翻译：极端紫外线（EUV）网络的工具和工具外保护
公开(公告)号：US20080174749A1
公开(公告)日：2008-07-24
申请号：US12055250
申请日：2008-03-25
申请人： Arun Ramamoorthy , Robert Bristol
发明人： Arun Ramamoorthy , Robert Bristol
IPC分类号： G03B27/52
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/62 , G03F1/66 , G03F7/70741 , G03F7/70916
摘要： A reticle carrier for an Extreme Ultraviolet (EUV) reticle may include nested grids of electret fibers to provide active protection from contamination without a power supply. The reticle carrier may include in-line sensors for in-situ monitoring of contamination. Grids of electret fibers may also be used in an EUV pellicle.
摘要翻译：用于极紫外（EUV）掩模版的掩模版载体可以包括驻极体纤维的嵌套网格，以在没有电源的情况下提供主动防止污染。标线载体可以包括用于原位监测污染物的在线传感器。驻极体纤维网格也可用于EUV防护薄膜。

6. 发明申请

US20050155624A1 Erosion mitigation for collector optics using electric and magnetic fields 有权
标题翻译：使用电场和磁场的集光器光栅的侵蚀减轻
公开(公告)号：US20050155624A1
公开(公告)日：2005-07-21
申请号：US10759344
申请日：2004-01-15
申请人： Sang Lee , Robert Bristol , Arun Ramamoorthy
发明人： Sang Lee , Robert Bristol , Arun Ramamoorthy
IPC分类号： B08B6/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70916 , H01L21/0273
摘要： A magnetic and/or electric field may be generated around collector optics in an EUV lithography system to deflect debris particles from the reflective surfaces of the optics. The magnetic and/or electric field may be generated by a solenoid structure around the optics or by passing current through inner an outer shells in a nested shell arrangement.
摘要翻译：可以在EUV光刻系统中的收集器光学器件周围产生磁场和/或电场，以使来自光学器件的反射表面的碎屑颗粒偏转。磁场和/或电场可以通过围绕光学器件的螺线管结构产生，或者通过将电流传递通过嵌套壳体布置中的外部外壳。

7. 发明授权

US07423275B2 Erosion mitigation for collector optics using electric and magnetic fields 有权
标题翻译：使用电场和磁场的集光器光栅的侵蚀减轻
公开(公告)号：US07423275B2
公开(公告)日：2008-09-09
申请号：US10759344
申请日：2004-01-15
申请人： Sang Hun Lee , Robert Bristol , Arun Ramamoorthy
发明人： Sang Hun Lee , Robert Bristol , Arun Ramamoorthy
IPC分类号： H01J1/50
CPC分类号： G03F7/70916 , H01L21/0273
摘要： A magnetic and/or electric field may be generated around collector optics in an EUV lithography system to deflect debris particles from the reflective surfaces of the optics. The magnetic and/or electric field may be generated by a solenoid structure around the optics or by passing current through inner an outer shells in a nested shell arrangement.
摘要翻译：可以在EUV光刻系统中的收集器光学器件周围产生磁场和/或电场，以使来自光学器件的反射表面的碎屑颗粒偏转。磁场和/或电场可以通过围绕光学器件的螺线管结构产生，或者通过将电流传递通过嵌套壳体布置中的外部外壳。

8. 发明申请

US20060000553A1 Minimizing particle contamination of semiconductor wafers during pressure evacuation by selective orientation and shielding 审中-公开
标题翻译：通过选择性取向和屏蔽，在减压期间最大限度地减少半导体晶片的颗粒污染
公开(公告)号：US20060000553A1
公开(公告)日：2006-01-05
申请号：US10881140
申请日：2004-06-30
申请人： Arun Ramamoorthy , Kevin Orvek
发明人： Arun Ramamoorthy , Kevin Orvek
IPC分类号： C23F1/00
CPC分类号： H01L21/02046
摘要： A method including placing a wafer active side down in a chamber and reducing the pressure in the chamber. An apparatus or system including a chamber having an interior volume suitable to accommodate a semiconductor wafer and capable of maintaining a vacuum; and a support to maintain a wafer in the volume of the chamber with minimum or no contact with an active side of the wafer, wherein an amount of particles that an active side of a wafer is exposed to during a pressure change in the chamber is minimized when the wafer is loaded in the chamber in an active side down configuration.
摘要翻译：一种方法，包括将晶片活动侧向下放置在腔室中并降低腔室中的压力。一种包括具有适于容纳半导体晶片并能够保持真空的内部容积的室的装置或系统; 以及用于将晶片保持在具有与晶片的有源侧最少或不接触的室的体积的支撑件，其中晶片的活性侧在室内的压力变化期间暴露的量的量被最小化当晶片以有源侧向下配置装载在腔室中时。

9. 发明授权

US06734445B2 Mechanized retractable pellicles and methods of use 失效
标题翻译：机械化可伸缩薄膜和使用方法
公开(公告)号：US06734445B2
公开(公告)日：2004-05-11
申请号：US09840364
申请日：2001-04-23
申请人： Arun Ramamoorthy , Hsing-Chien Ma
发明人： Arun Ramamoorthy , Hsing-Chien Ma
IPC分类号： G03B2762
CPC分类号： G03F1/64 , G03F7/70983
摘要： Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths outside the visible spectrum include a pellicle that is readily retracted during exposure or to provide access to the photomask. The pellicle can be transparent at an inspection wavelength and opaque at an exposure wavelength. In various embodiments, the pellicle is slid, retracted, or pivoted relative to a base aligned with the photomask, thus uncovering the photomask. When overlying the photomask, the pellicle can be secured with magnetic elements, such as magnets or electromagnets. In another embodiment, the pellicle includes a diaphragm that can be opened or closed. Methods of using a pellicle are also described.
摘要翻译：用于保护在可见光谱外的波长处用于半导体光刻的光掩模的装置和方法包括在曝光期间容易缩回或提供对光掩模的访问的防护薄膜组件。防护薄膜组件在检测波长下可以是透明的，并且在曝光波长处是不透明的。在各种实施例中，防护薄膜组件相对于与光掩模对准的底座滑动，缩回或枢转，从而露出光掩模。当覆盖光掩模时，防护薄膜组件可以用诸如磁体或电磁体的磁性元件固定。在另一个实施例中，防护薄膜组件包括可打开或关闭的隔膜。还描述了使用防护薄膜的方法。

10. 发明授权

US06611327B2 Detection of contaminants on low wavelength masks 失效
公开(公告)号：US06611327B2
公开(公告)日：2003-08-26
申请号：US09817012
申请日：2001-03-23
申请人： Arun Ramamoorthy , Giang Dao , Christopher Gerth
发明人： Arun Ramamoorthy , Giang Dao , Christopher Gerth
IPC分类号： G01N2188
CPC分类号： G03F7/70483 , G01N21/65
摘要： Testing of a mask which is intended to be used for low wavelength lithography. At lower wavelengths, e.g., 157 nm, certain contaminants may become visible, even though they were transparent under visible or ultraviolet light. A combination of Raman spectroscopy and infrared absorption spectroscopy are used to identify the contaminants.

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