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1. 发明授权

US06813032B1 Method and apparatus for enhanced embedded substrate inspection through process data collection and substrate imaging techniques 失效
标题翻译：用于通过工艺数据采集和衬底成像技术增强嵌入式衬底检查的方法和装置
公开(公告)号：US06813032B1
公开(公告)日：2004-11-02
申请号：US09680226
申请日：2000-10-06
申请人： Reginald Hunter
发明人： Reginald Hunter
IPC分类号： G01N2188
CPC分类号： G01N21/94 , G01N21/8903 , G01N21/9501 , G01N21/956
摘要： The present invention generally provides an apparatus and a method for inspecting a substrate in a processing system. In one aspect, a par of light sources is used in conjunction with an optical receiving device, such as a camera having a CCD, to illuminate and inspect a substrate for various optical signatures. The substrate signatures are then used to generate images of obstructions in three dimensions (3-D) for further analysis. In one embodiment, the substrate is scanned in two or more directions with a first light source and then scanned in two or more directions with a second light source. A receiver captures the reflected and/or scatted signals from sources comprising two or more different images. The light illumination from the first and second light sources impinges on substrate surface obstructions from two differing angles (i.e. perspectives). Therefore, the image from the first light source obtains information pertaining to one side of obstructions while the image from the second light source offers information pertaining to the opposite side of the obstruction. Differentiation between the images is provided by either different perspective angles and/or different optical filtering configurations.
摘要翻译：本发明总体上提供了一种在处理系统中检查基板的装置和方法。在一个方面，光源的一部分与诸如具有CCD的照相机的光学接收装置结合使用以照亮和检查用于各种光学特征的基板。然后使用底物特征来产生三维障碍物（3-D）的图像用于进一步分析。在一个实施例中，用第一光源以两个或更多个方向扫描基板，然后用第二光源以两个或更多个方向扫描基板。接收器捕获来自包括两个或更多个不同图像的源的反射和/或散射信号。来自第一和第二光源的光照射从两个不同的角度（即透视图）撞击基板表面的障碍物。因此，来自第一光源的图像在来自第二光源的图像提供关于障碍物的相对侧的信息的同时获得与障碍物的一侧有关的信息。图像之间的差异由不同的透视角度和/或不同的光学滤波配置提供。

2. 发明授权

US06791680B1 System and method for inspecting semiconductor wafers 失效
标题翻译：用于检查半导体晶片的系统和方法
公开(公告)号：US06791680B1
公开(公告)日：2004-09-14
申请号：US09474941
申请日：1999-12-30
申请人： Eliezer Rosengaus , Steven R. Lange
发明人： Eliezer Rosengaus , Steven R. Lange
IPC分类号： G01N2188
CPC分类号： G01N21/95623 , G01N21/9501 , G01N2021/8822 , H01L21/67155
摘要： A method for inspecting semiconductor wafers is provided in which a plurality of independent, low-cost, optical-inspection subsystems are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer, the wafer location relative to the inspection being controlled so that the entire wafer is imaged by the system of optical subsystems in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtered. The filtered light is processed by general purpose digital-signal processors. Image subtraction methods are used to detect wafer defects, which are reported to a main computer to aid in statistical process control, particularly for manufacturing equipment.
摘要翻译：提供了一种用于检查半导体晶片的方法，其中多个独立的，低成本的光学检查子系统被封装和集成，以同时对晶片的部分进行并行检查，相对于被检查的晶片位置被控制，使得整个晶片由光学子系统的系统以光栅扫描模式成像。单色相干光源照亮晶片表面。暗场光学系统使用傅立叶滤波来收集散射光并滤除由有效周期性晶片结构产生的图案。滤波后的光由通用数字信号处理器处理。图像减法方法用于检测晶片缺陷，报告给主计算机，以帮助进行统计过程控制，特别是制造设备。

3. 发明授权

US06724005B2 Substrate defect inspection method and substrate defect inspection system 有权
标题翻译：基板缺陷检查方法和基板缺陷检查系统
公开(公告)号：US06724005B2
公开(公告)日：2004-04-20
申请号：US09982339
申请日：2001-10-17
申请人： Toshifumi Tokumoto
发明人： Toshifumi Tokumoto
IPC分类号： G01N2188
CPC分类号： G01N21/9501
摘要： When performing a defect inspection of a wafer W, defect observation equipment 3 first inputs defect position data from defect detection equipment 2. After a plurality of measurement points are set, the amount of position shift between the detection coordinate system and the observation coordinate system is measured for each measurement point. Then, the defect observation equipment 3 creates a first-order defect position correction formula in order to make reasonable the defect position in the detection coordinate system, based on the position shift amounts of the measurement points. This first-order defect position correction formula has three terms, for the offset component, the magnification component, and the rotation component of the observation coordinate system with respect to the detection coordinate system. Next, using the defect position correction formula, a defect position detected by the defect detection equipment 2 is corrected. By this means, the resolution of the defect observation equipment is raised, and the precision of substrate defect inspection is improved.
摘要翻译：当对晶片W进行缺陷检查时，缺陷观察设备3首先从缺陷检测设备2输入缺陷位置数据。在设置了多个测量点之后，检测坐标系和观察坐标系之间的位置偏移量为测量每个测量点。然后，缺陷观察设备3基于测量点的位置偏移量，创建一级缺陷位置校正公式，以使检测坐标系中的缺陷位置合理化。该一阶缺陷位置校正公式对于观察坐标系相对于检测坐标系的偏移分量，放大分量和旋转分量具有三个项。接下来，使用缺陷位置校正公式，校正由缺陷检测设备2检测到的缺陷位置。通过这种方式，提高了缺陷观察设备的分辨率，提高了基板缺陷检查的精度。

4. 发明授权

US06707545B1 Optical signal routing method and apparatus providing multiple inspection collection points on semiconductor manufacturing systems 失效
标题翻译：在半导体制造系统上提供多个检测收集点的光信号路由方法和装置
公开(公告)号：US06707545B1
公开(公告)日：2004-03-16
申请号：US09684733
申请日：2000-10-06
申请人： Reginald Hunter
发明人： Reginald Hunter
IPC分类号： G01N2188
CPC分类号： H01L21/67276 , G01N21/94 , G01N21/9501 , G01N21/956 , H01L21/67739 , H01L21/67763 , H01L21/68707
摘要： The present invention generally provides an apparatus and a method for inspecting a substrate in a processing system. More specifically, optical signal routing methods and apparatus provide multiple inspection collection points on a semiconductor processing system. In one aspect, an optical inspection system comprises a light source and an optical receiving device, such as a CCD camera, to illuminate and inspect a substrate for various optical signatures. A plurality of optical inspection systems are connected to a signal switching device, such as a multiplexer, which operates to route a particular signal to a detector.
摘要翻译：本发明总体上提供了一种用于在处理系统中检查衬底的装置和方法。更具体地说，光信号路由方法和装置在半导体处理系统上提供多个检验收集点。在一个方面，光学检查系统包括光源和诸如CCD照相机的光学接收装置，以照亮和检查用于各种光学特征的基板。多个光学检查系统连接到信号切换装置，例如多路复用器，其操作以将特定信号路由到检测器。

5. 发明授权

US06707544B1 Particle detection and embedded vision system to enhance substrate yield and throughput 失效
标题翻译：粒子检测和嵌入式视觉系统，以提高底物产量和产量
公开(公告)号：US06707544B1
公开(公告)日：2004-03-16
申请号：US09391341
申请日：1999-09-07
申请人： Reginald Hunter , Sagie Tsadka
发明人： Reginald Hunter , Sagie Tsadka
IPC分类号： G01N2188
CPC分类号： G01N21/956 , G01N21/94 , G01N21/9501
摘要： The present invention generally provides an apparatus and a method for scanning a substrate in a processing system. A transmitter unit and a receiver unit are disposed on a processing system and cooperate to transmit and detect energy, respectively. The transmitter unit is positioned to transmit a signal onto the substrate surface moving between vacuum chambers, one of which is preferably a transfer chamber of a cluster tool. Features disposed on the substrate surface, which may include particles, devices, alphanumeric characters, the substrate edges, notches, etc., cause a scattering or reflection of a portion of the signal. The receiver unit is disposed to collect the scattered/reflected portion of the signal and direct the same to a processing unit. Preferably, the transmitter unit comprises a laser source and the receiver unit comprises a charged-coupled device (CCD). Preferably, the invention is integrally positioned in a processing system to allow substrate inspection during normal operation and provide real-time information.
摘要翻译：本发明总体上提供了一种用于在处理系统中扫描衬底的装置和方法。发射机单元和接收机单元设置在处理系统上，并分别协同传输和检测能量。发射器单元被定位成将信号传输到在真空室之间移动的衬底表面上，其中一个优选地是簇工具的传送室。设置在基板表面上的特征可以包括颗粒，装置，字母数字字符，基板边缘，凹口等，导致信号的一部分的散射或反射。接收器单元设置成收集信号的散射/反射部分并将其引导到处理单元。优选地，发射器单元包括激光源，并且接收器单元包括电荷耦合器件（CCD）。优选地，本发明整体地定位在处理系统中，以允许正常操作期间的基板检查并提供实时信息。

6. 发明授权

US06690024B1 Laser inspection apparatus 失效
标题翻译：激光检查仪
公开(公告)号：US06690024B1
公开(公告)日：2004-02-10
申请号：US09618721
申请日：2000-07-18
申请人： Koji Funaoka , Masahiko Sakamoto , Shozui Takeno , Hiroshi Sasai
发明人： Koji Funaoka , Masahiko Sakamoto , Shozui Takeno , Hiroshi Sasai
IPC分类号： G01N2188
CPC分类号： G01N21/47 , G01N21/64 , G01N21/956 , G01N21/95692 , G01N2021/95638
摘要： A laser inspection apparatus has a light source 13 for outputting laser beam, application means 5, 33, 34 for irradiating the laser beam 7 output from the light source 13 to any desired position of a detected body 21, first detection means 2 for detecting fluorescence 8 generated from the detected body 21 to which the laser beam 7 is applied, and second detection means 3 for detecting reflected light 8 scattered on a surface of the detected body 21 to which the laser beam 7 is applied.
摘要翻译：激光检查装置具有用于输出激光束的光源13，用于将从光源13输出的激光束7照射到检测体21的任何期望位置的施加装置5,33,34，用于检测荧光的第一检测装置2 8是从被施加激光束7的检测体21产生的第二检测装置3，以及用于检测在被施加激光束7的检测体21的表面上散射的反射光8的第二检测装置3。

7. 发明授权

US06686995B2 Two-dimensional UV compatible programmable spatial filter 有权
标题翻译：二维UV兼容可编程空间滤波器
公开(公告)号：US06686995B2
公开(公告)日：2004-02-03
申请号：US10163762
申请日：2002-06-04
申请人： Dieter E. Wilk , Anlun Tang , Eric N. Vella , Rex Runyon , Jamie Michael Sullivan , Ralph Thomas Johnson
发明人： Dieter E. Wilk , Anlun Tang , Eric N. Vella , Rex Runyon , Jamie Michael Sullivan , Ralph Thomas Johnson
IPC分类号： G01N2188
CPC分类号： G02B27/46 , G01N21/95623
摘要： Disclosed are mechanisms for selectively filtering spatial portions of light emanating from a sample under inspection within an optical system. In one embodiment, a programmable spatial filter (PSF) is constructed from materials that are compatible with light in a portion of the UV wavelength range. In a specific implementation, the PSF is constructed from a UV compatible material, such as a polymer stabilized liquid crystal material. In a further aspect, the PSF also includes a pair of plates that are formed from a UV grade glass. The PSF may also include a relatively thin first and second ITO layer that results in a sheet resistance between about 100 and about 300 &OHgr; per square. The PSF provides selective filtering in two directions. In other words, the PSF provides two dimensional filtering.
摘要翻译：公开了一种用于选择性地过滤在光学系统内被检查的样品发出的光的空间部分的机构。在一个实施例中，可编程空间滤波器（PSF）由与UV波长范围的一部分中的光兼容的材料构成。在具体实施方案中，PSF由诸如聚合物稳定的液晶材料的UV相容材料构成。在另一方面，PSF还包括由UV级玻璃形成的一对板。 PSF还可以包括相对薄的第一和第二ITO层，其导致约100和约300Ω/平方之间的薄层电阻。 PSF在两个方向提供选择性滤波。换句话说，PSF提供二维滤波。

8. 发明授权

US06686994B2 UV compatible programmable spatial filter 有权
标题翻译： UV兼容可编程空间滤波器
公开(公告)号：US06686994B2
公开(公告)日：2004-02-03
申请号：US10163398
申请日：2002-06-04
申请人： Dieter Wilk , Anlun Tang , Eric N. Vella , Rex Runyon , Jamie M. Sullivan
发明人： Dieter Wilk , Anlun Tang , Eric N. Vella , Rex Runyon , Jamie M. Sullivan
IPC分类号： G01N2188
CPC分类号： G01N21/95623 , G02B27/46 , G02F2001/13775 , G02F2203/055
摘要： Disclosed are mechanisms for selectively filtering spatial portions of light emanating from a sample under inspection within an optical system. In one embodiment, a programmable spatial filter (PSF) is constructed from materials that are compatible with light in a portion of the UV wavelength range. In a specific implementation, the PSF is constructed from a UV compatible material, such as a polymer stabilized liquid crystal material. In a further aspect, the PSF also includes a pair of plates that are formed from a UV grade glass. The PSF may also include a relatively thin first and second ITO layer that results in a sheet resistance between about 100 and about 300 &OHgr; per square.
摘要翻译：公开了一种用于选择性地过滤在光学系统内被检查的样品发出的光的空间部分的机构。在一个实施例中，可编程空间滤波器（PSF）由与UV波长范围的一部分中的光兼容的材料构成。在具体实施方案中，PSF由诸如聚合物稳定的液晶材料的UV相容材料构成。在另一方面，PSF还包括由UV级玻璃形成的一对板。 PSF还可以包括相对薄的第一和第二ITO层，其导致约100和约300Ω/平方之间的薄层电阻。

9. 发明授权

US06657716B1 Method and apparatus for detecting necking over field/active transitions 有权
标题翻译：用于检测场/活跃过渡处的颈缩的方法和装置
公开(公告)号：US06657716B1
公开(公告)日：2003-12-02
申请号：US09863598
申请日：2001-05-23
申请人： Kevin R. Lensing , Marilyn I. Wright
发明人： Kevin R. Lensing , Marilyn I. Wright
IPC分类号： G01N2188
CPC分类号： H01L22/20 , G01N21/95607 , H01L2223/54453
摘要： A method and an apparatus for detecting a necking error during semiconductor manufacturing. At least one semiconductor wafer is processed. Metrology data from the processed semiconductor wafer is acquired. Data from a reference library comprising optical data relating to a poly-silicon formation on a semiconductor wafer is accessed. The metrology data is compared to data from the reference library. A fault-detection analysis is performed in response to the comparison of the metrology data and the reference library data.
摘要翻译：一种在半导体制造过程中检测颈缩误差的方法和装置。至少一个半导体晶片被处理。获得来自处理后的半导体晶片的计量数据。访问包括与半导体晶片上的多晶硅结构相关的光学数据的参考库的数据。将测量数据与参考库中的数据进行比较。响应于测量数据和参考库数据的比较，执行故障检测分析。

10. 发明授权

US06630995B1 Method and apparatus for embedded substrate and system status monitoring 失效
标题翻译：嵌入式基板和系统状态监测方法与装置
公开(公告)号：US06630995B1
公开(公告)日：2003-10-07
申请号：US09684880
申请日：2000-10-06
申请人： Reginald Hunter
发明人： Reginald Hunter
IPC分类号： G01N2188
CPC分类号： H01L21/67276 , G01N21/94 , G01N21/9501 , G01N21/956 , G01N2021/4704 , H01L21/67253
摘要： The present invention generally provides an apparatus and a method for inspecting a substrate in a processing system. One embodiment provides a substrate inspection apparatus, comprising a vacuum chamber lid, the lid comprising a body defining at least three ports located to provide a field of view to a common area on a substrate transfer plane and light management system.
摘要翻译：本发明总体上提供了一种在处理系统中检查基板的装置和方法。一个实施例提供了一种基板检查装置，其包括真空室盖，该盖包括限定至少三个端口的主体，该至少三个端口用于向基板传送平面和光管理系统上的公共区域提供视场。

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