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1. 发明授权

US06734443B2 Apparatus and method for removing photomask contamination and controlling electrostatic discharge 失效
标题翻译：去除光掩模污染和控制静电放电的设备和方法
公开(公告)号：US06734443B2
公开(公告)日：2004-05-11
申请号：US09850766
申请日：2001-05-08
申请人： Jun Fei Zheng , Giang Dao
发明人： Jun Fei Zheng , Giang Dao
IPC分类号： B08B700
CPC分类号： G03F7/70925 , G03F7/70983
摘要： A method and apparatus to remove contamination and control electrostatic discharge in-situ in a semiconductor device manufacture process. In an embodiment, the method includes providing a reticle having first and second planar surfaces into a chamber. A circuit pattern of opaque material may be disposed on the first planar surface of the reticle. The method further includes irradiating the reticle using an ultraviolet light radiation beam to remove contamination disposed on the first and second planar surfaces of the reticle and to neutralize static electricity accumulated by the reticle.
摘要翻译：一种在半导体器件制造工艺中去除污染物并原位控制静电放电的方法和装置。在一个实施例中，该方法包括将具有第一和第二平面表面的掩模版提供到腔室中。不透明材料的电路图案可以设置在掩模版的第一平面表面上。该方法还包括使用紫外光辐射束照射掩模版，以去除设置在掩模版的第一和第二平面表面上的污染物，并且中和由掩模版积累的静电。

2. 发明申请

US20050235135A1 Input/output device disable control for PC-based consumer electronics device 失效
标题翻译：基于PC的消费电子设备的输入/输出设备禁用控制
公开(公告)号：US20050235135A1
公开(公告)日：2005-10-20
申请号：US10825904
申请日：2004-04-16
申请人： Giang Dao , Jonathan Hayden , Harold Vang
发明人： Giang Dao , Jonathan Hayden , Harold Vang
IPC分类号： G06F9/445 , G06F15/177 , G06F21/00
CPC分类号： G06F9/4401 , G06F21/10 , G06F21/85
摘要： An electronic system that includes control logic that causes input and output ports to be disabled during the interruption windows of the initialization process, and subsequently to be selectively disabled or enabled after completion of the initialization process. The input and output ports are disabled during initialization of the electronic system to prevent interruption of the initialization process by the user. The input and output ports are disabled or enabled, after completion of the initialization process, to control access to content stored on, or made available by, the electronic system.
摘要翻译：一种电子系统，其包括控制逻辑，其使得在初始化过程的中断窗口期间禁用输入和输出端口，并且随后在完成初始化过程之后被选择性地禁用或使能。在电子系统的初始化期间，输入和输出端口被禁用，以防止用户初始化过程中断。在初始化过程完成后，输入和输出端口被禁用或启用，以控制对电子系统存储或使其可用的内容的访问。

3. 发明授权

US06660649B2 In-situ balancing for phase-shifting mask 失效
公开(公告)号：US06660649B2
公开(公告)日：2003-12-09
申请号：US10231520
申请日：2002-08-29
申请人： Giang Dao , Qi-De Qian
发明人： Giang Dao , Qi-De Qian
IPC分类号： H01L21302
CPC分类号： G03F1/30 , Y10S438/942
摘要： The present invention describes a method of forming a mask comprising: providing a substrate, the substrate having a first thickness; forming a balancing layer over the substrate, the balancing layer having a second thickness; forming an absorber layer over the balancing layer, the absorber layer having a first region separated from a second region by a third region; removing the absorber layer in the first region and the second region; removing the balancing layer in the second region; and reducing the substrate in the second region to a third thickness. The present invention also describes a mask comprising: an absorber layer, the absorber layer having a first opening and a second opening, the first opening uncovering a balancing layer disposed over a substrate having a first thickness, and the second opening uncovering the substrate having a second thickness.

4. 发明授权

US06611327B2 Detection of contaminants on low wavelength masks 失效
公开(公告)号：US06611327B2
公开(公告)日：2003-08-26
申请号：US09817012
申请日：2001-03-23
申请人： Arun Ramamoorthy , Giang Dao , Christopher Gerth
发明人： Arun Ramamoorthy , Giang Dao , Christopher Gerth
IPC分类号： G01N2188
CPC分类号： G03F7/70483 , G01N21/65
摘要： Testing of a mask which is intended to be used for low wavelength lithography. At lower wavelengths, e.g., 157 nm, certain contaminants may become visible, even though they were transparent under visible or ultraviolet light. A combination of Raman spectroscopy and infrared absorption spectroscopy are used to identify the contaminants.

5. 发明授权

US06625800B1 Method and apparatus for physical image based inspection system 失效
标题翻译：基于物理图像的检测系统的方法和装置
公开(公告)号：US06625800B1
公开(公告)日：2003-09-23
申请号：US09476318
申请日：1999-12-30
申请人： Qi-De Qian , Edita Tejnil , Giang Dao
发明人： Qi-De Qian , Edita Tejnil , Giang Dao
IPC分类号： G06F1750
CPC分类号： G03F1/84 , G01N21/95607 , G03F1/36
摘要： A method is described that involves accepting a mask design file input and then simulating the inspection of a mask through an optical channel. The mask design file has patterns. The optical channel corresponds to a mask inspection tool optical channel. The mask is patterned according to the mask design file patterns.
摘要翻译：描述了一种方法，其涉及接受掩模设计文件输入，然后通过光通道模拟掩模的检查。面具设计文件有模式。光通道对应于掩模检查工具光通道。掩模根据掩模设计文件图案进行图案化。

6. 发明授权

US06548417B2 In-situ balancing for phase-shifting mask 失效
标题翻译：移相掩模的原位平衡
公开(公告)号：US06548417B2
公开(公告)日：2003-04-15
申请号：US09957571
申请日：2001-09-19
申请人： Giang Dao , Qi-De Qian
发明人： Giang Dao , Qi-De Qian
IPC分类号： H01L21302
CPC分类号： G03F1/30 , Y10S438/942
摘要： The present invention describes a method of forming a mask comprising: providing a substrate, the substrate having a first thickness; forming a balancing layer over the substrate, the balancing layer having a second thickness; forming an absorber layer over the balancing layer, the absorber layer having a first region separated from a second region by a third region; removing the absorber layer in the first region and the second region; removing the balancing layer in the second region; and reducing the substrate in the second region to a third thickness. The present invention also describes a mask comprising: an absorber layers the absorber layer having a first opening and a second opening, the first opening uncovering a balancing layer disposed over a substrate having a first thickness, and the second opening uncovering the substrate having a second thickness.
摘要翻译：本发明描述了一种形成掩模的方法，包括：提供基底，所述基底具有第一厚度; 在所述基底上形成平衡层，所述平衡层具有第二厚度; 在所述平衡层上形成吸收层，所述吸收层具有与第二区域隔开第三区域的第一区域; 去除所述第一区域和所述第二区域中的吸收层; 去除第二区域中的平衡层; 以及将所述第二区域中的所述衬底减少到第三厚度。本发明还描述了一种掩模，其包括：吸收层，其具有第一开口和第二开口，所述第一开口露出设置在具有第一厚度的基底上的平衡层，并且所述第二开口露出所述基底具有第二开口厚度。

7. 发明授权

US06537706B1 Method for making a photolithographic mask 失效
标题翻译：制造光刻掩模的方法
公开(公告)号：US06537706B1
公开(公告)日：2003-03-25
申请号：US09525198
申请日：2000-03-14
申请人： Qing Ma , Jin Lee , Jun Fei Zheng , Giang Dao
发明人： Qing Ma , Jin Lee , Jun Fei Zheng , Giang Dao
IPC分类号： G03F900
CPC分类号： G03F1/50
摘要： A method for making a photolithographic mask. The method comprises forming a film on a substrate that deforms the substrate, and applying a deformation reducing agent to the substrate to reduce the amount of deformation that the film caused. In a preferred embodiment, the deformation reducing agent comprises one or more films, which are formed on one side of the substrate, that balance the substrate deformation effect of one or more films that are deposited on the other side of the substrate. The film or films that constitute the deformation reducing agent may be similar to, or different from, an absorption film and/or any other films deposited on the substrate or on the absorption film.
摘要翻译：一种制备光刻掩模的方法。该方法包括在使基板变形的基板上形成膜，并向基板施加变形还原剂以减少膜引起的变形量。在优选的实施方案中，变形减少剂包括一个或多个膜，其形成在基底的一侧上，其平衡沉积在基底另一侧上的一个或多个膜的基底变形效应。构成变形还原剂的膜或膜可以与吸收膜和/或沉积在基底上或吸收膜上的任何其它膜相似或不同。

8. 发明授权

US06793717B2 Apparatus for keeping contamination away from a mask during exposure with light 失效
标题翻译：用于在光照曝光期间将污染物远离面罩的装置
公开(公告)号：US06793717B2
公开(公告)日：2004-09-21
申请号：US10460102
申请日：2003-06-11
申请人： Han-Ming Wu , Giang Dao
发明人： Han-Ming Wu , Giang Dao
IPC分类号： B03C380
CPC分类号： B03C3/32 , B01D46/0067 , B01D46/10 , B01D46/50 , B01D46/521 , B01D51/10 , B01D53/00 , Y10S438/905 , Y10S438/906
摘要： The present invention includes a filtered mask enclosure having an exterior portion and interior regions within the exterior portion such that the interior regions have a filtering region and a purging region connected to the filtering region. The present invention further includes a method of removing a first contaminant in a gas phase, a second contaminant in a solid phase, and a third contaminant having an electrical charge from a purge gas and flowing the purge gas through a vicinity of a mask while exposing a wafer with light through the mask.
摘要翻译：本发明包括具有在外部部分内的外部部分和内部区域的过滤的掩模外壳，使得内部区域具有连接到过滤区域的过滤区域和清洗区域。本发明还包括一种除去气相中的第一污染物，固相中的第二污染物和具有来自吹扫气体的电荷的第三污染物并且使清洗气体通过掩模附近而流过的同时曝光具有通过掩模的光的晶片。

9. 发明授权

US06610123B2 Filtered mask enclosure 失效
标题翻译：过滤面罩外壳
公开(公告)号：US06610123B2
公开(公告)日：2003-08-26
申请号：US10025258
申请日：2001-12-17
申请人： Han-Ming Wu , Giang Dao
发明人： Han-Ming Wu , Giang Dao
IPC分类号： B03C3011
CPC分类号： B03C3/32 , B01D46/0067 , B01D46/10 , B01D46/50 , B01D46/521 , B01D51/10 , B01D53/00 , Y10S438/905 , Y10S438/906
摘要： The present invention includes a filtered mask enclosure having an exterior portion and interior regions within the exterior portion such that the interior regions have a filtering region and a purging region connected to the filtering region. The present invention further includes a method of removing a first contaminant in a gas phase, a second contaminant in a solid phase, and a third contaminant having an electrical charge from a purge gas and flowing the purge gas through a vicinity of a mask while exposing a wafer with light through the mask.
摘要翻译：本发明包括具有在外部部分内的外部部分和内部区域的过滤的掩模外壳，使得内部区域具有连接到过滤区域的过滤区域和清洗区域。本发明还包括一种除去气相中的第一污染物，固相中的第二污染物和具有来自吹扫气体的电荷的第三污染物并且使清洗气体通过掩模附近而流过的同时曝光具有通过掩模的光的晶片。

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