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1. 发明申请

US20070057028A1 Systems and methods for depositing conductive material into openings in microfeature workpieces 失效
标题翻译：将导电材料沉积在微型工件的开口中的系统和方法
公开(公告)号：US20070057028A1
公开(公告)日：2007-03-15
申请号：US11215214
申请日：2005-08-30
申请人： Rick Lake , Ross Dando
发明人： Rick Lake , Ross Dando
IPC分类号： B23K31/02 , B23K35/38
CPC分类号： B23K3/0669 , B23K2101/40
摘要： Systems and methods for depositing conductive material into openings in microfeature workpieces are disclosed herein. One particular embodiment of a system for processing microfeature workpieces includes a processing chamber and a solder reservoir in the processing chamber. The solder reservoir includes a slot having a generally vertical orientation positioned to receive a microfeature workpiece. In several embodiments, the system can further include a conductive material at least partially filling the slot.
摘要翻译：本文公开了用于将导电材料沉积在微特征工件的开口中的系统和方法。用于处理微特征工件的系统的一个具体实施例包括在处理室中的处理室和焊料储存器。焊料储存器包括具有定位成接收微特征工件的大致垂直取向的槽。在几个实施例中，系统还可以包括至少部分地填充槽的导电材料。

2. 发明申请

US20080212303A1 DEVICE FOR REDUCING OR PREVENTING EXCHANGE OF INFORMATION 审中-公开
标题翻译：用于减少或防止信息交换的设备
公开(公告)号：US20080212303A1
公开(公告)日：2008-09-04
申请号：US11681340
申请日：2007-03-02
申请人： Warren Farnworth , Ross Dando
发明人： Warren Farnworth , Ross Dando
IPC分类号： H05K9/00
CPC分类号： H05K9/0043 , G06K19/07327
摘要： A device that is adapted to receive a card including information, such as confidential information, in machine-readable form is disclosed. The device includes a body, wherein at least a portion of the body is made of a material that is adapted to attenuate or disrupt an interrogating signal sent toward the card or a return signal sent from the card to thereby at least reduce the likelihood that the confidential information is read from the card.
摘要翻译：公开了一种适于以机器可读形式接收包括诸如机密信息等信息的卡的设备。该装置包括主体，其中主体的至少一部分由适于衰减或破坏朝向卡发送的询问信号的材料或从卡发送的返回信号，从而至少降低了可能性从卡中读取机密信息。

3. 发明申请

US20070062465A1 Methods of operating a liquid vaporizer 失效
标题翻译：操作液体蒸发器的方法
公开(公告)号：US20070062465A1
公开(公告)日：2007-03-22
申请号：US11198560
申请日：2004-08-10
申请人： Ross Dando , Allen Mardian , Raynald Cantin , Gurtej Sandhu
发明人： Ross Dando , Allen Mardian , Raynald Cantin , Gurtej Sandhu
IPC分类号： F22B37/10
CPC分类号： H01L21/6708 , C23C16/4481
摘要： The present invention is generally directed to a vaporizer with positive liquid shut-off. In one illustrative embodiment, the vaporizer is comprised of a body, a liquid inlet and a carrier gas inlet coupled to the body, a nozzle positioned within the body, the nozzle having at least one opening formed therethrough that defines a vaporized liquid exit, and a positive shut-off valve, a portion of which is adapted to engage the vaporized liquid exit of the nozzle. In another illustrative embodiment, the vaporizer is comprised of a body, a liquid inlet and a carrier gas inlet coupled to-the body and a plurality of peltier cells coupled to the body.
摘要翻译：本发明一般涉及具有正液体截止的汽化器。在一个说明性实施例中，蒸发器包括主体，液体入口和连接到主体的载气入口，位于主体内的喷嘴，喷嘴具有限定蒸发的液体出口的至少一个通过其形成的开口，以及正截止阀，其一部分适于接合喷嘴的汽化液体出口。在另一示例性实施例中，蒸发器包括主体，液体入口和连接到主体的载气入口以及耦合到主体的多个珀耳帖细胞。

4. 发明申请

US20060231016A1 Deposition apparatuses 审中-公开
标题翻译：沉积装置
公开(公告)号：US20060231016A1
公开(公告)日：2006-10-19
申请号：US11471106
申请日：2006-06-19
申请人： Eric Blomiley , Nirmal Ramaswamy , Ross Dando , Joel Drewes , Alan Colwell , Eduardo Tovar
发明人： Eric Blomiley , Nirmal Ramaswamy , Ross Dando , Joel Drewes , Alan Colwell , Eduardo Tovar
IPC分类号： C30B23/00 , C30B25/00 , C30B28/12 , C30B28/14
CPC分类号： H01L21/67248 , C23C16/481 , C23C16/52 , C30B25/165 , C30B31/18
摘要： The invention includes deposition apparatuses configured to monitor the temperature of a semiconductor wafer substrate by utilizing conduits which channel radiation from the substrate to a detector/signal processor system. In particular aspects, the temperature of the substrate can be measured while the substrate is spinning within a reaction chamber. The invention also includes deposition apparatuses in which flow of mixed gases is controlled by mass flow controllers provided downstream of the location where the gases are mixed and/or where flow of gases is measured with mass flow measurement devices provided downstream of the location where the gases are mixed. Additionally, the invention encompasses deposition apparatuses in which mass flow controllers and/or mass flow measurement devices are provided upstream of a header which splits a source gas into multiple paths directed toward multiple different reaction chambers.
摘要翻译：本发明包括沉积设备，其被配置为通过利用将辐射从衬底传送到检测器/信号处理器系统的管道来监测半导体晶片衬底的温度。在特定方面，可以在衬底在反应室内旋转的同时测量衬底的温度。本发明还包括沉积装置，其中混合气体的流动由设置在气体混合位置下游的质量流量控制器控制，和/或在气体流量测量时，质量流量测量装置设置在气体的位置的下游混合此外，本发明还包括沉积装置，其中质量流量控制器和/或质量流量测量装置设置在将源气体分成多个指向多个不同反应室的路径的集管的上游。

5. 发明申请

US20060097849A1 Wireless communication devices and methods of forming and operating the same 审中-公开
标题翻译：无线通信设备及其形成和操作的方法
公开(公告)号：US20060097849A1
公开(公告)日：2006-05-11
申请号：US11312669
申请日：2005-12-19
申请人： Ross Dando
发明人： Ross Dando
IPC分类号： H04Q5/22
CPC分类号： G06K19/07749 , H01L23/49855 , H01L2224/16 , H01L2924/0102 , H01L2924/01079 , H01L2924/3025
摘要： The present invention relates to wireless communication devices and methods of forming and operating the same. The present invention provides a wireless communication device including a substrate having a support surface, wireless communication circuitry upon the support surface of the substrate, at least one antenna electrically coupled with the wireless communication circuitry, a conductive layer configured to interact with the antenna, and an insulative layer intermediate the conductive layer and the antenna. A method of forming a wireless communication device includes providing a substrate having a support surface, forming an antenna upon the support surface, conductively coupling wireless communication circuitry with the antenna, forming an insulative layer over at least a portion of the antenna, and providing a conductive layer over at least a portion of the insulative layer.
摘要翻译：本发明涉及无线通信装置及其形成和操作方法。本发明提供了一种无线通信设备，其包括具有支撑表面的基板，在基板的支撑表面上的无线通信电路，与无线通信电路电耦合的至少一个天线，被配置为与天线相互作用的导电层，以及在导电层和天线之间的绝缘层。一种形成无线通信设备的方法包括提供具有支撑表面的基板，在支撑表面上形成天线，将无线通信电路与天线导电耦合，在天线的至少一部分上形成绝缘层，并提供绝缘层的至少一部分上的导电层。

6. 发明申请

US20060027326A1 Semiconductor substrate processing chamber and substrate transfer chamber interfacial structure 审中-公开
标题翻译：半导体衬底处理室和衬底转移室界面结构
公开(公告)号：US20060027326A1
公开(公告)日：2006-02-09
申请号：US11208964
申请日：2005-08-22
申请人： Craig Carpenter , Ross Dando , Allen Mardian , Kevin Hamer , Raynald Cantin , Philip Campbell , Kimberly Tschepen , Randy Mercil
发明人： Craig Carpenter , Ross Dando , Allen Mardian , Kevin Hamer , Raynald Cantin , Philip Campbell , Kimberly Tschepen , Randy Mercil
IPC分类号： C23F1/00
CPC分类号： H01L21/67126 , C23C16/4409 , C23C16/54 , Y10S414/139
摘要： A semiconductor substrate processor includes a substrate transfer chamber and a plurality of substrate processing chambers connected therewith. An interfacial structure is received between at least one of the processing chambers and the transfer chamber. The interfacial structure includes a substantially non-metallic, thermally insulative mass of material interposed between the one processing chamber and the transfer chamber. The mass is of sufficient volume to effectively reduce heat transfer from the processing chamber to the transfer chamber than would otherwise occur in the absence of said mass of material. An interfacial structure includes a body having a substrate passageway extending therethrough. The passageway includes walls at least a portion of which are substantially metallic. The body includes material peripheral of the walls which is substantially non-metallic and thermally insulative. The substantially non-metallic material has mounting openings extending at least partially therein.
摘要翻译：半导体衬底处理器包括衬底传送室和与之连接的多个衬底处理室。在至少一个处理室和传送室之间接收界面结构。界面结构包括插入在一个处理室和传送室之间的基本上非金属的绝热材料块。质量足够的体积以有效地减少从处理室到传送室的传热比否则不存在所述材料块的情况。界面结构包括具有延伸穿过其中的基底通道的主体。该通道包括其至少一部分基本上是金属的壁。主体包括基本上非金属和热绝缘的壁的材料周边。基本上非金属材料具有其中至少部分延伸的安装开口。

7. 发明申请

US20050241581A1 Chemical vapor deposition apparatuses and deposition methods 审中-公开
标题翻译：化学气相沉积装置和沉积方法
公开(公告)号：US20050241581A1
公开(公告)日：2005-11-03
申请号：US11175523
申请日：2005-07-05
申请人： Craig Carpenter , Ross Dando , Philip Campbell , Allen Mardian , Jeff Fuss , Randy Mercil
发明人： Craig Carpenter , Ross Dando , Philip Campbell , Allen Mardian , Jeff Fuss , Randy Mercil
IPC分类号： C23C16/44 , C23C16/455 , C30B25/08 , C23C16/00
CPC分类号： C23C16/45544 , C30B25/08
摘要： A chemical vapor deposition (CVD) apparatus includes a deposition chamber defined partly by a chamber wall. The chamber wall has an innermost surface inside the chamber and an outermost surface outside the chamber. The apparatus further includes a valve body having a seat between the innermost and outermost surfaces of the chamber wall. The chamber wall can be a lid and the valve can include a portion of the lid as at least a part of the seat. The valve body can include at least a part of a valve housing between the innermost and outermost surfaces of the chamber wall. Such a valve body can even include a portion of the chamber wall as at least part of the valve housing. The deposition apparatus can further include at least a part of a process chemical inlet to the valve body between the innermost and outermost surfaces of the chamber wall. In one example, the chamber wall can form at least a part of the chemical inlet. A deposition method includes temporarily isolating a process chemical supply line from a deposition chamber at a chamber wall of the deposition chamber. While isolated at the chamber wall, the supply line can be filled to a first pressure with chemical through a supply valve upstream from the chamber wall. The chemical can be released from the supply line into the deposition chamber at the chamber wall. The supply line can be again temporarily isolated from the deposition chamber at the chamber wall.
摘要翻译：化学气相沉积（CVD）装置包括由室壁部分地限定的沉积室。室壁具有在腔室内的最内表面和室外的最外表面。该装置还包括阀体，其具有在室壁的最内表面和最外表面之间的座。室壁可以是盖子，并且阀门可以包括作为座椅的至少一部分的盖子的一部分。阀体可以包括在室壁的最内表面和最外表面之间的阀壳的至少一部分。这种阀体甚至可以包括作为阀壳体的至少一部分的室壁的一部分。沉积设备还可以包括在室壁的最内表面和最外表面之间的阀体的至少一部分过程化学品入口。在一个示例中，室壁可以形成化学品入口的至少一部分。沉积方法包括将沉积室的沉积室临时隔离工艺化学品供应管线。虽然在室壁处隔离，但是供应管线可以通过来自室壁上游的供应阀将化学物质填充到第一压力。化学品可以从供应管线释放到室壁处的沉积室中。供应管线可以再次临时从室壁处的沉积室隔离。

8. 发明申请

US20050078462A1 Laser assisted material deposition 有权
标题翻译：激光辅助材料沉积
公开(公告)号：US20050078462A1
公开(公告)日：2005-04-14
申请号：US10683806
申请日：2003-10-10
申请人： Ross Dando , Dan Gealy , Craig Carpenter , Philip Campbell , Allen Mardian
发明人： Ross Dando , Dan Gealy , Craig Carpenter , Philip Campbell , Allen Mardian
IPC分类号： C23C16/48 , H01L21/314 , H01L29/78
CPC分类号： H01L21/02271 , C23C16/45523 , C23C16/483 , H01L21/0228 , H01L21/3141 , H01L29/78
摘要： Apparatus is provided for a method of forming a film on a substrate that includes activating a gas precursor to deposit a material on the substrate by irradiating the gas precursor with electromagnetic energy at a frequency tuned to an absorption frequency of the gas precursor. The electromagnetic energy can be provided by an array of lasers. The frequency of the laser beam is selected by switching from one laser in the array to another laser in the array. The laser array may include laser diodes, one or more tunable lasers, solid state lasers, or gas lasers. The frequency of the electromagnetic energy is selected to impart specific amounts of energy to a gas precursor at a specific frequency that provides point of use activation of the gas precursor.
摘要翻译：提供了一种在衬底上形成膜的方法，该方法包括通过用调谐到气体前体的吸收频率的频率的电磁能照射气体前体来激活气体前体以将材料沉积在衬底上。电磁能可由激光阵列提供。通过从阵列中的一个激光器切换到阵列中的另一个激光器来选择激光束的频率。激光器阵列可以包括激光二极管，一个或多个可调激光器，固态激光器或气体激光器。选择电磁能量的频率以将特定量的能量以提供气体前体的使用激活的特定频率赋予气体前体。

9. 发明申请

US20050011974A1 Methods of operating a liquid vaporizer 失效
标题翻译：操作液体蒸发器的方法
公开(公告)号：US20050011974A1
公开(公告)日：2005-01-20
申请号：US10917640
申请日：2004-08-13
申请人： Ross Dando , Allen Mardian , Raynald Cantin , Gurtej Sandhu
发明人： Ross Dando , Allen Mardian , Raynald Cantin , Gurtej Sandhu
IPC分类号： C23C16/448 , F02M25/025 , F02M25/032 , H01L21/00 , B05B1/30
CPC分类号： H01L21/6708 , C23C16/4481
摘要： The present invention is generally directed to a vaporizer with positive liquid shut-off. In one illustrative embodiment, the vaporizer is comprised of a body, a liquid inlet and a carrier gas inlet coupled to the body, a nozzle positioned within the body, the nozzle having at least one opening formed therethrough that defines a vaporized liquid exit, and a positive shut-off valve, a portion of which is adapted to engage the vaporized liquid exit of the nozzle. In another illustrative embodiment, the vaporizer is comprised of a body, a liquid inlet and a carrier gas inlet coupled to the body and a plurality of peltier cells coupled to the body.
摘要翻译：本发明一般涉及具有正液体截止的汽化器。在一个说明性实施例中，蒸发器包括主体，液体入口和连接到主体的载气入口，位于主体内的喷嘴，喷嘴具有限定蒸发的液体出口的至少一个通过其形成的开口，以及正截止阀，其一部分适于接合喷嘴的汽化液体出口。在另一个说明性实施例中，蒸发器包括主体，液体入口和连接到主体的载气入口以及耦合到主体的多个珀耳帖细胞。

10. 发明申请

US20070190785A1 Methods, apparatus, and systems for causing fluid to flow through or into via holes, vents, and other openings or recesses that communicate with surfaces of substrates of semiconductor device components 有权
标题翻译：使流体流过或穿过通孔，通风口以及与半导体器件部件的基板表面连通的其它开口或凹槽的方法，装置和系统
公开(公告)号：US20070190785A1
公开(公告)日：2007-08-16
申请号：US11351640
申请日：2006-02-10
申请人： Ross Dando
发明人： Ross Dando
IPC分类号： H01L21/302 , H01L21/306
CPC分类号： H01L21/30604 , C09K13/00 , H01L21/67075 , H01L21/6708 , H01L21/67086
摘要： A method for removing material from surfaces of at least a portion of at least one recess or at least one aperture extending into a surface of a substrate includes pressurizing fluid so as to cause the fluid to flow into the at least one recess or at least one aperture. The fluid may be pressurized by generating a pressure differential across the substrate, which causes the fluid to flow into or through the at least one aperture or recess. Apparatus for pressurizing fluid so as to cause it to flow into or through recesses or apertures in a substrate are also disclosed.
摘要翻译：从至少一个凹部的至少一部分的至少一部分的表面上移除材料的方法或至少一个延伸到衬底的表面中的孔的方法包括加压流体，以使流体流入至少一个凹部或至少一个凹部光圈。流体可以通过在衬底上产生压差来加压，这导致流体流入或穿过至少一个孔或凹槽。还公开了用于加压流体以使其流入或穿过基底中的凹部或孔的装置。

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