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1. 发明授权

US09018561B2 High power seed/amplifier laser system with beam shaping intermediate the seed and amplifier 有权
公开(公告)号：US09018561B2
公开(公告)日：2015-04-28
申请号：US12284031
申请日：2008-09-17
申请人： Richard L Sandstrom , Daniel J. W. Brown , Thomas Hoffmann , Jason D Robinson , Craig W Unick
发明人： Richard L Sandstrom , Daniel J. W. Brown , Thomas Hoffmann , Jason D Robinson , Craig W Unick
IPC分类号： B23K26/00 , C30B13/24 , B23K26/06 , B23K26/073 , C30B29/06 , H01L21/67
CPC分类号： C30B13/24 , B23K26/0622 , B23K26/0738 , C30B29/06 , H01L21/67115
摘要： An apparatus and method of operation for a high power broad band elongated thin beam laser annealing light source, which may comprise a gas discharge seed laser oscillator having a resonance cavity, providing a seed laser output pulse; a gas discharge amplifier laser amplifying the seed laser output pulse to provide an amplified seed laser pulse output; a divergence correcting multi-optical element optical assembly intermediate the seed laser and the amplifier laser. The divergence correcting optical assembly may adjust the size and/or shape of the seed laser output pulse within a discharge region of the amplifier laser in order to adjust an output parameter of the amplified seed laser pulse output. The divergence correcting optical assembly may comprise a telescope with an adjustable focus. The adjustable telescope may comprise an active feedback-controlled actuator based upon a sensed parameter of the amplified seed laser output from the amplifier laser.

2. 发明申请

US20090116530A1 High power seed/amplifier laser system with beam shaping intermediate the seed and amplifier 有权
标题翻译：大功率种子/放大器激光系统，具有光束成形中间种子和放大器
公开(公告)号：US20090116530A1
公开(公告)日：2009-05-07
申请号：US12284031
申请日：2008-09-17
申请人： Richard L. Sandstrom , Daniel J. W. Brown , Thomas Hofmann , Jason D. Robinson , Craig W. Unick
发明人： Richard L. Sandstrom , Daniel J. W. Brown , Thomas Hofmann , Jason D. Robinson , Craig W. Unick
IPC分类号： H01S3/22
CPC分类号： C30B13/24 , B23K26/0622 , B23K26/0738 , C30B29/06 , H01L21/67115
摘要： An apparatus and method of operation for a high power broad band elongated thin beam laser annealing light source, which may comprise a gas discharge seed laser oscillator having a resonance cavity, providing a seed laser output pulse; a gas discharge amplifier laser amplifying the seed laser output pulse to provide an amplified seed laser pulse output; a divergence correcting multi-optical element optical assembly intermediate the seed laser and the amplifier laser. The divergence correcting optical assembly may adjust the size and/or shape of the seed laser output pulse within a discharge region of the amplifier laser in order to adjust an output parameter of the amplified seed laser pulse output. The divergence correcting optical assembly may comprise a telescope with an adjustable focus. The adjustable telescope may comprise an active feedback-controlled actuator based upon a sensed parameter of the amplified seed laser output from the amplifier laser.
摘要翻译：一种用于大功率宽带细长光束激光退火光源的装置和方法，其可以包括具有谐振腔的气体放电种子激光振荡器，提供种子激光输出脉冲; 气体放电放大器激光器，放大种子激光输出脉冲，以提供放大的种子激光脉冲输出; 种子激光器和放大器激光器之间的发散校正多光学元件光学组件。发散校正光学组件可以在放大器激光器的放电区域内调整种子激光器输出脉冲的尺寸和/或形状，以便调节放大的种子激光脉冲输出的输出参数。发散校正光学组件可以包括具有可调焦点的望远镜。可调节望远镜可以包括基于从放大器激光器输出的放大的种子激光器的感测参数的主动反馈控制致动器。

3. 发明授权

US07088758B2 Relax gas discharge laser lithography light source 有权
标题翻译：放气放电激光光刻光源
公开(公告)号：US07088758B2
公开(公告)日：2006-08-08
申请号：US10956784
申请日：2004-10-01
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Thomas A. Yager , Alexander I. Ershov , Robert J. Rafac , German E. Rylov
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Thomas A. Yager , Alexander I. Ershov , Robert J. Rafac , German E. Rylov
IPC分类号： H01S3/22
CPC分类号： G01J1/429 , B23K26/0622 , B23K2101/40 , G01J9/02 , G02B26/002 , G02B26/0875 , G03F7/70041 , G03F7/70575 , H01S3/005 , H01S3/0057 , H01S3/1055 , H01S3/225
摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
摘要翻译：公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在色散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置脉冲光束在可变折射光学元件上。可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。脉冲参数测量和脉冲调制控制的其它方面包括响应来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

4. 发明授权

US06801560B2 Line selected F2 two chamber laser system 失效
公开(公告)号：US06801560B2
公开(公告)日：2004-10-05
申请号：US10056619
申请日：2002-01-23
申请人： David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scott T. Smith , William G. Hulburd
发明人： David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scott T. Smith , William G. Hulburd
IPC分类号： H01S322
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.

5. 发明授权

US08170078B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US08170078B2
公开(公告)日：2012-05-01
申请号：US12987039
申请日：2011-01-07
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , H01S3/005 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/083 , H01S3/10092 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2383 , H01S2301/02
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束脉冲，其可以包括环形功率放大级。

6. 发明申请

US20100142582A1 GAS DISCHARGE LASER CHAMBER 有权
标题翻译：气体放电激光室
公开(公告)号：US20100142582A1
公开(公告)日：2010-06-10
申请号：US12603486
申请日：2009-10-21
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
IPC分类号： H01S3/038 , H01S3/03
CPC分类号： H01S3/036
摘要： One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
摘要翻译：所公开的主题的一个方面描述了气体放电激光室。气体放电激光室包括形成在第一电极和第二电极之间的放电区域，用于使气体循环通过放电区域的切向风扇，其中风扇靠近放电区域的输入侧，输入侧隔音板接近到放电区域的输入侧。输入侧声挡板包括消失点前缘，消失点后缘，气流平滑偏移表面，使来自输入侧声挡板的表面的气流与放电区域中的阴极支撑体的输入侧对准，由多个沟槽分开的多个脊，其中所述多个脊和所述多个沟槽与通过所述放电区域的气体流动方向对齐，并且其中所述多个脊具有约0.3和约0.7英寸之间的随机间距。

7. 发明申请

US20100108913A1 Laser system 有权
公开(公告)号：US20100108913A1
公开(公告)日：2010-05-06
申请号：US11787180
申请日：2007-04-13
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
IPC分类号： G21G5/00 , H01S3/225 , H01S3/083
CPC分类号： H01S3/225 , H01S3/005 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/083 , H01S3/10092 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2383 , H01S2301/02
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

8. 发明授权

US07154928B2 Laser output beam wavefront splitter for bandwidth spectrum control 有权
标题翻译：激光输出光束波前分离器，用于带宽频谱控制
公开(公告)号：US07154928B2
公开(公告)日：2006-12-26
申请号：US10875662
申请日：2004-06-23
申请人： Richard L. Sandstrom , Daniel J. W. Brown , Alexander I. Ershov , Igor V. Fomenkov , William N. Partlo
发明人： Richard L. Sandstrom , Daniel J. W. Brown , Alexander I. Ershov , Igor V. Fomenkov , William N. Partlo
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/0812 , G03F7/70025 , G03F7/70575 , H01S3/08059 , H01S3/097 , H01S3/1055 , H01S3/1305
摘要： Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the beam containing the respective pulse on the optic; a tuning mechanism operative to select at least one angle of incidence of the beam containing the respective pulse upon the optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the pulse to return from the optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each having one of at least two different selected center wavelengths.
摘要翻译：在窄带短脉冲持续时间气体放电激光输出光脉冲光束产生系统中提供带宽控制的装置/方法，产生包括选定的脉冲重复轨迹的脉冲的波束，例如包括色散带宽选择光学器件，用于为每个脉冲选择至少一个中心波长至少部分地由在光学元件上包含相应脉冲的光束的入射角确定; 调谐机构，用于选择在光学元件上包含相应脉冲的光束的至少一个入射角; 所述调谐机构包括多个入射角选择元件，每个入射角选择元件限定所述脉冲的不同的空间分离但不是时间上分离的部分的入射角，以从所述光学器件返回包括多个空间分离但不时间分离的部分的激光脉冲每个具有至少两个不同选择的中心波长中的一个。

9. 发明授权

US07061961B2 Very narrow band, two chamber, high rep-rate gas discharge laser system 有权
公开(公告)号：US07061961B2
公开(公告)日：2006-06-13
申请号：US11199691
申请日：2005-08-09
申请人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scot T. Smith , William G. Hulburd , Jeffrey Oicles
发明人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scot T. Smith , William G. Hulburd , Jeffrey Oicles
IPC分类号： H01S3/22
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.

10. 发明授权

US06625191B2 Very narrow band, two chamber, high rep rate gas discharge laser system 有权
公开(公告)号：US06625191B2
公开(公告)日：2003-09-23
申请号：US10012002
申请日：2001-11-30
申请人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
发明人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
IPC分类号： H01S322
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

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