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1. 发明申请

US20130077078A1 Lithographic Apparatus and Substrate Handling Method 审中-公开
标题翻译：平版印刷设备和基板处理方法
公开(公告)号：US20130077078A1
公开(公告)日：2013-03-28
申请号：US13597831
申请日：2012-08-29
申请人： Raymond Wilhelmus Louis LAFARRE , Sjoerd Nicolaas Lambertus Donders , Antonius Franciscus Johannes De Groot , Hubert Marie Segers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Johannes Charles Adrianus Van Den Berg , Jan Steven Christiaan Westerlaken , Yang-Shan Huang , Christiaan Louis Valentin
发明人： Raymond Wilhelmus Louis LAFARRE , Sjoerd Nicolaas Lambertus Donders , Antonius Franciscus Johannes De Groot , Hubert Marie Segers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Johannes Charles Adrianus Van Den Berg , Jan Steven Christiaan Westerlaken , Yang-Shan Huang , Christiaan Louis Valentin
IPC分类号： G03B27/58
CPC分类号： G03F7/70708
摘要： A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.
摘要翻译：一种光刻设备包括：基板台，其构造成保持基板和夹持器，所述夹具布置成将基板定位在基板台上。夹持器包括布置成将基板夹在其顶侧的静电夹。静电夹具被布置成夹持衬底的顶表面的周向外部区域的至少一部分。本发明提供了一种基板处理方法，包括通过夹持器将基板定位在光刻设备的基板台上。通过使用夹持器的静电夹持器将基板夹在其顶侧。

2. 发明授权

US07486384B2 Lithographic support structure 有权
标题翻译：光刻支撑结构
公开(公告)号：US07486384B2
公开(公告)日：2009-02-03
申请号：US10813687
申请日：2004-03-31
申请人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
发明人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
摘要翻译：本发明涉及具有支撑结构以支撑和移动物体（如基底）的光刻投影装置。支撑结构可以是具有机器人臂的机器人，其具有支撑框架的支撑框架，例如。底物。支撑框架包括具有用于在移动期间保持基板的一个或多个夹具的夹持结构。机器人手臂包括一个或多个柔顺部件。夹具可以是具有氧化的上表面的Johnson-Raybeck效应型夹具。为了更好地去夹紧，可以向夹具提供RF AC衰减的去钳位电压。该装置可以仅用一个单一的衬底清洁。

3. 发明申请

US20080297758A1 Lithographic support structure 审中-公开
标题翻译：光刻支撑结构
公开(公告)号：US20080297758A1
公开(公告)日：2008-12-04
申请号：US12213930
申请日：2008-06-26
申请人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Van Meer , Patrick Johannes Cornelus Smulders , Franciscus Andreas Cornelis Spanjers , Johannes Petrus Martinus Ber Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
发明人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Van Meer , Patrick Johannes Cornelus Smulders , Franciscus Andreas Cornelis Spanjers , Johannes Petrus Martinus Ber Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.
摘要翻译：本发明涉及一种用于传送物体（W）的传送装置。传送装置包括用于在第一位置处夹持物体（W）的至少一个然后在靠近接收器（20）的第二位置处释放物体（W）的至少一个并且释放物体（W）的夹持器（15）在靠近接收器（20）的第二位置处夹持物体之后的第一位置。传送装置还设置有测量装置（22），该测量装置设置成在至少一个维度上测量夹具（15）相对于接收器（20）的相对位置。此外，基于测量的相对位置，相对于期望的相对位置来定义相对位置误差。调整夹持器（15）和接收器（20）的相对位置以最小化第二位置中的相对位置误差。

4. 发明授权

US07394525B2 Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing method 失效
标题翻译：可替换物体处理装置，包括这种可更换物体处理装置的光刻设备和装置制造方法
公开(公告)号：US07394525B2
公开(公告)日：2008-07-01
申请号：US10969244
申请日：2004-10-21
申请人： Jan Jaap Kuit , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
发明人： Jan Jaap Kuit , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70741
摘要： The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.
摘要翻译：本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统; 构造成支撑图案形成装置的图案形成装置支撑件，放置在图案形成装置支撑件上的图案形成装置能够在其横截面上赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 配置成将图案化的辐射束投射到基板的目标部分上的投影系统，以及包括用于与图案形成装置支撑件和装载站更换图案形成装置的单个机器人的图案形成装置处理装置，其中，所述机器人包括第一保持装置，其构造成将图案形成装置保持在第一保持位置，以及第二保持装置，其构造成将图案形成装置保持在第二保持位置。这种单机器人可以快速准确地交换图案形成装置。

5. 发明授权

US07106420B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07106420B2
公开(公告)日：2006-09-12
申请号：US11015763
申请日：2004-12-20
申请人： Jan Jaap Kuit , Dirk Jan Bijvoet , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
发明人： Jan Jaap Kuit , Dirk Jan Bijvoet , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
IPC分类号： G03B27/58
CPC分类号： G03F7/70733
摘要： The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support. The lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with a exchangeable object station and a support, the exchangeable object being one of the substrate and the patterning device and the support being one of the substrate support and the patterning device support, the exchangeable object handling apparatus including an intermediate holding device for holding an exchangeable object, which intermediate holding device can interact with the support to place an exchangeable object on or take an exchangeable object from the support, and a robot which can exchange an exchangeable object with the support, the intermediate holding device and said exchangeable object station.

6. 发明授权

US07408618B2 Lithographic apparatus substrate alignment 有权
标题翻译：平版印刷设备基板对准
公开(公告)号：US07408618B2
公开(公告)日：2008-08-05
申请号：US11170796
申请日：2005-06-30
申请人： Raimond Visser
发明人： Raimond Visser
IPC分类号： G03B27/42 , G03B27/32 , G01B11/00
CPC分类号： G03F9/7084 , G03F9/7076 , G03F9/7088
摘要： A method for aligning a substrate in a lithographic apparatus includes determining from a geometric reference of the substrate a position of a window on the substrate. The window indicates an area in which an alignment mark of the substrate may be expected. Then, a position of the alignment mark is measured in the window. A relationship between the measured position of the alignment mark and the position of the window is determined. The relationship is stored in a database and the substrate is aligned making use of the measured position of the alignment mark.The above may be repeated for a following aligning of the substrate, prior however to the measuring of the position of the alignment mark in the window, the position of the window is amended making use of the relationship between the measured position of the alignment mark and the position of the window as stored in the database for one or more preceding alignings.
摘要翻译：在光刻设备中对准衬底的方法包括从衬底的几何参考确定窗口在衬底上的位置。该窗口表示可以预期基板的对准标记的区域。然后，在窗口中测量对准标记的位置。确定对准标记的测量位置和窗口的位置之间的关系。将该关系存储在数据库中，并使用对准标记的测量位置对准基板。可以重复以上对于基板的跟随对准，然而，在测量窗口中的对准标记的位置之前，利用对准标记的测量位置和对准标记的测量位置之间的关系来修改窗口的位置存储在数据库中的窗口的位置用于一个或多个先前的对齐。

7. 发明授权

US08064730B2 Device manufacturing method, orientation determination method and lithographic apparatus 有权
标题翻译：器件制造方法，取向确定方法和光刻设备
公开(公告)号：US08064730B2
公开(公告)日：2011-11-22
申请号：US10935739
申请日：2004-09-08
申请人： Raimond Visser , Leo Wilhelmus Maria Kuipers
发明人： Raimond Visser , Leo Wilhelmus Maria Kuipers
IPC分类号： G06K9/00
CPC分类号： G03F9/7003 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method to determine a rotation of a substrate with respect to the patterning device without using a reference mark on the substrate is presented. At least two structures having corresponding features and present on the substrate, e.g. previously projected patterns, are imaged with a known position with respect to a measurement coordinate system. A distance vector between the at least two structures is determined. From the distance vector, a rotation angle is calculated. In an embodiment of the invention, there is provided a method to estimate a position of the substrate from the acquired image(s). A position is measured and used as a reference position for subsequent substrates of which the rotation angle is to be determined.
摘要翻译：提出了一种在不使用基板上的参考标记的情况下确定基板相对于图案形成装置的旋转的方法。至少两个具有相应特征并且存在于衬底上的结构。先前投影的图案，以相对于测量坐标系的已知位置成像。确定至少两个结构之间的距离矢量。从距离向量计算旋转角度。在本发明的实施例中，提供了一种从所获取的图像估计衬底的位置的方法。测量位置并将其用作要确定旋转角度的后续衬底的参考位置。

8. 发明授权

US07283225B2 Particle detection device, lithographic apparatus and device manufacturing method 失效
标题翻译：粒子检测装置，光刻设备及器件制造方法
公开(公告)号：US07283225B2
公开(公告)日：2007-10-16
申请号：US11242146
申请日：2005-10-04
申请人： Johannes Onvlee , Raimond Visser , Peter Ferdinand Greve , Johannes Hendrikus Gertrudis Franssen , Erwin Theodorus Jacoba Verhagen
发明人： Johannes Onvlee , Raimond Visser , Peter Ferdinand Greve , Johannes Hendrikus Gertrudis Franssen , Erwin Theodorus Jacoba Verhagen
IPC分类号： G01N21/00
CPC分类号： G03F7/70916 , G01N21/94 , G01N21/956 , G03F7/7085
摘要： To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level. The detector system may include a radiation detector device configured to generate the first detector signal in response to radiation incident on at least one predetermined part of the radiation detector device and a radiation blocking assembly configured to prevent radiation not originating from a particle from being incident on the predetermined part of the detector device.
摘要翻译：为了能够区分粒子和重影粒子，检测器系统从实际粒子的辐射中解析来自重影粒子的辐射。检测器系统输出对应于入射在检测器系统的不同部分上的辐射强度的至少两个检测器信号，或者检测器系统输出对应于不同波长的辐射强度入射在检测器系统上的至少两个检测器信号。如果从重影粒子接收到辐射，则并非所述至少两个检测器信号中的每一个具有高于预定阈值电平的电平，而从粒子接收的辐射导致信号具有高于阈值电平的基本上相同的电平。检测器系统可以包括辐射检测器装置，其被配置为响应于入射到辐射检测器装置的至少一个预定部分上的辐射而产生第一检测器信号;以及辐射阻挡组件，其被配置为防止不是源自颗粒的辐射被入射检测器装置的预定部分。

9. 发明申请

US20060087636A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060087636A1
公开(公告)日：2006-04-27
申请号：US10969244
申请日：2004-10-21
申请人： Jan Kuit , Jan Hoogkamp , Hubert Segers , Raimond Visser , Johannes Maquine
发明人： Jan Kuit , Jan Hoogkamp , Hubert Segers , Raimond Visser , Johannes Maquine
IPC分类号： G03B27/58
CPC分类号： G03F7/70741
摘要： The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.
摘要翻译：本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统; 构造成支撑图案形成装置的图案形成装置支撑件，放置在图案形成装置支撑件上的图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 配置成将图案化的辐射束投射到基板的目标部分上的投影系统，以及包括用于与图案形成装置支撑件和装载站更换图案形成装置的单个机器人的图案形成装置处理装置，其中，所述机器人包括第一保持装置，其构造成将图案形成装置保持在第一保持位置，以及第二保持装置，其构造成将图案形成装置保持在第二保持位置。这种单机器人可以快速准确地交换图案形成装置。

10. 发明申请

US20060066833A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060066833A1
公开(公告)日：2006-03-30
申请号：US11015763
申请日：2004-12-20
申请人： Jan Kuit , Dirk Bijvoet , Jan Hoogkamp , Hubert Segers , Raimond Visser , Johannes Maquine
发明人： Jan Kuit , Dirk Bijvoet , Jan Hoogkamp , Hubert Segers , Raimond Visser , Johannes Maquine
IPC分类号： G03B27/58
CPC分类号： G03F7/70733
摘要： The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support. The lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with a exchangeable object station and a support, the exchangeable object being one of the substrate and the patterning device and the support being one of the substrate support and the patterning device support, the exchangeable object handling apparatus including an intermediate holding device for holding an exchangeable object, which intermediate holding device can interact with the support to place an exchangeable object on or take an exchangeable object from the support, and a robot which can exchange an exchangeable object with the support, the intermediate holding device and said exchangeable object station.
摘要翻译：本发明涉及一种包括投影系统的光刻设备，该投影系统被配置为将图案化的辐射束投影到保持在基板支撑件上的基板的目标部分上，图案化的辐射束被图案化装置支撑的图案形成装置图案化。光刻设备包括可交换物体处理装置，用于与可交换物体站和支撑体交换可交换物体，可交换物体是基板和图案形成装置之一，支撑体是基板支撑件和图案形成装置支架之一，所述可交换物体处理装置包括用于保持可更换物体的中间保持装置，所述中间保持装置可以与所述支撑件相互作用以将可更换对象放置在所述支撑件上或从所述支撑件获取可更换物体;以及机器人，其可以与支撑件，中间保持装置和所述可更换对象站。

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