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1. 发明授权

US07283225B2 Particle detection device, lithographic apparatus and device manufacturing method 失效
标题翻译：粒子检测装置，光刻设备及器件制造方法
公开(公告)号：US07283225B2
公开(公告)日：2007-10-16
申请号：US11242146
申请日：2005-10-04
申请人： Johannes Onvlee , Raimond Visser , Peter Ferdinand Greve , Johannes Hendrikus Gertrudis Franssen , Erwin Theodorus Jacoba Verhagen
发明人： Johannes Onvlee , Raimond Visser , Peter Ferdinand Greve , Johannes Hendrikus Gertrudis Franssen , Erwin Theodorus Jacoba Verhagen
IPC分类号： G01N21/00
CPC分类号： G03F7/70916 , G01N21/94 , G01N21/956 , G03F7/7085
摘要： To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level. The detector system may include a radiation detector device configured to generate the first detector signal in response to radiation incident on at least one predetermined part of the radiation detector device and a radiation blocking assembly configured to prevent radiation not originating from a particle from being incident on the predetermined part of the detector device.
摘要翻译：为了能够区分粒子和重影粒子，检测器系统从实际粒子的辐射中解析来自重影粒子的辐射。检测器系统输出对应于入射在检测器系统的不同部分上的辐射强度的至少两个检测器信号，或者检测器系统输出对应于不同波长的辐射强度入射在检测器系统上的至少两个检测器信号。如果从重影粒子接收到辐射，则并非所述至少两个检测器信号中的每一个具有高于预定阈值电平的电平，而从粒子接收的辐射导致信号具有高于阈值电平的基本上相同的电平。检测器系统可以包括辐射检测器装置，其被配置为响应于入射到辐射检测器装置的至少一个预定部分上的辐射而产生第一检测器信号;以及辐射阻挡组件，其被配置为防止不是源自颗粒的辐射被入射检测器装置的预定部分。

2. 发明申请

US20090148604A1 Substrate Processing Apparatus and Device Manufacturing Method 审中-公开
标题翻译：基板加工装置及装置制造方法
公开(公告)号：US20090148604A1
公开(公告)日：2009-06-11
申请号：US12271362
申请日：2008-11-14
申请人： Raimond VISSER , Pieter Renaat Maria Hennus , Johannes Hendrikus Gertrudis Franssen , Erwin Theodorus Jacoba Verhagen
发明人： Raimond VISSER , Pieter Renaat Maria Hennus , Johannes Hendrikus Gertrudis Franssen , Erwin Theodorus Jacoba Verhagen
IPC分类号： B05D3/00 , C23C14/00
CPC分类号： H01L21/67201 , G03F7/70841
摘要： An exemplary substrate processing apparatus has a vacuum chamber and a load lock for gas removal. The load lock has a support table to support a substrate. A cover plate may be provided in the load lock, the cover plate having a lower surface facing the upper surface of the support table. Openings may be provided in the lower surface of the cover plate to allow removal of gas from over the substrate in a direction substantially normal to the lower surface. In an embodiment, a gas pressure between the upper surface of the support table and the substrate is initially reduced through the opening to a certain pressure below a concurrent load lock pressure. When the remainder of the load lock pressure has dropped below the certain, gas pressure between the upper surface of the support table and the substrate is reduced together with the remainder load lock pressure.
摘要翻译：示例性的基板处理装置具有真空室和用于除气的装载锁。负载锁具有支撑台以支撑基板。盖板可以设置在装载锁中，盖板具有面向支撑台的上表面的下表面。可以在盖板的下表面中设置开口，以允许基本上垂直于下表面的方向从基板上除去气体。在一个实施例中，支撑台的上表面和基板之间的气体压力最初通过开口减小到低于同时的负载锁定压力的一定压力。当负载锁定压力的其余部分已经下降到特定值以下时，支撑台的上表面和基板之间的气体压力与剩余的负载锁定压力一起减小。

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