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1. 发明授权

US07106420B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07106420B2
公开(公告)日：2006-09-12
申请号：US11015763
申请日：2004-12-20
申请人： Jan Jaap Kuit , Dirk Jan Bijvoet , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
发明人： Jan Jaap Kuit , Dirk Jan Bijvoet , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
IPC分类号： G03B27/58
CPC分类号： G03F7/70733
摘要： The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support. The lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with a exchangeable object station and a support, the exchangeable object being one of the substrate and the patterning device and the support being one of the substrate support and the patterning device support, the exchangeable object handling apparatus including an intermediate holding device for holding an exchangeable object, which intermediate holding device can interact with the support to place an exchangeable object on or take an exchangeable object from the support, and a robot which can exchange an exchangeable object with the support, the intermediate holding device and said exchangeable object station.

2. 发明授权

US07394525B2 Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing method 失效
标题翻译：可替换物体处理装置，包括这种可更换物体处理装置的光刻设备和装置制造方法
公开(公告)号：US07394525B2
公开(公告)日：2008-07-01
申请号：US10969244
申请日：2004-10-21
申请人： Jan Jaap Kuit , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
发明人： Jan Jaap Kuit , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70741
摘要： The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.
摘要翻译：本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统; 构造成支撑图案形成装置的图案形成装置支撑件，放置在图案形成装置支撑件上的图案形成装置能够在其横截面上赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 配置成将图案化的辐射束投射到基板的目标部分上的投影系统，以及包括用于与图案形成装置支撑件和装载站更换图案形成装置的单个机器人的图案形成装置处理装置，其中，所述机器人包括第一保持装置，其构造成将图案形成装置保持在第一保持位置，以及第二保持装置，其构造成将图案形成装置保持在第二保持位置。这种单机器人可以快速准确地交换图案形成装置。

3. 发明授权

US07349067B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07349067B2
公开(公告)日：2008-03-25
申请号：US10892394
申请日：2004-07-16
申请人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
发明人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/7075 , Y10S414/14
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.
摘要翻译：提出了一种具有改进的转印单元的光刻设备。光刻设备包括处理单元，该处理单元执行涉及可更换物体的光刻处理，其中处理单元包括提供辐射束的照明系统，支撑结构，其被配置为支撑图案形成装置，所述图案形成装置将期望的图案赋予辐射束，被配置为保持衬底的衬底保持器，以及配置成将所述图案化的光束投影到所述衬底的目标部分上的投影系统。光刻设备还包括包括单个机器人的传送单元。单个机器人被配置为将第一可交换对象从加载站传送到处理单元，并将第二可更换对象从处理单元传送到放电站。

4. 发明授权

US07408615B2 Lithographic apparatus and device manufacturing method 失效
公开(公告)号：US07408615B2
公开(公告)日：2008-08-05
申请号：US10871528
申请日：2004-06-21
申请人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
发明人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
IPC分类号： G03B27/42
CPC分类号： G03F7/70733 , G03F7/7075 , H01L21/67742 , Y10S414/14
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

5. 发明授权

US07345736B2 Lithographic apparatus and device manufacturing method 失效
公开(公告)号：US07345736B2
公开(公告)日：2008-03-18
申请号：US10927532
申请日：2004-08-27
申请人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
发明人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70733 , G03F7/7075
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

6. 发明授权

US07131999B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07131999B2
公开(公告)日：2006-11-07
申请号：US10950674
申请日：2004-09-28
申请人： Jan Frederik Hoogkamp , Jan Jaap Kuit , Raimond Visser
发明人： Jan Frederik Hoogkamp , Jan Jaap Kuit , Raimond Visser
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , H01L21/68707
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 支撑构造成支撑图案形成装置，图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及机器人，其构造成将可交换物体传送到支撑区域和从支撑区域传递，所述机器人包括臂和端部执行器，所述末端执行器包括构造成承载相应可更换物体的第一和第二托架，并且所述末端执行器可旋转地连接到机器人的臂围绕基本上平行于支撑区域延伸的旋转轴线。

7. 发明申请

US20060066832A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060066832A1
公开(公告)日：2006-03-30
申请号：US10950674
申请日：2004-09-28
申请人： Jan Frederik Hoogkamp , Jan Jaap Kuit , Raimond Visser
发明人： Jan Frederik Hoogkamp , Jan Jaap Kuit , Raimond Visser
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , H01L21/68707
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.

8. 发明授权

US07151590B2 Transport system for a lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备及装置制造方法的运输系统
公开(公告)号：US07151590B2
公开(公告)日：2006-12-19
申请号：US10784893
申请日：2004-02-24
申请人： Jan Jaap Kuit
发明人： Jan Jaap Kuit
IPC分类号： G03B27/42 , G03B27/72
CPC分类号： G03F7/7075 , G03F7/70991 , Y10S414/135
摘要： A lithographic apparatus and a device manufacturing method is disclosed. In particular, a transport system configured to transport substrates between the lithographic apparatus and a track is disclosed, the track comprising one or more processing devices. The transport system may also transport substrates between the processing devices within the track. In an embodiment, the transport system comprises a transporter pathway along which one or more tracks and lithographic apparatuses are spaced. The substrates can be transported along the transporter pathway by a transporting device adapted to hold a substrate.
摘要翻译：公开了一种光刻设备和设备制造方法。具体地，公开了一种配置成在光刻设备和轨道之间传送基板的传送系统，该轨道包括一个或多个处理设备。传送系统还可以在轨道内的处理装置之间传送衬底。在一个实施例中，传送系统包括传送器通道，一个或多个轨道和光刻设备沿着该传送器通道间隔开。衬底可以通过适于保持衬底的传送装置沿着运送器路径传送。

9. 发明申请

US20070070324A1 Lithographic apparatus, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20070070324A1
公开(公告)日：2007-03-29
申请号：US11238157
申请日：2005-09-29
申请人： Jan Jaap Kuit , Peter Schaap
发明人： Jan Jaap Kuit , Peter Schaap
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , G03F7/7075 , G03F7/70875
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder.
摘要翻译：公开了一种布置成将图案从图案形成结构转印到基板上的光刻设备，其包括被配置为保持基板的基板保持器和被配置为在转印之前，期间或两者期间调节基板的温度的基板温度调节器的衬底到衬底保持器以基本上匹配衬底保持器的温度。

10. 发明授权

US07130019B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07130019B2
公开(公告)日：2006-10-31
申请号：US10986182
申请日：2004-11-12
申请人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Carlo Cornelis Maria Luijten , Bernardus Antonius Johannes Luttikhuis , Michael Ten Bhomer , Ferdy Migchelbrink , Jan Jaap Kuit
发明人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Carlo Cornelis Maria Luijten , Bernardus Antonius Johannes Luttikhuis , Michael Ten Bhomer , Ferdy Migchelbrink , Jan Jaap Kuit
IPC分类号： G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/7095 , G02B7/028 , G03F7/70833 , G03F7/70858 , G03F7/709
摘要： A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10−6/K.
摘要翻译：提供了一种光刻设备，其包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。图案形成装置用于使辐射束在其横截面上具有图案。该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于提供参考表面的隔离参考框架，以及用于测量基板相对于基板的测量系统参考面。参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。

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